JP6889569B2 - 有機ガス低減装置 - Google Patents
有機ガス低減装置 Download PDFInfo
- Publication number
- JP6889569B2 JP6889569B2 JP2017032483A JP2017032483A JP6889569B2 JP 6889569 B2 JP6889569 B2 JP 6889569B2 JP 2017032483 A JP2017032483 A JP 2017032483A JP 2017032483 A JP2017032483 A JP 2017032483A JP 6889569 B2 JP6889569 B2 JP 6889569B2
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- JP
- Japan
- Prior art keywords
- oxidation catalyst
- gas
- copper
- organic gas
- organic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 230000009467 reduction Effects 0.000 title claims description 30
- 239000003054 catalyst Substances 0.000 claims description 179
- 238000007254 oxidation reaction Methods 0.000 claims description 157
- 230000003647 oxidation Effects 0.000 claims description 154
- 239000002245 particle Substances 0.000 claims description 78
- 238000010438 heat treatment Methods 0.000 claims description 38
- 239000011148 porous material Substances 0.000 claims description 25
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 19
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 claims description 18
- 239000005977 Ethylene Substances 0.000 claims description 18
- 238000007664 blowing Methods 0.000 claims description 18
- 230000007246 mechanism Effects 0.000 claims description 18
- 239000000126 substance Substances 0.000 claims description 18
- 150000001875 compounds Chemical class 0.000 claims description 14
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 12
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 12
- 230000000844 anti-bacterial effect Effects 0.000 claims description 11
- 229910052697 platinum Inorganic materials 0.000 claims description 8
- 238000009423 ventilation Methods 0.000 claims description 7
- 238000004438 BET method Methods 0.000 claims description 6
- 229910052763 palladium Inorganic materials 0.000 claims description 6
- 230000035699 permeability Effects 0.000 claims description 6
- 230000000843 anti-fungal effect Effects 0.000 claims description 5
- 230000000840 anti-viral effect Effects 0.000 claims description 5
- 229940121375 antifungal agent Drugs 0.000 claims description 5
- 238000011144 upstream manufacturing Methods 0.000 claims description 4
- 239000007789 gas Substances 0.000 description 121
- 239000010410 layer Substances 0.000 description 78
- 239000000463 material Substances 0.000 description 53
- 239000000243 solution Substances 0.000 description 34
- -1 members Substances 0.000 description 31
- 238000000034 method Methods 0.000 description 27
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 25
- 229910052751 metal Inorganic materials 0.000 description 23
- 239000010408 film Substances 0.000 description 22
- 239000002184 metal Substances 0.000 description 21
- 238000012360 testing method Methods 0.000 description 21
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 19
- 239000000919 ceramic Substances 0.000 description 19
- 239000010949 copper Substances 0.000 description 19
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 18
