JP7041121B2 - 半導体平坦化用及びインプリントリソグラフィ用ウェハスケールプログラマブル膜 - Google Patents

半導体平坦化用及びインプリントリソグラフィ用ウェハスケールプログラマブル膜 Download PDF

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JP7041121B2
JP7041121B2 JP2019506101A JP2019506101A JP7041121B2 JP 7041121 B2 JP7041121 B2 JP 7041121B2 JP 2019506101 A JP2019506101 A JP 2019506101A JP 2019506101 A JP2019506101 A JP 2019506101A JP 7041121 B2 JP7041121 B2 JP 7041121B2
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substrate
film
solvent
resist
pattern
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JP2019526174A (ja
JP2019526174A5 (enExample
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ヴイ． スリーニヴァッサン，シトルガタ
シンハル，シュラワン
アベッド，オヴァディア
デュン，ローレンス
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University of Texas System
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q60/00—Particular types of SPM [Scanning Probe Microscopy] or microscopes; Essential components thereof
    • G01Q60/24—AFM [Atomic Force Microscopy] or apparatus therefor, e.g. AFM probes

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  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Radiology & Medical Imaging (AREA)
  • General Health & Medical Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2019506101A 2016-08-03 2017-08-03 半導体平坦化用及びインプリントリソグラフィ用ウェハスケールプログラマブル膜 Active JP7041121B2 (ja)

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US201662370259P 2016-08-03 2016-08-03
US62/370,259 2016-08-03
PCT/US2017/045373 WO2018027073A1 (en) 2016-08-03 2017-08-03 Wafer-scale programmable films for semiconductor planarization and for imprint lithography

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JP2019526174A JP2019526174A (ja) 2019-09-12
JP2019526174A5 JP2019526174A5 (enExample) 2020-10-01
JP7041121B2 true JP7041121B2 (ja) 2022-03-23

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US (2) US11762284B2 (enExample)
EP (1) EP3493921A4 (enExample)
JP (1) JP7041121B2 (enExample)
WO (2) WO2018027069A1 (enExample)

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WO2018027069A1 (en) 2016-08-03 2018-02-08 Board Of Regents, The University Of Texas System Roll-to-roll programmable film imprint lithography
TWI794566B (zh) 2018-12-13 2023-03-01 德克薩斯大學系統董事會 用以修改基板的系統及方法
US20220229361A1 (en) * 2019-05-13 2022-07-21 Board Of Regents, The University Of Texas System Roll-to-roll nanoimprint lithography tools and processes
WO2020246405A1 (ja) * 2019-06-07 2020-12-10 富士フイルム株式会社 パターン形成用組成物、硬化膜、積層体、パターンの製造方法および半導体素子の製造方法
US11562924B2 (en) * 2020-01-31 2023-01-24 Canon Kabushiki Kaisha Planarization apparatus, planarization process, and method of manufacturing an article
US11455436B2 (en) * 2020-03-25 2022-09-27 Tokyo Electron Limited Predicting across wafer spin-on planarization over a patterned topography
KR20230047961A (ko) * 2020-05-18 2023-04-10 에스디에스 나노, 아이앤씨. 고정밀 나노스케일 박막 제조 공정
FI131751B1 (en) * 2020-10-21 2025-11-07 Teknologian Tutkimuskeskus Vtt Oy Roll-to-roll imprinting
US12152162B2 (en) 2021-11-30 2024-11-26 Canon Kabushiki Kaisha Method of forming a photo-cured layer
NL2036140B1 (en) * 2023-10-27 2025-05-12 Morphotonics Holding Bv Method and system for in situ layer thickness control during imprinting

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JP2010036444A (ja) 2008-08-05 2010-02-18 Fuji Electric Device Technology Co Ltd 微細凹凸構造体の製造方法
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JP2013175709A (ja) 2012-01-27 2013-09-05 Canon Inc インプリント装置、それを用いた物品の製造方法
JP2013211450A (ja) 2012-03-30 2013-10-10 Dainippon Printing Co Ltd 基板の製造方法、および、ナノインプリントリソグラフィ用テンプレートの製造方法
JP2015088667A (ja) 2013-10-31 2015-05-07 株式会社東芝 微細加工システム、微細加工装置、および微細加工方法

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JP2001239202A (ja) 1999-12-20 2001-09-04 Tokyo Electron Ltd 塗布処理装置
US20050037143A1 (en) 2000-07-18 2005-02-17 Chou Stephen Y. Imprint lithography with improved monitoring and control and apparatus therefor
JP2006069120A (ja) 2004-09-03 2006-03-16 Asahi Kasei Chemicals Corp 電子回路あるいは光学部材の製造方法
JP2007324504A (ja) 2006-06-05 2007-12-13 Ibaraki Univ 転写印刷方法、転写印刷装置およびそれを用いて製造した転写印刷製品
JP2007322363A (ja) 2006-06-05 2007-12-13 Sii Nanotechnology Inc プローブ構造体及び走査型プローブ顕微鏡
JP2011529626A (ja) 2008-06-09 2011-12-08 ボード・オブ・リージエンツ，ザ・ユニバーシテイ・オブ・テキサス・システム 適応ナノトポグラフィ・スカルプティング
JP2010036444A (ja) 2008-08-05 2010-02-18 Fuji Electric Device Technology Co Ltd 微細凹凸構造体の製造方法
JP2013175709A (ja) 2012-01-27 2013-09-05 Canon Inc インプリント装置、それを用いた物品の製造方法
JP2013211450A (ja) 2012-03-30 2013-10-10 Dainippon Printing Co Ltd 基板の製造方法、および、ナノインプリントリソグラフィ用テンプレートの製造方法
JP2015088667A (ja) 2013-10-31 2015-05-07 株式会社東芝 微細加工システム、微細加工装置、および微細加工方法

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US11669009B2 (en) 2023-06-06
US20210389666A1 (en) 2021-12-16
JP2019526174A (ja) 2019-09-12
WO2018027073A1 (en) 2018-02-08
EP3493921A4 (en) 2020-06-03
US20210341833A1 (en) 2021-11-04
WO2018027069A1 (en) 2018-02-08
EP3493921A1 (en) 2019-06-12
US11762284B2 (en) 2023-09-19

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