JP6889773B2 - 基板およびその上に配置された層のパターニング方法、ならびにデバイス構造の形成方法 - Google Patents
基板およびその上に配置された層のパターニング方法、ならびにデバイス構造の形成方法 Download PDFInfo
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Description
本出願は、「方向性イオンを使用したパターンフィーチャの形成技法」と題する、2016年9月22日に出願された米国仮特許出願第62/398032号に対する優先権を主張し、これは参照によりその全体が本明細書に組み込まれる。
Claims (15)
- 基板のパターニング方法であって:
第1の表面フィーチャおよび第2の表面フィーチャを、前記基板上に配置された層内に千鳥配置で設けるステップと;
反応種を含む反応性雰囲気の存在下で、第1の露光において第1のイオンを前記第1の表面フィーチャの第1の側面および前記第2の表面フィーチャの第1の側面に向けるステップと;を含み、
前記第1の露光が、前記第1の表面フィーチャの前記第1の側面および前記第2の表面フィーチャの前記第1の側面をエッチングし、当該イオンを向けた後、前記第1の表面フィーチャおよび前記第2の表面フィーチャが併合して第3の表面フィーチャを形成する、方法。 - 前記第3の表面フィーチャが:L字型、大文字のT字型、小文字のt字型、ジグザグ形状、および階段形状のうちの1つによって特徴付けられる形状を有する、請求項1に記載の方法。
- 前記第3の表面フィーチャが前記層内の凹部である、請求項1に記載の方法。
- 前記基板が基板平面を含み、前記第1の表面フィーチャの少なくとも一端が、前記第2の表面フィーチャの少なくとも一端に対して第1の軸に沿ってオフセットしている、請求項1に記載の方法。
- 前記基板が基板平面を含み、前記第1の表面フィーチャの前記第1の側面および前記第2の表面フィーチャの前記第1の側面が、前記第1の軸と平行に延びている、請求項4に記載の方法。
- 前記第1のイオンがイオン軌道を含み、前記基板平面内における前記イオン軌道の投影が、前記第1の軸に対して垂直である、前記基板平面内における第2の軸と平行である、請求項4に記載の方法。
- 前記基板が第1の材料を含み、前記層が第2の材料を含み、前記イオンおよび前記反応種が、前記基板の前記第1の材料に対して前記層の前記第2の材料を選択的にエッチングし、前記第1の材料の第1のエッチング速度は、前記第2の材料の第2のエッチング速度よりも大きい、請求項1に記載の方法。
- 前記基板が基板平面を含み、当該方法が;
前記基板平面の垂直線を中心に前記基板を約180度回転させるステップと;
前記反応種を含む前記反応性雰囲気の存在下で、第2の露光において第2のイオンを前記第1の表面フィーチャの第2の側面および前記第2の表面フィーチャの第2の側面に向けるステップと;をさらに含み、
前記第1の露光および前記第2の露光の組合せが、前記第3の表面フィーチャを形成する、請求項1に記載の方法。 - 基板上に配置された層のパターニング方法であって:
第1の表面フィーチャおよび第2の表面フィーチャを前記層内に千鳥配置で設けるステップと;
前記第1の表面フィーチャおよび前記第2の表面フィーチャを露光にさらすステップと、を含み、前記露光は:
反応種を含む反応性雰囲気の存在下で、第1のイオンを前記第1の表面フィーチャの第1の側面および前記第2の表面フィーチャの第1の側面に向けることと;
同時に、第2のイオンを前記第1の表面フィーチャの第2の側面および前記第2の表面フィーチャの第2の側面に向けることと、を含み、
前記露光は、前記第1の表面フィーチャの前記第1の側面および前記第2の表面フィーチャの前記第1の側面をエッチングし、かつ前記第1の表面フィーチャの前記第2の側面および前記第2の表面フィーチャの前記第2の側面をエッチングし、
前記イオンを向けた後、前記第1の表面フィーチャおよび前記第2の表面フィーチャが併合して第3の表面フィーチャを形成する、方法。 - 前記基板が基板平面を含み、前記第1の表面フィーチャの少なくとも一端が、前記第2の表面フィーチャの少なくとも一端に対して第1の軸に沿ってオフセットしている、請求項9に記載の方法。
- 前記基板が基板平面を含み、前記第1の表面フィーチャの前記第1の側面および前記第2の側面ならびに前記第2の表面フィーチャの前記第1の側面および前記第2の側面が、前記第1の軸と平行に延びている、請求項10に記載の方法。
- 前記第1のイオンが第1のリボンビームを形成し、前記第2のイオンが第2のリボンビームを形成し、前記第1のイオンおよび前記第2のイオンが前記第1の軸と平行な長軸を有する、請求項10に記載の方法。
- 前記露光の間に、前記第1の軸に対して垂直に延びる第2の軸に沿って前記基板を走査するステップをさらに含む、請求項12に記載の方法。
- デバイス構造の形成方法であって:
第1の表面フィーチャおよび第2の表面フィーチャを、基板上に配置された第1の層内に千鳥配置で設けるステップと;
反応種を含む反応性雰囲気の存在下で、露光において第1のイオンを前記第1の表面フィーチャの第1の側面および前記第2の表面フィーチャの第1の側面に向けるステップであって、
前記露光が、前記第1の表面フィーチャおよび前記第2の表面フィーチャの前記第1の側面をエッチングし、前記イオンを向けた後、前記第1の表面フィーチャおよび前記第2の表面フィーチャが併合して、凹部を含む第3の表面フィーチャを形成するステップと;
前記第3の表面フィーチャを導電性材料で充填するステップと;を含む、方法。 - 前記基板が基板平面を含み、前記第1の表面フィーチャの少なくとも一端が、前記第2の表面フィーチャの少なくとも一端に対して第1の軸に沿ってオフセットしている、請求項14に記載の方法。
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201662398032P | 2016-09-22 | 2016-09-22 | |
US62/398,032 | 2016-09-22 | ||
US15/384,496 | 2016-12-20 | ||
US15/384,496 US10229832B2 (en) | 2016-09-22 | 2016-12-20 | Techniques for forming patterned features using directional ions |
PCT/US2017/050958 WO2018057327A1 (en) | 2016-09-22 | 2017-09-11 | Techniques for forming patterned features using directional ions |
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Publication Number | Publication Date |
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JP2019530222A JP2019530222A (ja) | 2019-10-17 |
JP2019530222A5 JP2019530222A5 (ja) | 2020-05-28 |
JP6889773B2 true JP6889773B2 (ja) | 2021-06-18 |
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US10229832B2 (en) | 2019-03-12 |
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