JP7161767B2 - 形成材料、形成方法、及び新規化合物 - Google Patents

形成材料、形成方法、及び新規化合物 Download PDF

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Publication number
JP7161767B2
JP7161767B2 JP2019081378A JP2019081378A JP7161767B2 JP 7161767 B2 JP7161767 B2 JP 7161767B2 JP 2019081378 A JP2019081378 A JP 2019081378A JP 2019081378 A JP2019081378 A JP 2019081378A JP 7161767 B2 JP7161767 B2 JP 7161767B2
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film
bis
cobalt
gas
compound
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Japanese (ja)
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JP2020176104A5 (enExample
JP2020176104A (ja
Inventor
英明 町田
真人 石川
弘 須藤
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GAS-PHASE GROWTH LTD.
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GAS-PHASE GROWTH LTD.
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Priority to JP2019081378A priority Critical patent/JP7161767B2/ja
Priority to KR1020190069738A priority patent/KR20200123722A/ko
Priority to CN201910524161.3A priority patent/CN111825570A/zh
Priority to TW108121188A priority patent/TWI726336B/zh
Priority to US16/833,827 priority patent/US20200331944A1/en
Publication of JP2020176104A publication Critical patent/JP2020176104A/ja
Publication of JP2020176104A5 publication Critical patent/JP2020176104A5/ja
Priority to JP2022139567A priority patent/JP7332211B2/ja
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    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F15/00—Compounds containing elements of Groups 8, 9, 10 or 18 of the Periodic Table
    • C07F15/06—Cobalt compounds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C257/00—Compounds containing carboxyl groups, the doubly-bound oxygen atom of a carboxyl group being replaced by a doubly-bound nitrogen atom, this nitrogen atom not being further bound to an oxygen atom, e.g. imino-ethers, amidines
    • C07C257/10—Compounds containing carboxyl groups, the doubly-bound oxygen atom of a carboxyl group being replaced by a doubly-bound nitrogen atom, this nitrogen atom not being further bound to an oxygen atom, e.g. imino-ethers, amidines with replacement of the other oxygen atom of the carboxyl group by nitrogen atoms, e.g. amidines
    • C07C257/14—Compounds containing carboxyl groups, the doubly-bound oxygen atom of a carboxyl group being replaced by a doubly-bound nitrogen atom, this nitrogen atom not being further bound to an oxygen atom, e.g. imino-ethers, amidines with replacement of the other oxygen atom of the carboxyl group by nitrogen atoms, e.g. amidines having carbon atoms of amidino groups bound to acyclic carbon atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F15/00—Compounds containing elements of Groups 8, 9, 10 or 18 of the Periodic Table
    • C07F15/06—Cobalt compounds
    • C07F15/065—Cobalt compounds without a metal-carbon linkage
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F15/00—Compounds containing elements of Groups 8, 9, 10 or 18 of the Periodic Table
    • C07F15/02—Iron compounds
    • C07F15/025—Iron compounds without a metal-carbon linkage
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • C23C16/18—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metallo-organic compounds

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Vapour Deposition (AREA)
JP2019081378A 2019-04-22 2019-04-22 形成材料、形成方法、及び新規化合物 Active JP7161767B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2019081378A JP7161767B2 (ja) 2019-04-22 2019-04-22 形成材料、形成方法、及び新規化合物
KR1020190069738A KR20200123722A (ko) 2019-04-22 2019-06-13 형성재료, 형성방법 및 신규화합물
CN201910524161.3A CN111825570A (zh) 2019-04-22 2019-06-18 形成材料、形成方法以及新型化合物
TW108121188A TWI726336B (zh) 2019-04-22 2019-06-19 形成材料、形成方法、以及新穎化合物
US16/833,827 US20200331944A1 (en) 2019-04-22 2020-03-30 Compound
JP2022139567A JP7332211B2 (ja) 2019-04-22 2022-09-01 新規化合物および製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2019081378A JP7161767B2 (ja) 2019-04-22 2019-04-22 形成材料、形成方法、及び新規化合物

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JP2022139567A Division JP7332211B2 (ja) 2019-04-22 2022-09-01 新規化合物および製造方法

Publications (3)

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JP2020176104A JP2020176104A (ja) 2020-10-29
JP2020176104A5 JP2020176104A5 (enExample) 2020-12-10
JP7161767B2 true JP7161767B2 (ja) 2022-10-27

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US (1) US20200331944A1 (enExample)
JP (1) JP7161767B2 (enExample)
KR (1) KR20200123722A (enExample)
CN (1) CN111825570A (enExample)
TW (1) TWI726336B (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2022171726A (ja) * 2019-04-22 2022-11-11 気相成長株式会社 新規化合物および製造方法

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7578236B2 (ja) * 2020-10-22 2024-11-06 気相成長株式会社 アミジネート金属錯体の製造方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006511716A (ja) 2002-11-15 2006-04-06 プレジデント・アンド・フェロウズ・オブ・ハーバード・カレッジ 金属アミジナートを用いる原子層の析出
JP2011525697A (ja) 2008-03-21 2011-09-22 プレジデント アンド フェロウズ オブ ハーバード カレッジ 配線用セルフアライン（自己整合）バリア層
WO2013051670A1 (ja) 2011-10-07 2013-04-11 気相成長株式会社 コバルト系膜形成方法、コバルト系膜形成材料、及び新規化合物
JP2016172894A (ja) 2015-03-17 2016-09-29 気相成長株式会社 鉄系膜形成材料および鉄系膜形成方法
CN107597148A (zh) 2017-09-28 2018-01-19 北京大学深圳研究生院 一种电催化剂及其制备方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100482345B1 (ko) 2002-11-27 2005-04-14 엘지전자 주식회사 액정을 이용한 플라즈마 디스플레이 패널의 구동방법
JP5225957B2 (ja) 2009-09-17 2013-07-03 東京エレクトロン株式会社 成膜方法および記憶媒体
KR20130051670A (ko) 2011-11-10 2013-05-21 공주대학교 산학협력단 지표면 대상물체 모니터링 장치 및 방법

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006511716A (ja) 2002-11-15 2006-04-06 プレジデント・アンド・フェロウズ・オブ・ハーバード・カレッジ 金属アミジナートを用いる原子層の析出
JP2011525697A (ja) 2008-03-21 2011-09-22 プレジデント アンド フェロウズ オブ ハーバード カレッジ 配線用セルフアライン（自己整合）バリア層
WO2013051670A1 (ja) 2011-10-07 2013-04-11 気相成長株式会社 コバルト系膜形成方法、コバルト系膜形成材料、及び新規化合物
JP2016172894A (ja) 2015-03-17 2016-09-29 気相成長株式会社 鉄系膜形成材料および鉄系膜形成方法
CN107597148A (zh) 2017-09-28 2018-01-19 北京大学深圳研究生院 一种电催化剂及其制备方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2022171726A (ja) * 2019-04-22 2022-11-11 気相成長株式会社 新規化合物および製造方法
JP7332211B2 (ja) 2019-04-22 2023-08-23 気相成長株式会社 新規化合物および製造方法

Also Published As

Publication number Publication date
CN111825570A (zh) 2020-10-27
JP2020176104A (ja) 2020-10-29
US20200331944A1 (en) 2020-10-22
TW202039422A (zh) 2020-11-01
KR20200123722A (ko) 2020-10-30
TWI726336B (zh) 2021-05-01

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