JP6688875B2 - 組成物、膜、硬化膜、光学センサおよび膜の製造方法 - Google Patents
組成物、膜、硬化膜、光学センサおよび膜の製造方法 Download PDFInfo
- Publication number
- JP6688875B2 JP6688875B2 JP2018505362A JP2018505362A JP6688875B2 JP 6688875 B2 JP6688875 B2 JP 6688875B2 JP 2018505362 A JP2018505362 A JP 2018505362A JP 2018505362 A JP2018505362 A JP 2018505362A JP 6688875 B2 JP6688875 B2 JP 6688875B2
- Authority
- JP
- Japan
- Prior art keywords
- group
- composition
- resin
- mass
- refractive index
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
- C08K3/20—Oxides; Hydroxides
- C08K3/22—Oxides; Hydroxides of metals
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L101/00—Compositions of unspecified macromolecular compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/04—Polysiloxanes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016049982 | 2016-03-14 | ||
JP2016049982 | 2016-03-14 | ||
PCT/JP2017/005531 WO2017159190A1 (ja) | 2016-03-14 | 2017-02-15 | 組成物、膜、硬化膜、光学センサおよび膜の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2017159190A1 JPWO2017159190A1 (ja) | 2018-12-27 |
JP6688875B2 true JP6688875B2 (ja) | 2020-04-28 |
Family
ID=59851914
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2018505362A Active JP6688875B2 (ja) | 2016-03-14 | 2017-02-15 | 組成物、膜、硬化膜、光学センサおよび膜の製造方法 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP6688875B2 (zh) |
TW (1) | TW201800464A (zh) |
WO (1) | WO2017159190A1 (zh) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20230164671A (ko) | 2021-03-31 | 2023-12-04 | 미쯔비시 케미컬 주식회사 | 착색 감광성 수지 조성물, 경화물, 격벽, 유기 전계 발광 소자, 발광성 나노 결정 입자를 포함하는 컬러 필터 및 화상 표시 장치 |
KR20230166082A (ko) | 2021-03-31 | 2023-12-06 | 미쯔비시 케미컬 주식회사 | 착색 감광성 수지 조성물, 경화물, 격벽, 컬러 필터 및 화상 표시 장치 |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2019065562A1 (ja) * | 2017-09-28 | 2019-04-04 | 東レ株式会社 | 感光性樹脂組成物、感光性シート、ならびにそれらの硬化膜、その製造方法、それを用いた中空構造体および電子部品 |
WO2019176785A1 (ja) * | 2018-03-14 | 2019-09-19 | 東レ株式会社 | ネガ型感光性着色組成物、硬化膜、それを用いたタッチパネル |
JP7081337B2 (ja) * | 2018-06-27 | 2022-06-07 | Dic株式会社 | 光硬化性組成物及びその製造方法 |
JP6962958B2 (ja) * | 2019-03-25 | 2021-11-05 | 株式会社タムラ製作所 | 感光性樹脂組成物 |
US20220348722A1 (en) * | 2019-10-03 | 2022-11-03 | Dow Toray Co., Ltd. | Uv-curable organopolysiloxane composition and use thereof |
EP4130147A4 (en) | 2020-03-30 | 2023-08-09 | FUJIFILM Corporation | COMPOSITION, FILM AND OPTICAL SENSOR |
WO2023054142A1 (ja) | 2021-09-29 | 2023-04-06 | 富士フイルム株式会社 | 組成物、樹脂、膜および光センサ |
TWI827161B (zh) * | 2022-07-26 | 2023-12-21 | 台虹科技股份有限公司 | 鈦黑組合物、聚醯胺酸組合物、聚醯亞胺膜及其層疊體 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4332360B2 (ja) * | 2003-02-28 | 2009-09-16 | 大日本印刷株式会社 | 濡れ性パターン形成用塗工液およびパターン形成体の製造方法 |
WO2009035874A1 (en) * | 2007-09-07 | 2009-03-19 | 3M Innovative Properties Company | Self-assembling antireflective coating comprising surface modified high refractive index nanoparticles |
WO2009090867A1 (ja) * | 2008-01-15 | 2009-07-23 | Sekisui Chemical Co., Ltd. | レジスト材料及び積層体 |
JP2009251093A (ja) * | 2008-04-02 | 2009-10-29 | Konica Minolta Opto Inc | 光学用複合材料、及び光学素子 |
