JP6858274B2 - 軽水炉を除染するための亜鉛注入 - Google Patents
軽水炉を除染するための亜鉛注入 Download PDFInfo
- Publication number
- JP6858274B2 JP6858274B2 JP2019554828A JP2019554828A JP6858274B2 JP 6858274 B2 JP6858274 B2 JP 6858274B2 JP 2019554828 A JP2019554828 A JP 2019554828A JP 2019554828 A JP2019554828 A JP 2019554828A JP 6858274 B2 JP6858274 B2 JP 6858274B2
- Authority
- JP
- Japan
- Prior art keywords
- acid
- metal
- ions
- decontamination
- decontamination solution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000011701 zinc Substances 0.000 title claims description 34
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 title claims description 20
- 229910052725 zinc Inorganic materials 0.000 title claims description 20
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 title description 6
- 238000002347 injection Methods 0.000 title 1
- 239000007924 injection Substances 0.000 title 1
- 238000005202 decontamination Methods 0.000 claims description 74
- 230000003588 decontaminative effect Effects 0.000 claims description 66
- 229910052751 metal Inorganic materials 0.000 claims description 52
- 239000002184 metal Substances 0.000 claims description 52
- 239000000243 solution Substances 0.000 claims description 49
- 238000000034 method Methods 0.000 claims description 42
- 229910052723 transition metal Inorganic materials 0.000 claims description 29
- 150000003624 transition metals Chemical class 0.000 claims description 29
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 claims description 24
- 150000002500 ions Chemical class 0.000 claims description 22
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 18
- 239000008139 complexing agent Substances 0.000 claims description 14
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 claims description 12
- 230000002285 radioactive effect Effects 0.000 claims description 11
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 claims description 8
- 229910052759 nickel Inorganic materials 0.000 claims description 8
- 235000006408 oxalic acid Nutrition 0.000 claims description 8
- SIOXPEMLGUPBBT-UHFFFAOYSA-N picolinic acid Chemical compound OC(=O)C1=CC=CC=N1 SIOXPEMLGUPBBT-UHFFFAOYSA-N 0.000 claims description 8
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 6
- 229910017052 cobalt Inorganic materials 0.000 claims description 6
- 239000010941 cobalt Substances 0.000 claims description 6
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 6
- 238000007254 oxidation reaction Methods 0.000 claims description 6
- 230000003647 oxidation Effects 0.000 claims description 5
- 150000003839 salts Chemical class 0.000 claims description 5
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 4
- 239000007864 aqueous solution Substances 0.000 claims description 4
- 229940098779 methanesulfonic acid Drugs 0.000 claims description 4
- 229910017604 nitric acid Inorganic materials 0.000 claims description 4
- 229940081066 picolinic acid Drugs 0.000 claims description 4
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 claims description 3
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 claims description 3
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 claims description 3
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims description 3
- 150000001732 carboxylic acid derivatives Chemical class 0.000 claims description 3
- 150000001735 carboxylic acids Chemical class 0.000 claims description 3
- 235000015165 citric acid Nutrition 0.000 claims description 3
- 239000000203 mixture Substances 0.000 claims description 3
- MGFYIUFZLHCRTH-UHFFFAOYSA-N nitrilotriacetic acid Chemical compound OC(=O)CN(CC(O)=O)CC(O)=O MGFYIUFZLHCRTH-UHFFFAOYSA-N 0.000 claims description 3
- 239000011975 tartaric acid Substances 0.000 claims description 3
- 235000002906 tartaric acid Nutrition 0.000 claims description 3
