JP2019526174A5 - - Google Patents

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Publication number
JP2019526174A5
JP2019526174A5 JP2019506101A JP2019506101A JP2019526174A5 JP 2019526174 A5 JP2019526174 A5 JP 2019526174A5 JP 2019506101 A JP2019506101 A JP 2019506101A JP 2019506101 A JP2019506101 A JP 2019506101A JP 2019526174 A5 JP2019526174 A5 JP 2019526174A5
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Japan
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substrate
film
solvent
change
film thickness
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JP2019506101A
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JP2019526174A (ja
JP7041121B2 (ja
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Priority claimed from PCT/US2017/045373 external-priority patent/WO2018027073A1/en
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JP2019506101A 2016-08-03 2017-08-03 半導体平坦化用及びインプリントリソグラフィ用ウェハスケールプログラマブル膜 Active JP7041121B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201662370259P 2016-08-03 2016-08-03
US62/370,259 2016-08-03
PCT/US2017/045373 WO2018027073A1 (en) 2016-08-03 2017-08-03 Wafer-scale programmable films for semiconductor planarization and for imprint lithography

Publications (3)

Publication Number Publication Date
JP2019526174A JP2019526174A (ja) 2019-09-12
JP2019526174A5 true JP2019526174A5 (enExample) 2020-10-01
JP7041121B2 JP7041121B2 (ja) 2022-03-23

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JP2019506101A Active JP7041121B2 (ja) 2016-08-03 2017-08-03 半導体平坦化用及びインプリントリソグラフィ用ウェハスケールプログラマブル膜

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US (2) US11762284B2 (enExample)
EP (1) EP3493921A4 (enExample)
JP (1) JP7041121B2 (enExample)
WO (2) WO2018027069A1 (enExample)

Families Citing this family (10)

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WO2018027069A1 (en) 2016-08-03 2018-02-08 Board Of Regents, The University Of Texas System Roll-to-roll programmable film imprint lithography
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US20220229361A1 (en) * 2019-05-13 2022-07-21 Board Of Regents, The University Of Texas System Roll-to-roll nanoimprint lithography tools and processes
WO2020246405A1 (ja) * 2019-06-07 2020-12-10 富士フイルム株式会社 パターン形成用組成物、硬化膜、積層体、パターンの製造方法および半導体素子の製造方法
US11562924B2 (en) * 2020-01-31 2023-01-24 Canon Kabushiki Kaisha Planarization apparatus, planarization process, and method of manufacturing an article
US11455436B2 (en) * 2020-03-25 2022-09-27 Tokyo Electron Limited Predicting across wafer spin-on planarization over a patterned topography
KR20230047961A (ko) * 2020-05-18 2023-04-10 에스디에스 나노, 아이앤씨. 고정밀 나노스케일 박막 제조 공정
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