JP5544739B2 (ja) * | 2009-03-31 | 2014-07-09 | 日立化成株式会社 | 光反射用熱硬化性樹脂組成物、これを用いた光半導体素子搭載用基板及びその製造方法、並びに光半導体装置 |
JP2012064928A (ja) * | 2010-08-18 | 2012-03-29 | Mitsubishi Chemicals Corp | 半導体発光装置用樹脂成形体用材料及び樹脂成形体 |
JP2012124428A (ja) * | 2010-12-10 | 2012-06-28 | Mitsubishi Chemicals Corp | 半導体発光装置用樹脂成形体 |
JP2012185463A (ja) * | 2011-02-14 | 2012-09-27 | Sekisui Chem Co Ltd | 感光性組成物の製造方法 |
JP5919903B2 (ja) * | 2011-03-31 | 2016-05-18 | 三菱化学株式会社 | 半導体発光装置用パッケージ及び該パッケージを有してなる半導体発光装置並びにそれらの製造方法 |
JP2014145012A (ja) * | 2013-01-28 | 2014-08-14 | Mitsubishi Chemicals Corp | 樹脂組成物、波長変換部材、発光装置、led照明器具、及び光学部材 |
US9651865B2 (en) * | 2013-02-14 | 2017-05-16 | Toray Industries, Inc. | Negative-type photosensitive coloring composition, cured film, light-shielding pattern for touch panel, and touch panel manufacturing method |
JP2015048446A (ja) * | 2013-09-03 | 2015-03-16 | 三菱化学株式会社 | 波長変換部材、発光装置、照明器具、及び、ディスプレイ |
JP2016061818A (ja) * | 2014-09-16 | 2016-04-25 | 東洋インキScホールディングス株式会社 | 光散乱層用樹脂組成物、光散乱層、および有機エレクトロルミネッセンス装置 |
-
2017
- 2017-02-15 JP JP2018505362A patent/JP6688875B2/ja active Active
- 2017-02-15 WO PCT/JP2017/005531 patent/WO2017159190A1/ja active Application Filing
- 2017-03-01 TW TW106106590A patent/TW201800464A/zh unknown
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20230164671A (ko) | 2021-03-31 | 2023-12-04 | 미쯔비시 케미컬 주식회사 | 착색 감광성 수지 조성물, 경화물, 격벽, 유기 전계 발광 소자, 발광성 나노 결정 입자를 포함하는 컬러 필터 및 화상 표시 장치 |
KR20230166082A (ko) | 2021-03-31 | 2023-12-06 | 미쯔비시 케미컬 주식회사 | 착색 감광성 수지 조성물, 경화물, 격벽, 컬러 필터 및 화상 표시 장치 |
Also Published As
Publication number | Publication date |
---|---|
TW201800464A (zh) | 2018-01-01 |
WO2017159190A1 (ja) | 2017-09-21 |
JPWO2017159190A1 (ja) | 2018-12-27 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6688875B2 (ja) | 組成物、膜、硬化膜、光学センサおよび膜の製造方法 | |
JP6692428B2 (ja) | 積層体、キット、積層体の製造方法および光学センサ | |
US10928726B2 (en) | Dispersion liquid, composition, film, manufacturing method of film, and dispersant | |
JP6701324B2 (ja) | 組成物、膜、硬化膜、光学センサおよび膜の製造方法 | |
JP6893236B2 (ja) | 組成物、膜、光センサおよび分散剤 | |
WO2018180116A1 (ja) | 構造体および光センサ | |
TWI795360B (zh) | 硬化膜形成用組成物、硬化膜、彩色濾光片、遮光膜、固體攝像裝置及圖像顯示裝置 | |
US10678131B2 (en) | Composition, film, cured film, optical sensor, and method for producing film | |
JP6717930B2 (ja) | 遠赤外線透過性組成物、形成体、積層体、遠赤外線透過フィルタ、固体撮像素子および赤外線カメラ | |
US11045834B2 (en) | Method for producing film | |
WO2023190567A1 (ja) | 遮光膜、固体撮像素子、画像表示装置、赤外線センサ | |
WO2017163818A1 (ja) | 赤外線フィルタ、赤外線センサおよび赤外線フィルタ用組成物 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20180830 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20190730 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20190906 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20200204 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20200316 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20200331 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20200406 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 6688875 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |