JP7266387B2 - 表示装置 - Google Patents
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- JP7266387B2 JP7266387B2 JP2018212437A JP2018212437A JP7266387B2 JP 7266387 B2 JP7266387 B2 JP 7266387B2 JP 2018212437 A JP2018212437 A JP 2018212437A JP 2018212437 A JP2018212437 A JP 2018212437A JP 7266387 B2 JP7266387 B2 JP 7266387B2
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- layer
- light emitting
- emitting element
- substrate
- display device
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Description
図1は、第1実施形態に係る表示装置を模式的に示す斜視図である。図1に示すように、表示装置DSPは、第1基板SU1と、第2基板SU2と、画素Pixと、周辺回路GCと、接続部CNとを有する。図1には、第1基板SU1上の構成を透過して示す。第1基板SU1、複数のトランジスタ、複数の容量及び各種配線等により、各画素Pixを駆動するためのアレイ基板SUAが構成される。アレイ基板SUAは、駆動回路基板であり、バックプレーン又はアクティブマトリクス基板とも呼ばれる。駆動IC(Integrated Circuit)は、接続部CNを介して接続される。
θTR=arcsin(1/nLED) ・・・ (1)
図11は、第1実施形態の第1変形例に係る表示装置の複数の画素を示す平面図である。なお、以下の説明において、上述した実施形態で説明した構成要素については、同じ符号を付して、説明を省略する。
図12は、第1実施形態の第2変形例に係る表示装置の複数の画素を示す平面図である。図12に示すように、第2変形例において、第2画素PxGは、第3青色発光素子BLED3、蛍光体層RF及び緑色カラーフィルタ(図12では図示しない)との組み合わせで構成される。第3青色発光素子BLED3は、青色の光を出射する。第2画素PxGの蛍光体層RFは、第3青色発光素子BLED3からの光を緑色に変換する。第2画素PxGの蛍光体層RFは、緑色の光を発光する量子ドットを含有するネガ型レジストで形成される。これに限定されず、蛍光体層RFは、量子ドットに換えて、Alq3等の有機金属錯体を用いることができる。第2画素PxGの緑色カラーフィルタは、緑色顔料を含むネガ型レジストで形成される。
図13は、第1実施形態の第3変形例に係る表示装置を示す断面図である。第1実施形態、第1変形例及び第2変形例の発光素子LEDは、下部でアノード電極ADと接続され、上部でカソード電極CDと接続される垂直構造であるが、これに限定されない。図13に示すように、第3変形例において、アノード端子ELED1及びカソード端子ELED2は、いずれも第2青色発光素子BLED2の上面側に設けられている。
図14は、第1実施形態の第4変形例に係る表示装置を示す断面図である。図14に示すように、第4変形例において、アノード電極傾斜部ADb及び第2反射層RFL2は、第1基板SU1の法線方向に延びている。この場合であっても、第2青色発光素子BLED2から側方に出射される光Lb、Lc(図4参照)は、アノード電極ADにより蛍光体層RFに出射される。また、蛍光体層RFで発光した蛍光Ld、Le、Lfは、第2反射層RFL2で多重反射して、第2基板SU2側に出射される。このため、表示装置DSPは、光取出し効率を向上させることができる。
図15は、第2実施形態に係る表示装置を示す断面図である。図15に示すように、第2実施形態では、第1実施形態に示した第2平坦化層LL2に換えて、第2蛍光体層RF2が設けられている。すなわち、第1画素PxRにおいて、蛍光体層は、第1蛍光体層RF1と、第2蛍光体層RF2とを有する。第1蛍光体層RF1は、対向基板SUBに設けられ、第2青色発光素子BLED2の少なくとも上面を覆って設けられる。第2蛍光体層RF2は、第2青色発光素子BLED2の側面を覆って、第1基板SU1の法線方向において、第1基板SU1と第1蛍光体層RF1の間に設けられる。より具体的には、第2蛍光体層RF2は、壁状構造WL及びアノード電極ADで形成される凹部内に設けられる。
