JP6772804B2 - プラズマ光源システム - Google Patents
プラズマ光源システム Download PDFInfo
- Publication number
- JP6772804B2 JP6772804B2 JP2016240114A JP2016240114A JP6772804B2 JP 6772804 B2 JP6772804 B2 JP 6772804B2 JP 2016240114 A JP2016240114 A JP 2016240114A JP 2016240114 A JP2016240114 A JP 2016240114A JP 6772804 B2 JP6772804 B2 JP 6772804B2
- Authority
- JP
- Japan
- Prior art keywords
- plasma
- light source
- light
- electrode
- center electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 230000003287 optical effect Effects 0.000 claims description 74
- 210000002381 plasma Anatomy 0.000 description 200
- 238000010586 diagram Methods 0.000 description 10
- 239000003990 capacitor Substances 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 238000002679 ablation Methods 0.000 description 4
- 238000004146 energy storage Methods 0.000 description 4
- 239000012212 insulator Substances 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 238000012986 modification Methods 0.000 description 4
- 230000004048 modification Effects 0.000 description 4
- 238000012546 transfer Methods 0.000 description 4
- 238000011144 upstream manufacturing Methods 0.000 description 4
- 238000013459 approach Methods 0.000 description 3
- 230000000903 blocking effect Effects 0.000 description 3
- 239000004020 conductor Substances 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 2
- 238000009434 installation Methods 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 229910052744 lithium Inorganic materials 0.000 description 2
- 239000000155 melt Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 230000007935 neutral effect Effects 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 239000003870 refractory metal Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 229910052688 Gadolinium Inorganic materials 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 229910052771 Terbium Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 230000002238 attenuated effect Effects 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000005485 electric heating Methods 0.000 description 1
- UIWYJDYFSGRHKR-UHFFFAOYSA-N gadolinium atom Chemical compound [Gd] UIWYJDYFSGRHKR-UHFFFAOYSA-N 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000000608 laser ablation Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
- GZCRRIHWUXGPOV-UHFFFAOYSA-N terbium atom Chemical compound [Tb] GZCRRIHWUXGPOV-UHFFFAOYSA-N 0.000 description 1
- 230000003685 thermal hair damage Effects 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
Images
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- X-Ray Techniques (AREA)
- Plasma Technology (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Description
Claims (3)
- 発光点が1つの光路上に並ぶように配列し、順次発光する複数のプラズマ光源と、
前記複数のプラズマ光源のうちの互いに隣接する2つの間に設けられ、当該2つのプラズマ光源のうちの一方の発光点から放出された極端紫外光を他方の発光点に集光する集光光学系と
を有する線形光源を備え、
各プラズマ光源は、
単一の軸線上に延びる中心電極および前記中心電極の外周を囲むように設けられる外部電極を有し、対称面を挟んで互いに対向配置され、極端紫外光を放射するプラズマを発生すると共に前記プラズマを閉じ込める一対の同軸状電極と、
前記プラズマの媒体を、前記中心電極と前記外部電極の間に供給する媒体供給部と、
各前記同軸状電極に対して放電電圧を印加する電圧印加装置と
を有するプラズマ光源システム。 - 前記線形光源はその光路を所定の中心点に向けて複数設けられ、
前記中心点には各線形光源から放出された極端紫外光を単一の集光点に集光する回転ミラーが設けられ、
全ての前記プラズマ光源のうちの1つのプラズマ光源が発光するとき、そのうちの残りのプラズマ光源は発光を停止している、請求項1に記載のプラズマ光源システム。 - 前記線形光源は、その光路の最上流に設置された反射ミラーを更に有する、請求項1又は2に記載のプラズマ光源システム。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016240114A JP6772804B2 (ja) | 2016-12-12 | 2016-12-12 | プラズマ光源システム |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016240114A JP6772804B2 (ja) | 2016-12-12 | 2016-12-12 | プラズマ光源システム |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2018097105A JP2018097105A (ja) | 2018-06-21 |
JP6772804B2 true JP6772804B2 (ja) | 2020-10-21 |
Family
ID=62633494
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2016240114A Expired - Fee Related JP6772804B2 (ja) | 2016-12-12 | 2016-12-12 | プラズマ光源システム |
Country Status (1)
Country | Link |
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JP (1) | JP6772804B2 (ja) |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3791441B2 (ja) * | 2002-03-27 | 2006-06-28 | ウシオ電機株式会社 | 極端紫外光発生装置 |
US7342644B2 (en) * | 2004-12-29 | 2008-03-11 | Asml Netherlands B.V. | Methods and systems for lithographic beam generation |
CN102484938B (zh) * | 2009-09-01 | 2014-12-10 | 株式会社Ihi | 等离子体光源 |
WO2011027699A1 (ja) * | 2009-09-01 | 2011-03-10 | 株式会社Ihi | プラズマ光源システム |
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2016
- 2016-12-12 JP JP2016240114A patent/JP6772804B2/ja not_active Expired - Fee Related
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JP2018097105A (ja) | 2018-06-21 |
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