JP7051131B2 - 半導体素子 - Google Patents
半導体素子 Download PDFInfo
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- JP7051131B2 JP7051131B2 JP2019502713A JP2019502713A JP7051131B2 JP 7051131 B2 JP7051131 B2 JP 7051131B2 JP 2019502713 A JP2019502713 A JP 2019502713A JP 2019502713 A JP2019502713 A JP 2019502713A JP 7051131 B2 JP7051131 B2 JP 7051131B2
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- 239000004065 semiconductor Substances 0.000 title claims description 260
- 239000000203 mixture Substances 0.000 claims description 29
- 239000000758 substrate Substances 0.000 claims description 9
- 239000010410 layer Substances 0.000 description 320
- 229910052782 aluminium Inorganic materials 0.000 description 23
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 20
- 239000000463 material Substances 0.000 description 20
- 230000003287 optical effect Effects 0.000 description 20
- 238000000926 separation method Methods 0.000 description 18
- 230000007423 decrease Effects 0.000 description 17
- 238000000605 extraction Methods 0.000 description 16
- 238000000034 method Methods 0.000 description 15
- 230000008569 process Effects 0.000 description 15
- 239000002019 doping agent Substances 0.000 description 11
- 238000002347 injection Methods 0.000 description 11
- 239000007924 injection Substances 0.000 description 11
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 11
- 239000006185 dispersion Substances 0.000 description 8
- 239000010931 gold Substances 0.000 description 8
- 238000009792 diffusion process Methods 0.000 description 7
- 239000000126 substance Substances 0.000 description 7
- 239000010936 titanium Substances 0.000 description 7
- 229910052737 gold Inorganic materials 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 4
- 230000008901 benefit Effects 0.000 description 4
- 238000004891 communication Methods 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- 239000004020 conductor Substances 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 229910052738 indium Inorganic materials 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 230000004048 modification Effects 0.000 description 4
- 238000012986 modification Methods 0.000 description 4
- 229910052759 nickel Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 229910052709 silver Inorganic materials 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- YVTHLONGBIQYBO-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical compound [O--].[Zn++].[In+3] YVTHLONGBIQYBO-UHFFFAOYSA-N 0.000 description 4
- 229910002704 AlGaN Inorganic materials 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 238000005336 cracking Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- VRIVJOXICYMTAG-IYEMJOQQSA-L iron(ii) gluconate Chemical compound [Fe+2].OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C([O-])=O.OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C([O-])=O VRIVJOXICYMTAG-IYEMJOQQSA-L 0.000 description 3
- 230000001954 sterilising effect Effects 0.000 description 3
- 229910052718 tin Inorganic materials 0.000 description 3
- 229910052719 titanium Inorganic materials 0.000 description 3
- 229910052725 zinc Inorganic materials 0.000 description 3
- 239000011701 zinc Substances 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 229910019897 RuOx Inorganic materials 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000003086 colorant Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- JAONJTDQXUSBGG-UHFFFAOYSA-N dialuminum;dizinc;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Al+3].[Al+3].[Zn+2].[Zn+2] JAONJTDQXUSBGG-UHFFFAOYSA-N 0.000 description 2
- 238000005401 electroluminescence Methods 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 229910052733 gallium Inorganic materials 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- 238000002161 passivation Methods 0.000 description 2
- 230000004044 response Effects 0.000 description 2
- 229910052711 selenium Inorganic materials 0.000 description 2
- 239000011669 selenium Substances 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 230000003595 spectral effect Effects 0.000 description 2
- 238000004659 sterilization and disinfection Methods 0.000 description 2
