JP7027177B2 - 補正情報生成方法、描画方法、補正情報生成装置および描画装置 - Google Patents

補正情報生成方法、描画方法、補正情報生成装置および描画装置 Download PDF

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Publication number
JP7027177B2
JP7027177B2 JP2018007939A JP2018007939A JP7027177B2 JP 7027177 B2 JP7027177 B2 JP 7027177B2 JP 2018007939 A JP2018007939 A JP 2018007939A JP 2018007939 A JP2018007939 A JP 2018007939A JP 7027177 B2 JP7027177 B2 JP 7027177B2
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Prior art keywords
measurement position
measurement
design
correction information
correction
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JP2018007939A
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Japanese (ja)
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JP2019128375A (ja
Inventor
清志 北村
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Screen Holdings Co Ltd
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Screen Holdings Co Ltd
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Priority to JP2018007939A priority Critical patent/JP7027177B2/ja
Priority to PCT/JP2018/040860 priority patent/WO2019142443A1/fr
Priority to TW107143178A priority patent/TWI709826B/zh
Publication of JP2019128375A publication Critical patent/JP2019128375A/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
JP2018007939A 2018-01-22 2018-01-22 補正情報生成方法、描画方法、補正情報生成装置および描画装置 Active JP7027177B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2018007939A JP7027177B2 (ja) 2018-01-22 2018-01-22 補正情報生成方法、描画方法、補正情報生成装置および描画装置
PCT/JP2018/040860 WO2019142443A1 (fr) 2018-01-22 2018-11-02 Procédé de génération d'informations de correction, procédé de dessin, dispositif de génération d'informations de correction et dispositif de dessin
TW107143178A TWI709826B (zh) 2018-01-22 2018-12-03 修正資訊產生方法、描繪方法、修正資訊產生裝置及描繪裝置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2018007939A JP7027177B2 (ja) 2018-01-22 2018-01-22 補正情報生成方法、描画方法、補正情報生成装置および描画装置

Publications (2)

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JP2019128375A JP2019128375A (ja) 2019-08-01
JP7027177B2 true JP7027177B2 (ja) 2022-03-01

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JP2018007939A Active JP7027177B2 (ja) 2018-01-22 2018-01-22 補正情報生成方法、描画方法、補正情報生成装置および描画装置

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Country Link
JP (1) JP7027177B2 (fr)
TW (1) TWI709826B (fr)
WO (1) WO2019142443A1 (fr)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008124142A (ja) 2006-11-09 2008-05-29 Dainippon Screen Mfg Co Ltd 位置検出方法、位置検出装置、パターン描画装置及び被検出物
JP2010212383A (ja) 2009-03-09 2010-09-24 Nikon Corp 露光方法、露光システム、及びデバイス製造方法
JP2014143335A (ja) 2013-01-25 2014-08-07 Dainippon Screen Mfg Co Ltd 描画装置および描画方法
JP2017068002A (ja) 2015-09-30 2017-04-06 株式会社Ｓｃｒｅｅｎホールディングス 補正情報生成装置、描画装置、補正情報生成方法および描画方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6278957B1 (en) * 1993-01-21 2001-08-21 Nikon Corporation Alignment method and apparatus therefor
JP3348918B2 (ja) * 1993-01-21 2002-11-20 株式会社ニコン 位置合わせ方法、該方法を用いた露光方法、及びデバイス製造方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008124142A (ja) 2006-11-09 2008-05-29 Dainippon Screen Mfg Co Ltd 位置検出方法、位置検出装置、パターン描画装置及び被検出物
JP2010212383A (ja) 2009-03-09 2010-09-24 Nikon Corp 露光方法、露光システム、及びデバイス製造方法
JP2014143335A (ja) 2013-01-25 2014-08-07 Dainippon Screen Mfg Co Ltd 描画装置および描画方法
JP2017068002A (ja) 2015-09-30 2017-04-06 株式会社Ｓｃｒｅｅｎホールディングス 補正情報生成装置、描画装置、補正情報生成方法および描画方法

Also Published As

Publication number Publication date
TWI709826B (zh) 2020-11-11
TW201932990A (zh) 2019-08-16
JP2019128375A (ja) 2019-08-01
WO2019142443A1 (fr) 2019-07-25

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