JP6719567B2 - キャリアを搬送するための装置、基板を真空処理するためのシステム、及び真空チャンバ内でキャリアを搬送するための方法 - Google Patents
キャリアを搬送するための装置、基板を真空処理するためのシステム、及び真空チャンバ内でキャリアを搬送するための方法 Download PDFInfo
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Description
Claims (15)
- 真空チャンバ(101)内でキャリア(10)を搬送するための装置(100)であって、
第1の搬送経路(T1)に沿って搬送方向(T)に設けられ、下側トラックセクション(121)と上側トラックセクション(122)を備えた、第1の搬送システム(112)であって、前記第1の搬送経路に沿って前記搬送方向に前記キャリアを非接触方式で搬送するように構成された、第1の搬送システム(112)、
前記第1の搬送経路(T1)から離れるように経路切り替え方向(S)へ前記キャリアを移動させるための経路切り替えアセンブリ(150)、及び
前記下側トラックセクション(121)と前記上側トラックセクション(122)との間の距離を変更するためのアクチュエータ(125)を備え、
前記非接触方式の搬送の間、前記キャリア(10)と前記上側トラックセクション(122)との間、及び、前記キャリア(10)と前記下側トラックセクション(121)との間に、間隙が設けられる、装置。 - 前記経路切り替えアセンブリ(150)が、キャリア保持部分(152)であって、前記キャリア保持部分(152)によって保持された前記キャリア(10)を前記経路切り替え方向(S)に移動するために前記経路切り替え方向(S)に可動である、キャリア保持部分(152)を備える、請求項1に記載の装置。
- 前記アクチュエータ(125)が、前記キャリア保持部分(152)上に前記キャリアを配置するために前記下側トラックセクション(121)上に支持された前記キャリア(10)を有する前記下側トラックセクション(121)を下げること、前記上側トラックセクション(122)から離れるように下向きの方向へ前記下側トラックセクション(121)を移動させること、及び前記下側トラックセクション(121)から離れるように上向きの方向へ前記上側トラックセクション(122)を移動させること、から成る群から選択された少なくとも1つを行うように構成されている、請求項2に記載の装置。
- 前記第1の搬送経路(T1)から水平方向にオフセットされた第2の搬送経路(T2)に沿って設けられた第2の搬送システム(114)を更に備え、前記経路切り替えアセンブリ(150)のキャリア保持部分(152)が、前記第1の搬送経路(T1)から前記第2の搬送経路(T2)と前記第1及び第2の搬送経路から水平方向にオフセットされた処理位置(T3)のうちの少なくとも一方へ、前記経路切り替え方向(S)に可動である、請求項1から3のいずれか一項に記載の装置。
- 前記第2の搬送システム(114)が、垂直方向(V)に可動な第2の下側トラックセクション(123)を備える、請求項4に記載の装置。
- 前記第1の搬送システム(112)が、前記下側トラックセクション(121)の上方へ距離をおいて前記キャリアを非接触方式で保持するように構成された第1の磁気浮揚システムであり、前記下側トラックセクション(121)が、キャリア支持体であって、前記キャリア支持体上に前記キャリアを機械的に支持するための、キャリア支持体を更に備える、請求項1から5のいずれか一項に記載の装置。
- 前記経路切り替えアセンブリ(150)が、前記キャリア(10)の上側部分を保持すること及び安定化することから成る群のうちの少なくとも一方を行うように構成された上側保持デバイス(154)であって、少なくとも前記経路切り替え方向(S)に可動である、上側保持デバイス(154)を備える、請求項1から6のいずれか一項に記載の装置。
- 前記上側保持デバイス(154)が、第1のサイドから前記キャリア(10)の前記上側部分に反発する磁力を加えるための第1の磁石ユニット(302)、及び前記第1のサイドとは反対側の第2のサイドから前記キャリア(10)の前記上側部分に反発する磁力を加えるための第2の磁石ユニット(304)を備える、請求項7に記載の装置。
- 前記下側トラックセクション(121)と前記経路切り替えアセンブリ(150)のキャリア保持部分(152)が、下方から前記キャリア(10)を支持するように構成されている、請求項2から8のいずれか一項に記載の装置。
- 基板を真空処理するためのシステムであって、
真空チャンバ(101)、
請求項1から9のいずれか一項に記載の装置(100)、並びに
堆積源、スパッタ源、蒸発源、表面処理ツール、加熱デバイス、洗浄デバイス、エッチングツール、及びそれらの組み合わせから成る群から選択された、前記真空チャンバ(101)内に配置された1以上の処理ツール(105)を備える、システム。 - 真空チャンバ内でキャリアを搬送するための方法であって、
第1の搬送システム(112)の下側トラックセクション(121)と上側トラックセクション(122)との間で第1の搬送経路(T1)に沿って搬送方向(T)にキャリア(10)を非接触方式で搬送すること、
前記下側トラックセクション(121)と前記上側トラックセクション(122)との間の距離を増加させること、及び
前記第1の搬送経路(T1)から離れるように前記搬送方向(T)を横切る経路切り替え方向(S)へ、前記キャリアを移動させることを含み、
前記非接触方式の搬送の間、前記キャリア(10)と前記上側トラックセクション(122)との間、及び、前記キャリア(10)と前記下側トラックセクション(121)との間に、間隙が設けられる、方法。 - 真空チャンバ内でキャリアを搬送するための方法であって、
第1の搬送経路(T1)に沿って搬送方向(T)にキャリア(10)を非接触方式で搬送すること、並びに
前記キャリアを下げること、経路切り替え方向(S)に前記キャリアを移動させること、及び前記キャリアを持ち上げることを含む、前記第1の搬送経路(T1)から水平方向にオフセットされた第2の搬送経路(T2)へ前記キャリアを移動させることを含み、
前記非接触方式の搬送の間、前記キャリア(10)と上側トラックセクション(122)との間、及び、前記キャリア(10)と下側トラックセクション(121)との間に、間隙が設けられる、方法。 - 前記キャリア(10)を下げることが、
前記第1の搬送経路(T1)に沿って設けられた第1の搬送システム(112)の下側トラックセクション(121)上に前記キャリアを配置すること、及び
