JP6885866B2 - シロキサンポリマー及び粒子を有する組成物 - Google Patents

シロキサンポリマー及び粒子を有する組成物 Download PDF

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JP6885866B2
JP6885866B2 JP2017518607A JP2017518607A JP6885866B2 JP 6885866 B2 JP6885866 B2 JP 6885866B2 JP 2017518607 A JP2017518607 A JP 2017518607A JP 2017518607 A JP2017518607 A JP 2017518607A JP 6885866 B2 JP6885866 B2 JP 6885866B2
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nitride
carbide
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JP2017518434A (ja
JP2017518434A5 (enExample
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ヘイッキネン ヤルゥコー
ヘイッキネン ヤルゥコー
ランタラ ユハ
ランタラ ユハ
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Inkron Oy
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • C08G77/14Polysiloxanes containing silicon bound to oxygen-containing groups
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    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • C08G77/14Polysiloxanes containing silicon bound to oxygen-containing groups
    • C08G77/18Polysiloxanes containing silicon bound to oxygen-containing groups to alkoxy or aryloxy groups
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    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
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    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
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    • C09J183/04Polysiloxanes
    • C09J183/06Polysiloxanes containing silicon bound to oxygen-containing groups
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
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    • C08K2201/00Specific properties of additives
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    • C08K2201/003Additives being defined by their diameter
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    • C08K2201/005Additives being defined by their particle size in general
    • CCHEMISTRY; METALLURGY
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    • C08L2201/00Properties
    • C08L2201/10Transparent films; Clear coatings; Transparent materials

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Silicon Polymers (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
JP2017518607A 2014-06-19 2015-06-22 シロキサンポリマー及び粒子を有する組成物 Active JP6885866B2 (ja)

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Application Number Priority Date Filing Date Title
US201462014138P 2014-06-19 2014-06-19
FI20145601 2014-06-19
US62/014,138 2014-06-19
FI20145601 2014-06-19
PCT/FI2015/050455 WO2015193556A1 (en) 2014-06-19 2015-06-22 Composition having siloxane polymer and particle

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JP2017518434A JP2017518434A (ja) 2017-07-06
JP2017518434A5 JP2017518434A5 (enExample) 2018-08-02
JP6885866B2 true JP6885866B2 (ja) 2021-06-16

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US (1) US20170137601A1 (enExample)
EP (1) EP3158005A1 (enExample)
JP (1) JP6885866B2 (enExample)
KR (1) KR102454572B1 (enExample)
CN (1) CN106612617A (enExample)
WO (1) WO2015193556A1 (enExample)

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CN110511669B (zh) * 2019-07-12 2021-10-15 广州奥松电子股份有限公司 一种有机硅组合物及其固化方法
KR102522180B1 (ko) * 2019-10-30 2023-04-14 주식회사 엘지화학 열전도성을 갖는 실리콘 수지 조성물
CN110903484B (zh) * 2019-12-09 2022-02-08 湖南钰宏新材料科技有限公司 一种有机硅改性有机聚硅氮烷及由其制得的高硬度易清洁涂层
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CN115894934A (zh) * 2022-11-21 2023-04-04 江南大学 一种含磷聚硅氧烷及其制备方法与改性环氧树脂的应用
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KR20170023981A (ko) 2017-03-06
CN106612617A (zh) 2017-05-03
EP3158005A1 (en) 2017-04-26
WO2015193556A1 (en) 2015-12-23
JP2017518434A (ja) 2017-07-06
KR102454572B1 (ko) 2022-10-13
US20170137601A1 (en) 2017-05-18

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