JP7253946B2 - 配線基板及びその製造方法、半導体パッケージ - Google Patents
配線基板及びその製造方法、半導体パッケージ Download PDFInfo
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- JP7253946B2 JP7253946B2 JP2019053623A JP2019053623A JP7253946B2 JP 7253946 B2 JP7253946 B2 JP 7253946B2 JP 2019053623 A JP2019053623 A JP 2019053623A JP 2019053623 A JP2019053623 A JP 2019053623A JP 7253946 B2 JP7253946 B2 JP 7253946B2
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- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
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Description
[第1実施形態に係る配線基板の構造]
まず、第1実施形態に係る配線基板の構造について説明する。図1は、第1実施形態に係る配線基板を例示する断面図であり、図1(a)は全体図、図1(b)はA部の部分拡大図である。
次に、第1実施形態に係る配線基板の製造方法について説明する。図2~図4は、第1実施形態に係る配線基板の製造工程を例示する図である。図2は図1(a)に対応する断面図であり、図3及び図4は図1(b)に対応する断面図である。なお、ここでは、1つの配線基板を作製する工程の例を示すが、配線基板となる複数の部分を作製し、その後個片化して各配線基板とする工程としてもよい。
第2実施形態では、第1実施形態に係る配線基板に半導体チップを搭載した半導体パッケージの例を示す。なお、第2実施形態において、既に説明した本実施形態と同一構成部品についての説明は省略する場合がある。
10 コア層
10x 貫通孔
11 貫通配線
12、14、16、22、24、26 配線層
13、15、23、25 絶縁層
13x、15x、23x、25x ビアホール
17 表面処理層
18、28 ソルダーレジスト層
18x、28x 開口部
100 半導体パッケージ
110 半導体チップ
111 半導体基板
112 電極パッド
130 バンプ
140 アンダーフィル樹脂
161 第1金属層
162 第2金属層
163 第3金属層
Claims (7)
- 第1配線層、前記第1配線層を被覆する絶縁層、及び前記絶縁層を介して前記第1配線層と接続された第2配線層、を備えた配線基板であって、
前記第2配線層は、前記絶縁層を貫通し前記第1配線層の上面を露出するビアホール内に充填されたビア配線、及び前記絶縁層の上面に前記ビア配線と一体に形成された半導体チップ接続用のパッド、を含むパッド構造体を複数有し、
前記パッド構造体は、
前記絶縁層の上面、前記ビアホールの内壁面、及び前記ビアホール内に露出する前記第1配線層の上面に連続的に形成された第1金属層と、
前記第1金属層上に形成され、前記ビアホールを充填し、更に前記絶縁層の上面よりも上側に延在する、上面が平坦である第2金属層と、
前記第2金属層の上面に形成された第3金属層と、を有し、
複数の前記パッド構造体は、第1パッド構造体と第2パッド構造体とを有し、前記第1パッド構造体のビア配線径は、前記第2パッド構造体のビア配線径と異なり、
前記絶縁層の上面から前記第1パッド構造体の前記第2金属層の上面までの距離は、前記絶縁層の上面から前記第2パッド構造体の前記第2金属層の上面までの距離と同じであり、
前記第3金属層の厚さは、前記ビアホールよりも外側に形成された部分の前記第2金属層の厚さよりも厚い配線基板。 - 前記第1パッド構造体のパッド径は、前記第2パッド構造体のパッド径と異なる請求項1に記載の配線基板。
- 前記第2金属層と前記第3金属層の積層方向において、前記パッドを形成する前記第2金属層の一部は前記第1金属層よりも厚い請求項1又は2に記載の配線基板。
- 前記第2金属層と前記第3金属層とは同一の金属材料から形成されている請求項1乃至3の何れか一項に記載の配線基板。
- 各々の前記パッド構造体において、前記第2金属層と前記第3金属層とは、前記第2金属層と前記第3金属層の積層方向に対して直交する方向に切った断面の面積が等しい請求項1乃至4の何れか一項に記載の配線基板。
- 請求項1乃至5の何れか一項に記載の配線基板と、前記配線基板に実装された半導体チップと、を有し、
前記配線基板の前記パッドと前記半導体チップの電極パッドとが、はんだで接合された半導体パッケージ。 - 第1配線層、前記第1配線層を被覆する絶縁層、及び前記絶縁層を介して前記第1配線層と接続された第2配線層、を備えた配線基板の製造方法であって、
前記絶縁層を貫通し前記第1配線層の上面を露出するビアホール内に充填されたビア配線、及び前記絶縁層の上面に前記ビア配線と一体に形成された半導体チップ接続用のパッド、を含むパッド構造体を複数有する第2配線層を形成する工程を含み、
前記第2配線層を形成する工程は、
前記絶縁層を貫通し前記第1配線層の上面を露出するビアホールを形成する工程と、
前記絶縁層の上面、前記ビアホールの内壁面、及び前記ビアホール内に露出する前記第1配線層の上面に第1金属層を連続的に形成する工程と、
前記第1金属層から給電する電解めっき法により、前記第1金属層上に、前記ビアホールを充填し、更に前記絶縁層の上面よりも上側に延在する第2金属層を形成する工程と、
前記第2金属層の全体を薄化し、上面を平坦とする工程と、
薄化後の前記第2金属層の上面に、電解めっき法により、厚さが一定である第3金属層を選択的に形成する工程と、
前記第3金属層をマスクとしたエッチングを行い、前記第3金属層から露出する前記第1金属層及び前記第2金属層を除去する工程と、を有する配線基板の製造方法。
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