JP7268944B2 - メモリスタ構造体の製造方法およびメモリスタ構造体 - Google Patents
メモリスタ構造体の製造方法およびメモリスタ構造体 Download PDFInfo
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- VLXXBCXTUVRROQ-UHFFFAOYSA-N lithium;oxido-oxo-(oxomanganiooxy)manganese Chemical compound [Li+].[O-][Mn](=O)O[Mn]=O VLXXBCXTUVRROQ-UHFFFAOYSA-N 0.000 description 1
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Description
Claims (20)
- 抵抗状態間を対称変調するためのメモリスタ構造体を製造する方法であって、
絶縁基板上に第1の電極および第2の電極を形成することと、
前記第1の電極および前記第2の電極に接触する陽極を形成することと、
前記陽極上にイオン導電体を形成することと、
前記イオン導電体上に陰極を形成することと、
前記陰極上に第3の電極を形成することと、
前記陽極と前記陰極との間のイオンの双方向輸送を可能にし、結果として前記メモリスタ構造体の抵抗調節をもたらすことと、
を含み、前記陽極および前記陰極が同じ準安定材料から形成される、
方法。 - 前記抵抗調節が、前記抵抗状態間の前記対称変調を維持するための抵抗スイッチングを含む、請求項1に記載の方法。
- 前記第1の電極、前記第2の電極、および前記第3の電極が、不活性金属から形成される、請求項1に記載の方法。
- 前記準安定材料が、インターカレートされた可動イオンの濃度に導電率が依存する準安定相分離のイオン電子混合導電体(MIEC)である、請求項1に記載の方法。
- 前記第1の電極と前記第3の電極との間、または前記第2の電極と前記第3の電極との間に電気パルスを印加して書き込み動作を可能にする、請求項1に記載の方法。
- 前記第1の電極と前記第2の電極との間に電気パルスを印加して読み取り動作を可能にする、請求項1に記載の方法。
- 前記イオンの移動が電圧の印加によって可能になり、読み取り動作と書き込み動作を同時に行うことができる、請求項1に記載の方法。
- 前記陽極と前記陰極との間のイオンの化学ポテンシャル差がゼロ近くに維持される、請求項1に記載の方法。
- 抵抗状態間を対称変調するためのメモリスタ構造体であって、
絶縁基板上に形成された第1の電極および第2の電極と、
前記第1の電極および前記第2の電極に接触する陽極と、
前記陽極上に形成されたイオン導電体と、
前記イオン導電体上に形成された陰極と、
前記陰極上に形成された第3の電極と、
を備え、
前記陽極および前記陰極が、同じ準安定材料から形成され、前記準安定材料が、前記陽極と前記陰極との間のイオンの双方向輸送を可能にし、結果として前記メモリスタ構造体の抵抗調節をもたらす、
メモリスタ構造体。 - 前記抵抗調節が、前記抵抗状態間の前記対称変調を維持するための抵抗スイッチングを含む、請求項9に記載の構造体。
- 前記第1の電極、前記第2の電極、および前記第3の電極が不活性金属から形成される、
請求項9に記載の構造体。 - 前記準安定材料が、インターカレートされた可動イオンの濃度に導電率が依存する準安定相分離のイオン電子混合導電体(MIEC)である、請求項9に記載の構造体。
- 前記第1の電極と前記第3の電極との間、または前記第2の電極と前記第3の電極との間に電気パルスを印加して書き込み動作を可能にする、請求項9に記載の構造体。
- 前記第1の電極と前記第2の電極との間に電気パルスを印加して読み取り動作を可能にする、請求項9に記載の構造体。
- 前記イオンの移動が電圧の印加によって可能になり、読み取り動作と書き込み動作を同時に行うことができる、請求項9に記載の構造体。
- 前記陽極と前記陰極との間のイオンの化学ポテンシャル差がゼロ近くに維持される、請求項9に記載の構造体。
- 抵抗状態間を対称変調するためのメモリスタ構造体であって、
同じ準安定材料を含む準安定陽極と準安定陰極との間に形成されたイオン導電層と、
前記準安定陽極および前記準安定陰極に隣接して形成された電極と、
を備え、
前記準安定陽極と前記準安定陰極との間のイオンの双方向輸送により、結果として前記抵抗状態間の前記対称変調を維持するための抵抗スイッチングが行われる、
メモリスタ構造体。 - 前記電極が不活性金属から形成され、前記準安定陽極および前記準安定陰極が、インターカレートされた可動イオンの濃度に導電率が依存する準安定相分離のイオン電子混合導電体(MIEC)である、請求項17に記載の構造体。
- 前記電極間に電気パルスを印加して書き込み動作および読み取り動作を可能にする、請求項17に記載の構造体。
- 前記準安定陽極と前記準安定陰極との間のイオンの化学ポテンシャル差がゼロ近くに維持される、請求項17に記載の構造体。
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US15/616,320 US10340447B2 (en) | 2017-06-07 | 2017-06-07 | Three-terminal metastable symmetric zero-volt battery memristive device |
US15/616,320 | 2017-06-07 | ||
PCT/IB2018/053936 WO2018224927A1 (en) | 2017-06-07 | 2018-06-01 | Memristive structue |
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JP7268944B2 true JP7268944B2 (ja) | 2023-05-08 |
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JP (1) | JP7268944B2 (ja) |
CN (1) | CN110622313B (ja) |
DE (1) | DE112018001828T5 (ja) |
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WO (1) | WO2018224927A1 (ja) |