図16は、第3実施形態に係る表示装置を示す断面図である。図16に示すように、第3実施形態では、第1画素PxRは、アノード電極AD、第2反射層RFL2に加え、第3反射層RFL3を有する。第3反射層RFL3は、カソード電極CDを覆って第2蛍光体層RF2の上に設けられている。言い換えると、第3反射層RFL3は、第2青色発光素子BLED2の上面と第1蛍光体層RF1との間に設けられる。第3反射層RFL3は、例えばアルミニウム、銀などの金属材料が用いられる。
図17は、第4実施形態に係る表示装置を示す断面図である。第4実施形態では、第1画素PxRは、さらに光取出し層LPLを有する。なお、図17及び図18では、第1画素PxRを示しているが、第2画素PxG及び第3画素PxBにも光取出し層LPLを設けてもよい。
θr=arcsin(nAJ/nLED) ・・・ (2)
図19は、第4実施形態の第5変形例に係る表示装置において、光取出し層を拡大して示す断面図である。図19に示すように、第5変形例において、光取出し層LPLの表面に複数の微小な凹部COCが設けられる。凹部COCは、側部LPLa、延出部LPLc及び対向部LPLdに設けられる。ただし、凹部COCは、傾斜部LPLbにも設けられていてもよい。凹部COCは、光取出し層LPLの表面を削って形成することができ、例えば、サンドブラストなどの研磨剤を光取出し層LPLに吹き付ける方法で形成できる。
図20は、第4実施形態の第6変形例に係る表示装置において、光取出し層を拡大して示す断面図である。図20に示すように、第6変形例において、光取出し層LPLの表面に複数の微小な凸部COVが設けられる。凸部COVは、側部LPLa、延出部LPLc及び対向部LPLdに設けられる。ただし、凸部COVは、傾斜部LPLbにも設けられていてもよい。凸部COVは、光取出し層LPLと同じ材料、例えば酸化チタンの微粒子を付着させることで形成できる。より具体的には、第2平坦化層LL2を構成する有機材料中に酸化チタンの微粒子を混合させて第2平坦化層LL2を形成し、第2平坦化層LL2中の微粒子の一部が、光取出し層LPLの表面に付着することで凸部COVが形成される。
図21は、第4実施形態の第7変形例に係る表示装置において、光取出し層を拡大して示す断面図である。図21に示すように、第7変形例において、容量窒化膜LSNの上に複数の凸状構造PTが設けられている。複数の凸状構造PTは、容量窒化膜LSNの上に有機レジストをパターニングすることで形成できる。その後、熱処理を施すことにより有機レジストが溶融しながら固化して、複数の凸状構造PTは、曲面を有する半円状の断面構造となる。
図22は、第4実施形態の第8変形例に係る表示装置において、光取出し層を拡大して示す断面図である。図22に示すように、第8変形例において、容量窒化膜LSNの上に設けられた複数の凸状構造PTの断面形状は台形状である。凸状構造PTは、有機レジストの溶融温度よりも低い温度で熱処理を施すことにより形成できる。
図23は、第5実施形態に係る表示装置を示す断面図である。図23に示すように、第5実施形態の表示装置DSPは、さらに第1共振層CA1、第2共振層CA2及び第3共振層CA3を有する。第1共振層CA1及び第2共振層CA2は、発光素子LEDAの内部に設けられる。具体的には、第1共振層CA1は、発光素子基板SULEDとn型クラッド層NCとの間に設けられる。第1共振層CA1は、1層の誘電体層で構成される。第1共振層CA1の材料として低屈折率の酸化珪素膜を用いることができる。第1共振層CA1の層厚は、緑色発光素子GLEDにおいて、174nm程度であり、第1青色発光素子BLED1及び第2青色発光素子BLED2において、154nm程度である。
d2=iλ/2n2 ・・・ (3)
d3=iλ/2n3 ・・・ (4)