- 239000003242 anti bacterial agent Substances 0.000 description 18
- 229910052802 copper Inorganic materials 0.000 description 18
- 229910052709 silver Inorganic materials 0.000 description 18
- 239000004332 silver Substances 0.000 description 18
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 17
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 16
- 239000002243 precursor Substances 0.000 description 16
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 15
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 15
- 239000011521 glass Substances 0.000 description 13
- 229910000077 silane Inorganic materials 0.000 description 11
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 10
- 229910010413 TiO 2 Inorganic materials 0.000 description 10
- 150000004703 alkoxides Chemical class 0.000 description 10
- 230000003197 catalytic effect Effects 0.000 description 10
- 239000000835 fiber Substances 0.000 description 10
- 239000004094 surface-active agent Substances 0.000 description 10
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 9
- 230000000694 effects Effects 0.000 description 9
- 239000011347 resin Substances 0.000 description 9
- 229920005989 resin Polymers 0.000 description 9
- 229910052725 zinc Inorganic materials 0.000 description 9
- 239000011701 zinc Substances 0.000 description 9
- 239000000178 monomer Substances 0.000 description 8
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 8
- 150000002894 organic compounds Chemical class 0.000 description 8
- 239000000377 silicon dioxide Substances 0.000 description 8
- 239000002904 solvent Substances 0.000 description 8
- 239000012298 atmosphere Substances 0.000 description 7
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- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- 239000005749 Copper compound Substances 0.000 description 6
- 239000011398 Portland cement Substances 0.000 description 6
- 239000002253 acid Substances 0.000 description 6
- 239000002131 composite material Substances 0.000 description 6
- 150000001880 copper compounds Chemical class 0.000 description 6
- 229910052742 iron Inorganic materials 0.000 description 6
- 150000002739 metals Chemical class 0.000 description 6
- 239000012466 permeate Substances 0.000 description 6
- 150000003839 salts Chemical class 0.000 description 6
- 239000010409 thin film Substances 0.000 description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 5
- 229910045601 alloy Inorganic materials 0.000 description 5
- 239000000956 alloy Substances 0.000 description 5
- 239000011230 binding agent Substances 0.000 description 5
- 239000004568 cement Substances 0.000 description 5
- 238000010304 firing Methods 0.000 description 5
- 229910010272 inorganic material Inorganic materials 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 239000000843 powder Substances 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 4
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 4
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 4
- 239000003463 adsorbent Substances 0.000 description 4
