JP6806236B2 - 照明装置及び方法、露光装置及び方法、並びにデバイス製造方法 - Google Patents

照明装置及び方法、露光装置及び方法、並びにデバイス製造方法 Download PDF

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JP6806236B2
JP6806236B2 JP2019506258A JP2019506258A JP6806236B2 JP 6806236 B2 JP6806236 B2 JP 6806236B2 JP 2019506258 A JP2019506258 A JP 2019506258A JP 2019506258 A JP2019506258 A JP 2019506258A JP 6806236 B2 JP6806236 B2 JP 6806236B2
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illumination
illumination light
light
optical system
mask
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Japanese (ja)
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JPWO2018168993A1 (ja
Inventor
加藤　正紀
正紀 加藤
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Nikon Corp
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Nikon Corp
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/701—Off-axis setting using an aperture
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Microscoopes, Condenser (AREA)
JP2019506258A 2017-03-17 2018-03-15 照明装置及び方法、露光装置及び方法、並びにデバイス製造方法 Active JP6806236B2 (ja)

Applications Claiming Priority (3)

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JP2017052365 2017-03-17
JP2017052365 2017-03-17
PCT/JP2018/010204 WO2018168993A1 (ja) 2017-03-17 2018-03-15 照明装置及び方法、露光装置及び方法、並びにデバイス製造方法

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JP2020201771A Division JP7116368B2 (ja) 2017-03-17 2020-12-04 照明装置及び方法、露光装置及び方法、並びにデバイス製造方法

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JPWO2018168993A1 JPWO2018168993A1 (ja) 2019-12-19
JP6806236B2 true JP6806236B2 (ja) 2021-01-06

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JP2019506258A Active JP6806236B2 (ja) 2017-03-17 2018-03-15 照明装置及び方法、露光装置及び方法、並びにデバイス製造方法
JP2020201771A Active JP7116368B2 (ja) 2017-03-17 2020-12-04 照明装置及び方法、露光装置及び方法、並びにデバイス製造方法

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JP (2) JP6806236B2 (enExample)
KR (1) KR102315115B1 (enExample)
CN (1) CN110431487B (enExample)
WO (1) WO2018168993A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2021047444A (ja) * 2017-03-17 2021-03-25 株式会社ニコン 照明装置及び方法、露光装置及び方法、並びにデバイス製造方法

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110501868A (zh) * 2019-08-16 2019-11-26 银月光学(苏州)有限公司 投影系统、曝光设备
JP7550559B2 (ja) * 2020-07-27 2024-09-13 キヤノン株式会社 走査露光装置、走査露光方法および物品製造方法
JP7506571B2 (ja) * 2020-10-02 2024-06-26 レーザーテック株式会社 照明光学系、照明方法、及び検査装置

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5719704A (en) 1991-09-11 1998-02-17 Nikon Corporation Projection exposure apparatus
JP3360686B2 (ja) * 1990-12-27 2002-12-24 株式会社ニコン 照明光学装置および投影露光装置並びに露光方法および素子製造方法
JP3005203B2 (ja) * 1997-03-24 2000-01-31 キヤノン株式会社 照明装置、露光装置及びデバイス製造方法
JP4051473B2 (ja) * 1998-12-17 2008-02-27 株式会社ニコン 照明光学装置および該照明光学装置を備えた露光装置
KR20000048227A (ko) * 1998-12-17 2000-07-25 오노 시게오 이미지 투사 장치를 이용한 표면 조명 방법 및 조명 광학시스템
JP2000208396A (ja) * 1999-01-13 2000-07-28 Nikon Corp 視野絞り投影光学系及び投影露光装置
US6392742B1 (en) * 1999-06-01 2002-05-21 Canon Kabushiki Kaisha Illumination system and projection exposure apparatus
JP2001155993A (ja) * 1999-09-13 2001-06-08 Nikon Corp 照明光学装置及び該装置を備える投影露光装置
JP4649717B2 (ja) * 1999-10-01 2011-03-16 株式会社ニコン 露光方法及び露光装置、デバイス製造方法
JP3605064B2 (ja) * 2001-10-15 2004-12-22 株式会社ルネサステクノロジ フォーカスモニタ用フォトマスク、フォーカスモニタ方法、フォーカスモニタ用装置および装置の製造方法
JP3826047B2 (ja) * 2002-02-13 2006-09-27 キヤノン株式会社 露光装置、露光方法、及びそれを用いたデバイス製造方法
KR100629209B1 (ko) * 2002-05-23 2006-09-27 후지 샤신 필름 가부시기가이샤 레이저장치, 노광헤드, 노광장치 및 광섬유의 접속방법
JP5238879B2 (ja) * 2008-05-09 2013-07-17 カール・ツァイス・エスエムティー・ゲーエムベーハー フーリエ光学系を含む照明系
JP2014134591A (ja) * 2013-01-08 2014-07-24 Nikon Corp 照明装置、露光装置、照明方法及びデバイス製造方法
JP6806236B2 (ja) * 2017-03-17 2021-01-06 株式会社ニコン 照明装置及び方法、露光装置及び方法、並びにデバイス製造方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2021047444A (ja) * 2017-03-17 2021-03-25 株式会社ニコン 照明装置及び方法、露光装置及び方法、並びにデバイス製造方法
JP7116368B2 (ja) 2017-03-17 2022-08-10 株式会社ニコン 照明装置及び方法、露光装置及び方法、並びにデバイス製造方法

Also Published As

Publication number Publication date
JP7116368B2 (ja) 2022-08-10
JPWO2018168993A1 (ja) 2019-12-19
JP2021047444A (ja) 2021-03-25
CN110431487B (zh) 2021-08-10
CN110431487A (zh) 2019-11-08
KR102315115B1 (ko) 2021-10-21
KR20190117642A (ko) 2019-10-16
WO2018168993A1 (ja) 2018-09-20

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