- -1 60Co ions Chemical class 0.000 claims description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims 4
- 230000001590 oxidative effect Effects 0.000 claims 1
- 229910001428 transition metal ion Inorganic materials 0.000 claims 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 11
- 239000002253 acid Substances 0.000 description 9
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical class C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 8
- 239000003456 ion exchange resin Substances 0.000 description 7
- 229920003303 ion-exchange polymer Polymers 0.000 description 7
- 150000001768 cations Chemical class 0.000 description 5
- 239000011651 chromium Substances 0.000 description 5
- 229910052804 chromium Inorganic materials 0.000 description 4
- 238000005342 ion exchange Methods 0.000 description 4
- 239000011572 manganese Substances 0.000 description 4
- 239000012286 potassium permanganate Substances 0.000 description 4
- 229910052596 spinel Inorganic materials 0.000 description 4
- 239000011029 spinel Substances 0.000 description 4
- ONDPHDOFVYQSGI-UHFFFAOYSA-N zinc nitrate Chemical compound [Zn+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O ONDPHDOFVYQSGI-UHFFFAOYSA-N 0.000 description 4
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 230000001771 impaired effect Effects 0.000 description 3
- 229910052742 iron Inorganic materials 0.000 description 3
- 229910044991 metal oxide Inorganic materials 0.000 description 3
- 150000004706 metal oxides Chemical class 0.000 description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 229910001417 caesium ion Inorganic materials 0.000 description 2
- 238000005341 cation exchange Methods 0.000 description 2
- 229910052500 inorganic mineral Inorganic materials 0.000 description 2
- 238000007689 inspection Methods 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 239000011707 mineral Substances 0.000 description 2
- 239000007800 oxidant agent Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 150000003682 vanadium compounds Chemical class 0.000 description 2
- 150000003752 zinc compounds Chemical class 0.000 description 2
- NWONKYPBYAMBJT-UHFFFAOYSA-L zinc sulfate Chemical compound [Zn+2].[O-]S([O-])(=O)=O NWONKYPBYAMBJT-UHFFFAOYSA-L 0.000 description 2
- 229960001763 zinc sulfate Drugs 0.000 description 2
- 229910000368 zinc sulfate Inorganic materials 0.000 description 2
- MKRZFOIRSLOYCE-UHFFFAOYSA-L zinc;methanesulfonate Chemical compound [Zn+2].CS([O-])(=O)=O.CS([O-])(=O)=O MKRZFOIRSLOYCE-UHFFFAOYSA-L 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910019589 Cr—Fe Inorganic materials 0.000 description 1
- VEQPNABPJHWNSG-UHFFFAOYSA-N Nickel(2+) Chemical compound [Ni+2] VEQPNABPJHWNSG-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- PTFCDOFLOPIGGS-UHFFFAOYSA-N Zinc dication Chemical compound [Zn+2] PTFCDOFLOPIGGS-UHFFFAOYSA-N 0.000 description 1
- LKVDKMLTMVKACQ-UHFFFAOYSA-I [V+5].[O-]C=O.[O-]C=O.[O-]C=O.[O-]C=O.[O-]C=O Chemical compound [V+5].[O-]C=O.[O-]C=O.[O-]C=O.[O-]C=O.[O-]C=O LKVDKMLTMVKACQ-UHFFFAOYSA-I 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000002238 attenuated effect Effects 0.000 description 1
- 229910052728 basic metal Inorganic materials 0.000 description 1
- 150000003818 basic metals Chemical class 0.000 description 1
- 239000003729 cation exchange resin Substances 0.000 description 1
- 150000004697 chelate complex Chemical class 0.000 description 1
- 239000002738 chelating agent Substances 0.000 description 1
- 238000009390 chemical decontamination Methods 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 229960004106 citric acid Drugs 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 229910001453 nickel ion Inorganic materials 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 229940074355 nitric acid Drugs 0.000 description 1
