JP6833778B2 - 半導体装置 - Google Patents
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- JP6833778B2 JP6833778B2 JP2018169710A JP2018169710A JP6833778B2 JP 6833778 B2 JP6833778 B2 JP 6833778B2 JP 2018169710 A JP2018169710 A JP 2018169710A JP 2018169710 A JP2018169710 A JP 2018169710A JP 6833778 B2 JP6833778 B2 JP 6833778B2
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- 239000004065 semiconductor Substances 0.000 title claims description 199
- 239000012535 impurity Substances 0.000 claims description 72
- 239000010410 layer Substances 0.000 description 171
- 238000002347 injection Methods 0.000 description 35
- 239000007924 injection Substances 0.000 description 35
- 238000009792 diffusion process Methods 0.000 description 21
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 8
- 238000002513 implantation Methods 0.000 description 8
- 229910052710 silicon Inorganic materials 0.000 description 8
- 239000010703 silicon Substances 0.000 description 8
- 230000005684 electric field Effects 0.000 description 7
- 239000000758 substrate Substances 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 4
- 230000010355 oscillation Effects 0.000 description 4
- 239000011229 interlayer Substances 0.000 description 2
- 238000010998 test method Methods 0.000 description 2
- 230000003213 activating effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000005669 field effect Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
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- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/7801—DMOS transistors, i.e. MISFETs with a channel accommodating body or base region adjoining a drain drift region
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- H01L29/063—Reduced surface field [RESURF] pn-junction structures
- H01L29/0634—Multiple reduced surface field (multi-RESURF) structures, e.g. double RESURF, charge compensation, cool, superjunction (SJ), 3D-RESURF, composite buffer (CB) structures
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- H01L29/0852—Source or drain regions of field-effect devices of field-effect transistors with insulated gate of DMOS transistors
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- H01L29/66409—Unipolar field-effect transistors
- H01L29/66477—Unipolar field-effect transistors with an insulated gate, i.e. MISFET
- H01L29/66674—DMOS transistors, i.e. MISFETs with a channel accommodating body or base region adjoining a drain drift region
- H01L29/66712—Vertical DMOS transistors, i.e. VDMOS transistors
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- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/0684—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by the shape, relative sizes or dispositions of the semiconductor regions or junctions between the regions
- H01L29/0692—Surface layout
- H01L29/0696—Surface layout of cellular field-effect devices, e.g. multicellular DMOS transistors or IGBTs
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- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Composite Materials (AREA)
- Insulated Gate Type Field-Effect Transistor (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
Description
ゲート電極40は、ゲート絶縁膜43により半導体部10から電気的に絶縁される。また、ゲート電極40は、層間絶縁膜45によりソース電極20から電気的に絶縁される。
Claims (4)
- 第1導電形の第1半導体層と、第2導電形の第2半導体層と、を含む半導体部と、
前記半導体部に部分的に接した第1電極と、
前記半導体部を挟んで、前記第1電極の反対側に設けられた第2電極と、
前記半導体部と前記第1電極との間に設けられた制御電極と、
を備え、
前記第1半導体層および前記第2半導体層は、前記半導体部の前記第1電極に接する表面に沿った第1方向に交互に配置され、
前記半導体部は、前記第2半導体層と前記第1電極との間に設けられた第2導電形の第3半導体層と、前記第3半導体層と前記第1電極との間に選択的に設けられた第1導電形の第4半導体層と、をさらに含み、
前記第1半導体層は、第1導電形の不純物濃度が他の部分よりも低い第1低濃度部を含み、
前記第2半導体層は、前記第2半導体層と前記第3半導体層との境界と前記第2電極側の端との間に位置し、第2導電形の不純物濃度が他の部分よりも低い第2低濃度部含み、
前記第1低濃度部は、前記第2電極から前記第1電極へ向かう第2方向における前記第2低濃度部のレベルと同じ前記第2方向のレベルに位置し、
前記第2低濃度部から前記第3半導体層に至る前記第2方向に沿った第1距離と、前記第2半導体層の前記第2電極側の端から前記第2低濃度部に至る前記第2方向に沿った第2距離との比は、前記第1半導体層中を移動する、正孔の移動度と電子の移動度の比と略同一である半導体装置。 - 第1導電形の第1半導体層と、第2導電形の第2半導体層と、を含む半導体部と、
前記半導体部に部分的に接した第1電極と、
前記半導体部を挟んで、前記第1電極の反対側に設けられた第2電極と、
前記半導体部と前記第1電極との間に設けられた制御電極と、
を備え、
前記第1半導体層および前記第2半導体層は、前記半導体部の前記第1電極に接する表面に沿った第1方向に交互に配置され、
前記半導体部は、前記第2半導体層と前記第1電極との間に設けられた第2導電形の第3半導体層と、前記第3半導体層と前記第1電極との間に選択的に設けられた第1導電形の第4半導体層と、をさらに含み、
前記第1半導体層は、第1導電形の不純物濃度が他の部分よりも低い第1低濃度部を含み、
前記第2半導体層は、前記第2半導体層と前記第3半導体層との境界と前記第2電極側の端との間に位置し、第2導電形の不純物濃度が他の部分よりも低い第2低濃度部含み、
前記第1低濃度部は、前記第2電極から前記第1電極へ向かう第2方向における前記第2低濃度部のレベルと同じ前記第2方向のレベルに位置し、
前記第2低濃度部から前記第3半導体層に至る前記第2方向に沿った第1距離と、前記第2半導体層の前記第2電極側の端から前記第2低濃度部に至る前記第2方向に沿った第2距離との比は、1:3に設けられる半導体装置。 - 前記第1低濃度部および前記第2低濃度部に含まれる第1導電形の不純物の総量は、前記第1低濃度部および前記第2低濃度部に含まれる第2導電形の不純物の総量とバランスする請求項1または2に記載の半導体装置。
- 前記第1距離は、前記第2距離よりも短い請求項1〜3のいずれか1つに記載の半導体装置。
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JP2018169710A JP6833778B2 (ja) | 2018-09-11 | 2018-09-11 | 半導体装置 |
US16/357,567 US10971623B2 (en) | 2018-09-11 | 2019-03-19 | Semiconductor device and method for manufacturing the same |
US17/193,830 US20210193835A1 (en) | 2018-09-11 | 2021-03-05 | Semiconductor device and method for manufacturing the same |
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JP2018169710A JP6833778B2 (ja) | 2018-09-11 | 2018-09-11 | 半導体装置 |
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JP4843843B2 (ja) * | 2000-10-20 | 2011-12-21 | 富士電機株式会社 | 超接合半導体素子 |
JP4785335B2 (ja) | 2001-02-21 | 2011-10-05 | 三菱電機株式会社 | 半導体装置およびその製造方法 |
DE102006061994B4 (de) | 2006-12-21 | 2011-05-05 | Infineon Technologies Austria Ag | Ladungskompensationsbauelement mit einer Driftstrecke zwischen zwei Elektroden und Verfahren zur Herstellung desselben |
JP4564509B2 (ja) | 2007-04-05 | 2010-10-20 | 株式会社東芝 | 電力用半導体素子 |
JP2010045307A (ja) | 2008-08-18 | 2010-02-25 | Toshiba Corp | 電力用半導体装置 |
JP5863574B2 (ja) * | 2012-06-20 | 2016-02-16 | 株式会社東芝 | 半導体装置 |
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US20200083372A1 (en) | 2020-03-12 |
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