JP6689959B2 - 基板処理装置、処理システム及び半導体装置の製造方法 - Google Patents
基板処理装置、処理システム及び半導体装置の製造方法 Download PDFInfo
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- JP6689959B2 JP6689959B2 JP2018508822A JP2018508822A JP6689959B2 JP 6689959 B2 JP6689959 B2 JP 6689959B2 JP 2018508822 A JP2018508822 A JP 2018508822A JP 2018508822 A JP2018508822 A JP 2018508822A JP 6689959 B2 JP6689959 B2 JP 6689959B2
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- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Retry When Errors Occur (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016068476 | 2016-03-30 | ||
| JP2016068476 | 2016-03-30 | ||
| PCT/JP2017/007808 WO2017169464A1 (fr) | 2016-03-30 | 2017-02-28 | Dispositif de traitement de substrat et système de traitement |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2017169464A1 JPWO2017169464A1 (ja) | 2018-12-20 |
| JP6689959B2 true JP6689959B2 (ja) | 2020-04-28 |
Family
ID=59964019
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018508822A Active JP6689959B2 (ja) | 2016-03-30 | 2017-02-28 | 基板処理装置、処理システム及び半導体装置の製造方法 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP6689959B2 (fr) |
| WO (1) | WO2017169464A1 (fr) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2020077666A (ja) * | 2018-11-05 | 2020-05-21 | 株式会社Ｋｏｋｕｓａｉ Ｅｌｅｃｔｒｉｃ | 基板処理装置、半導体装置の製造方法、プログラムおよび記録媒体 |
| JP7382769B2 (ja) | 2019-09-20 | 2023-11-17 | 株式会社Ｓｃｒｅｅｎホールディングス | 基板処理方法 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA2307212A1 (fr) * | 1997-11-03 | 1999-05-14 | Gateway, Inc. | Copie de sauvegarde automatique en fonction de l'etat de l'unite de disque |
| JP5281037B2 (ja) * | 2008-03-18 | 2013-09-04 | 株式会社日立国際電気 | 基板処理システム、基板処理システムの表示方法及びそのプログラム |
-
2017
- 2017-02-28 JP JP2018508822A patent/JP6689959B2/ja active Active
- 2017-02-28 WO PCT/JP2017/007808 patent/WO2017169464A1/fr active Application Filing
Also Published As
| Publication number | Publication date |
|---|---|
| JPWO2017169464A1 (ja) | 2018-12-20 |
| WO2017169464A1 (fr) | 2017-10-05 |
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