図24は、第5実施形態の第9変形例に係る表示装置を示す断面図である。図24に示すように、第9変形例において、発光素子LEDBは、5層の誘電体層で構成された第1共振層CA1を含む。すなわち、第1共振層CA1は、発光素子基板SULEDの上に、低屈折率層、高屈折率層、低屈折率層、高屈折率層、低屈折率層の順に積層される。また、第3共振層CA3は6層の誘電体層で構成される。第3共振層CA3は、カソード電極CD及び第2平坦化層LL2の上に、低屈折率層、高屈折率層、低屈折率層、高屈折率層、低屈折率層、高屈折率層の順に積層される。第3共振層CA3の最上層に高屈折率層が設けられる。
図25は、第6実施形態に係る表示装置を模式的に示す斜視図である。図26は、第6実施形態に係る表示装置を示す断面図である。なお、図25は、図面を見やすくするために、第2基板SU2を省略して示している。また、図26では、第1画素PxRの断面構造と、周辺領域GAにおけるカソード電極CDの接続部分の断面構造とを、模式的に示している。
図27は、第6実施形態の第10変形例に係る表示装置を示す断面図である。上述した各実施形態及び変形例では、第1基板SU1と第2基板SU2とが対向する構成を示したが、これに限定されない。図27に示すように、第10変形例の表示装置DSPは、第2基板SU2を有さず、カラーフィルタRCF及び第2反射層RFL2の上に第3平坦化層LL3が設けられている。第3平坦化層LL3は、周辺領域GAまで設けられ、カソード電極CDを覆っている。
CA1 第1共振層
CA2 第2共振層
CA3 第3共振層
CD カソード電極
CL 接続層
DA 表示領域
DSP 表示装置
DRT 駆動トランジスタ
FIL 充填層、 FIL1 第1充填層、FIL2 第2充填層
LED、LEDA、LEDB、GLED、BLED 発光素子
LL1 第1平坦化層
LL2 第2平坦化層
LPL 光取出し層
LPLa 側部
LPLb 傾斜部
LPLc 延出部
LPLd 対向部
LS 遮光層
LSL 光散乱層
Pix 画素
PxR 第1画素
PxG 第2画素
PxB 第3画素
PT 凸状構造
RF 蛍光体層
RF1 第1蛍光体層
RF2 第2蛍光体層
RFL1 第1反射層
RFL2 第2反射層
RFL3 第3反射層
SU1 第1基板
SU2 第2基板
WL、WL1、WL2 壁状構造
BLED1 第1青色発光素子
BLED2 第2青色発光素子
BLED3 第3青色発光素子
GA 周辺領域
ADa アノード電極底部
ADb アノード電極傾斜部
CDCL、CDCLa カソード接続線
ADCL アノード接続層
CAL3 低屈折率誘電体層
CAH3 高屈折率誘電体層
Claims (20)
- 第1基板と、
前記第1基板に設けられた複数の画素と、
複数の前記画素の各々に設けられる発光素子と、
前記発光素子の少なくとも上面を覆う蛍光体層と、
前記発光素子の側面と対向する第1反射層と、
前記蛍光体層の側面に設けられ、前記第1基板の法線方向において、前記第1反射層と離隔して、前記第1反射層よりも前記第1基板から離れて配置される第2反射層と、
前記発光素子の上面と前記蛍光体層との間に設けられた第3反射層と、を有する
表示装置。 - 第1基板と、
前記第1基板に設けられた複数の画素と、
複数の前記画素の各々に設けられる発光素子と、
前記発光素子の少なくとも上面を覆う蛍光体層と、
前記発光素子の側面と対向する第1反射層と、
前記蛍光体層の側面に設けられ、前記第1基板の法線方向において、前記第1反射層と離隔して、前記第1反射層よりも前記第1基板から離れて配置される第2反射層と、
透光性を有し、前記発光素子の少なくとも一部及び前記第1反射層を覆う無機絶縁層と、を有する
表示装置。 - 前記無機絶縁層の表面に、複数の凹部又は複数の凸部が設けられる
請求項2に記載の表示装置。 - 前記第1反射層の、前記無機絶縁層と重なる部分に、複数の凸部が設けられる
請求項2に記載の表示装置。 - 前記第1反射層及び前記発光素子と、前記蛍光体層及び前記第2反射層との間に設けられ、複数層の誘電体層が積層された共振層を有する
請求項2から請求項4のいずれか1項に記載の表示装置。 - 前記発光素子は、第1共振層と、第2共振層とを含み、
前記発光素子及び前記第1反射層の上側に、複数層の誘電体層が積層された第3共振層が設けられる
請求項2から請求項4のいずれか1項に記載の表示装置。 - 前記発光素子の上面と前記蛍光体層との間に設けられた第3反射層を有する
