JP6917775B2 - ガス溶解液製造装置 - Google Patents
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- 238000004519 manufacturing process Methods 0.000 title claims description 50
- 239000007788 liquid Substances 0.000 claims description 230
- 239000007789 gas Substances 0.000 claims description 155
- 238000000926 separation method Methods 0.000 claims description 144
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 64
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 claims description 57
- 238000004090 dissolution Methods 0.000 claims description 18
- 239000002994 raw material Substances 0.000 claims description 18
- 230000008602 contraction Effects 0.000 claims description 16
- 238000005259 measurement Methods 0.000 claims description 8
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 4
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 4
- 238000004904 shortening Methods 0.000 claims description 3
- 229910052786 argon Inorganic materials 0.000 claims description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 2
- 239000001569 carbon dioxide Substances 0.000 claims description 2
- 229910002092 carbon dioxide Inorganic materials 0.000 claims description 2
- 239000001257 hydrogen Substances 0.000 claims description 2
- 229910052739 hydrogen Inorganic materials 0.000 claims description 2
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims description 2
- 229910052757 nitrogen Inorganic materials 0.000 claims description 2
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- 229910021642 ultra pure water Inorganic materials 0.000 description 3
- 239000012498 ultrapure water Substances 0.000 description 3
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- 239000004065 semiconductor Substances 0.000 description 2
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- 239000000203 mixture Substances 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000003643 water by type Substances 0.000 description 1
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- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/20—Mixing gases with liquids
- B01F23/23—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
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- B01D19/0036—Flash degasification
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- B01F23/20—Mixing gases with liquids
- B01F23/23—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
- B01F23/232—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids using flow-mixing means for introducing the gases, e.g. baffles
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D19/00—Degasification of liquids
- B01D19/0063—Regulation, control including valves and floats
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D19/00—Degasification of liquids
- B01D19/0073—Degasification of liquids by a method not covered by groups B01D19/0005 - B01D19/0042
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F21/00—Dissolving
- B01F21/30—Workflow diagrams or layout of plants, e.g. flow charts; Details of workflow diagrams or layout of plants, e.g. controlling means
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
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- B01F23/20—Mixing gases with liquids
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
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- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/20—Mixing gases with liquids
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- B01F23/2366—Parts; Accessories
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B01F23/20—Mixing gases with liquids
- B01F23/23—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
- B01F23/237—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids characterised by the physical or chemical properties of gases or vapours introduced in the liquid media
- B01F23/2376—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids characterised by the physical or chemical properties of gases or vapours introduced in the liquid media characterised by the gas being introduced
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B01F23/80—After-treatment of the mixture
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
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- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/80—After-treatment of the mixture
- B01F23/803—Venting, degassing or ventilating of gases, fumes or toxic vapours from the mixture
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F33/00—Other mixers; Mixing plants; Combinations of mixers
- B01F33/70—Mixers specially adapted for working at sub- or super-atmospheric pressure, e.g. combined with de-foaming
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
- B01F35/20—Measuring; Control or regulation
- B01F35/21—Measuring
- B01F35/213—Measuring of the properties of the mixtures, e.g. temperature, density or colour
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/72—Treatment of water, waste water, or sewage by oxidation
- C02F1/78—Treatment of water, waste water, or sewage by oxidation with ozone