- 239000003443 antiviral agent Substances 0.000 description 4
- 239000003426 co-catalyst Substances 0.000 description 4
- SHZIWNPUGXLXDT-UHFFFAOYSA-N ethyl hexanoate Chemical compound CCCCCC(=O)OCC SHZIWNPUGXLXDT-UHFFFAOYSA-N 0.000 description 4
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 4
- 229910052737 gold Inorganic materials 0.000 description 4
- 239000010931 gold Substances 0.000 description 4
- 229910044991 metal oxide Inorganic materials 0.000 description 4
- 150000004706 metal oxides Chemical class 0.000 description 4
- 230000001590 oxidative effect Effects 0.000 description 4
- 150000002941 palladium compounds Chemical class 0.000 description 4
- 150000003058 platinum compounds Chemical class 0.000 description 4
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 4
- 125000005372 silanol group Chemical group 0.000 description 4
- 238000001179 sorption measurement Methods 0.000 description 4
- 239000004575 stone Substances 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- ZCHHRLHTBGRGOT-SNAWJCMRSA-N (E)-hex-2-en-1-ol Chemical compound CCC\C=C\CO ZCHHRLHTBGRGOT-SNAWJCMRSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- JKFYKCYQEWQPTM-UHFFFAOYSA-N 2-azaniumyl-2-(4-fluorophenyl)acetate Chemical compound OC(=O)C(N)C1=CC=C(F)C=C1 JKFYKCYQEWQPTM-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- 241000894006 Bacteria Species 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 3
- 229910021612 Silver iodide Inorganic materials 0.000 description 3
- 241000700605 Viruses Species 0.000 description 3
- 239000013543 active substance Substances 0.000 description 3
- JSNRRGGBADWTMC-UHFFFAOYSA-N alpha-farnesene Natural products CC(C)=CCCC(C)=CCCC(=C)C=C JSNRRGGBADWTMC-UHFFFAOYSA-N 0.000 description 3
- OBNCKNCVKJNDBV-UHFFFAOYSA-N butanoic acid ethyl ester Natural products CCCC(=O)OCC OBNCKNCVKJNDBV-UHFFFAOYSA-N 0.000 description 3
- 238000004891 communication Methods 0.000 description 3
- OPQARKPSCNTWTJ-UHFFFAOYSA-L copper(ii) acetate Chemical compound [Cu+2].CC([O-])=O.CC([O-])=O OPQARKPSCNTWTJ-UHFFFAOYSA-L 0.000 description 3
- GBRBMTNGQBKBQE-UHFFFAOYSA-L copper;diiodide Chemical compound I[Cu]I GBRBMTNGQBKBQE-UHFFFAOYSA-L 0.000 description 3
- NBPFTDFXKORRKN-UHFFFAOYSA-L copper;pentanoate Chemical compound [Cu+2].CCCCC([O-])=O.CCCCC([O-])=O NBPFTDFXKORRKN-UHFFFAOYSA-L 0.000 description 3
- 238000000354 decomposition reaction Methods 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 235000012055 fruits and vegetables Nutrition 0.000 description 3
- 125000000524 functional group Chemical group 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 150000002484 inorganic compounds Chemical class 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- HBEQXAKJSGXAIQ-UHFFFAOYSA-N oxopalladium Chemical compound [Pd]=O HBEQXAKJSGXAIQ-UHFFFAOYSA-N 0.000 description 3
- MUMZUERVLWJKNR-UHFFFAOYSA-N oxoplatinum Chemical compound [Pt]=O MUMZUERVLWJKNR-UHFFFAOYSA-N 0.000 description 3
- 229910003445 palladium oxide Inorganic materials 0.000 description 3
