JP6760479B2 - ノッチフィルタ - Google Patents
ノッチフィルタ Download PDFInfo
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- JP6760479B2 JP6760479B2 JP2019505846A JP2019505846A JP6760479B2 JP 6760479 B2 JP6760479 B2 JP 6760479B2 JP 2019505846 A JP2019505846 A JP 2019505846A JP 2019505846 A JP2019505846 A JP 2019505846A JP 6760479 B2 JP6760479 B2 JP 6760479B2
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- 239000010408 film Substances 0.000 claims description 25
- 239000010409 thin film Substances 0.000 claims description 25
- 239000000758 substrate Substances 0.000 claims description 19
- 230000001902 propagating effect Effects 0.000 claims description 18
- 230000000052 comparative effect Effects 0.000 description 41
- 238000010586 diagram Methods 0.000 description 30
- 239000000463 material Substances 0.000 description 6
- 230000000903 blocking effect Effects 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- 229910013641 LiNbO 3 Inorganic materials 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 238000010897 surface acoustic wave method Methods 0.000 description 1
- 229910001936 tantalum oxide Inorganic materials 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/46—Filters
- H03H9/54—Filters comprising resonators of piezo-electric or electrostrictive material
- H03H9/547—Notch filters, e.g. notch BAW or thin film resonator filters
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/02535—Details of surface acoustic wave devices
- H03H9/02543—Characteristics of substrate, e.g. cutting angles
- H03H9/02574—Characteristics of substrate, e.g. cutting angles of combined substrates, multilayered substrates, piezoelectrical layers on not-piezoelectrical substrate
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/125—Driving means, e.g. electrodes, coils
- H03H9/13—Driving means, e.g. electrodes, coils for networks consisting of piezoelectric or electrostrictive materials
- H03H9/132—Driving means, e.g. electrodes, coils for networks consisting of piezoelectric or electrostrictive materials characterized by a particular shape
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/15—Constructional features of resonators consisting of piezoelectric or electrostrictive material
- H03H9/17—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/46—Filters
- H03H9/64—Filters using surface acoustic waves
- H03H9/6406—Filters characterised by a particular frequency characteristic
- H03H9/6409—SAW notch filters
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/46—Filters
- H03H9/64—Filters using surface acoustic waves
- H03H9/6423—Means for obtaining a particular transfer characteristic
- H03H9/6433—Coupled resonator filters
- H03H9/6483—Ladder SAW filters
Description
2…圧電薄膜
3…低音速膜
4…高音速部材
5…IDT電極
6a,7a…第1,第2のバスバー
6b,7b…第1,第2の電極指
8,9…第1,第2の端子
12…圧電性を有する基板
16,17…反射器
16b,17b…電極指
L…インダクタ
P1,S1,S2…弾性波共振子
Claims (6)
- 高音速部材と、前記高音速部材上に設けられた低音速膜と、前記低音速膜上に設けられた圧電薄膜と、で構成されており、前記低音速膜を伝搬するバルク波の音速は、前記圧電薄膜を伝搬する弾性波の音速よりも低く、前記高音速部材を伝搬するバルク波の音速は、前記圧電薄膜を伝搬する弾性波の音速よりも高い、圧電性を有する基板と、
前記圧電性を有する基板の前記圧電薄膜上に設けられているIDT電極と、
前記圧電性を有する基板の前記圧電薄膜上において、前記IDT電極の弾性波伝搬方向両側に設けられている反射器と、
を備え、
前記IDT電極及び前記反射器がそれぞれ電極指を有し、
前記IDT電極の電極指ピッチにより規定される波長をλとしたときに、前記IDT電極の前記電極指のうち最も前記反射器側に位置する電極指と、前記反射器の前記電極指のうち最も前記IDT電極側に位置する電極指との電極指中心間距離をIRギャップGIRとしたときに、前記IRギャップGIRが0.1λ≦GIR<0.5λ及び0.5λ<GIR≦0.9λのうち一方の範囲内である、ノッチフィルタ。 - 前記IRギャップGIRが、0.4λ≦GIR<0.5λ及び0.5λ<GIR≦0.6λのうち一方の範囲内である、請求項1に記載のノッチフィルタ。
- 前記IRギャップGIRが、0.2λ≦GIR≦0.4λ及び0.6λ≦GIR≦0.8λのうち一方の範囲内である、請求項1に記載のノッチフィルタ。
- 前記反射器の前記電極指の本数が21本以下である、請求項1〜3のいずれか1項に記載のノッチフィルタ。
- 前記反射器の電極指ピッチにより規定される波長をλRとしたときに、0.91λ≦λR≦5λである、請求項1〜4のいずれか1項に記載のノッチフィルタ。
- 前記高音速部材は、支持基板と、前記支持基板上に形成されており、前記圧電薄膜を伝搬する弾性波の音速より伝搬するバルク波の音速が高い高音速膜と、で構成される、請求項1〜5のいずれか1項に記載のノッチフィルタ。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017047417 | 2017-03-13 | ||
JP2017047417 | 2017-03-13 | ||
PCT/JP2018/007180 WO2018168439A1 (ja) | 2017-03-13 | 2018-02-27 | ノッチフィルタ |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2018168439A1 JPWO2018168439A1 (ja) | 2019-07-25 |
