JP7237021B2 - 支持された炭素分子ふるい膜およびそれらを形成する方法 - Google Patents
支持された炭素分子ふるい膜およびそれらを形成する方法 Download PDFInfo
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- JP7237021B2 JP7237021B2 JP2019568730A JP2019568730A JP7237021B2 JP 7237021 B2 JP7237021 B2 JP 7237021B2 JP 2019568730 A JP2019568730 A JP 2019568730A JP 2019568730 A JP2019568730 A JP 2019568730A JP 7237021 B2 JP7237021 B2 JP 7237021B2
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Images
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- B01D53/22—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by diffusion
- B01D53/228—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by diffusion characterised by specific membranes
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Description
(i)ポリマー織物と接触している炭素形成ポリマーのフィルムの積層体を形成して、積層体を形成することと、
(ii)フィルムおよびポリマー織物を炭化させるのに十分な雰囲気下で一定時間にわたって積層体を炭化温度に加熱して、炭素織物層上に支持された分離炭素層で構成された支持された炭素分子ふるい膜を形成することと、を含む、方法。
本発明の方法は、例えば、熱分解中の応力から生じる欠陥、または熱分解すると炭素分離層となるポリマー層を形成するときの溶媒拡散もしくは蒸発からの欠陥を回避しながらも薄い、支持されたCMS膜の形成を可能にする。特定の実施形態では、炭素形成ポリマーは、ポリマー織物と同様の、または同じ化学構造を有する。
(i)態様2に記載の支持された炭素分子ふるい膜を提供することと、
(ii)炭素分子ふるい膜を通してガス供給を流して、高濃度のガス分子を有する第1の流れ、および高濃度の他のガス分子を有する第2の流れと、を生成することと、を含む、プロセスである。
本出願の発明の例として、以下のものが挙げられる。
[1] 支持された炭素分子ふるい膜を作製する方法であって、
(i)炭素形成ポリマーのフィルムをポリマー織物と接触させて、積層体を形成することと、
(ii)フィルムおよびポリマー織物を炭化させるのに十分な大気下で一定時間にわたって積層体を炭化温度に加熱して、炭素織物層上に支持された分離炭素層で構成された支持された炭素分子ふるい膜を形成することと、を含む、方法。
[2] 前記フィルムの前記炭素形成ポリマーおよび前記織物の前記ポリマーが、同じ化学構造を有する、[1]に記載の方法。
[3] 前記接触することが、前記フィルムの一部分を前記織物に融合させる積層温度に加熱することで構成される、[1]に記載の方法。
[4] 前記接触することが、前記積層温度に加熱する間に圧力を加えることで構成される、[3]に記載の方法。
[5] 前記炭素織物層上に支持された前記分離炭素層は、前記フィルムが前記織物に融合されている場所でグラファイト結合されている、[3]または[4]のいずれかに記載の方法。
[6] 前記炭素分離層が、0.01マイクロメートル~15マイクロメートルの厚さを有する、[1]~[5]のいずれか一項に記載の方法。
[7] 炭素分離層が、0.05マイクロメートル~10マイクロメートルの厚さを有する、[6]のいずれか一項に記載の方法。
[8] 前記フィルムの前記炭素形成ポリマーおよび前記ポリマーが、ポリ塩化ビニリデンコポリマー、ポリイミド、またはそれらの組み合わせからなる群から選択される、[1]に記載の方法。
[9] 前記ポリ塩化ビニリデンコポリマーが、前記ポリ塩化ビニリデンコポリマーの重量の3%~20%のコモノマーの量を有する、[8]に記載の方法。
[10] 前記コモノマーが、ビニルモノマー、塩化ビニルモノマー、アクリレートモノマー、メタクリレートモノマー、スチレン系モノマー、アクリロニトリル、メタクリロニトリル、イタコン酸、クロロトリフルオロエチレンのうちの1つ以上である、[9]に記載の方法。
[11] [1]~[10]のいずれか一項に記載の方法によって作製された、支持された炭素分子ふるい膜。
[12] ガス分子を、前記ガス分子と少なくとも1つの他のガス分子で構成されたガス供給から分離するためのプロセスであって、
(i)[11]に記載の支持された炭素分子ふるい膜を提供することと、
(ii)前記炭素分子ふるい膜を通して前記ガス供給を流して、高濃度の前記ガス分子を有する第1の流れ、および高濃度の前記他のガス分子を有する第2の流れと、を生成することと、を含む、プロセス。
[13] 炭素織物にグラファイト結合した炭素分離層を有する積層体で構成された、支持された炭素分子ふるい膜であって、前記炭素分離層が、連続層である、支持された炭素分子ふるい膜。
[14] 前記織物が、織布、編物、かぎ針編み、スプレッドトウ、編組、マクラメ、フェルト、またはそれらの組み合わせの織物である、[13]に記載の支持された炭素分子ふるい膜。
[15] 前記織物が、織布である、[14]に記載の支持された炭素分子ふるい膜。
炭素膜形成
商業用気泡押出プロセスを使用して、フィルム1および2と呼ばれる2つのPVDCコポリマー樹脂から約0.4ミル(約10ミクロン)の厚さの2つの薄いPVDCコポリマーフィルムを溶融押出した。フィルム1は、4.8重量%のメチルアクリレートコモノマーおよび5%のジブチルセバテート(sebatate)を有するPVDCポリマーであった。フィルム2は、17.6重量%の塩化ビニルコモノマーを有するPVDCポリマーであった。市販のPVDC織物は、商標名NF-711(3リーフ綾織、0.05mm*15フィラメント、51%多孔性)でAsahi Kaseiから入手した。
不透過性のアルミニウムテープを使用して、所定の透過領域を残して、支持された炭素分子ふるい膜を標準的な25mmフィルターホルダー(Millipore #4502500、EMD Millipore Corp.、Germany)上にマスキングした。次いで、2液性エポキシ(J-B Weld twin tube)をテープと支持されたCMSマックとの界面に沿って塗布した。上流では連続供給で(25sccm、1atm)、および下流ではHeパージで(2.0sccm、1atm)、単一のガスを20℃で試験した。Heパージによって運ばれた透過物を、TCD(H2およびCO2のための熱伝導度検出器)およびFID(CH4のための水素炎イオン化検出器)を用いてGC(ガスクロマトグラフ)によって分析した。全ての場合の濃度は5%未満であったため、下流におけるガス流速はHe流量と同じと見なした。透過率は、Heパージ流量にGCによって測定した透過濃度を掛けたものを使用して計算した。試験の順序は、H2、CO2、およびCH4の順序で維持した。試験は、透過濃度が安定するまで数時間から数日間行った。結果を表1に示す。結果から、支持されたCMS膜が、支持されたCMS膜の製造中の欠陥または故障を引き起こすことなく、メタンからの水素の良好な分離を実現することが明らかである。実施例1の断面および上面図を図1および2に示す。
炭素膜形成
4.8重量%のメチルアクリレートコモノマーを有するポリマーPVDCポリマーを、60℃のn-メチルピロリドン中に溶解して、30重量%のポリマー装填量のポリマー溶液を作製した。次いで、流延前にポリマー溶液を20℃に冷却した。市販のPVDC織物は、商標名NF-711(3リーフ綾織、0.05mm*15フィラメント、51%多孔性)でAsahi Kaseiから得た。4ミル(約100ミクロン)のアプリケータを使用して、ポリマー溶液をPVDC織物上に注ぎ、均等に流延した。ポリマー溶液でコーティングした織物を、約10秒間空気中に置いた後、20℃の水浴中に浸漬し、そこでポリマー溶液層の「相分離」が生じ、この層が基板上に「ロック」されてポリマー複合体が作製される。