- 229910003446 platinum oxide Inorganic materials 0.000 description 3
- 235000013824 polyphenols Nutrition 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 229940100890 silver compound Drugs 0.000 description 3
- 150000003379 silver compounds Chemical class 0.000 description 3
- 229940045105 silver iodide Drugs 0.000 description 3
- 238000003860 storage Methods 0.000 description 3
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 3
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 3
- 239000008096 xylene Substances 0.000 description 3
- FQTLCLSUCSAZDY-UHFFFAOYSA-N (+) E(S) nerolidol Natural products CC(C)=CCCC(C)=CCCC(C)(O)C=C FQTLCLSUCSAZDY-UHFFFAOYSA-N 0.000 description 2
- PFTAWBLQPZVEMU-DZGCQCFKSA-N (+)-catechin Chemical compound C1([C@H]2OC3=CC(O)=CC(O)=C3C[C@@H]2O)=CC=C(O)C(O)=C1 PFTAWBLQPZVEMU-DZGCQCFKSA-N 0.000 description 2
- MBDOYVRWFFCFHM-SNAWJCMRSA-N (2E)-hexenal Chemical compound CCC\C=C\C=O MBDOYVRWFFCFHM-SNAWJCMRSA-N 0.000 description 2
- BSAIUMLZVGUGKX-BQYQJAHWSA-N (E)-non-2-enal Chemical compound CCCCCC\C=C\C=O BSAIUMLZVGUGKX-BQYQJAHWSA-N 0.000 description 2
- GHBSPIPJMLAMEP-UHFFFAOYSA-N 6-pentyloxan-2-one Chemical compound CCCCCC1CCCC(=O)O1 GHBSPIPJMLAMEP-UHFFFAOYSA-N 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 2
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 2
- JMHWNJGXUIJPKG-UHFFFAOYSA-N CC(=O)O[SiH](CC=C)OC(C)=O Chemical compound CC(=O)O[SiH](CC=C)OC(C)=O JMHWNJGXUIJPKG-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- LZZYPRNAOMGNLH-UHFFFAOYSA-M Cetrimonium bromide Chemical compound [Br-].CCCCCCCCCCCCCCCC[N+](C)(C)C LZZYPRNAOMGNLH-UHFFFAOYSA-M 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- JJLJMEJHUUYSSY-UHFFFAOYSA-L Copper hydroxide Chemical compound [OH-].[OH-].[Cu+2] JJLJMEJHUUYSSY-UHFFFAOYSA-L 0.000 description 2
- 239000005750 Copper hydroxide Substances 0.000 description 2
- 239000005751 Copper oxide Substances 0.000 description 2
- RUPBZQFQVRMKDG-UHFFFAOYSA-M Didecyldimethylammonium chloride Chemical compound [Cl-].CCCCCCCCCC[N+](C)(C)CCCCCCCCCC RUPBZQFQVRMKDG-UHFFFAOYSA-M 0.000 description 2
- OJIYIVCMRYCWSE-UHFFFAOYSA-M Domiphen bromide Chemical compound [Br-].CCCCCCCCCCCC[N+](C)(C)CCOC1=CC=CC=C1 OJIYIVCMRYCWSE-UHFFFAOYSA-M 0.000 description 2
- XBLVHTDFJBKJLG-UHFFFAOYSA-N Ethyl nicotinate Chemical compound CCOC(=O)C1=CC=CN=C1 XBLVHTDFJBKJLG-UHFFFAOYSA-N 0.000 description 2
- YNQLUTRBYVCPMQ-UHFFFAOYSA-N Ethylbenzene Chemical compound CCC1=CC=CC=C1 YNQLUTRBYVCPMQ-UHFFFAOYSA-N 0.000 description 2
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 2
- CPLXHLVBOLITMK-UHFFFAOYSA-N Magnesium oxide Chemical compound [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 2
- OCWLYWIFNDCWRZ-UHFFFAOYSA-N Methyl (S)-2-Methylbutanoate Chemical compound CCC(C)C(=O)OC OCWLYWIFNDCWRZ-UHFFFAOYSA-N 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- 229910019142 PO4 Inorganic materials 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- NBBJYMSMWIIQGU-UHFFFAOYSA-N Propionic aldehyde Chemical compound CCC=O NBBJYMSMWIIQGU-UHFFFAOYSA-N 0.000 description 2