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US10248907B2 (en) * | 2015-10-20 | 2019-04-02 | International Business Machines Corporation | Resistive processing unit |
US9646243B1 (en) | 2016-09-12 | 2017-05-09 | International Business Machines Corporation | Convolutional neural networks using resistive processing unit array |
US9715656B1 (en) | 2016-09-12 | 2017-07-25 | International Business Machines Corporation | Killing asymmetric resistive processing units for neural network training |
US10734576B2 (en) * | 2018-03-16 | 2020-08-04 | 4D-S, Ltd. | Resistive memory device having ohmic contacts |
US11121259B2 (en) | 2019-07-17 | 2021-09-14 | International Business Machines Corporation | Metal-oxide-based neuromorphic device |
US11250315B2 (en) * | 2019-10-29 | 2022-02-15 | International Business Machines Corporation | Electrochemical device of variable electrical conductance |
US11615842B2 (en) | 2020-12-14 | 2023-03-28 | International Business Machines Corporation | Mixed conducting volatile memory element for accelerated writing of nonvolatile memristive device |
US11568927B2 (en) | 2021-03-30 | 2023-01-31 | International Business Machines Corporation | Two-terminal non-volatile memory cell for decoupled read and write operations |
US11569444B2 (en) | 2021-03-30 | 2023-01-31 | International Business Machines Corporation | Three-dimensional confined memory cell with decoupled read-write |
CN117918065A (zh) | 2021-06-18 | 2024-04-23 | 加泰罗尼亚能源研究所基金会 | 电子晶体管 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009076670A (ja) | 2007-09-20 | 2009-04-09 | Panasonic Corp | 情報記憶素子 |
US20110248381A1 (en) | 2009-01-20 | 2011-10-13 | William Tong | Multilayer Memristive Devices |
JP2012064808A (ja) | 2010-09-16 | 2012-03-29 | Sony Corp | 記憶素子および記憶装置 |
JP2012069612A (ja) | 2010-09-22 | 2012-04-05 | National Institute For Materials Science | 電気化学トランジスタ |
WO2017025346A1 (de) | 2015-08-12 | 2017-02-16 | Wacker Chemie Ag | Siliciumpartikel enthaltende anodenmaterialien für lithium-ionen-batterien |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7151273B2 (en) | 2002-02-20 | 2006-12-19 | Micron Technology, Inc. | Silver-selenide/chalcogenide glass stack for resistance variable memory |
FR2851073A1 (fr) * | 2003-02-06 | 2004-08-13 | Thomson Plasma | Dispositif d'affichage a plasma dote de moyens de pilotage adaptes pour realiser des operations rapides d'egalisation de charge |
JP5007566B2 (ja) * | 2004-11-08 | 2012-08-22 | 学校法人早稲田大学 | メモリー素子及びその製造方法 |
CN100553744C (zh) | 2005-08-11 | 2009-10-28 | 中国科学院过程工程研究所 | 固体氧化物电解质氧泵的结构 |
US20070195580A1 (en) * | 2006-02-23 | 2007-08-23 | Heinz Hoenigschmid | Memory circuit having a resistive memory cell and method for operating such a memory circuit |