前記下側トラックセクション(121)を下向きの方向へ移動させることを含む、請求項12に記載の方法。 - 前記キャリアが、経路切り替えアセンブリ(150)のキャリア保持部分(152)上に下げられ、前記経路切り替えアセンブリ(150)が、前記キャリア保持部分(152)上に支持された前記キャリアを前記経路切り替え方向(S)に移動させる、請求項12又は13に記載の方法。
- 前記キャリアを持ち上げることが、
前記キャリアが、前記キャリア保持部分(152)から持ち上げられ、前記キャリア保持部分(152)の上方の所定の高さに配置されるまで、前記第2の搬送経路(T2)に沿って設けられた第2の搬送システム(114)の第2の下側トラックセクション(123)を上向きの方向へ移動させることを含む、請求項14に記載の方法。
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PCT/EP2017/071447 WO2019037871A1 (en) | 2017-08-25 | 2017-08-25 | APPARATUS FOR TRANSPORTING A CARRIER, SYSTEM FOR VACUUM PROCESSING OF A SUBSTRATE, AND METHOD FOR TRANSPORTING A SUBSTRATE CARRIER IN A VACUUM CHAMBER |
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JP6766189B2 (ja) * | 2017-08-25 | 2020-10-07 | アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated | キャリアを上げ又は下げるためのアセンブリ、真空チャンバ内でキャリアを搬送するための装置、及びキャリアを上げる又は下げるための方法 |
WO2020200443A1 (en) * | 2019-04-03 | 2020-10-08 | Applied Materials, Inc. | Carrier transport system, vacuum deposition system, and method of transporting a carrier in a vacuum chamber |
CN218089795U (zh) * | 2022-06-23 | 2022-12-20 | 拉普拉斯(无锡)半导体科技有限公司 | 一种真空腔体的变距结构 |
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EP1973154B1 (de) * | 2007-03-13 | 2012-04-25 | Applied Materials, Inc. | Vorrichtung zum Bewegen eines Carriers in einer Vakuumkammer |
JP5059583B2 (ja) * | 2007-12-26 | 2012-10-24 | 東京エレクトロン株式会社 | 真空装置、真空処理システムおよび真空室の圧力制御方法 |
US20090324368A1 (en) * | 2008-06-27 | 2009-12-31 | Applied Materials, Inc. | Processing system and method of operating a processing system |
KR101243743B1 (ko) * | 2010-02-18 | 2013-03-13 | 주식회사 아바코 | 기판 이송 장치, 기판 처리 장치 및 이를 이용한 기판 처리 방법 |
US10062600B2 (en) * | 2012-04-26 | 2018-08-28 | Intevac, Inc. | System and method for bi-facial processing of substrates |
KR102192244B1 (ko) * | 2013-12-30 | 2020-12-17 | 삼성디스플레이 주식회사 | 기판 이송장치 |
US9899635B2 (en) * | 2014-02-04 | 2018-02-20 | Applied Materials, Inc. | System for depositing one or more layers on a substrate supported by a carrier and method using the same |
WO2017125123A1 (en) * | 2016-01-18 | 2017-07-27 | Applied Materials, Inc. | Apparatus for transportation of a substrate carrier in a vacuum chamber, system for vacuum processing of a substrate, and method for transportation of a substrate carrier in a vacuum chamber |
-
2017
- 2017-08-25 WO PCT/EP2017/071447 patent/WO2019037871A1/en active Application Filing
- 2017-08-25 JP JP2018538584A patent/JP6719567B2/ja active Active
- 2017-08-25 KR KR1020187024096A patent/KR102107369B1/ko active IP Right Grant
- 2017-08-25 CN CN201780031568.1A patent/CN109715849B/zh active Active
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TWI678756B (zh) | 2019-12-01 |
CN109715849A (zh) | 2019-05-03 |
TW201913860A (zh) | 2019-04-01 |
KR20190087984A (ko) | 2019-07-25 |
JP2019531590A (ja) | 2019-10-31 |
CN109715849B (zh) | 2020-12-22 |
KR102107369B1 (ko) | 2020-05-07 |
WO2019037871A1 (en) | 2019-02-28 |
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