- SKRWFPLZQAAQSU-UHFFFAOYSA-N stibanylidynetin;hydrate Chemical compound O.[Sn].[Sb] SKRWFPLZQAAQSU-UHFFFAOYSA-N 0.000 description 2
- 239000011787 zinc oxide Substances 0.000 description 2
- WUPHOULIZUERAE-UHFFFAOYSA-N 3-(oxolan-2-yl)propanoic acid Chemical compound OC(=O)CCC1CCCO1 WUPHOULIZUERAE-UHFFFAOYSA-N 0.000 description 1
- 229910000980 Aluminium gallium arsenide Inorganic materials 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000000844 anti-bacterial effect Effects 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- AQCDIIAORKRFCD-UHFFFAOYSA-N cadmium selenide Chemical compound [Cd]=[Se] AQCDIIAORKRFCD-UHFFFAOYSA-N 0.000 description 1
- 229910052980 cadmium sulfide Inorganic materials 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 230000008094 contradictory effect Effects 0.000 description 1
- 230000000994 depressogenic effect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- YZZNJYQZJKSEER-UHFFFAOYSA-N gallium tin Chemical compound [Ga].[Sn] YZZNJYQZJKSEER-UHFFFAOYSA-N 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000004020 luminiscence type Methods 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- GNRSAWUEBMWBQH-UHFFFAOYSA-N nickel(II) oxide Inorganic materials [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Substances [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 1
- 239000002096 quantum dot Substances 0.000 description 1
- 230000003014 reinforcing effect Effects 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010944 silver (metal) Substances 0.000 description 1
- 230000035882 stress Effects 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
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- A61L2/00—Methods or apparatus for disinfecting or sterilising materials or objects other than foodstuffs or contact lenses; Accessories therefor
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- H01L33/46—Reflective coating, e.g. dielectric Bragg reflector
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- A61L2202/00—Aspects relating to methods or apparatus for disinfecting or sterilising materials or objects
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- H01L33/26—Materials of the light emitting region
- H01L33/30—Materials of the light emitting region containing only elements of Group III and Group V of the Periodic Table
- H01L33/32—Materials of the light emitting region containing only elements of Group III and Group V of the Periodic Table containing nitrogen
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Description
H1=W4×tanθ1
Claims (16)
- 第1導電型半導体層、第2導電型半導体層、前記第1導電型半導体層と前記第2導電型半導体層間に配置される活性層を含み、
前記第2導電型半導体層および前記活性層を貫通して前記第1導電型半導体層の一部の領域まで配置される複数個の第1リセスおよび前記複数個の第1リセスの間に配置される第2リセスを含む半導体構造物;
前記複数個の第1リセスの内部に配置され、前記第1導電型半導体層と電気的に連結される複数個の第1電極;
前記第2導電型半導体層に電気的に連結される複数個の第2電極;および
前記第2リセスの内部に配置される反射層を含み、
前記半導体構造物は紫外線波長帯の光を生成し、
前記半導体構造物は前記第2リセスによって区画される複数個の第1領域を含み、
前記複数個の第1電極は前記複数個の第1領域にそれぞれ配置され、
前記第1領域の面積は前記第1電極の面積の2.0倍~5.0倍であり、
前記複数個の第1リセスの面積と前記第2リセスの面積の和は前記半導体構造物の第1方向最大面積の60%以下であり、
前記複数個の第1リセスの面積と前記第2リセスの面積は前記半導体構造物の下部面に形成された面積であり、
前記第1方向は前記半導体構造物の厚さ方向と垂直な方向である、半導体素子。 - 前記複数個の第2電極の間の距離は3μm以上60μm以下である、請求項1に記載の半導体素子。
- 前記反射層の幅は3μm以上30μm以下である、請求項1に記載の半導体素子。
- 前記複数個の第2電極の間の距離と前記反射層の幅は同じである、請求項1に記載の半導体素子。
- 前記複数個の第1電極が前記第1導電型半導体層と電気的に連結される面積は、前記半導体構造物の第1方向最大面積の6.0%~11.0%である、請求項1に記載の半導体素子。
- 前記複数個の第2電極が前記第2導電型半導体層と電気的に連結される面積は、前記半導体構造物の第1方向最大面積の40%~60%である、請求項1に記載の半導体素子。
- 前記複数個の第1電極が前記第1導電型半導体層と電気的に連結される面積と前記複数個の第2電極が前記第2導電型半導体層と電気的に連結される面積の比は、1:4以上1:10以下である、請求項1に記載の半導体素子。
- 前記複数個の第1領域の面積は前記複数個の第1リセスの面積の2.0倍~5.0倍である、請求項1に記載の半導体素子。
- 前記反射層は前記第2リセスから延びて前記第2電極と接触する延長部を含む、請求項1に記載の半導体素子。
- 前記反射層と前記第2電極を覆うキャッピング層を含む、請求項9に記載の半導体素子。
- 前記キャッピング層と電気的に連結される第2電極パッドを含む、請求項10に記載の半導体素子。
- 前記複数個の第1電極と電気的に連結される下部反射層を含む、請求項1に記載の半導体素子。
- 前記下部反射層と電気的に連結される基板を含む、請求項12に記載の半導体素子。
- 前記第1導電型半導体層は前記活性層と隣接して配置された第1層と前記第1層上に配置される第2層を含み、
前記第2層は前記第1層よりAl組成が高く、
前記第1電極は前記第1層に配置される、請求項1に記載の半導体素子。 - 前記複数個の第1リセスは第2方向に分離され、前記複数個の第1リセスのそれぞれは前記第2方向と垂直な第1方向に延び、
前記第2リセスは前記複数個の第1リセスの間に配置される、請求項1に記載の半導体素子。 - 前記第2リセスは、前記第2リセスが前記複数個の第1リセスを取り囲むように前記半導体構造物の側面に沿って延びる、請求項1に記載の半導体素子。
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