PL3256906T3 - Sposób teksturowania dyskretnych podłoży i elastyczny stempel - Google Patents
Sposób teksturowania dyskretnych podłoży i elastyczny stempelInfo
- Publication number
- PL3256906T3 PL3256906T3 PL16704585T PL16704585T PL3256906T3 PL 3256906 T3 PL3256906 T3 PL 3256906T3 PL 16704585 T PL16704585 T PL 16704585T PL 16704585 T PL16704585 T PL 16704585T PL 3256906 T3 PL3256906 T3 PL 3256906T3
- Authority
- PL
- Poland
- Prior art keywords
- discreet
- texturing
- substrates
- flexible punch
- punch
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B30—PRESSES
- B30B—PRESSES IN GENERAL
- B30B11/00—Presses specially adapted for forming shaped articles from material in particulate or plastic state, e.g. briquetting presses, tabletting presses
- B30B11/20—Roller-and-ring machines, i.e. with roller disposed within a ring and co-operating with the inner surface of the ring
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/01—Manufacture or treatment
- H10W72/0198—Manufacture or treatment batch processes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C2791/00—Shaping characteristics in general
- B29C2791/004—Shaping under special conditions
- B29C2791/006—Using vacuum
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
- Electroluminescent Light Sources (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Photovoltaic Devices (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP15155039 | 2015-02-13 | ||
| EP16704585.5A EP3256906B1 (en) | 2015-02-13 | 2016-02-11 | Method for texturing discrete substrates and flexible stamp |
| PCT/EP2016/052872 WO2016128493A1 (en) | 2015-02-13 | 2016-02-11 | Method for texturing discrete substrates ii |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| PL3256906T3 true PL3256906T3 (pl) | 2019-10-31 |
Family
ID=52595064
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PL16704585T PL3256906T3 (pl) | 2015-02-13 | 2016-02-11 | Sposób teksturowania dyskretnych podłoży i elastyczny stempel |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US10996559B2 (pl) |
| EP (1) | EP3256906B1 (pl) |
| JP (1) | JP6720199B2 (pl) |
| KR (1) | KR102566639B1 (pl) |
| CN (1) | CN107430329B (pl) |
| DK (1) | DK3256906T3 (pl) |
| ES (1) | ES2733809T3 (pl) |
| PL (1) | PL3256906T3 (pl) |
| TR (1) | TR201909874T4 (pl) |
| WO (1) | WO2016128493A1 (pl) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2017050926A1 (en) | 2015-09-23 | 2017-03-30 | Carl Zeiss Smt Gmbh | Optical imaging arrangement with a piezoelectric device |
| WO2018027073A1 (en) * | 2016-08-03 | 2018-02-08 | Board Of Regents, The University Of Texas System | Wafer-scale programmable films for semiconductor planarization and for imprint lithography |
| KR102448904B1 (ko) * | 2017-07-31 | 2022-09-29 | 삼성디스플레이 주식회사 | 임프린트 장치 및 임프린트 방법 |
| US10580659B2 (en) * | 2017-09-14 | 2020-03-03 | Canon Kabushiki Kaisha | Planarization process and apparatus |
| KR102775942B1 (ko) * | 2018-01-26 | 2025-03-07 | 모포토닉스 홀딩 비.브이. | 개별 기판을 텍스처링하기 위한 공정 및 장비 |
| US11977328B2 (en) * | 2018-10-12 | 2024-05-07 | Morphotonics Holding B.V. | Flexible stamp with tunable high dimensional stability |