- ZTHYODDOHIVTJV-UHFFFAOYSA-N Propyl gallate Chemical compound CCCOC(=O)C1=CC(O)=C(O)C(O)=C1 ZTHYODDOHIVTJV-UHFFFAOYSA-N 0.000 description 2
- 229910006404 SnO 2 Inorganic materials 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
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- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 229910021536 Zeolite Inorganic materials 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 2
- UGAPHEBNTGUMBB-UHFFFAOYSA-N acetic acid;ethyl acetate Chemical compound CC(O)=O.CCOC(C)=O UGAPHEBNTGUMBB-UHFFFAOYSA-N 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 125000003545 alkoxy group Chemical group 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 239000010953 base metal Substances 0.000 description 2
- HUMNYLRZRPPJDN-UHFFFAOYSA-N benzaldehyde Chemical compound O=CC1=CC=CC=C1 HUMNYLRZRPPJDN-UHFFFAOYSA-N 0.000 description 2
- 229960000686 benzalkonium chloride Drugs 0.000 description 2
- UREZNYTWGJKWBI-UHFFFAOYSA-M benzethonium chloride Chemical compound [Cl-].C1=CC(C(C)(C)CC(C)(C)C)=CC=C1OCCOCC[N+](C)(C)CC1=CC=CC=C1 UREZNYTWGJKWBI-UHFFFAOYSA-M 0.000 description 2
- 229960001950 benzethonium chloride Drugs 0.000 description 2
- QUKGYYKBILRGFE-UHFFFAOYSA-N benzyl acetate Chemical compound CC(=O)OCC1=CC=CC=C1 QUKGYYKBILRGFE-UHFFFAOYSA-N 0.000 description 2
- CADWTSSKOVRVJC-UHFFFAOYSA-N benzyl(dimethyl)azanium;chloride Chemical compound [Cl-].C[NH+](C)CC1=CC=CC=C1 CADWTSSKOVRVJC-UHFFFAOYSA-N 0.000 description 2
- LLEMOWNGBBNAJR-UHFFFAOYSA-N biphenyl-2-ol Chemical compound OC1=CC=CC=C1C1=CC=CC=C1 LLEMOWNGBBNAJR-UHFFFAOYSA-N 0.000 description 2
- 229920001400 block copolymer Polymers 0.000 description 2
- ODWXUNBKCRECNW-UHFFFAOYSA-M bromocopper(1+) Chemical compound Br[Cu+] ODWXUNBKCRECNW-UHFFFAOYSA-M 0.000 description 2
- ZTQSAGDEMFDKMZ-UHFFFAOYSA-N butyric aldehyde Natural products CCCC=O ZTQSAGDEMFDKMZ-UHFFFAOYSA-N 0.000 description 2
- 235000005487 catechin Nutrition 0.000 description 2
- ADRVNXBAWSRFAJ-UHFFFAOYSA-N catechin Natural products OC1Cc2cc(O)cc(O)c2OC1c3ccc(O)c(O)c3 ADRVNXBAWSRFAJ-UHFFFAOYSA-N 0.000 description 2
- 229960001927 cetylpyridinium chloride Drugs 0.000 description 2
- NFCRBQADEGXVDL-UHFFFAOYSA-M cetylpyridinium chloride monohydrate Chemical compound O.[Cl-].CCCCCCCCCCCCCCCC[N+]1=CC=CC=C1 NFCRBQADEGXVDL-UHFFFAOYSA-M 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 229950001002 cianidanol Drugs 0.000 description 2
- YEOCHZFPBYUXMC-UHFFFAOYSA-L copper benzoate Chemical compound [Cu+2].[O-]C(=O)C1=CC=CC=C1.[O-]C(=O)C1=CC=CC=C1 YEOCHZFPBYUXMC-UHFFFAOYSA-L 0.000 description 2
- 229910001956 copper hydroxide Inorganic materials 0.000 description 2
- 229910000431 copper oxide Inorganic materials 0.000 description 2
- PDZKZMQQDCHTNF-UHFFFAOYSA-M copper(1+);thiocyanate Chemical compound [Cu+].[S-]C#N PDZKZMQQDCHTNF-UHFFFAOYSA-M 0.000 description 2
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 2