請求項2から請求項4のいずれか1項に記載の表示装置。 - 第1基板と、
前記第1基板に設けられた複数の画素と、
複数の前記画素の各々に設けられる発光素子と、
前記発光素子の少なくとも上面を覆う蛍光体層と、
前記発光素子の側面と対向する第1反射層と、
前記蛍光体層の側面に設けられ、前記第1基板の法線方向において、前記第1反射層と離隔して、前記第1反射層よりも前記第1基板から離れて配置される第2反射層と、
前記第1反射層及び前記発光素子と、前記蛍光体層及び前記第2反射層との間に設けられ、複数層の誘電体層が積層された共振層と、を有する
表示装置。 - 第1基板と、
前記第1基板に設けられた複数の画素と、
複数の前記画素の各々に設けられる発光素子と、
前記発光素子の少なくとも上面を覆う蛍光体層と、
前記発光素子の側面と対向する第1反射層と、
前記蛍光体層の側面に設けられ、前記第1基板の法線方向において、前記第1反射層と離隔して、前記第1反射層よりも前記第1基板から離れて配置される第2反射層と、を有し、
前記発光素子は、第1共振層と、第2共振層とを含み、
前記発光素子及び前記第1反射層の上側に、複数層の誘電体層が積層された第3共振層が設けられる
表示装置。 - 前記第1共振層は、前記発光素子の基板と、前記発光素子の発光層との間に設けられ、
前記第2共振層は、前記発光素子の前記発光層及びクラッド層で構成される
請求項6又は請求項9に記載の表示装置。 - 前記第1反射層及び前記第2反射層は、前記第1基板の法線方向に対して傾斜する
請求項1から請求項10のいずれか1項に記載の表示装置。 - 前記発光素子の側面と対向する壁状構造を有し、
前記第1反射層は、
前記発光素子と重なる領域から前記発光素子の周囲に延出する底部と、
前記底部に接続され、前記壁状構造の壁面に沿って設けられて前記第1基板の法線方向に対して傾斜する傾斜部と、を有する
請求項1から請求項11のいずれか1項に記載の表示装置。 - 前記第1反射層は、前記発光素子と電気的に接続されたアノード電極である
請求項1から請求項12のいずれか1項に記載の表示装置。 - 前記蛍光体層の上に設けられたカラーフィルタを有し、
前記第2反射層は、前記蛍光体層の側面及び前記カラーフィルタの側面に亘って設けられる
請求項1から請求項13のいずれか1項に記載の表示装置。 - 前記発光素子の側面を覆い、前記発光素子と前記第1反射層との間に設けられた平坦化層を有し、
前記蛍光体層は、前記平坦化層の上に設けられる
請求項1から請求項14のいずれか1項に記載の表示装置。 - 前記第1基板と対向する第2基板を有し、
前記第2基板の前記第1基板と対向する面に前記蛍光体層及び前記第2反射層が設けられ、
前記第1基板の前記第2基板と対向する面に前記第1反射層及び前記発光素子が設けられる
請求項1から請求項15のいずれか1項に記載の表示装置。 - 前記蛍光体層は、第1蛍光体層と、第2蛍光体層とを有し、
前記第1蛍光体層は、前記発光素子の少なくとも上面を覆って設けられ、
前記第2蛍光体層は、前記発光素子の側面を覆って、前記第1基板の法線方向において、前記第1基板と前記第1蛍光体層の間に設けられる
請求項1から請求項14のいずれか1項に記載の表示装置。 - 複数の前記画素は、赤色を表示する第1画素と、緑色を表示する第2画素と、青色を表示する第3画素と、を含み
前記第1画素には、青色の光を出射する青色発光素子と、青色発光素子からの光を赤色に変換する蛍光体層とが設けられる
請求項1から請求項17のいずれか1項に記載の表示装置。 - 前記第2画素には、青色の光を出射する青色発光素子と、青色発光素子からの光を緑色に変換する蛍光体層とが設けられる
請求項18に記載の表示装置。 - 複数の前記画素は、赤色を表示する第1画素と、緑色を表示する第2画素と、青色を表示する第3画素と、を含み
前記蛍光体層は、有機低分子材料のDCM(4-(ジシアノメチレン)-2-メチル-6-(4-ジメチルアミノスチリル)-4H-ピラン)を含み、
前記第1画素には、緑色の光を出射する緑色発光素子が設けられる
請求項1から請求項17のいずれか1項に記載の表示装置。
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