CN110431487B - 照明装置及方法、曝光装置及方法、以及元件制造方法 - Google Patents

照明装置及方法、曝光装置及方法、以及元件制造方法 Download PDF

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Publication number
CN110431487B
CN110431487B CN201880018873.1A CN201880018873A CN110431487B CN 110431487 B CN110431487 B CN 110431487B CN 201880018873 A CN201880018873 A CN 201880018873A CN 110431487 B CN110431487 B CN 110431487B
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China
Prior art keywords
illumination
illumination light
light
optical system
mask
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CN201880018873.1A
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Chinese (zh)
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CN110431487A (zh
Inventor
加藤正纪
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Nikon Corp
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Nikon Corp
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/701—Off-axis setting using an aperture
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Microscoopes, Condenser (AREA)
CN201880018873.1A 2017-03-17 2018-03-15 照明装置及方法、曝光装置及方法、以及元件制造方法 Active CN110431487B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2017-052365 2017-03-17
JP2017052365 2017-03-17
PCT/JP2018/010204 WO2018168993A1 (ja) 2017-03-17 2018-03-15 照明装置及び方法、露光装置及び方法、並びにデバイス製造方法

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CN110431487A CN110431487A (zh) 2019-11-08
CN110431487B true CN110431487B (zh) 2021-08-10

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JP (2) JP6806236B2 (enExample)
KR (1) KR102315115B1 (enExample)
CN (1) CN110431487B (enExample)
WO (1) WO2018168993A1 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6806236B2 (ja) * 2017-03-17 2021-01-06 株式会社ニコン 照明装置及び方法、露光装置及び方法、並びにデバイス製造方法
CN110501868A (zh) * 2019-08-16 2019-11-26 银月光学(苏州)有限公司 投影系统、曝光设备
JP7550559B2 (ja) * 2020-07-27 2024-09-13 キヤノン株式会社 走査露光装置、走査露光方法および物品製造方法
JP7506571B2 (ja) * 2020-10-02 2024-06-26 レーザーテック株式会社 照明光学系、照明方法、及び検査装置

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000208396A (ja) * 1999-01-13 2000-07-28 Nikon Corp 視野絞り投影光学系及び投影露光装置
EP1014196A3 (en) * 1998-12-17 2002-05-29 Nikon Corporation Method and system of illumination for a projection optical apparatus
CN1412620A (zh) * 2001-10-15 2003-04-23 三菱电机株式会社 焦点监测用光掩模、监测方法、监测装置及其制造方法
CN1459645A (zh) * 2002-05-23 2003-12-03 富士胶片株式会社 激光装置、曝光头、曝光装置以及光纤的连接方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5719704A (en) 1991-09-11 1998-02-17 Nikon Corporation Projection exposure apparatus
JP3360686B2 (ja) * 1990-12-27 2002-12-24 株式会社ニコン 照明光学装置および投影露光装置並びに露光方法および素子製造方法
JP3005203B2 (ja) * 1997-03-24 2000-01-31 キヤノン株式会社 照明装置、露光装置及びデバイス製造方法
JP4051473B2 (ja) * 1998-12-17 2008-02-27 株式会社ニコン 照明光学装置および該照明光学装置を備えた露光装置
US6392742B1 (en) 1999-06-01 2002-05-21 Canon Kabushiki Kaisha Illumination system and projection exposure apparatus
JP2001155993A (ja) 1999-09-13 2001-06-08 Nikon Corp 照明光学装置及び該装置を備える投影露光装置
JP4649717B2 (ja) * 1999-10-01 2011-03-16 株式会社ニコン 露光方法及び露光装置、デバイス製造方法
JP3826047B2 (ja) * 2002-02-13 2006-09-27 キヤノン株式会社 露光装置、露光方法、及びそれを用いたデバイス製造方法
CN102084298B (zh) * 2008-05-09 2013-08-21 卡尔蔡司Smt有限责任公司 包括傅立叶光学系统的照明系统
JP2014134591A (ja) * 2013-01-08 2014-07-24 Nikon Corp 照明装置、露光装置、照明方法及びデバイス製造方法
JP6806236B2 (ja) * 2017-03-17 2021-01-06 株式会社ニコン 照明装置及び方法、露光装置及び方法、並びにデバイス製造方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1014196A3 (en) * 1998-12-17 2002-05-29 Nikon Corporation Method and system of illumination for a projection optical apparatus
JP2000208396A (ja) * 1999-01-13 2000-07-28 Nikon Corp 視野絞り投影光学系及び投影露光装置
CN1412620A (zh) * 2001-10-15 2003-04-23 三菱电机株式会社 焦点监测用光掩模、监测方法、监测装置及其制造方法
CN1459645A (zh) * 2002-05-23 2003-12-03 富士胶片株式会社 激光装置、曝光头、曝光装置以及光纤的连接方法

Also Published As

Publication number Publication date
JP7116368B2 (ja) 2022-08-10
KR20190117642A (ko) 2019-10-16
CN110431487A (zh) 2019-11-08
WO2018168993A1 (ja) 2018-09-20
KR102315115B1 (ko) 2021-10-21
JP6806236B2 (ja) 2021-01-06
JPWO2018168993A1 (ja) 2019-12-19
JP2021047444A (ja) 2021-03-25

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