JP7245843B2 - 遮光膜、遮光膜の製造方法、光学素子、固体撮像素子、ヘッドライトユニット - Google Patents

遮光膜、遮光膜の製造方法、光学素子、固体撮像素子、ヘッドライトユニット Download PDF

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JP7245843B2
JP7245843B2 JP2020548151A JP2020548151A JP7245843B2 JP 7245843 B2 JP7245843 B2 JP 7245843B2 JP 2020548151 A JP2020548151 A JP 2020548151A JP 2020548151 A JP2020548151 A JP 2020548151A JP 7245843 B2 JP7245843 B2 JP 7245843B2
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JPWO2020059382A1 (ja
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貴洋 大谷
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Fujifilm Corp
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21S—NON-PORTABLE LIGHTING DEVICES; SYSTEMS THEREOF; VEHICLE LIGHTING DEVICES SPECIALLY ADAPTED FOR VEHICLE EXTERIORS
    • F21S41/00—Illuminating devices specially adapted for vehicle exteriors, e.g. headlamps
    • F21S41/40—Illuminating devices specially adapted for vehicle exteriors, e.g. headlamps characterised by screens, non-reflecting members, light-shielding members or fixed shades
    • F21S41/43—Illuminating devices specially adapted for vehicle exteriors, e.g. headlamps characterised by screens, non-reflecting members, light-shielding members or fixed shades characterised by the shape thereof
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21S—NON-PORTABLE LIGHTING DEVICES; SYSTEMS THEREOF; VEHICLE LIGHTING DEVICES SPECIALLY ADAPTED FOR VEHICLE EXTERIORS
    • F21S45/00—Arrangements within vehicle lighting devices specially adapted for vehicle exteriors, for purposes other than emission or distribution of light
    • F21S45/10—Protection of lighting devices
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/02—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of crystals, e.g. rock-salt, semi-conductors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/037—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyamides or polyimides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144—Devices controlled by radiation
    • H01L27/146—Imager structures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144—Devices controlled by radiation
    • H01L27/146—Imager structures
    • H01L27/14601—Structural or functional details thereof
    • H01L27/1462—Coatings
    • H01L27/14623—Optical shielding

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Optical Filters (AREA)
  • Materials For Photolithography (AREA)
  • Solid State Image Pick-Up Elements (AREA)
JP2020548151A 2018-09-21 2019-08-20 遮光膜、遮光膜の製造方法、光学素子、固体撮像素子、ヘッドライトユニット Active JP7245843B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2018177855 2018-09-21
JP2018177855 2018-09-21
PCT/JP2019/032377 WO2020059382A1 (ja) 2018-09-21 2019-08-20 遮光膜、遮光膜の製造方法、光学素子、固体撮像素子、ヘッドライトユニット

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JPWO2020059382A1 JPWO2020059382A1 (ja) 2021-09-24
JP7245843B2 true JP7245843B2 (ja) 2023-03-24

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JP (1) JP7245843B2 (zh)
KR (1) KR102660236B1 (zh)
CN (1) CN112513692A (zh)
TW (1) TW202022498A (zh)
WO (1) WO2020059382A1 (zh)

Families Citing this family (5)

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Publication number Priority date Publication date Assignee Title
JPWO2022065490A1 (zh) * 2020-09-28 2022-03-31
JPWO2022202486A1 (zh) * 2021-03-23 2022-09-29
CN113001325B (zh) * 2021-03-25 2022-11-22 中国科学院国家天文台南京天文光学技术研究所 一种基于主动压力调制的阵列研磨方法
CN113867101B (zh) * 2021-10-09 2023-10-24 杭州福斯特电子材料有限公司 用于led的白色感光覆盖膜组合物、覆盖膜及其制备方法
WO2024004793A1 (ja) * 2022-06-30 2024-01-04 富士フイルム株式会社 化合物、組成物、フィルム、着色組成物の製造方法、及び表示素子用積層体の製造方法

