JP7010093B2 - 感放射線性組成物 - Google Patents

感放射線性組成物 Download PDF

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Publication number
JP7010093B2
JP7010093B2 JP2018050669A JP2018050669A JP7010093B2 JP 7010093 B2 JP7010093 B2 JP 7010093B2 JP 2018050669 A JP2018050669 A JP 2018050669A JP 2018050669 A JP2018050669 A JP 2018050669A JP 7010093 B2 JP7010093 B2 JP 7010093B2
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JP
Japan
Prior art keywords
radiation
composition
mass
sensitive
compound
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JP2018050669A
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English (en)
Japanese (ja)
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JP2019164194A (ja
Inventor
和生 工藤
満代 吉澤
友希 大沼
朗人 成子
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Original Assignee
JSR Corp
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Filing date
Publication date
Application filed by JSR Corp filed Critical JSR Corp
Priority to JP2018050669A priority Critical patent/JP7010093B2/ja
Priority to KR1020190012896A priority patent/KR102610602B1/ko
Priority to TW108107400A priority patent/TWI803587B/zh
Priority to CN201910193446.3A priority patent/CN110286561A/zh
Publication of JP2019164194A publication Critical patent/JP2019164194A/ja
Priority to JP2021120654A priority patent/JP7201034B2/ja
Application granted granted Critical
Publication of JP7010093B2 publication Critical patent/JP7010093B2/ja
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nonlinear Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Inorganic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Measurement Of Radiation (AREA)
  • Polymerisation Methods In General (AREA)
JP2018050669A 2018-03-19 2018-03-19 感放射線性組成物 Active JP7010093B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2018050669A JP7010093B2 (ja) 2018-03-19 2018-03-19 感放射線性組成物
KR1020190012896A KR102610602B1 (ko) 2018-03-19 2019-01-31 감방사선성 조성물, 경화막 및 표시 소자
TW108107400A TWI803587B (zh) 2018-03-19 2019-03-06 感放射線性組合物、硬化膜及顯示元件
CN201910193446.3A CN110286561A (zh) 2018-03-19 2019-03-14 感放射线性组合物、硬化膜及显示元件
JP2021120654A JP7201034B2 (ja) 2018-03-19 2021-07-21 感放射線性組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2018050669A JP7010093B2 (ja) 2018-03-19 2018-03-19 感放射線性組成物

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2021120654A Division JP7201034B2 (ja) 2018-03-19 2021-07-21 感放射線性組成物

Publications (2)

Publication Number Publication Date
JP2019164194A JP2019164194A (ja) 2019-09-26
JP7010093B2 true JP7010093B2 (ja) 2022-01-26

Family

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Family Applications (2)

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JP2018050669A Active JP7010093B2 (ja) 2018-03-19 2018-03-19 感放射線性組成物
JP2021120654A Active JP7201034B2 (ja) 2018-03-19 2021-07-21 感放射線性組成物

Family Applications After (1)

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JP2021120654A Active JP7201034B2 (ja) 2018-03-19 2021-07-21 感放射線性組成物

Country Status (4)

Country Link
JP (2) JP7010093B2 (zh)
KR (1) KR102610602B1 (zh)
CN (1) CN110286561A (zh)
TW (1) TWI803587B (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114585654B (zh) * 2019-10-04 2023-11-07 北欧化工公司 用于烯烃聚合的齐格勒-纳塔催化剂
JP7229187B2 (ja) * 2020-01-29 2023-02-27 Jsr株式会社 重合体組成物、硬化膜及び有機ｅｌ素子

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008176218A (ja) 2007-01-22 2008-07-31 Jsr Corp 感放射線性樹脂組成物およびカラーフィルタ
US20080199805A1 (en) 2007-02-08 2008-08-21 Fujifilm Electronic Materials. U.S.A., Inc. Photosensitive compositions employing silicon-containing additives
JP2010128136A (ja) 2008-11-27 2010-06-10 Jsr Corp 上層反射防止膜形成用組成物、上層反射防止膜及びパターン形成方法
JP2013114096A (ja) 2011-11-30 2013-06-10 Sanyo Chem Ind Ltd フォトスペーサー形成用感光性樹脂組成物
JP2014131998A (ja) 2012-12-31 2014-07-17 Rohm & Haas Electronic Materials Llc 樹状化合物、フォトレジスト組成物、および電子デバイスを作製する方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4933639A (zh) * 1972-07-25 1974-03-28
JPH10217434A (ja) * 1997-02-04 1998-08-18 Dainippon Printing Co Ltd 印刷機のインキ装置
JP2002293837A (ja) * 2001-03-30 2002-10-09 Dainippon Printing Co Ltd 硬化性樹脂及びその製造方法
JP5298653B2 (ja) * 2007-07-06 2013-09-25 Ｊｓｒ株式会社 着色層形成用感放射線性組成物、カラーフィルタおよびカラー液晶表示素子
JP5064950B2 (ja) * 2007-09-14 2012-10-31 株式会社カネカ 新規な感光性樹脂組成物、それから得られる感光性樹脂組成物溶液、感光性フィルム、絶縁膜及び絶縁膜付きプリント配線板
JP2011197142A (ja) * 2010-03-17 2011-10-06 Jsr Corp 感放射線性組成物、硬化膜及びその形成方法
JP2012159601A (ja) 2011-01-31 2012-08-23 Toray Ind Inc 感光性樹脂組成物
JP2015092233A (ja) * 2013-09-30 2015-05-14 Jsr株式会社 感放射線性樹脂組成物、表示素子用層間絶縁膜、その形成方法及び表示素子
JP7012424B2 (ja) * 2016-03-25 2022-02-14 東京応化工業株式会社 エネルギー感受性組成物、硬化物及び硬化物の製造方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008176218A (ja) 2007-01-22 2008-07-31 Jsr Corp 感放射線性樹脂組成物およびカラーフィルタ
US20080199805A1 (en) 2007-02-08 2008-08-21 Fujifilm Electronic Materials. U.S.A., Inc. Photosensitive compositions employing silicon-containing additives
JP2010128136A (ja) 2008-11-27 2010-06-10 Jsr Corp 上層反射防止膜形成用組成物、上層反射防止膜及びパターン形成方法
JP2013114096A (ja) 2011-11-30 2013-06-10 Sanyo Chem Ind Ltd フォトスペーサー形成用感光性樹脂組成物
JP2014131998A (ja) 2012-12-31 2014-07-17 Rohm & Haas Electronic Materials Llc 樹状化合物、フォトレジスト組成物、および電子デバイスを作製する方法

Also Published As

Publication number Publication date
JP2019164194A (ja) 2019-09-26
JP7201034B2 (ja) 2023-01-10
KR20190110019A (ko) 2019-09-27
TWI803587B (zh) 2023-06-01
TW201940973A (zh) 2019-10-16
KR102610602B1 (ko) 2023-12-05
JP2021176017A (ja) 2021-11-04
CN110286561A (zh) 2019-09-27

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