KR102315115B1 - 조명 장치 및 방법, 노광 장치 및 방법, 및 디바이스 제조 방법 - Google Patents

조명 장치 및 방법, 노광 장치 및 방법, 및 디바이스 제조 방법 Download PDF

Info

Publication number
KR102315115B1
KR102315115B1 KR1020197026788A KR20197026788A KR102315115B1 KR 102315115 B1 KR102315115 B1 KR 102315115B1 KR 1020197026788 A KR1020197026788 A KR 1020197026788A KR 20197026788 A KR20197026788 A KR 20197026788A KR 102315115 B1 KR102315115 B1 KR 102315115B1
Authority
KR
South Korea
Prior art keywords
illumination
illumination light
light
optical system
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
KR1020197026788A
Other languages
English (en)
Korean (ko)
Other versions
KR20190117642A (ko
Inventor
마사키 가토
Original Assignee
가부시키가이샤 니콘
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가부시키가이샤 니콘 filed Critical 가부시키가이샤 니콘
Publication of KR20190117642A publication Critical patent/KR20190117642A/ko
Application granted granted Critical
Publication of KR102315115B1 publication Critical patent/KR102315115B1/ko
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/701—Off-axis setting using an aperture
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Microscoopes, Condenser (AREA)
KR1020197026788A 2017-03-17 2018-03-15 조명 장치 및 방법, 노광 장치 및 방법, 및 디바이스 제조 방법 Active KR102315115B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2017-052365 2017-03-17
JP2017052365 2017-03-17
PCT/JP2018/010204 WO2018168993A1 (ja) 2017-03-17 2018-03-15 照明装置及び方法、露光装置及び方法、並びにデバイス製造方法

Publications (2)

Publication Number Publication Date
KR20190117642A KR20190117642A (ko) 2019-10-16
KR102315115B1 true KR102315115B1 (ko) 2021-10-21

Family

ID=63523155

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020197026788A Active KR102315115B1 (ko) 2017-03-17 2018-03-15 조명 장치 및 방법, 노광 장치 및 방법, 및 디바이스 제조 방법

Country Status (4)

Country Link
JP (2) JP6806236B2 (enExample)
KR (1) KR102315115B1 (enExample)
CN (1) CN110431487B (enExample)
WO (1) WO2018168993A1 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6806236B2 (ja) * 2017-03-17 2021-01-06 株式会社ニコン 照明装置及び方法、露光装置及び方法、並びにデバイス製造方法
CN110501868A (zh) * 2019-08-16 2019-11-26 银月光学(苏州)有限公司 投影系统、曝光设备
JP7550559B2 (ja) * 2020-07-27 2024-09-13 キヤノン株式会社 走査露光装置、走査露光方法および物品製造方法
JP7506571B2 (ja) * 2020-10-02 2024-06-26 レーザーテック株式会社 照明光学系、照明方法、及び検査装置

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000182933A (ja) * 1998-12-17 2000-06-30 Nikon Corp 照明光学装置および該照明光学装置を備えた露光装置
JP2000208396A (ja) * 1999-01-13 2000-07-28 Nikon Corp 視野絞り投影光学系及び投影露光装置
JP2001155993A (ja) 1999-09-13 2001-06-08 Nikon Corp 照明光学装置及び該装置を備える投影露光装置
US6392742B1 (en) 1999-06-01 2002-05-21 Canon Kabushiki Kaisha Illumination system and projection exposure apparatus

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5719704A (en) 1991-09-11 1998-02-17 Nikon Corporation Projection exposure apparatus
JP3360686B2 (ja) * 1990-12-27 2002-12-24 株式会社ニコン 照明光学装置および投影露光装置並びに露光方法および素子製造方法
JP3005203B2 (ja) * 1997-03-24 2000-01-31 キヤノン株式会社 照明装置、露光装置及びデバイス製造方法
KR20000048227A (ko) * 1998-12-17 2000-07-25 오노 시게오 이미지 투사 장치를 이용한 표면 조명 방법 및 조명 광학시스템
JP4649717B2 (ja) * 1999-10-01 2011-03-16 株式会社ニコン 露光方法及び露光装置、デバイス製造方法
JP3605064B2 (ja) * 2001-10-15 2004-12-22 株式会社ルネサステクノロジ フォーカスモニタ用フォトマスク、フォーカスモニタ方法、フォーカスモニタ用装置および装置の製造方法
JP3826047B2 (ja) * 2002-02-13 2006-09-27 キヤノン株式会社 露光装置、露光方法、及びそれを用いたデバイス製造方法
KR100629209B1 (ko) * 2002-05-23 2006-09-27 후지 샤신 필름 가부시기가이샤 레이저장치, 노광헤드, 노광장치 및 광섬유의 접속방법
JP5238879B2 (ja) * 2008-05-09 2013-07-17 カール・ツァイス・エスエムティー・ゲーエムベーハー フーリエ光学系を含む照明系
JP2014134591A (ja) * 2013-01-08 2014-07-24 Nikon Corp 照明装置、露光装置、照明方法及びデバイス製造方法
JP6806236B2 (ja) * 2017-03-17 2021-01-06 株式会社ニコン 照明装置及び方法、露光装置及び方法、並びにデバイス製造方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000182933A (ja) * 1998-12-17 2000-06-30 Nikon Corp 照明光学装置および該照明光学装置を備えた露光装置
JP2000208396A (ja) * 1999-01-13 2000-07-28 Nikon Corp 視野絞り投影光学系及び投影露光装置
US6392742B1 (en) 1999-06-01 2002-05-21 Canon Kabushiki Kaisha Illumination system and projection exposure apparatus
JP2001155993A (ja) 1999-09-13 2001-06-08 Nikon Corp 照明光学装置及び該装置を備える投影露光装置