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2259/00—Type of treatment
- B01D2259/45—Gas separation or purification devices adapted for specific applications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/20—Mixing gases with liquids
- B01F23/23—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
- B01F23/237—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids characterised by the physical or chemical properties of gases or vapours introduced in the liquid media
- B01F23/2376—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids characterised by the physical or chemical properties of gases or vapours introduced in the liquid media characterised by the gas being introduced
- B01F23/23761—Aerating, i.e. introducing oxygen containing gas in liquids
- B01F23/237613—Ozone
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- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Water Supply & Treatment (AREA)
- Environmental & Geological Engineering (AREA)
- Hydrology & Water Resources (AREA)
- Life Sciences & Earth Sciences (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Health & Medical Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Treatment Of Water By Oxidation Or Reduction (AREA)
- Accessories For Mixers (AREA)
Description
本発明の第1の実施の形態のガス溶解液製造装置の構成を、図面を参照して説明する。図1は、本実施の形態のガス溶解液製造装置の構成を示すブロック図である。図1に示すように、ガス溶解液製造装置1は、第1原料の液体(純水)の供給源である水供給部2と、第2原料の気体(オゾンガス)の供給源であるオゾンガス供給部3と、第1原料の液体(純水)に第2原料の気体(オゾンガス)を溶解させて混合液体(オゾン水)を生成する気体溶解部4を備えている。また、このガス溶解液製造装置1は、気体溶解部4により生成された混合液体を、ユースポイント5に供給されるガス溶解液(オゾン水)と、排気口6から排出される排出気体(ガス)とに気液分離する気液分離部7を備えている。気液分離部7は、例えばフッ素樹脂塗装が内面に施されたタンクで構成されている。
次に、本発明の第2の実施の形態のガス溶解液製造装置1について説明する。ここでは、第2の実施の形態のガス溶解液製造装置1が、第1の実施の形態と相違する点を中心に説明する。ここで特に言及しない限り、本実施の形態の構成および動作は、第1の実施の形態と同様である。
2 水供給部
3 オゾンガス供給部
4 気体溶解部
5 ユースポイント
6 排気口
7 気液分離部
8 容積可変体(容積可変部)
9 荷重測定部
10 液面高さ算出部
11 排気管
12 リリーフ弁
20 伸縮可変構造(容積可変部)
Claims (5)
- 第1原料の液体に第2原料の気体を溶解させてガス溶解液を生成する気体溶解部と、
前記気体溶解部により生成された混合液体を、ユースポイントに供給されるガス溶解液と、排気口から排出される排出気体とに気液分離する気液分離部と、
を備え、
前記気液分離部は、当該気液分離部の内部空間の容積を変える容積可変部を備えたガス溶解液製造装置において、
前記容積可変部は、前記気液分離部の内部空間に収納される容積可変体であり、
前記ガス溶解液製造装置の立ち上げ時に、前記容積可変体の内部に気体を供給することにより前記容積可変体の体積を増大させて前記気液分離部の内部空間の容積が減少され、
前記ガス溶解液製造装置の稼働時に、前記容積可変体の内部から気体を排出することにより前記容積可変体の体積を減少させて前記気液分離部の内部空間の容積が増大される、ガス溶解液製造装置。 - 第1原料の液体に第2原料の気体を溶解させてガス溶解液を生成する気体溶解部と、
前記気体溶解部により生成された混合液体を、ユースポイントに供給されるガス溶解液と、排気口から排出される排出気体とに気液分離する気液分離部と、
を備え、
前記気液分離部は、当該気液分離部の内部空間の容積を変える容積可変部を備えたガス溶解液製造装置において、
前記容積可変部は、前記気液分離部に設けられる伸縮可変構造であり、
前記ガス溶解液製造装置の立ち上げ時に、前記伸縮可変構造を短縮させることにより前記気液分離部の内部空間の容積が減少され、
前記ガス溶解液製造装置の稼働時に、前記伸縮可変構造を伸長させることにより前記気液分離部の内部空間の容積が増大される、ガス溶解液製造装置。 - 前記気液分離部は、前記気液分離部の荷重を測定する荷重測定部を備える、請求項1または請求項2に記載のガス溶解液製造装置。
- 前記気液分離部は、前記荷重測定部で測定した前記気液分離部の荷重から、前記気液分離部の内部の前記ガス溶解液の液面高さを算出する液面高さ算出部を備える、請求項3に記載のガス溶解液製造装置。
- 前記第1原料の液体は、純水または硫酸であり、前記第2原料の気体は、オゾン、水素、窒素、二酸化炭素、酸素、アルゴン、キセノンのいずれかまたはこれらの組み合わせからなる気体である、請求項1〜請求項4のいずれか一項に記載のガス溶解液製造装置。
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017099561A JP6917775B2 (ja) | 2017-05-19 | 2017-05-19 | ガス溶解液製造装置 |
TW107115234A TWI755530B (zh) | 2017-05-19 | 2018-05-04 | 氣體溶解液製造裝置 |
KR1020180055473A KR102519333B1 (ko) | 2017-05-19 | 2018-05-15 | 가스 용해액 제조 장치 |
CN201810473585.7A CN108939959A (zh) | 2017-05-19 | 2018-05-17 | 气体溶解液制造装置 |
US15/982,092 US10710030B2 (en) | 2017-05-19 | 2018-05-17 | Gas solution production apparatus |
SG10201804209SA SG10201804209SA (en) | 2017-05-19 | 2018-05-18 | Gas solution production apparatus |
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JP2017099561A JP6917775B2 (ja) | 2017-05-19 | 2017-05-19 | ガス溶解液製造装置 |
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JP2018192439A JP2018192439A (ja) | 2018-12-06 |
JP6917775B2 true JP6917775B2 (ja) | 2021-08-11 |
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JP (1) | JP6917775B2 (ja) |
KR (1) | KR102519333B1 (ja) |
CN (1) | CN108939959A (ja) |
SG (1) | SG10201804209SA (ja) |
TW (1) | TWI755530B (ja) |
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JP6970007B2 (ja) * | 2017-12-25 | 2021-11-24 | 株式会社荏原製作所 | ガス溶解液製造装置 |
JP7059040B2 (ja) | 2018-02-23 | 2022-04-25 | 株式会社荏原製作所 | ガス溶解液製造装置 |
WO2020138248A1 (ja) * | 2018-12-25 | 2020-07-02 | 株式会社御池鐵工所 | ウルトラファインバブル製造器及びウルトラファインバブル水製造装置 |
JP7260429B2 (ja) | 2019-07-19 | 2023-04-18 | 株式会社荏原製作所 | ガス溶解液製造装置 |
CN114057273B (zh) * | 2021-11-22 | 2022-08-19 | 三峡大学 | 一种高溶解气水制备装置、高溶解气水制备方法及应用 |
CN114345154A (zh) * | 2022-02-09 | 2022-04-15 | 珠海格力电器股份有限公司 | 等离子体活化水制备装置 |
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JP2009136822A (ja) * | 2007-12-10 | 2009-06-25 | Meidensha Corp | オゾン水生成方法とその装置 |
JP5079896B2 (ja) * | 2011-03-18 | 2012-11-21 | シャープ株式会社 | オゾン液生成器及びその生成方法 |
US8440003B2 (en) * | 2011-03-25 | 2013-05-14 | Idex Health & Science, Llc | Apparatus for pervaporation control in liquid degassing systems |
JP2016064386A (ja) * | 2014-09-18 | 2016-04-28 | 株式会社荏原製作所 | ガス溶解水製造装置および製造方法 |
CN105289342B (zh) * | 2015-09-08 | 2017-12-08 | 湖北土老憨生态农业科技股份有限公司 | 一种高浓度臭氧水制备装置及其制备方法和用途 |
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TW201900269A (zh) | 2019-01-01 |
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