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001051104A (ja) 1999-08-12 2001-02-23 Seiko Epson Corp マイクロレンズ基板、液晶パネル用対向基板、液晶パネルおよび投射型表示装置
JP2003177211A (ja) 2001-12-11 2003-06-27 Seiko Epson Corp マイクロレンズ基板、液晶パネル用対向基板、液晶パネル、投射型表示装置
JP2013517206A (ja) 2010-01-16 2013-05-16 日本板硝子株式会社 高品質放射制御コーティング、放射制御ガラスおよび製造方法
JP2014052436A (ja) 2012-09-05 2014-03-20 Dainippon Printing Co Ltd カラーフィルタおよび表示装置
JP2015110691A (ja) 2013-12-06 2015-06-18 大日精化工業株式会社 近赤外線透過性黒色アゾ顔料、近赤外線透過性黒色アゾ顔料の製造方法、これらの黒色アゾ顔料を用いた着色組成物、物品の着色方法および着色物品
WO2017159876A1 (ja) 2016-03-18 2017-09-21 東レ株式会社 ネガ型感光性樹脂組成物、硬化膜、硬化膜を具備する表示装置、及びその製造方法
WO2018066296A1 (ja) 2016-10-04 2018-04-12 富士フイルム株式会社 分散組成物、硬化性組成物、硬化膜、カラーフィルタ、固体撮像素子、固体撮像装置、赤外線センサ、分散組成物の製造方法、硬化性組成物の製造方法、及び、硬化膜の製造方法

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JP4699249B2 (ja) * 2006-03-17 2011-06-08 大日本印刷株式会社 有機エレクトロルミネッセンス素子用カラーフィルタ基板
JP2011248197A (ja) 2010-05-28 2011-12-08 Fujifilm Corp カラーフィルタの製造方法、カラーフィルタ、ならびにそれを用いる液晶ディスプレイおよび画像表示デバイス
CN107719228B (zh) * 2013-05-29 2021-06-29 提爱思科技股份有限公司 车用发光配件
JP6331314B2 (ja) * 2013-10-03 2018-05-30 東レ株式会社 フレキシブルカラーフィルター、その製造方法ならびにそれを用いたフレキシブル発光デバイス

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001051104A (ja) 1999-08-12 2001-02-23 Seiko Epson Corp マイクロレンズ基板、液晶パネル用対向基板、液晶パネルおよび投射型表示装置
JP2003177211A (ja) 2001-12-11 2003-06-27 Seiko Epson Corp マイクロレンズ基板、液晶パネル用対向基板、液晶パネル、投射型表示装置
JP2013517206A (ja) 2010-01-16 2013-05-16 日本板硝子株式会社 高品質放射制御コーティング、放射制御ガラスおよび製造方法
JP2014052436A (ja) 2012-09-05 2014-03-20 Dainippon Printing Co Ltd カラーフィルタおよび表示装置
JP2015110691A (ja) 2013-12-06 2015-06-18 大日精化工業株式会社 近赤外線透過性黒色アゾ顔料、近赤外線透過性黒色アゾ顔料の製造方法、これらの黒色アゾ顔料を用いた着色組成物、物品の着色方法および着色物品
WO2017159876A1 (ja) 2016-03-18 2017-09-21 東レ株式会社 ネガ型感光性樹脂組成物、硬化膜、硬化膜を具備する表示装置、及びその製造方法
WO2018066296A1 (ja) 2016-10-04 2018-04-12 富士フイルム株式会社 分散組成物、硬化性組成物、硬化膜、カラーフィルタ、固体撮像素子、固体撮像装置、赤外線センサ、分散組成物の製造方法、硬化性組成物の製造方法、及び、硬化膜の製造方法

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Publication number Publication date
JPWO2020059382A1 (ja) 2021-09-24
CN112513692A (zh) 2021-03-16
WO2020059382A1 (ja) 2020-03-26
TW202022498A (zh) 2020-06-16
KR20210021527A (ko) 2021-02-26
KR102660236B1 (ko) 2024-04-25

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