| EP3693714A1 (en) | 2019-02-11 | 2020-08-12 | Fresh Strips B.V. | Optical sensor based on shape memory between scattering and transparent modes |
| EP4058846B1 (en) | 2019-11-12 | 2023-07-05 | Morphotonics Holding B.V. | Imprinting apparatus for a roll-to-plate imprinting process comprising a plate carrier with cavity |
| WO2022023090A1 (en) * | 2020-07-31 | 2022-02-03 | Morphotonics Holding B.V. | Apparatus and process for replicating a texture |
| CN113189840A (zh) * | 2021-04-16 | 2021-07-30 | 深圳先进技术研究院 | 微纳结构制作方法及微纳结构制作装置 |
| WO2023069739A1 (en) * | 2021-10-22 | 2023-04-27 | Worcester Polytechnic Institute | Microchannel printing |
| JP2025502596A (ja) | 2021-11-15 | 2025-01-28 | モーフォトニクス ホールディング ベスローテン フェノーツハップ | インプリント方法 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1362682A1 (en) * | 2002-05-13 | 2003-11-19 | ZBD Displays Ltd, | Method and apparatus for liquid crystal alignment |
| US20080160129A1 (en) * | 2006-05-11 | 2008-07-03 | Molecular Imprints, Inc. | Template Having a Varying Thickness to Facilitate Expelling a Gas Positioned Between a Substrate and the Template |
| ATE513625T1 (de) * | 2006-04-03 | 2011-07-15 | Molecular Imprints Inc | Lithographiedrucksystem |
| TW200819546A (en) | 2006-10-30 | 2008-05-01 | Jinn P Chu | In-air micro and nanoimprint of bulk metallic glasses and a method for making the same |
| JP4840668B2 (ja) | 2007-11-30 | 2011-12-21 | 綜研化学株式会社 | 熱インプリント用モールドおよびこのモールドを用いた光学素子の製造方法 |
| EP2280813B1 (en) | 2008-04-18 | 2017-06-07 | Massachusetts Institute Of Technology | Imprint patterning of irregular surface |
| CN101852986A (zh) * | 2009-03-30 | 2010-10-06 | 鸿富锦精密工业（深圳）有限公司 | 压印模具 |
| TW201228807A (en) * | 2011-01-13 | 2012-07-16 | Moser Baer India Ltd | Method of imprinting a texture on a rigid substrate using flexible stamp |
| KR101910974B1 (ko) * | 2011-12-13 | 2018-10-24 | 삼성전자주식회사 | 임프린팅 스탬프 및 이를 이용한 나노 임프린트 방법 |
| CN105722687B (zh) * | 2013-11-06 | 2018-09-25 | 3M创新有限公司 | 具有功能特征结构的微接触印刷压模 |
-
2016
- 2016-02-11 KR KR1020177022080A patent/KR102566639B1/ko active Active
- 2016-02-11 US US15/549,419 patent/US10996559B2/en active Active
- 2016-02-11 JP JP2017542481A patent/JP6720199B2/ja active Active
- 2016-02-11 WO PCT/EP2016/052872 patent/WO2016128493A1/en not_active Ceased
- 2016-02-11 PL PL16704585T patent/PL3256906T3/pl unknown
- 2016-02-11 ES ES16704585T patent/ES2733809T3/es active Active
- 2016-02-11 EP EP16704585.5A patent/EP3256906B1/en active Active
- 2016-02-11 TR TR2019/09874T patent/TR201909874T4/tr unknown
- 2016-02-11 DK DK16704585.5T patent/DK3256906T3/da active
- 2016-02-11 CN CN201680009436.4A patent/CN107430329B/zh active Active
Also Published As
| Publication number | Publication date |
|---|---|
| TR201909874T4 (tr) | 2019-07-22 |
| KR20170122186A (ko) | 2017-11-03 |
| JP6720199B2 (ja) | 2020-07-08 |
| US20180017862A1 (en) | 2018-01-18 |
| CN107430329A (zh) | 2017-12-01 |
| ES2733809T3 (es) | 2019-12-03 |
| KR102566639B1 (ko) | 2023-08-16 |
| US10996559B2 (en) | 2021-05-04 |
| EP3256906A1 (en) | 2017-12-20 |
| EP3256906B1 (en) | 2019-04-10 |
| WO2016128493A1 (en) | 2016-08-18 |
| CN107430329B (zh) | 2021-02-12 |
| DK3256906T3 (da) | 2019-07-15 |
| JP2018512263A (ja) | 2018-05-17 |
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