JP6892921B2 - 小角x線スキャトロメトリベースの計測システムの較正 - Google Patents
小角x線スキャトロメトリベースの計測システムの較正 Download PDFInfo
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- H01L22/10—Measuring as part of the manufacturing process
- H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
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- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
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- G01N23/02—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material
- G01N23/06—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and measuring the absorption
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Description
本特許出願は、米国特許法119条に基づき、2016年10月21に出願された米国仮特許出願第62/411,152号からの優先権を主張するものであり、その主題は、その全体を本願に引用して援用する。
ΔX=∂xcosθ+∂zsinθ+∂n(3)
Claims (18)
- X線照明ビームを生成するように構成されるX線照明源と、
前記X線照明ビームの軸に直交する第1の方向および前記X線照明ビームの前記軸に直交する第2の方向に移動可能な試料ステージと、
前記試料ステージに移動可能に装着される試料と、
前記試料の近くで前記試料ステージ上に配設される第1の閉塞素子であって、前記第1の閉塞素子が、前記試料の表面と同一平面上の中心軸を有し、第1の位置にある前記試料ステージが、前記X線照明ビームの部分が前記第1の閉塞素子によって閉塞されるように、前記第1の閉塞素子を前記X線照明ビームの経路内に位置付ける、第1の閉塞素子と、
前記試料の近くで前記試料ステージ上に配設される第2の閉塞素子であって、前記第2の閉塞素子が、前記試料の表面と同一平面上にありかつ前記第1の閉塞素子の前記中心軸とは異なる方向に整列される中心軸を有し、第2の位置にある前記試料ステージが、前記X線照明ビームの部分が前記第2の閉塞素子によって閉塞されるように、前記第2の閉塞素子を前記X線照明ビームの前記経路内に位置付ける、第2の閉塞素子と、
前記第1の位置における第1の透過放射束量および前記第2の位置における第2の放射束量を検出するように構成されるX線検出器と、
前記第1の透過放射束量に基づいて前記第1の方向において前記X線照明ビームに対する前記第1の閉塞素子の第1の位置を決定し、前記第2の透過放射束量に基づいて前記第2の方向において前記X線照明ビームに対する前記第2の閉塞素子の第2の位置を決定するように構成される、コンピューティングシステムと、
を備える計測システム。 - 請求項1に記載の計測システムであって、
前記第1および第2の位置の決定が、前記X線照明ビームに対する前記第1および第2の閉塞素子の位置の関数としての透過放射束のモデルに基づく、
計測システム。 - 請求項1に記載の計測システムであって、
前記第1および第2の閉塞素子のいずれかが、円筒形状である、
計測システム。 - 請求項1に記載の計測システムであって、
前記第1および第2の閉塞素子のいずれかが、ナイフエッジを含み、前記中心軸が前記ナイフエッジと整列される、
計測システム。 - 請求項1に記載の計測システムであって、
前記第1および第2の閉塞素子のいずれかが、前記中心軸に平行な方向に延びる1つ以上の平面表面を含む、
計測システム。 - 請求項1に記載の計測システムであって、
前記第1の位置における前記第1の閉塞素子の少なくとも部分の第1の画像、および前記第2の位置における前記第2の閉塞素子の少なくとも部分の第2の画像を生成するアライメントカメラをさらに備える、
計測システム。 - 請求項6に記載の計測システムであって、
前記第1の閉塞素子の前記部分が、前記第1の閉塞素子の前記中心軸と同一平面上に位置する第1の基準マークを含み、
前記第2の閉塞素子の前記部分が、前記第2の閉塞素子の前記中心軸と同一平面上に位置する第2の基準マークを含む、
計測システム。 - 請求項6に記載の計測システムであって、
前記試料ステージが、前記試料上に配設される基準マークが前記アライメントカメラの視野内にあるように、前記X線照明ビームに対して第3の位置へ移動し、
前記試料上への前記X線照明ビームの入射の場所が、前記第1および第2の画像に基づいて前記第3の位置において決定される、
計測システム。 - 請求項6に記載の計測システムであって、
前記アライメントカメラが、正確に測定された距離だけ前記アライメントカメラの焦点面を移動させることによって鮮明な画像焦点を維持するオートフォーカス機構を含み、
前記アライメントカメラが、前記試料の表面上の異なる場所において参照フレームと前記試料の表面との間の距離の変化を測定する、
計測システム。 - 請求項9に記載の計測システムであって、
前記試料の表面に垂直な方向にある前記第1の閉塞素子に対する前記試料の相対位置が、前記オートフォーカス機構に基づいて測定され、
試料位置決めシステムが、前記相対位置が無視できる値であるように、前記試料の表面に垂直な方向に前記試料を移動させる、
計測システム。 - 請求項1に記載の計測システムであって、
前記試料の表面の反対側の前記試料の裏側表面上の複数の異なる場所の各々において参照フレームと前記試料の表面との間の距離を測定するように構成される1つ以上の近接センサをさらに備える、
計測システム。 - X線照明ビームを生成するように構成されるX線照明源と、
前記X線照明ビームが試料の表面上の任意の場所において前記試料の表面に入射するように、前記試料を前記X線照明ビームに対して位置決めし、前記X線照明ビームが複数の入射角で任意の場所において前記試料の表面に入射するように、前記試料を前記X線照明ビームに対して回転軸の周りで回転させるように構成される試料位置決めシステムと、
前記試料の近くに配設される閉塞素子であって、前記試料の表面と同一平面上の中心軸を有する、閉塞素子と、
前記回転軸の角度位置の範囲にわたって透過放射束量を検出するように構成されるX線検出器と、
検出された前記透過放射束量に基づいて前記X線照明ビームに対する前記回転軸の位置の調整を決定するように構成されるコンピューティングシステムと、
を備え、前記X線照明ビームの少なくとも部分が、前記角度位置の前記範囲にわたって前記閉塞素子に入射する、計測システム。 - 請求項12に記載の計測システムであって、
前記コンピューティングシステムが、前記検出された透過放射束量に基づいて前記回転軸に対する前記試料の位置の調整を決定するようにさらに構成される、
計測システム。 - 請求項13に記載の計測システムであって、
前記コンピューティングシステムは、前記角度位置の前記範囲にわたる前記X線照明ビームに対する前記閉塞素子の移動量を低減するように、前記回転軸に対する前記試料の位置を調整する、
計測システム。 - 請求項13に記載の計測システムであって、
前記回転軸の位置の調整および前記試料の位置の調整が、前記角度位置の前記範囲にわたる前記X線照明ビームに対する前記閉塞素子の位置の関数としての透過放射束のモデルに基づく、
計測システム。 - 請求項13に記載の計測システムであって、
前記角度位置の前記範囲にわたる前記透過放射束量の検出、ならびに前記検出された透過放射束量に基づく前記回転軸の位置の調整および前記試料の位置の調整の決定が、反復的に実施される、
計測システム。 - 請求項12に記載の計測システムであって、
前記X線検出器が、前記回転軸の角度位置の第2の範囲にわたって第2の透過放射束量を検出するようにさらに構成され、
前記X線照明ビームが、前記試料のパターン化されていない領域に入射し、
前記コンピューティングシステムが、検出された前記第2の放射束量に基づいて前記回転軸の前記角度位置と関連付けられたオフセット値を決定するようにさらに構成される、
計測システム。 - 請求項17に記載の計測システムであって、
前記オフセット値の決定が、前記角度位置の前記第2の範囲にわたる前記検出された第2の放射束量への吸収モデルのフィッティングを伴う、
計測システム。
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