不透過性のアルミニウムテープを使用して、所定の透過領域を残して、支持された炭素分子ふるい膜を標準的な25mmフィルターホルダー(Millipore #4502500、EMD Millipore Corp.、Germany)上にマスキングした。次いで、2液性エポキシ(J-B Weld twin tube)をテープと支持されたCMSマックとの界面に沿って塗布した。上流では連続供給で(1atm)、および下流ではHeパージで(2.0sccm、1atm)、混合ガス透過を20℃で試験した。Heパージによって運ばれた透過物を、TCD(H2およびCO2のための熱伝導度検出器)およびFID(全ての炭化水素のための水素炎イオン化検出器)を用いてGC(ガスクロマトグラフ)によって分析した。全ての場合の濃度は5%未満であったため、下流におけるガス流速はHe流量と同じと見なした。透過率は、Heパージ流量にGCによって測定した透過濃度を掛けたものを使用して計算した。2つのガス混合物を、等モルのH2/CO2/CH4(75sccmの総流量)および等モルのC2H4/C2H6/C3H6/C3H8(60sccmの総流量)の順序で膜の上流に供給した。試験は、透過濃度が安定するまで数時間から数日間行った。結果を表1に示す。結果から、支持されたCMS膜が、パラフィンからのオレフィンの良好な分離を実現することが明らかである。
Claims (11)
- 支持された炭素分子ふるい膜を作製する方法であって、
(i)炭素形成ポリマーのフィルムをポリマー織物と接触させて、積層体を形成することであって、前記フィルムおよびポリマー織物が、ポリ塩化ビニリデンコポリマー、ポリイミド、またはそれらの組み合わせからなる群から選択されるポリマーで構成される、形成することと、
(ii)前記フィルムおよびポリマー織物を炭化させるのに十分な雰囲気下で一定時間にわたって、炭化のために、100℃~180℃の温度、次いで350℃~1700℃の温度に前記積層体を加熱して、炭素織物層上に支持された分離用炭素層で構成された、支持された炭素分子ふるい膜を形成することと、
を含み、
前記フィルムの前記炭素形成ポリマーおよび前記ポリマー織物が、加熱すると、同じ温度で同じ様式で膨張および収縮を受け、
前記炭素織物層上に支持された前記分離用炭素層は、ステップ(ii)の後に、前記フィルムが前記織物に融合された場所でグラファイト結合されており、
前記分離用炭素層が連続層であり、前記連続層は、前記分離用炭素層自体の微細構造細孔性の部分を通過することなくガス分子が通過することを可能にする欠陥が本質的にない層である、方法。 - 前記接触することが、前記フィルムの一部分を前記織物に融合させる積層温度に加熱することで構成され、前記積層温度が、前記フィルムおよび織物を炭化させない温度である、請求項1に記載の方法。
- 前記接触することが、前記フィルムを前記織物に熱間圧延することで構成される、請求項2に記載の方法。
- 前記分離用炭素層が、0.01マイクロメートル~15マイクロメートルの厚さを有する、請求項2または3のいずれか一項に記載の方法。
- 前記分離用炭素層が、0.05マイクロメートル~10マイクロメートルの厚さを有する、請求項4に記載の方法。
- 前記フィルムの前記炭素形成ポリマーおよび前記織物の前記ポリマーが、前記ポリ塩化ビニリデンコポリマーである、請求項1に記載の方法。
- 前記ポリ塩化ビニリデンコポリマーが、前記ポリ塩化ビニリデンコポリマーの重量の3%~20%のコモノマーの量を有する、請求項6に記載の方法。
- 前記コモノマーが、ビニルモノマー、塩化ビニルモノマー、アクリレートモノマー、メタクリレートモノマー、スチレン系モノマー、アクリロニトリル、メタクリロニトリル、イタコン酸、クロロトリフルオロエチレンのうちの1つ以上である、請求項7に記載の方法。
- 請求項1に記載の方法によって作製された、炭素織物にグラファイト結合した分離用炭素層を有する積層体で構成された、支持された炭素分子ふるい膜であって、前記分離用炭素層が前記連続層である、支持された炭素分子ふるい膜。
- 前記織物が、織布、編物、かぎ針編み、スプレッドトウ、編組、マクラメ、またはこれらの組み合わせの織物である、請求項9に記載の支持された炭素分子ふるい膜。
- 前記織物が、織布である、請求項10に記載の支持された炭素分子ふるい膜。
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