- 229940116315 oxalic acid Drugs 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 235000011007 phosphoric acid Nutrition 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000012857 radioactive material Substances 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 235000002639 sodium chloride Nutrition 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21F—PROTECTION AGAINST X-RADIATION, GAMMA RADIATION, CORPUSCULAR RADIATION OR PARTICLE BOMBARDMENT; TREATING RADIOACTIVELY CONTAMINATED MATERIAL; DECONTAMINATION ARRANGEMENTS THEREFOR
- G21F9/00—Treating radioactively contaminated material; Decontamination arrangements therefor
- G21F9/001—Decontamination of contaminated objects, apparatus, clothes, food; Preventing contamination thereof
- G21F9/002—Decontamination of the surface of objects with chemical or electrochemical processes
- G21F9/004—Decontamination of the surface of objects with chemical or electrochemical processes of metallic surfaces
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21F—PROTECTION AGAINST X-RADIATION, GAMMA RADIATION, CORPUSCULAR RADIATION OR PARTICLE BOMBARDMENT; TREATING RADIOACTIVELY CONTAMINATED MATERIAL; DECONTAMINATION ARRANGEMENTS THEREFOR
- G21F9/00—Treating radioactively contaminated material; Decontamination arrangements therefor
- G21F9/04—Treating liquids
- G21F9/06—Processing
- G21F9/12—Processing by absorption; by adsorption; by ion-exchange
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21F—PROTECTION AGAINST X-RADIATION, GAMMA RADIATION, CORPUSCULAR RADIATION OR PARTICLE BOMBARDMENT; TREATING RADIOACTIVELY CONTAMINATED MATERIAL; DECONTAMINATION ARRANGEMENTS THEREFOR
- G21F9/00—Treating radioactively contaminated material; Decontamination arrangements therefor
- G21F9/28—Treating solids
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21F—PROTECTION AGAINST X-RADIATION, GAMMA RADIATION, CORPUSCULAR RADIATION OR PARTICLE BOMBARDMENT; TREATING RADIOACTIVELY CONTAMINATED MATERIAL; DECONTAMINATION ARRANGEMENTS THEREFOR
- G21F9/00—Treating radioactively contaminated material; Decontamination arrangements therefor
- G21F9/28—Treating solids
- G21F9/30—Processing
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Food Science & Technology (AREA)
- Treatment Of Water By Ion Exchange (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
- Apparatus For Disinfection Or Sterilisation (AREA)
- Detergent Compositions (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Manufacture And Refinement Of Metals (AREA)
Description
図は以下で詳細に示す。
軽水炉の一次回路の除染を実施し、それにより除染媒体中の平均Zn濃度およびFe濃度、ならびに、この場合にイオン交換樹脂(強酸性陽イオン交換)によって除染溶液から除去された60Coを測定した。一次回路の除染を15サイクルより多く実施した。
実施例1を繰り返し、それによりZn濃度の代わりにNi濃度またはCr濃度を観察した。この場合、いずれの場合においても、遷移金属の濃度と60Coによって除去された放射能との間で同様に相関関係が示された。測定した相関関係は、Znと比較して、CrによってNiから減少する傾向があった。
Claims (12)
- 放射能で汚染された金属表面を除染するための方法であって、
前記放射能で汚染された金属表面の少なくとも一部分を、フッ化水素酸、リン酸、硝酸、メタンスルホン酸、カルボン酸、およびそれらの塩から選択される錯化剤および遷移金属のイオンを含む除染溶液と接触させるステップを含み、
前記遷移金属の濃度が≧0.5〜≦15mg/kgの範囲である、方法。 - 前記遷移金属の前記イオンが亜鉛、ニッケル、コバルトまたはそれらの混合物からなる群から選択される、請求項1に記載の方法。
- 前記遷移金属の前記イオンが亜鉛であり、≧2〜≦5mg/kgの範囲の濃度で存在する、請求項1及び2のいずれか一項に記載の方法。
- 58Coイオンおよび60Coイオンの少なくとも一方が前記金属表面から除去される、請求項1から3のいずれか一項に記載の方法。
- 前記除染溶液が原子炉の一次回路に導入される、請求項1から4のいずれか一項に記載の方法。
- 前記除染溶液が循環される、請求項1から5のいずれか一項に記載の方法。
- 第1の方法ステップとして、前記方法が、前記放射能で汚染された金属表面を酸化するかまたは還元するための、予備酸化ステップまたは還元ステップを含む、請求項1から6のいずれか一項に記載の方法。
- 前記方法が、
前記除染溶液中に存在する放射性同位体の少なくとも一部を除去するステップをさらに含む、請求項1から7のいずれか一項に記載の方法。 - 前記方法ステップすべてが少なくとも1回繰り返される、請求項8に記載の方法。
- 前記カルボン酸は、ニトリロ三酢酸、エチレンジアミン四酢酸、シュウ酸、酒石酸、クエン酸、ピコリン酸、およびそれらの塩である、請求項1に記載の方法。
- 放射能で汚染された金属表面を除染するため、フッ化水素酸、リン酸、硝酸、メタンスルホン酸、カルボン酸、およびそれらの塩から選択される錯化剤および≧0.5mg/kg〜≦15mg/kgの範囲の濃度の遷移金属のイオンを含む、水溶液の使用。
- 前記カルボン酸は、ニトリロ三酢酸、エチレンジアミン四酢酸、シュウ酸、酒石酸、クエン酸、ピコリン酸、およびそれらの塩である、請求項11に記載の使用。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102017107584.4 | 2017-04-07 | ||