US20120280224A1 (en) | 2009-06-25 | 2012-11-08 | Georgia Tech Research Corporation | Metal oxide structures, devices, and fabrication methods |
US8270200B2 (en) | 2009-07-30 | 2012-09-18 | Hewlett-Packard Development Company, L.P. | Nanoscale three-terminal switching device |
US20130001809A1 (en) * | 2009-09-29 | 2013-01-03 | Kolpak Alexie M | Ferroelectric Devices including a Layer having Two or More Stable Configurations |
US8415652B2 (en) * | 2010-06-21 | 2013-04-09 | Hewlett-Packard Development Company, L.P. | Memristors with a switching layer comprising a composite of multiple phases |
KR101251742B1 (ko) * | 2011-04-14 | 2013-04-05 | 경북대학교 산학협력단 | 유기라디칼 폴리이미드 전극 활물질 및 이를 포함하는 전기화학소자 |
US20150079481A1 (en) | 2011-06-17 | 2015-03-19 | Applied Materials, Inc. | Solid state electrolyte and barrier on lithium metal and its methods |
JP2013161486A (ja) * | 2012-02-01 | 2013-08-19 | Toshiba Corp | 半導体記憶装置 |
CN106575703B (zh) | 2014-06-26 | 2019-12-17 | 英特尔公司 | 基于氧化物的三端子电阻式开关逻辑器件 |
US9118006B1 (en) | 2014-08-12 | 2015-08-25 | Boise State University | Carbon-chalcogenide variable resistance memory device |
WO2016171700A1 (en) | 2015-04-23 | 2016-10-27 | Halliburton Energy Services, Inc. | Spectrally programmable memristor-based optical computing |
CN104808409B (zh) | 2015-05-18 | 2018-03-27 | 京东方科技集团股份有限公司 | 阵列基板、阵列基板制造方法和显示装置 |
CN206282860U (zh) | 2016-11-11 | 2017-06-27 | 合肥鑫晟光电科技有限公司 | 一种阵列基板及显示面板 |
CN107068708B (zh) * | 2017-03-23 | 2019-08-06 | 北京航空航天大学 | 一种浮栅忆阻器 |
-
2017
- 2017-06-07 US US15/616,320 patent/US10340447B2/en active Active
- 2017-12-05 US US15/832,300 patent/US10186657B2/en active Active
-
2018
- 2018-06-01 GB GB1918712.9A patent/GB2577831B/en active Active
- 2018-06-01 JP JP2019565251A patent/JP7268944B2/ja active Active
- 2018-06-01 DE DE112018001828.8T patent/DE112018001828T5/de active Pending
- 2018-06-01 WO PCT/IB2018/053936 patent/WO2018224927A1/en active Application Filing
- 2018-06-01 CN CN201880031930.XA patent/CN110622313B/zh active Active
-
2019
- 2019-01-07 US US16/241,284 patent/US10651379B2/en active Active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009076670A (ja) | 2007-09-20 | 2009-04-09 | Panasonic Corp | 情報記憶素子 |
US20110248381A1 (en) | 2009-01-20 | 2011-10-13 | William Tong | Multilayer Memristive Devices |
JP2012064808A (ja) | 2010-09-16 | 2012-03-29 | Sony Corp | 記憶素子および記憶装置 |
JP2012069612A (ja) | 2010-09-22 | 2012-04-05 | National Institute For Materials Science | 電気化学トランジスタ |
WO2017025346A1 (de) | 2015-08-12 | 2017-02-16 | Wacker Chemie Ag | Siliciumpartikel enthaltende anodenmaterialien für lithium-ionen-batterien |
Non-Patent Citations (1)
Title |
---|
Elliot J. Fuller, et al.,Li-Ion Synaptic Transistor for Low Power Analog Computing,Advanced Materials,2016年,Volume 29, Issue 4 |
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