- QNZRVYCYEMYQMD-UHFFFAOYSA-N copper;pentane-2,4-dione Chemical compound [Cu].CC(=O)CC(C)=O QNZRVYCYEMYQMD-UHFFFAOYSA-N 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- KQAHMVLQCSALSX-UHFFFAOYSA-N decyl(trimethoxy)silane Chemical compound CCCCCCCCCC[Si](OC)(OC)OC KQAHMVLQCSALSX-UHFFFAOYSA-N 0.000 description 2
- 229960004670 didecyldimethylammonium chloride Drugs 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- REZZEXDLIUJMMS-UHFFFAOYSA-M dimethyldioctadecylammonium chloride Chemical compound [Cl-].CCCCCCCCCCCCCCCCCC[N+](C)(C)CCCCCCCCCCCCCCCCCC REZZEXDLIUJMMS-UHFFFAOYSA-M 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- DDXLVDQZPFLQMZ-UHFFFAOYSA-M dodecyl(trimethyl)azanium;chloride Chemical compound [Cl-].CCCCCCCCCCCC[N+](C)(C)C DDXLVDQZPFLQMZ-UHFFFAOYSA-M 0.000 description 2
- 229960001859 domiphen bromide Drugs 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 229910052571 earthenware Inorganic materials 0.000 description 2
- 125000003700 epoxy group Chemical group 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
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- AGFGXVAAIXIOFZ-UHFFFAOYSA-L zinc;butanedioate Chemical compound [Zn+2].[O-]C(=O)CCC([O-])=O AGFGXVAAIXIOFZ-UHFFFAOYSA-L 0.000 description 1
- WDHVIZKSFZNHJB-UHFFFAOYSA-L zinc;butanoate Chemical compound [Zn+2].CCCC([O-])=O.CCCC([O-])=O WDHVIZKSFZNHJB-UHFFFAOYSA-L 0.000 description 1
- JDLYKQWJXAQNNS-UHFFFAOYSA-L zinc;dibenzoate Chemical compound [Zn+2].[O-]C(=O)C1=CC=CC=C1.[O-]C(=O)C1=CC=CC=C1 JDLYKQWJXAQNNS-UHFFFAOYSA-L 0.000 description 1
- MKRZFOIRSLOYCE-UHFFFAOYSA-L zinc;methanesulfonate Chemical compound [Zn+2].CS([O-])(=O)=O.CS([O-])(=O)=O MKRZFOIRSLOYCE-UHFFFAOYSA-L 0.000 description 1
- ZPEJZWGMHAKWNL-UHFFFAOYSA-L zinc;oxalate Chemical compound [Zn+2].[O-]C(=O)C([O-])=O ZPEJZWGMHAKWNL-UHFFFAOYSA-L 0.000 description 1
- JLVUSDMLNQQPCD-UHFFFAOYSA-L zinc;phenylmethanesulfonate Chemical compound [Zn+2].[O-]S(=O)(=O)CC1=CC=CC=C1.[O-]S(=O)(=O)CC1=CC=CC=C1 JLVUSDMLNQQPCD-UHFFFAOYSA-L 0.000 description 1
- XKMZOFXGLBYJLS-UHFFFAOYSA-L zinc;prop-2-enoate Chemical compound [Zn+2].[O-]C(=O)C=C.[O-]C(=O)C=C XKMZOFXGLBYJLS-UHFFFAOYSA-L 0.000 description 1
- XDWXRAYGALQIFG-UHFFFAOYSA-L zinc;propanoate Chemical compound [Zn+2].CCC([O-])=O.CCC([O-])=O XDWXRAYGALQIFG-UHFFFAOYSA-L 0.000 description 1
- NHVUUBRKFZWXRN-UHFFFAOYSA-L zinc;pyridine-2-carboxylate Chemical compound C=1C=CC=NC=1C(=O)O[Zn]OC(=O)C1=CC=CC=N1 NHVUUBRKFZWXRN-UHFFFAOYSA-L 0.000 description 1
- OBOMINCSAYZPGH-UHFFFAOYSA-L zinc;undecanoate Chemical compound [Zn+2].CCCCCCCCCCC([O-])=O.CCCCCCCCCCC([O-])=O OBOMINCSAYZPGH-UHFFFAOYSA-L 0.000 description 1
- 229910052845 zircon Inorganic materials 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
- LTVDFSLWFKLJDQ-UHFFFAOYSA-N α-tocopherolquinone Chemical compound CC(C)CCCC(C)CCCC(C)CCCC(C)(O)CCC1=C(C)C(=O)C(C)=C(C)C1=O LTVDFSLWFKLJDQ-UHFFFAOYSA-N 0.000 description 1
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Description
また、農産物からは熟成作用を有するエチレンが放出され、自身の熟成を進行させている。そのため、温度、湿度を一定に保つとともにこのエチレンガス濃度を低減することが、鮮度を長期間保持するために有効であるとされている。
本発明は、被処理気体中の有機ガスを酸化触媒によって酸化するにあたり、その触媒の活性をより持続できる新規な技術を提供することを目的とする。
[1] 被処理気体中の有機ガスを低減する有機ガス低減装置であって、
通気性を有し、その表面にメソ孔と当該メソ孔に担持される白金、パラジウムの単体およびこれらの酸化物からなる群から1種または2種以上選択される物質を含む酸化触媒粒子とを有する酸化触媒部が配置されている部材と、
前記酸化触媒部を加熱する加熱部と、を備えることを特徴とする有機ガス低減装置。
[2] 前記加熱部が前記酸化触媒部を80℃以上に加熱することを特徴とする[1]に記載の有機ガス低減装置。
[3] 前記加熱部は、断続的に稼動することを特徴とする[1]もしくは[2]に記載の有機ガス低減装置。
[4] 前記有機ガスがエチレンであることを特徴とする[1]から[3]のいずれか一つに記載の有機ガス低減装置。
[5] 前記酸化触媒部がメソ孔を有する膜状支持体を有し、当該膜状支持体のメソ孔において前記酸化触媒粒子が担持されていることを特徴とする[1]から[4]のいずれか1つに記載の有機ガス低減装置。
[6] 前記膜状支持体の膜厚が50nm以上1000nm以下であることを特徴とする[5]に記載の有機ガス低減装置。
[7] 前記膜状支持体がSiO2で形成されていることを特徴とする[5]もしくは[6]に記載の有機ガス低減装置。
[8] 前記メソ孔のBET法で測定した平均孔径が2nm以上10nm以下であることを特徴とする[5]から[7]のいずれか一つに記載の有機ガス低減装置。
[9] 前記酸化触媒粒子の平均粒径が1nm以上10nm以下であることを特徴とする[5]から[8]のいずれか一つに記載の有機ガス低減装置。
[10] 前記酸化触媒体に被処理気体を供給する気体供給部をさらに備える[1]から[9]のいずれか一つに記載の有機ガス低減装置。
[11] 前記気体供給部が非処理気体を前記酸化触媒部に送風する送風機構を有しており、前記送風機構による送風の空間速度が10,000/h以上150,000/h以下であることを特徴とする[10]に記載の有機ガス低減装置。
[12] 前記酸化触媒部を有する部材の空気流通方向上流側に抗菌性、防カビ性、抗ウイルス性のうち少なくとも一つを有する化合物を担持した部材をさらに有することを特徴とする[10]もしくは[11]に記載の有機ガス低減装置。
図1は本実施形態の有機ガス低減装置の概要を示す図である。図2、図3は本実施形態に係る白金、パラジウムの単体および酸化物からなる群から1種または2種以上選択される物質を含む酸化触媒粒子(以下、単に酸化触媒粒子という場合もある)が担持された膜状支持体を有する部材の概要を示す図である。なお、図面において、実線の矢印は空気の移動方向を表し、また、破線の矢印は空気の酸化触媒層33における拡散を表す。
本実施形態の有機ガス低減装置100は、大気などの被処理気体中の有機ガスを酸化して、例えば青果物や花卉の生育に良好な大気状態を提供するために使用できる装置である。本実施形態の有機ガス低減装置100は、通気性を有し、その表面にメソ孔と当該メソ孔に担持される酸化触媒粒子とを有する酸化触媒部33が配置されている部材30と、膜状支持体に被処理気体を供給する気体供給部10と、酸化触媒部を加熱する加熱部36と、を備える。加熱部36により酸化触媒部を加熱することで、水分の影響で酸化触媒部における有機ガスの酸化する機能が低下した場合にもその機能を再生することができる。その結果、触媒の活性の持続に寄与することができる。
酸化触媒層33はその形状を保持するため、フィルター状やメッシュ状など通気可能な基材31の通気部分35表面に膜状に形成される。基材31は、気体が透過できる構造の部材ならば、板状、シート状あるいは多孔質なブロック体でも構わない。多孔質なブロック体として、ハニカム状の空隙を有する部材は表面積が広く通気性の良好な形態であり好ましい。
メソ孔の形状やその開口部の位置関係などは特に限定されず、例えば膜状支持体34の上面と下面が直線状に連通したシリンダー形状でも、メソ孔が支持体内部で分岐して他の細孔とつながっているようないわゆる連通構造でもよい。連通構造はより多くの開口部がつながっているので、支持体内部に水分が付着しても通気性が損なわれにくいため、連通構造のほうがより好ましい。
なお、酸化触媒粒子の粒径は透過型電子顕微鏡(TEM)の画像写真での粒子サイズを算出し、その平均値として粒径を得ることができる。
基材31を用いることで、容易に支持体の膜状の形状を維持することができる。
さらに、基材31には、ポリイミド、ポリエーテルエーテルケトン、ポリフェニレンスルフィド、ポリアラミド、ポリベンゾチアゾール、ポリベンゾオキサゾール、ポリベンゾイミダゾール、ポリキノリン、ポリキノキサリン、フッ素樹脂などや、フェノール樹脂やエポキシ樹脂などの熱硬化性樹脂などの当業者に公知な耐熱性有機高分子材料を用いることも可能である。
メソ孔を有する膜状の支持体34は、例えば、支持体内部のメソ孔の鋳型として作用する物質が含有している状態で基材31上に膜状の前駆体を形成し、その後鋳型として作用する物質を分解除去することで得ることができる。
なお、界面活性剤やアルコキシシランもしくは金属アルコキシドの割合は特に限定されず、適宜設定できる。界面活性剤/アルコキシシランもしくは金属アルコキシドのモル比を変えることで、得られる膜状支持体の細孔体積率、多孔度を制御することができる。
まず、膜状支持体34と担持させる酸化触媒粒子に対応する白金化合物および/またはパラジウム化合物が溶解している溶液(以下、金属化合物溶液と称する)とを接触させて膜状支持体34のメソ孔に金属化合物溶液を導入する。その後、焼成および/または還元処理を行いメソ孔内に酸化触媒粒子を形成することにより、本実施形態の酸化触媒層33を得ることができる。
より具体的には、金属化合物溶液を20〜90℃、好ましくは50〜70℃に加温、攪拌しながら、pH3〜10、好ましくはpH5〜8になるようにアルカリ溶液を用いて調整する。その後、その表面に膜状支持体34が形成されている基材31を金属化合物溶液に浸漬し、続いて、減圧脱気処理を行い細孔に金属化合物溶液を浸透させた後、200〜600℃で加熱焼成を行うことで細孔内に白金酸化物および/またはパラジウム酸化物を含む粒子を得ることができる。
金属化合物溶液における白金化合物および/またはパラジウム化合物の濃度は特に限定されないが、1×10−2〜1×10−5mol/Lとして溶液を調製するのが、生成した酸化触媒粒子が凝集しにくいので好ましい。
本実施形態に係る送風機構10は、被処理気体を酸化触媒層33に送風することで酸化触媒層33に被処理気体を強制的に接触させる。これにより、当該気体中に含まれる有機ガス濃度をより効率的に低減させることができる。よって送風機構10は酸化触媒層33中の触媒が酸化反応処理できる量の風量を送達できればよく、必要な風量は装置の能力設計に基づいて設計すればよいが、送風の空間速度が10,000/h以上150,000/h以下とするのが望ましい。
なお上述の空間速度とは、酸化触媒層33を通過した被処理気体の単位時間当たりの体積を当該触媒層33の体積で除したものと定義する。
また、送風機構10等によって生じた気流が酸化触媒層33を有する部材や後述の抗菌等剤を担持した部材以外の機能層を有する部材と接触するように送風機構を配置してもよい。例えば、機能層として、空気中の埃など浮遊物を除去する防塵フィルターが挙げられる。防塵フィルターを酸化触媒層33より上流側に設置することで、空気中の浮遊物が酸化触媒層33に付着して被処理気体と触媒の接触を阻害して有機ガスの分解が進まないことの防止に寄与することができる。
抗菌性および抗ウイルス性の少なくとも一つを有する化合物(以下、抗菌抗ウイルス剤と呼ぶ)は、例えば、ポリフェノール化合物、第4級アンモニウム塩、無機銅化合物、無機銀化合物、亜鉛、鉄などの原子を含む無機化合物、銅、銀、亜鉛、鉄などの原子を含む有機化合物、白金、ヨウ素化合物、ピリジン系化合物、エステル系化合物、スルファミド系化合物などがある。
これらの抗菌防カビ抗ウイルス剤は、2種以上を組み合わせて含有させてもよい。
加熱部38による加熱により酸化触媒層33のメソ孔内に吸着している水分が加熱によって揮発除去される。加熱部38による加熱により水分が除去されることによって、酸化触媒粒子と被処理気体中の有機ガス成分との接触阻害が解消され、酸化触媒層33の触媒活性を回復させることができる。
もしくは酸化触媒層33に対して赤外線やマイクロ波など外部から電磁波を照射することで加熱してもよい。マイクロ波は水分を直接発熱させることができる一方、膜状支持体34が無機材料で構成されている場合は発熱しにくく、被処理気体を余分に加熱しにくい熱源であるので好ましい。
例えば、有機ガス低減装置について酸化触媒部を備える部材、送風部、および加熱部を備える構成を例示して説明したが、送風部を有さない構成としてもよい。
また、酸化触媒部が膜状支持体を有しており、膜状支持体のメソ孔において酸化触媒粒子が担持されている態様を挙げて説明したがこれに限定されず、他の態様であってもよい。例えば、酸化触媒部がメソ孔を有する粒子状支持体を有しており、当該粒子状支持体のメソ孔において酸化触媒粒子が担持される態様等であってもよい。
例のみに限定されるものではない。
ビーカーにテトラエトキシシラン(TEOS)10.4gを入れ、さらにエタノール12.0gを加えた。ここに、さらに0.01M塩酸4.5gを加え、室温で20分攪拌した(A液)。別のビーカーに非イオン系界面活性剤(Brij56)3.3g及びエタノール8.0gを加え、室温で30分攪拌した(B液)。その後、A液にB液を加え、室温条件下で混合し、さらに3時間攪拌し、メソポーラスシリカの前駆体溶液を得た。メソポーラスシリカ前駆体溶液に、基材となるセラミックハニカム(岩谷産業社製)を浸漬させ、15分間減圧した。その後、セラミックハニカムを引上げ余剰分の溶液をエアブローで除去した後、1℃/分で昇温し、450℃で4時間焼成しメソポーラスシリカ膜を固定化したセラミックハニカム基材を得た。
その後、メソポーラスシリカ膜を固定化したセラミックハニカムにジアンミンジニトロ白金硝酸を含む溶液に浸漬させ、余剰分の溶液をエアブローで除去し、水素ガス10%、窒素ガス90%の還元処理ガス中で250℃、1時間焼成し、白金の酸化触媒層を有するハニカム基材を得た。
なおメソポーラスシリカ膜(Pt粒子を含む、以下同じ)に対するPtの担持量は1wt%であった。細孔径をBET法による測定を実施したところ、3.2nmであった。また、メソポーラスシリカ膜の膜厚は500nmであった。また、Ptの粒子サイズをTEMで観察したところ、3nmであった。
容積120Lの密閉空間内を温度5℃、湿度90%およびエチレン濃度が0.5ppmになるように調整した。その後、密閉空間内に実施例1の有機ガス低減装置を設置し、酸化触媒層を有するハニカム基材に対し空間速度48,000/hで送風しながら、密閉空間内のエチレンの濃度変化を経時的に測定した。なお、空間速度は酸化触媒層の体積300cm3(10cm×10cm×3cm)に対し、風量14.4m3/hから算出した。
試験例1を実施後、温度5℃、湿度90%、エチレン濃度が0.5ppmの環境下で有機ガス低減装置を14日間連続運転した。14日後に試験例1と同様な方法で実施した。
試験例2を実施後、有機ガス低減装置の酸化触媒層を50℃で1時間加熱処理をした。その後、試験例1と同様な方法で実施した。
試験例2を実施後、有機ガス低減装置の酸化触媒層を80℃で1時間加熱処理をした。その後、試験例1と同様な方法で実施した。
試験例2を実施後、有機ガス低減装置の酸化触媒層を140℃で1時間加熱処理をした。その後、試験例1と同様な方法で実施した。
試験例2を実施後、有機ガス低減装置の酸化触媒層を200℃で1時間加熱処理をした。その後、試験例1と同様な方法で実施した。
11 電動ファン
30 酸化触媒層を有する部材
31 基材
33 酸化触媒層
34 膜状支持体
35 通気部分
36 電熱ヒーター
37 電熱ヒーターへの給電配線
38 加熱部
100 有機ガス低減装置
Claims (10)
- 被処理気体中の有機ガスを低減する有機ガス低減装置であって、
表面にメソ孔を有する膜状支持体と、前記メソ孔に担持される酸化触媒粒子と、を有する酸化触媒部が配置される、通気性を有する部材と、
前記酸化触媒部を加熱する加熱部と、を備え、
前記膜状支持体の膜厚が50nm以上1000nm以下であり、
前記酸化触媒粒子が、白金、パラジウムおよびこれらの酸化物からなる群から選択される1種または2種以上の物質を含む酸化触媒粒子であることを特徴とする有機ガス低減装置。 - 前記加熱部が前記酸化触媒部を80℃以上に加熱することを特徴とする請求項1に記載の有機ガス低減装置。
- 前記加熱部は、断続的に稼動することを特徴とする請求項1もしくは2に記載の有機ガス低減装置。
- 前記有機ガスがエチレンであることを特徴とする請求項1から3のいずれか一つに記載の有機ガス低減装置。
- 前記膜状支持体がSiO2で形成されていることを特徴とする請求項1から4のいずれか一つに記載の有機ガス低減装置。
- 前記メソ孔のBET法で測定した平均孔径が2nm以上10nm以下であることを特徴とする請求項1から5のいずれか一つに記載の有機ガス低減装置。
- 前記酸化触媒粒子の平均粒径が1nm以上10nm以下であることを特徴とする請求項1から6のいずれか一つに記載の有機ガス低減装置。
- 前記酸化触媒部に被処理気体を供給する気体供給部をさらに備えることを特徴とする請求項1から7のいずれか一つに記載の有機ガス低減装置。
- 前記気体供給部が被処理気体を前記酸化触媒部に送風する送風機構を有しており、前記送風機構による送風の空間速度が10,000/h以上150,000/h以下であることを特徴とする請求項8に記載の有機ガス低減装置。
- 前記酸化触媒部を有する前記部材の空気流通方向上流側に抗菌性、防カビ性、抗ウイルス性のうち少なくとも一つを有する化合物を担持した部材をさらに有することを特徴とする請求項8もしくは9に記載の有機ガス低減装置。
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