Also Published As

Publication number Publication date
JP7116368B2 (ja) 2022-08-10
JPWO2018168993A1 (ja) 2019-12-19
JP2021047444A (ja) 2021-03-25
CN110431487B (zh) 2021-08-10
JP6806236B2 (ja) 2021-01-06
CN110431487A (zh) 2019-11-08
KR20190117642A (ko) 2019-10-16
WO2018168993A1 (ja) 2018-09-20

Similar Documents

Publication Publication Date Title
JP6343344B2 (ja) マイクロリソグラフィ投影露光装置の照明系
JP7116368B2 (ja) 照明装置及び方法、露光装置及び方法、並びにデバイス製造方法
KR101578560B1 (ko) 옵티컬 인테그레이터 시스템, 조명 광학 장치, 노광 장치, 및 디바이스 제조 방법
US7551261B2 (en) Illumination system for a microlithography projection exposure installation
US20080111983A1 (en) Illumination System for a Microlithographic Projection Exposure Apparatus
US8330938B2 (en) Solid-state array for lithography illumination
TW202023069A (zh) 光源裝置、照明裝置、曝光裝置及製造物件之方法
US8520188B2 (en) Illumination apparatus for efficiently gathering illumination light
JP5182588B2 (ja) オプティカルインテグレータ、照明光学系、露光装置、およびデバイス製造方法
JP5326733B2 (ja) 照明光学系、露光装置、およびデバイス製造方法
JP2010097975A (ja) 補正ユニット、照明光学系、露光装置、およびデバイス製造方法
CN112352203A (zh) 具有校正特征的光均质化元件
JP7353894B2 (ja) 光源装置、照明装置、露光装置及び物品の製造方法
JP5201061B2 (ja) 補正フィルター、照明光学系、露光装置、およびデバイス製造方法
US10459343B2 (en) Illumination device
JP5190804B2 (ja) 減光ユニット、照明光学系、露光装置、およびデバイス製造方法
JP5366019B2 (ja) 伝送光学系、照明光学系、露光装置、およびデバイス製造方法
JP2010067943A (ja) 補正ユニット、照明光学系、露光装置、およびデバイス製造方法
JP2010040617A (ja) オプティカルインテグレータ、照明光学系、露光装置、およびデバイス製造方法
WO2024142970A1 (ja) 照明光学系、露光装置、及びデバイス製造方法
JP2010027876A (ja) 減光ユニット、照明光学系、露光装置、およびデバイス製造方法
JP2012059848A (ja) 偏光変換ユニット、照明光学系、露光装置、およびデバイス製造方法

Legal Events

Date Code Title Description
A201 Request for examination
PA0105 International application

St.27 status event code: A-0-1-A10-A15-nap-PA0105

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

D13-X000 Search requested

St.27 status event code: A-1-2-D10-D13-srh-X000

D14-X000 Search report completed

St.27 status event code: A-1-2-D10-D14-srh-X000

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

E13-X000 Pre-grant limitation requested

St.27 status event code: A-2-3-E10-E13-lim-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U12-oth-PR1002

Fee payment year number: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

R18-X000 Changes to party contact information recorded

St.27 status event code: A-5-5-R10-R18-oth-X000

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 4

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 5

U11 Full renewal or maintenance fee paid

Free format text: ST27 STATUS EVENT CODE: A-4-4-U10-U11-OTH-PR1001 (AS PROVIDED BY THE NATIONAL OFFICE)

Year of fee payment: 5