JP6970826B2 - 不揮発性メモリにマルチビットデータを記憶するためのシステム及び方法 - Google Patents

不揮発性メモリにマルチビットデータを記憶するためのシステム及び方法 Download PDF

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JP6970826B2
JP6970826B2 JP2020524440A JP2020524440A JP6970826B2 JP 6970826 B2 JP6970826 B2 JP 6970826B2 JP 2020524440 A JP2020524440 A JP 2020524440A JP 2020524440 A JP2020524440 A JP 2020524440A JP 6970826 B2 JP6970826 B2 JP 6970826B2
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voltage
read current
offset value
memory cells
read
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JP2021501956A (ja
JP2021501956A5 (enExample
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ティワリ、ビピン
ドー、ナン
バン トラン、ヒュー
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Silicon Storage Technology Inc
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Silicon Storage Technology Inc
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    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/56Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using storage elements with more than two stable states represented by steps, e.g. of voltage, current, phase, frequency
    • G11C11/5621Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using storage elements with more than two stable states represented by steps, e.g. of voltage, current, phase, frequency using charge storage in a floating gate
    • G11C11/5642Sensing or reading circuits; Data output circuits
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/04Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
    • G11C16/0408Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells containing floating gate transistors
    • G11C16/0425Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells containing floating gate transistors comprising cells containing a merged floating gate and select transistor
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/06Auxiliary circuits, e.g. for writing into memory
    • G11C16/26Sensing or reading circuits; Data output circuits
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/06Auxiliary circuits, e.g. for writing into memory
    • G11C16/34Determination of programming status, e.g. threshold voltage, overprogramming or underprogramming, retention
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/56Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using storage elements with more than two stable states represented by steps, e.g. of voltage, current, phase, frequency
    • G11C11/5621Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using storage elements with more than two stable states represented by steps, e.g. of voltage, current, phase, frequency using charge storage in a floating gate
    • G11C11/5628Programming or writing circuits; Data input circuits
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/04Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
    • G11C16/0408Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells containing floating gate transistors
    • G11C16/0441Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells containing floating gate transistors comprising cells containing multiple floating gate devices, e.g. separate read-and-write FAMOS transistors with connected floating gates
    • G11C16/0458Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells containing floating gate transistors comprising cells containing multiple floating gate devices, e.g. separate read-and-write FAMOS transistors with connected floating gates comprising two or more independent floating gates which store independent data
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/04Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
    • G11C16/0466Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells with charge storage in an insulating layer, e.g. metal-nitride-oxide-silicon [MNOS], silicon-oxide-nitride-oxide-silicon [SONOS]
    • G11C16/0475Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells with charge storage in an insulating layer, e.g. metal-nitride-oxide-silicon [MNOS], silicon-oxide-nitride-oxide-silicon [SONOS] comprising two or more independent storage sites which store independent data
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/06Auxiliary circuits, e.g. for writing into memory
    • G11C16/10Programming or data input circuits

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  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Read Only Memory (AREA)
  • Semiconductor Memories (AREA)
  • Non-Volatile Memory (AREA)
JP2020524440A 2017-11-03 2018-10-02 不揮発性メモリにマルチビットデータを記憶するためのシステム及び方法 Active JP6970826B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201762581489P 2017-11-03 2017-11-03
US62/581,489 2017-11-03
US16/148,304 US10515694B2 (en) 2017-11-03 2018-10-01 System and method for storing multibit data in non-volatile memory
US16/148,304 2018-10-01
PCT/US2018/053930 WO2019089168A1 (en) 2017-11-03 2018-10-02 System and method for storing multibit data in non-volatile memory

Publications (3)

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JP2021501956A JP2021501956A (ja) 2021-01-21
JP2021501956A5 JP2021501956A5 (enExample) 2021-11-11
JP6970826B2 true JP6970826B2 (ja) 2021-11-24

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Country Link
US (1) US10515694B2 (enExample)
EP (1) EP3704700B1 (enExample)
JP (1) JP6970826B2 (enExample)
KR (1) KR102199607B1 (enExample)
CN (1) CN111344791B (enExample)
TW (1) TWI682393B (enExample)
WO (1) WO2019089168A1 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100671698B1 (ko) * 2004-08-05 2007-01-18 매그나칩 반도체 유한회사 엘디아이 내 디지털 아날로그 변환기의 테스트 장치
US10991433B2 (en) * 2019-09-03 2021-04-27 Silicon Storage Technology, Inc. Method of improving read current stability in analog non-volatile memory by limiting time gap between erase and program
US11682459B2 (en) * 2020-05-13 2023-06-20 Silicon Storage Technology, Inc. Analog neural memory array in artificial neural network comprising logical cells and improved programming mechanism
US12080355B2 (en) 2021-06-02 2024-09-03 Silicon Storage Technology, Inc. Method of improving read current stability in analog non-volatile memory by post-program tuning for memory cells exhibiting random telegraph noise
US11769558B2 (en) * 2021-06-08 2023-09-26 Silicon Storage Technology, Inc. Method of reducing random telegraph noise in non-volatile memory by grouping and screening memory cells
KR102703459B1 (ko) 2021-11-29 2024-09-06 충남대학교 산학협력단 멀티 레벨 구동이 가능한 메모리 소자

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US5029130A (en) 1990-01-22 1991-07-02 Silicon Storage Technology, Inc. Single transistor non-valatile electrically alterable semiconductor memory device
JP2812202B2 (ja) * 1994-06-27 1998-10-22 ヤマハ株式会社 半導体記憶装置
KR100324594B1 (ko) 1999-06-28 2002-02-16 박종섭 강유전체 메모리 장치
US7082056B2 (en) 2004-03-12 2006-07-25 Super Talent Electronics, Inc. Flash memory device and architecture with multi level cells
US7324374B2 (en) 2003-06-20 2008-01-29 Spansion Llc Memory with a core-based virtual ground and dynamic reference sensing scheme
US7315056B2 (en) 2004-06-07 2008-01-01 Silicon Storage Technology, Inc. Semiconductor memory array of floating gate memory cells with program/erase and select gates
US7554856B2 (en) * 2006-10-06 2009-06-30 Qimonda Flash Gmbh & Co. Kg Memory cell
US20090039410A1 (en) 2007-08-06 2009-02-12 Xian Liu Split Gate Non-Volatile Flash Memory Cell Having A Floating Gate, Control Gate, Select Gate And An Erase Gate With An Overhang Over The Floating Gate, Array And Method Of Manufacturing
US8238149B2 (en) 2009-06-25 2012-08-07 Macronix International Co., Ltd. Methods and apparatus for reducing defect bits in phase change memory
JP2012209004A (ja) 2011-03-30 2012-10-25 Toshiba Corp 半導体記憶装置
US9099202B2 (en) * 2012-11-06 2015-08-04 Sandisk Technologies Inc. 3D stacked non-volatile storage programming to conductive state
KR102043723B1 (ko) 2013-02-28 2019-12-02 에스케이하이닉스 주식회사 반도체 장치 및 이를 포함하는 프로세서와 시스템
KR101716998B1 (ko) 2013-03-14 2017-03-15 실리콘 스토리지 테크놀로지 인크 비휘발성 메모리 프로그램 알고리즘 디바이스 및 방법
US20150085571A1 (en) * 2013-09-24 2015-03-26 Sandisk Technologies Inc. Updating read voltages
US9543041B2 (en) * 2014-08-29 2017-01-10 Everspin Technologies, Inc. Configuration and testing for magnetoresistive memory to ensure long term continuous operation
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US9484094B2 (en) 2015-01-21 2016-11-01 Ememory Technology Inc. Control method of resistive random-access memory

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TW201931370A (zh) 2019-08-01
US20190139602A1 (en) 2019-05-09
KR102199607B1 (ko) 2021-01-08
WO2019089168A1 (en) 2019-05-09
CN111344791B (zh) 2021-06-25
TWI682393B (zh) 2020-01-11
EP3704700B1 (en) 2022-07-20
JP2021501956A (ja) 2021-01-21
CN111344791A (zh) 2020-06-26
EP3704700A4 (en) 2021-07-21
US10515694B2 (en) 2019-12-24
KR20200043501A (ko) 2020-04-27
EP3704700A1 (en) 2020-09-09

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