JP6879481B2 - キノフタロン系化合物、これを含む感光性樹脂組成物、感光材、カラーフィルタ、およびディスプレイ装置 - Google Patents

キノフタロン系化合物、これを含む感光性樹脂組成物、感光材、カラーフィルタ、およびディスプレイ装置 Download PDF

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JP6879481B2
JP6879481B2 JP2019537171A JP2019537171A JP6879481B2 JP 6879481 B2 JP6879481 B2 JP 6879481B2 JP 2019537171 A JP2019537171 A JP 2019537171A JP 2019537171 A JP2019537171 A JP 2019537171A JP 6879481 B2 JP6879481 B2 JP 6879481B2
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JP2020520343A (ja
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パク、ジョンホ
チョイ、サンガ
リー、ダミ
ジン ヤン、スン
ジン ヤン、スン
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エルジー・ケム・リミテッド
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    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D401/00—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom
    • C07D401/02—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings
    • C07D401/12—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings linked by a chain containing hetero atoms as chain links
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Materials For Photolithography (AREA)
  • Electroluminescent Light Sources (AREA)
  • Optical Filters (AREA)
  • Plural Heterocyclic Compounds (AREA)
  • Nitrogen Condensed Heterocyclic Rings (AREA)
  • Heterocyclic Carbon Compounds Containing A Hetero Ring Having Oxygen Or Sulfur (AREA)
  • Polymerisation Methods In General (AREA)
  • Graft Or Block Polymers (AREA)
JP2019537171A 2018-04-04 2018-10-24 キノフタロン系化合物、これを含む感光性樹脂組成物、感光材、カラーフィルタ、およびディスプレイ装置 Active JP6879481B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
KR1020180039312A KR102235984B1 (ko) 2018-04-04 2018-04-04 퀴노프탈론계 화합물 및 이를 포함하는 감광성 수지 조성물, 감광재, 컬러필터, 디스플레이 장치
KR10-2018-0039312 2018-04-04
PCT/KR2018/012614 WO2019194381A1 (ko) 2018-04-04 2018-10-24 퀴노프탈론계 화합물, 이를 포함하는 감광성 수지 조성물, 감광재, 컬러필터, 및 디스플레이 장치

Publications (2)

Publication Number Publication Date
JP2020520343A JP2020520343A (ja) 2020-07-09
JP6879481B2 true JP6879481B2 (ja) 2021-06-02

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JP2019537171A Active JP6879481B2 (ja) 2018-04-04 2018-10-24 キノフタロン系化合物、これを含む感光性樹脂組成物、感光材、カラーフィルタ、およびディスプレイ装置

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JP (1) JP6879481B2 (zh)
KR (1) KR102235984B1 (zh)
CN (1) CN110557947B (zh)
TW (1) TWI711673B (zh)
WO (1) WO2019194381A1 (zh)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110804039B (zh) * 2019-11-13 2020-08-14 大连理工大学 一类含邻苯二甲酰亚胺的1，8-萘酐类衍生物，其药学可接受的盐及其抗肿瘤药物应用

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0726340B2 (ja) * 1989-01-17 1995-03-22 大日精化工業株式会社 染料の製造方法
JPH0768459B2 (ja) * 1989-01-17 1995-07-26 大日精化工業株式会社 染 料
KR20010009058A (ko) 1999-07-07 2001-02-05 성재갑 감광성 수지 조성물
JP2001335711A (ja) * 2000-05-29 2001-12-04 Fuji Photo Film Co Ltd キノフタロン系化合物、それを含む顔料分散剤、顔料分散組成物及び着色感光性組成物
JP2004067715A (ja) * 2002-08-01 2004-03-04 Toray Ind Inc 顔料分散液、着色剤組成物、カラーフィルター、及び液晶表示パネル
JP5680274B2 (ja) * 2005-12-01 2015-03-04 チバ ホールディング インコーポレーテッドＣｉｂａ Ｈｏｌｄｉｎｇ Ｉｎｃ． オキシムエステル光開始剤
JP5737078B2 (ja) * 2011-02-28 2015-06-17 東洋インキＳｃホールディングス株式会社 カラーフィルタ用赤色着色組成物、およびカラーフィルタ
JP2012236882A (ja) * 2011-05-10 2012-12-06 Dainippon Printing Co Ltd 黄色顔料分散液、カラーフィルタ用黄色感光性樹脂組成物、カラーフィルタ、液晶表示装置及び有機発光表示装置
JP5267696B1 (ja) * 2012-03-02 2013-08-21 東洋インキＳｃホールディングス株式会社 キノフタロン化合物
KR20170112549A (ko) * 2016-03-31 2017-10-12 주식회사 엘지화학 신규한 화합물을 포함하는 착색제, 이를 포함하는 착색 감광성 수지 조성물 및 그의 제조방법
KR102067858B1 (ko) * 2016-05-24 2020-01-17 주식회사 엘지화학 화합물 및 이를 포함하는 색재 조성물 및 이를 포함하는 수지 조성물
KR101813447B1 (ko) * 2017-03-24 2017-12-28 동우 화인켐 주식회사 녹색 화소용 착색 감광성 수지 조성물, 컬러필터 및 화상표시장치

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Publication number Publication date
CN110557947A (zh) 2019-12-10
WO2019194381A1 (ko) 2019-10-10
TWI711673B (zh) 2020-12-01
KR20190115970A (ko) 2019-10-14
CN110557947B (zh) 2022-06-14
JP2020520343A (ja) 2020-07-09
KR102235984B1 (ko) 2021-04-02
TW201942255A (zh) 2019-11-01

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