JP6903449B2 - 欠陥検査装置、および欠陥検査方法 - Google Patents

欠陥検査装置、および欠陥検査方法 Download PDF

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Publication number
JP6903449B2
JP6903449B2 JP2017030759A JP2017030759A JP6903449B2 JP 6903449 B2 JP6903449 B2 JP 6903449B2 JP 2017030759 A JP2017030759 A JP 2017030759A JP 2017030759 A JP2017030759 A JP 2017030759A JP 6903449 B2 JP6903449 B2 JP 6903449B2
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optical system
defect inspection
inspected
substrate
imaging
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JP2018136200A5 (enExample
JP2018136200A (ja
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勝 田辺
勝 田辺
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Hoya Corp
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JP2017030759A 2017-02-22 2017-02-22 欠陥検査装置、および欠陥検査方法 Active JP6903449B2 (ja)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP4636353A1 (de) * 2024-04-19 2025-10-22 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Vorrichtung und verfahren zur charakterisierung einer oberfläche einer probe

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7202861B2 (ja) * 2018-11-30 2023-01-12 Hoya株式会社 欠陥検査方法、並びにマスクブランク、転写用マスクおよび半導体デバイスの製造方法
KR20200138654A (ko) * 2019-05-31 2020-12-10 (주)테크윙 전자부품 처리장비용 검사장치
CN114354627B (zh) * 2022-01-04 2022-11-22 浙江大学 一种用于表面缺陷检测的环形均匀准直照明装置及方法

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05297262A (ja) * 1992-04-23 1993-11-12 Toshiba Corp オートフォーカス装置
JPH11132748A (ja) * 1997-10-24 1999-05-21 Hitachi Ltd 多焦点同時検出装置および立体形状検出装置および外観検査装置、並びにその方法
JP2000009591A (ja) * 1998-06-25 2000-01-14 Omron Corp 検査装置
JP2005077295A (ja) * 2003-09-02 2005-03-24 Canon Inc 光学式３次元位置測定装置および位置測定方法
JP2005332489A (ja) * 2004-05-20 2005-12-02 Hitachi Maxell Ltd 多層型記録媒体の初期化方法及び初期化装置
JP2006153622A (ja) * 2004-11-29 2006-06-15 Opcell Co Ltd オートフォーカス装置
JP2008209726A (ja) * 2007-02-27 2008-09-11 Olympus Corp 照明装置
JP2009162492A (ja) * 2007-12-28 2009-07-23 Daishinku Corp 検査装置
JP2010123824A (ja) * 2008-11-21 2010-06-03 Hitachi High-Tech Control Systems Corp アライメントユニット及びウェハ搬送装置
JP2010151479A (ja) * 2008-12-24 2010-07-08 Ushio Inc 配線パターン検査装置
JP2010223613A (ja) * 2009-03-19 2010-10-07 Futec Inc 光学検査装置
US8593625B2 (en) * 2009-03-31 2013-11-26 Hitachi High-Technologies Corporation Examining apparatus and examining method
US8520200B2 (en) * 2010-05-24 2013-08-27 Camtek Ltd. Advanced inspection method utilizing short pulses LED illumination
JP2013007590A (ja) * 2011-06-23 2013-01-10 Hitachi High-Technologies Corp 基板検査方法及び装置
JP6212843B2 (ja) * 2012-09-05 2017-10-18 大日本印刷株式会社 異物検査装置、異物検査方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP4636353A1 (de) * 2024-04-19 2025-10-22 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Vorrichtung und verfahren zur charakterisierung einer oberfläche einer probe
WO2025219524A1 (de) * 2024-04-19 2025-10-23 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Vorrichtung und verfahren zur charakterisierung einer oberfläche einer probe

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