DE102017107584.4A DE102017107584A1 (de) | 2017-04-07 | 2017-04-07 | Zinkdosierung zur Dekontamination von Leichtwasserreaktoren |
PCT/EP2018/055374 WO2018184780A1 (de) | 2017-04-07 | 2018-03-05 | Zinkdosierung zur dekontamination von leichtwasserreaktoren |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2020516876A JP2020516876A (ja) | 2020-06-11 |
JP6858274B2 true JP6858274B2 (ja) | 2021-04-14 |
Family
ID=61691927
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2019554828A Active JP6858274B2 (ja) | 2017-04-07 | 2018-03-05 | 軽水炉を除染するための亜鉛注入 |
Country Status (10)
Country | Link |
---|---|
US (1) | US10998106B2 (ja) |
EP (1) | EP3607562B1 (ja) |
JP (1) | JP6858274B2 (ja) |
KR (1) | KR102246411B1 (ja) |
CN (1) | CN110494928A (ja) |
DE (1) | DE102017107584A1 (ja) |
ES (1) | ES2897688T3 (ja) |
RU (1) | RU2767977C2 (ja) |
UA (1) | UA124477C2 (ja) |
WO (1) | WO2018184780A1 (ja) |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
AT9719B (de) | 1901-08-03 | 1902-11-10 | Erminio Ferraris | Kugelmühle für Nassvermahlung. |
GB2077482B (en) * | 1980-06-06 | 1983-06-08 | Us Energy | Coolant system decontamination |
GB2085215A (en) * | 1980-08-11 | 1982-04-21 | Central Electr Generat Board | An application technique for the decontamination of nuclear reactors |
US5024805A (en) * | 1989-08-09 | 1991-06-18 | Westinghouse Electric Corp. | Method for decontaminating a pressurized water nuclear reactor system |
US5434331A (en) * | 1992-11-17 | 1995-07-18 | The Catholic University Of America | Removal of radioactive or heavy metal contaminants by means of non-persistent complexing agents |
AU1030995A (en) * | 1993-11-30 | 1995-06-19 | British Nuclear Fuels Plc | Process for the treatment of particulate material |
GB9610647D0 (en) * | 1996-05-21 | 1996-07-31 | British Nuclear Fuels Plc | Decontamination of metal |
RU2137232C1 (ru) * | 1997-07-31 | 1999-09-10 | Государственный научный центр Российской Федерации "Всероссийский научно-исследовательский институт неорганических материалов имени академика А.А.Бочвара" | Способ удаления радиоактивных загрязнений |
WO2000078403A1 (en) * | 1999-06-24 | 2000-12-28 | The University Of Chicago | Method for the decontamination of metallic surfaces |
FR2803855B1 (fr) | 2000-01-13 | 2002-05-31 | Usinor | Procede d'oxalatation de la surface zinguee d'une tole |
TW529041B (en) * | 2000-12-21 | 2003-04-21 | Toshiba Corp | Chemical decontamination method and treatment method and apparatus of chemical decontamination solution |
US6944254B2 (en) * | 2002-09-06 | 2005-09-13 | Westinghouse Electric Co., Llc | Pressurized water reactor shutdown method |
DE102009047524A1 (de) | 2009-12-04 | 2011-06-09 | Areva Np Gmbh | Verfahren zur Oberflächen-Dekontamination |
US20130251086A1 (en) | 2010-07-21 | 2013-09-26 | Atomic Energy Of Canada Limited | Reactor decontamination process and reagent |
US9738551B2 (en) * | 2012-04-18 | 2017-08-22 | Westinghouse Electric Company Llc | Additives for heat exchanger deposit removal in a wet layup condition |
KR20140095266A (ko) * | 2013-01-24 | 2014-08-01 | 한국원자력연구원 | 금속 표면 고착성 방사능 오염 산화막 제거를 위한 무착화성 화학 제염제 및 이를 이용한 화학 제염방법 |
KR101523763B1 (ko) * | 2013-06-19 | 2015-06-01 | 한국원자력연구원 | 금속 표면 고착성 방사능 오염 산화막 제거를 위한 산화 제염제 및 이를 이용한 산화 제염방법 |
US9334579B2 (en) * | 2013-10-29 | 2016-05-10 | Westinghouse Electric Company Llc | Targeted heat exchanger deposit removal by combined dissolution and mechanical removal |
US9793018B2 (en) | 2013-10-29 | 2017-10-17 | Westinghouse Electric Company Llc | Ambient temperature decontamination of nuclear power plant component surfaces containing radionuclides in a metal oxide |
JP6118278B2 (ja) * | 2014-01-31 | 2017-04-19 | 日立Geニュークリア・エナジー株式会社 | 原子力プラントの構造部材への貴金属付着方法 |
-
2017
