JP6887839B2 - 保護膜形成装置 - Google Patents

保護膜形成装置 Download PDF

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Publication number
JP6887839B2
JP6887839B2 JP2017055068A JP2017055068A JP6887839B2 JP 6887839 B2 JP6887839 B2 JP 6887839B2 JP 2017055068 A JP2017055068 A JP 2017055068A JP 2017055068 A JP2017055068 A JP 2017055068A JP 6887839 B2 JP6887839 B2 JP 6887839B2
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Prior art keywords
substrate
molded plate
adhesive
protective film
stage
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Japanese (ja)
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JP2018153791A5 (enExample
JP2018153791A (ja
Inventor
公昭 佐藤
公昭 佐藤
慶 手島
慶 手島
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Shibaura Mechatronics Corp
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Shibaura Mechatronics Corp
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Priority to JP2017055068A priority Critical patent/JP6887839B2/ja
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Publication of JP2018153791A5 publication Critical patent/JP2018153791A5/ja
Priority to JP2021084807A priority patent/JP7194228B2/ja
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JP2017055068A 2017-03-21 2017-03-21 保護膜形成装置 Active JP6887839B2 (ja)

Priority Applications (2)

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JP2017055068A JP6887839B2 (ja) 2017-03-21 2017-03-21 保護膜形成装置
JP2021084807A JP7194228B2 (ja) 2017-03-21 2021-05-19 保護膜形成装置

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JP2017055068A JP6887839B2 (ja) 2017-03-21 2017-03-21 保護膜形成装置

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JP2021084807A Division JP7194228B2 (ja) 2017-03-21 2021-05-19 保護膜形成装置

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JP2018153791A JP2018153791A (ja) 2018-10-04
JP2018153791A5 JP2018153791A5 (enExample) 2020-03-12
JP6887839B2 true JP6887839B2 (ja) 2021-06-16

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JP2017055068A Active JP6887839B2 (ja) 2017-03-21 2017-03-21 保護膜形成装置
JP2021084807A Active JP7194228B2 (ja) 2017-03-21 2021-05-19 保護膜形成装置

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JP2021084807A Active JP7194228B2 (ja) 2017-03-21 2021-05-19 保護膜形成装置

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Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114887830B (zh) * 2022-05-09 2023-05-23 广东寅创科技有限公司 一种特种机器人的生产工艺及装置

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07314461A (ja) * 1994-05-27 1995-12-05 Olympus Optical Co Ltd 複合型光学素子の離型方法および装置
JPH08323780A (ja) * 1995-06-01 1996-12-10 Olympus Optical Co Ltd 複合型光学素子の離型方法および装置
JP3971429B2 (ja) * 2005-03-25 2007-09-05 Tdk株式会社 光ディスクの製造装置及び製造方法
US8377361B2 (en) * 2006-11-28 2013-02-19 Wei Zhang Imprint lithography with improved substrate/mold separation
JP2008290357A (ja) 2007-05-25 2008-12-04 Seiko Epson Corp マイクロレンズアレイの製造方法
JP5704393B2 (ja) 2011-03-01 2015-04-22 宇部興産機械株式会社 多層成形装置及び多層成形方法

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JP7194228B2 (ja) 2022-12-21
JP2018153791A (ja) 2018-10-04
JP2021130112A (ja) 2021-09-09

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