JP6760479B2 true JP6760479B2 (ja) | 2020-09-23 |
Family
ID=63522168
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2019505846A Active JP6760479B2 (ja) | 2017-03-13 | 2018-02-27 | ノッチフィルタ |
Country Status (4)
Country | Link |
---|---|
US (1) | US11043933B2 (ja) |
JP (1) | JP6760479B2 (ja) |
CN (1) | CN110383688B (ja) |
WO (1) | WO2018168439A1 (ja) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20220116015A1 (en) | 2018-06-15 | 2022-04-14 | Resonant Inc. | Transversely-excited film bulk acoustic resonator with optimized electrode thickness, mark, and pitch |
US11323096B2 (en) | 2018-06-15 | 2022-05-03 | Resonant Inc. | Transversely-excited film bulk acoustic resonator with periodic etched holes |
US20210328574A1 (en) * | 2020-04-20 | 2021-10-21 | Resonant Inc. | Small transversely-excited film bulk acoustic resonators with enhanced q-factor |
US11929731B2 (en) | 2018-02-18 | 2024-03-12 | Murata Manufacturing Co., Ltd. | Transversely-excited film bulk acoustic resonator with optimized electrode mark, and pitch |
US11349452B2 (en) | 2018-06-15 | 2022-05-31 | Resonant Inc. | Transversely-excited film bulk acoustic filters with symmetric layout |
US11264966B2 (en) | 2018-06-15 | 2022-03-01 | Resonant Inc. | Solidly-mounted transversely-excited film bulk acoustic resonator with diamond layers in Bragg reflector stack |
US11811391B2 (en) | 2020-05-04 | 2023-11-07 | Murata Manufacturing Co., Ltd. | Transversely-excited film bulk acoustic resonator with etched conductor patterns |
WO2022009692A1 (ja) * | 2020-07-08 | 2022-01-13 | 株式会社村田製作所 | マルチプレクサ |
US11264969B1 (en) | 2020-08-06 | 2022-03-01 | Resonant Inc. | Transversely-excited film bulk acoustic resonator comprising small cells |
US11271539B1 (en) | 2020-08-19 | 2022-03-08 | Resonant Inc. | Transversely-excited film bulk acoustic resonator with tether-supported diaphragm |
US11658639B2 (en) | 2020-10-05 | 2023-05-23 | Murata Manufacturing Co., Ltd. | Transversely-excited film bulk acoustic resonator matrix filters with noncontiguous passband |
US11405017B2 (en) | 2020-10-05 | 2022-08-02 | Resonant Inc. | Acoustic matrix filters and radios using acoustic matrix filters |
US11476834B2 (en) | 2020-10-05 | 2022-10-18 | Resonant Inc. | Transversely-excited film bulk acoustic resonator matrix filters with switches in parallel with sub-filter shunt capacitors |
US11728784B2 (en) | 2020-10-05 | 2023-08-15 | Murata Manufacturing Co., Ltd. | Transversely-excited film bulk acoustic resonator matrix filters with split die sub-filters |
US11239816B1 (en) | 2021-01-15 | 2022-02-01 | Resonant Inc. | Decoupled transversely-excited film bulk acoustic resonators |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3614234B2 (ja) | 1996-03-14 | 2005-01-26 | 沖電気工業株式会社 | 共振器型弾性表面波フィルタ |
JPH11220354A (ja) * | 1997-11-25 | 1999-08-10 | Matsushita Electric Ind Co Ltd | 弾性表面波ノッチフィルタ |
JP3419339B2 (ja) * | 1999-03-11 | 2003-06-23 | 株式会社村田製作所 | 弾性表面波フィルタ、デュプレクサ、通信機装置 |
JP3971604B2 (ja) * | 2000-12-21 | 2007-09-05 | 京セラ株式会社 | 弾性表面波フィルタ |
JP2012257050A (ja) | 2011-06-08 | 2012-12-27 | Nippon Dempa Kogyo Co Ltd | ハイパス型のノッチフィルタ及びこのフィルタを備えた電子機器 |
WO2015080278A1 (ja) * | 2013-11-29 | 2015-06-04 | 京セラ株式会社 | 弾性波素子、分波器および通信装置 |
CN107710614B (zh) * | 2015-06-24 | 2021-05-28 | 株式会社村田制作所 | 弹性波滤波器、多工器、双工器、高频前端电路以及通信装置 |
-
2018
- 2018-02-27 CN CN201880016518.0A patent/CN110383688B/zh active Active
- 2018-02-27 WO PCT/JP2018/007180 patent/WO2018168439A1/ja active Application Filing
- 2018-02-27 JP JP2019505846A patent/JP6760479B2/ja active Active
-
2019
- 2019-08-23 US US16/548,894 patent/US11043933B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
US11043933B2 (en) | 2021-06-22 |
JPWO2018168439A1 (ja) | 2019-07-25 |
CN110383688A (zh) | 2019-10-25 |
CN110383688B (zh) | 2023-01-24 |
US20190379351A1 (en) | 2019-12-12 |
WO2018168439A1 (ja) | 2018-09-20 |
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