- 2017-04-07 DE DE102017107584.4A patent/DE102017107584A1/de not_active Withdrawn
-
2018
- 2018-03-05 CN CN201880023839.3A patent/CN110494928A/zh active Pending
- 2018-03-05 JP JP2019554828A patent/JP6858274B2/ja active Active
- 2018-03-05 KR KR1020197027140A patent/KR102246411B1/ko active IP Right Grant
- 2018-03-05 RU RU2019134954A patent/RU2767977C2/ru active
- 2018-03-05 EP EP18712094.4A patent/EP3607562B1/de active Active
- 2018-03-05 ES ES18712094T patent/ES2897688T3/es active Active
- 2018-03-05 WO PCT/EP2018/055374 patent/WO2018184780A1/de active Application Filing
- 2018-03-05 UA UAA201910746A patent/UA124477C2/uk unknown
- 2018-03-05 US US16/603,327 patent/US10998106B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
KR20190132374A (ko) | 2019-11-27 |
RU2767977C2 (ru) | 2022-03-22 |
JP2020516876A (ja) | 2020-06-11 |
CN110494928A (zh) | 2019-11-22 |
EP3607562B1 (de) | 2021-09-22 |
RU2019134954A3 (ja) | 2021-05-07 |
US20200051706A1 (en) | 2020-02-13 |
DE102017107584A1 (de) | 2018-10-11 |
EP3607562A1 (de) | 2020-02-12 |
KR102246411B1 (ko) | 2021-05-03 |
UA124477C2 (uk) | 2021-09-22 |
WO2018184780A1 (de) | 2018-10-11 |
ES2897688T3 (es) | 2022-03-02 |
RU2019134954A (ru) | 2021-05-07 |
US10998106B2 (en) | 2021-05-04 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CA1224025A (en) | Decontamination of metal surfaces in nuclear power reactors | |
US7166758B2 (en) | Foam and gel methods for the decontamination of metallic surfaces | |
JP5602241B2 (ja) | 表面除染方法 | |
US20130220366A1 (en) | Method for surface decontamination | |
KR101883895B1 (ko) | 방사성 폐기물을 혁신적으로 줄일 수 있는 제염방법 및 이를 위한 키트 | |
WO1991017124A1 (en) | New formulations for iron oxides dissolution | |
EP3446316B1 (en) | Method for decontaminating metal surfaces of a nuclear facility | |
US6504077B1 (en) | Method for the decontamination of metallic surfaces | |
KR20140095266A (ko) | 금속 표면 고착성 방사능 오염 산화막 제거를 위한 무착화성 화학 제염제 및 이를 이용한 화학 제염방법 | |
JP6339104B2 (ja) | 原子炉の冷却回路の構成部材の表面汚染除去方法 | |
KR101523763B1 (ko) | 금속 표면 고착성 방사능 오염 산화막 제거를 위한 산화 제염제 및 이를 이용한 산화 제염방법 | |
JP6796587B2 (ja) | 原子炉の冷却システムで金属表面を除染する方法 | |
EP0090512A1 (en) | Process for treatment of oxide films prior to chemical cleaning | |
CA1230806A (en) | Ceric acid decontamination of nuclear reactors | |
JP6858274B2 (ja) | 軽水炉を除染するための亜鉛注入 | |
KR101601201B1 (ko) | 금속 표면 고착성 방사능 오염 산화막 제거를 위한 무착화성 화학 제염제 및 이를 이용한 화학 제염방법 | |
Nunez et al. | Foam and gel methods for the decontamination of metallic surfaces | |
Kaminski et al. | Metal surface decontamination using 1-hydroxyethane-1, 1-diphosphonic acid | |
Bradbury et al. | Low concentration decontamination reagent development for LWRs | |
JPH0365520B2 (ja) | ||
JPS62144100A (ja) | 放射性物質で汚染された表面の汚染物質除去方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A821 Effective date: 20191108 Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20191108 |
|
A529 | Written submission of copy of amendment under article 34 pct |
Free format text: JAPANESE INTERMEDIATE CODE: A529 Effective date: 20191122 |
|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20191122 |
|
A871 | Explanation of circumstances concerning accelerated examination |
Free format text: JAPANESE INTERMEDIATE CODE: A871 Effective date: 20191122 |
|
A975 | Report on accelerated examination |
Free format text: JAPANESE INTERMEDIATE CODE: A971005 Effective date: 20200207 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20200602 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20200827 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20201110 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20210205 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20210302 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20210323 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 6858274 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |