JP7134567B2 - 破壊試験装置、及び破片回収方法 - Google Patents
破壊試験装置、及び破片回収方法 Download PDFInfo
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- JP7134567B2 JP7134567B2 JP2018183296A JP2018183296A JP7134567B2 JP 7134567 B2 JP7134567 B2 JP 7134567B2 JP 2018183296 A JP2018183296 A JP 2018183296A JP 2018183296 A JP2018183296 A JP 2018183296A JP 7134567 B2 JP7134567 B2 JP 7134567B2
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/10—Measuring as part of the manufacturing process
- H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N3/00—Investigating strength properties of solid materials by application of mechanical stress
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/20—Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/30—Structural arrangements specially adapted for testing or measuring during manufacture or treatment, or specially adapted for reliability measurements
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2203/00—Investigating strength properties of solid materials by application of mechanical stress
- G01N2203/0058—Kind of property studied
- G01N2203/006—Crack, flaws, fracture or rupture
- G01N2203/0067—Fracture or rupture
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- Health & Medical Sciences (AREA)
- Investigating Strength Of Materials By Application Of Mechanical Stress (AREA)
- Sampling And Sample Adjustment (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
Description
1a 表面
1b 裏面
1c 破壊起点
1d 破片
3a 一端
3b 他端
2 破壊試験装置
4 チップ破壊ユニット
6 チップ挟持ユニット
6a,6b チップ支持部
6c 初期位置
8a,8b 面
10 移動ユニット
12,12a 破片回収ユニット
14 基台
16,16a 粘着シート
18,18a 破片保持面
Claims (6)
- チップを破壊できるチップ破壊ユニットと、
該チップ破壊ユニットの下方に配設され、チップ破壊ユニットにより破壊された該チップの破片を保持する破片保持面を表面に有する破片回収ユニットと、を備え、
該破片回収ユニットは、粘着性を有し落下した該チップの破片を保持する粘着シートを該破片保持面に備え、
該チップ破壊ユニットは、破壊されるチップの破壊起点が該破片回収ユニットの該破片保持面に対面するように該チップを破壊することを特徴とする破壊試験装置。 - 該破片回収ユニットの該破片保持面は、水平面に沿うことを特徴とする請求項1に記載の破壊試験装置。
- 該チップ破壊ユニットは、
鉛直方向に沿った第1の面を有した第1のチップ支持部と、該第1の面に対面する鉛直方向に沿った第2の面を有した第2のチップ支持部と、を有し、U字状に湾曲されたチップを挟持できるチップ挟持ユニットと、
該第1のチップ支持部と、該第2のチップ支持部と、を互いに近接する方向に相対移動させる移動ユニットと、を備えることを特徴とする請求項1または請求項2に記載の破壊試験装置。 - 該破片回収ユニットの該破片保持面には、複数の該粘着シートが積層されており、
該複数の該粘着シートは、個々に剥離可能であることを特徴とする請求項1乃至請求項3のいずれかに記載の破壊試験装置。 - チップを破壊することで生成された該チップの破片を回収する破片回収方法であって、
表面に破片保持面を有し、該チップの破片を保持する粘着シートを該破片保持面に備える破片回収ユニットを準備する破片回収ユニット準備ステップと、
該破片回収ユニットの上方でチップを破壊する破壊ステップと、
該破壊ステップで破壊された該チップの破片が落下して該破片回収ユニットの破片保持面の該粘着シートに付着することで該チップの破片を回収する回収ステップと、を備えることを特徴とする破片回収方法。 - 該破片回収ユニットの該破片保持面には、複数の該粘着シートが積層されており、
該回収ステップでは、該チップの破片が付着した最上層の該粘着シートを剥離して次の該粘着シートを露出することを特徴とする請求項5に記載の破片回収方法。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
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JP2018183296A JP7134567B2 (ja) | 2018-09-28 | 2018-09-28 | 破壊試験装置、及び破片回収方法 |
KR1020190102954A KR102678808B1 (ko) | 2018-09-28 | 2019-08-22 | 파괴 시험 장치 및 파편 회수 방법 |
CN201910869125.0A CN110970316A (zh) | 2018-09-28 | 2019-09-16 | 破坏试验装置和碎片回收方法 |
TW108134530A TWI807105B (zh) | 2018-09-28 | 2019-09-25 | 破壞試驗裝置以及碎片回收方法 |
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JP2018183296A JP7134567B2 (ja) | 2018-09-28 | 2018-09-28 | 破壊試験装置、及び破片回収方法 |
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JP2020051965A JP2020051965A (ja) | 2020-04-02 |
JP7134567B2 true JP7134567B2 (ja) | 2022-09-12 |
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JP (1) | JP7134567B2 (ja) |
KR (1) | KR102678808B1 (ja) |
CN (1) | CN110970316A (ja) |
TW (1) | TWI807105B (ja) |
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CN112833946B (zh) * | 2020-12-31 | 2022-07-15 | 深圳市展芯科技有限公司 | 一种芯片快速检测设备及快速检测方法 |
KR102629626B1 (ko) * | 2023-04-14 | 2024-01-24 | 윤진성 | 시험기용 시편수집기 |
KR102627832B1 (ko) * | 2023-04-14 | 2024-01-19 | 윤진성 | 시편회수부를 가지는 충격시험기 |
KR102633202B1 (ko) * | 2023-04-14 | 2024-02-01 | 윤진성 | 시편가열부를 가지는 충격시험기 |
KR102542402B1 (ko) * | 2023-04-14 | 2023-06-13 | 윤진성 | 샤르피 충격시험기 |
KR102626080B1 (ko) * | 2023-04-14 | 2024-01-16 | 윤진성 | 충격시험기용 시편 회수 장치 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2003194688A (ja) | 2001-12-26 | 2003-07-09 | Shimadzu Corp | 曲げ試験機 |
JP2011033376A (ja) | 2009-07-30 | 2011-02-17 | Seiko Epson Corp | 試験装置、試験方法 |
WO2014171247A1 (ja) | 2013-04-15 | 2014-10-23 | 旭硝子株式会社 | 曲げ試験方法、シート物の製造方法、曲げ試験装置、脆性シート、素子付き脆性シート、および電子デバイス |
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JP3012513B2 (ja) * | 1996-03-04 | 2000-02-21 | 山口日本電気株式会社 | 半導体装置の試験方法及び試験装置 |
JP4415893B2 (ja) * | 2005-04-05 | 2010-02-17 | 信越半導体株式会社 | 半導体ウエーハの機械的強度測定装置及び機械的強度測定方法 |
JP5954254B2 (ja) | 2013-05-13 | 2016-07-20 | 信越半導体株式会社 | 半導体ウェーハの評価システム及び評価方法 |
JP2015044633A (ja) * | 2013-08-27 | 2015-03-12 | 株式会社村田製作所 | チップ部品回収装置 |
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- 2018-09-28 JP JP2018183296A patent/JP7134567B2/ja active Active
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- 2019-08-22 KR KR1020190102954A patent/KR102678808B1/ko active IP Right Grant
- 2019-09-16 CN CN201910869125.0A patent/CN110970316A/zh active Pending
- 2019-09-25 TW TW108134530A patent/TWI807105B/zh active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003194688A (ja) | 2001-12-26 | 2003-07-09 | Shimadzu Corp | 曲げ試験機 |
JP2011033376A (ja) | 2009-07-30 | 2011-02-17 | Seiko Epson Corp | 試験装置、試験方法 |
WO2014171247A1 (ja) | 2013-04-15 | 2014-10-23 | 旭硝子株式会社 | 曲げ試験方法、シート物の製造方法、曲げ試験装置、脆性シート、素子付き脆性シート、および電子デバイス |
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KR20200036729A (ko) | 2020-04-07 |
CN110970316A (zh) | 2020-04-07 |
TW202013547A (zh) | 2020-04-01 |
JP2020051965A (ja) | 2020-04-02 |
KR102678808B1 (ko) | 2024-06-26 |
TWI807105B (zh) | 2023-07-01 |
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