JP6673916B2 - 半導体洗浄用のアルキメデスブラシ - Google Patents
半導体洗浄用のアルキメデスブラシ Download PDFInfo
- Publication number
- JP6673916B2 JP6673916B2 JP2017525089A JP2017525089A JP6673916B2 JP 6673916 B2 JP6673916 B2 JP 6673916B2 JP 2017525089 A JP2017525089 A JP 2017525089A JP 2017525089 A JP2017525089 A JP 2017525089A JP 6673916 B2 JP6673916 B2 JP 6673916B2
- Authority
- JP
- Japan
- Prior art keywords
- brush
- mandrel
- cleaning device
- groove
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000004140 cleaning Methods 0.000 title claims description 60
- 239000004065 semiconductor Substances 0.000 title description 48
- 239000000758 substrate Substances 0.000 claims description 66
- 239000006260 foam Substances 0.000 claims description 9
- 239000011118 polyvinyl acetate Substances 0.000 claims description 8
- 239000011295 pitch Substances 0.000 claims description 5
- 229920000642 polymer Polymers 0.000 claims description 5
- 229920002689 polyvinyl acetate Polymers 0.000 claims description 5
- 229920005830 Polyurethane Foam Polymers 0.000 claims description 4
- 239000000463 material Substances 0.000 claims description 4
- 239000011496 polyurethane foam Substances 0.000 claims description 4
- 230000002745 absorbent Effects 0.000 claims description 3
- 239000002250 absorbent Substances 0.000 claims description 3
- 239000000853 adhesive Substances 0.000 claims description 3
- 230000001070 adhesive effect Effects 0.000 claims description 3
- 239000006261 foam material Substances 0.000 claims 1
- 239000012530 fluid Substances 0.000 description 23
- 239000002245 particle Substances 0.000 description 11
- 239000011521 glass Substances 0.000 description 7
- 238000000034 method Methods 0.000 description 6
- 238000005498 polishing Methods 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 230000000295 complement effect Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000005350 fused silica glass Substances 0.000 description 2
- 238000001746 injection moulding Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 229910021642 ultra pure water Inorganic materials 0.000 description 2
- 239000012498 ultrapure water Substances 0.000 description 2
- 235000012431 wafers Nutrition 0.000 description 2
- 230000005284 excitation Effects 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 238000012805 post-processing Methods 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
Images
Classifications
-
- A—HUMAN NECESSITIES
- A46—BRUSHWARE
- A46B—BRUSHES
- A46B13/00—Brushes with driven brush bodies or carriers
- A46B13/001—Cylindrical or annular brush bodies
-
- A—HUMAN NECESSITIES
- A46—BRUSHWARE
- A46B—BRUSHES
- A46B9/00—Arrangements of the bristles in the brush body
- A46B9/08—Supports or guides for bristles
-
- A—HUMAN NECESSITIES
- A46—BRUSHWARE
- A46B—BRUSHES
- A46B13/00—Brushes with driven brush bodies or carriers
- A46B13/001—Cylindrical or annular brush bodies
- A46B13/006—Cylindrical or annular brush bodies formed by winding a strip tuft in a helix about the body
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B1/00—Cleaning by methods involving the use of tools
- B08B1/10—Cleaning by methods involving the use of tools characterised by the type of cleaning tool
- B08B1/12—Brushes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67046—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly scrubbing means, e.g. brushes
-
- A—HUMAN NECESSITIES
- A46—BRUSHWARE
- A46D—MANUFACTURE OF BRUSHES
- A46D1/00—Bristles; Selection of materials for bristles
- A46D1/02—Bristles details
- A46D1/0207—Bristles characterised by the choice of material, e.g. metal
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Cleaning In General (AREA)
- Brushes (AREA)
Description
100a 洗浄システム
102 回転装置
104 半導体
106 半導体表面
110 洗浄ブラシ
110a 洗浄ブラシ
112 中空ボア
113 内面
114 外面
114a 外面
116 係合要素
124 端部
126 端部
130 ブラシ
130a マンドレル
133 外面
133a 外面
140 係合要素
150 流体通路
150a 流体通路
156 孔
156a 孔
160 回転係合要素
160a 回転係合要素
170a 溝
172 端部
172a 端部
174 端部
174a 端部
175 端壁
175a 端壁
176 内面
177a 内面
178a 壁
Claims (15)
- 基板を洗浄するための洗浄装置において、
円筒状の外面と、該外面から内方へ螺旋状の溝を形成する壁とを有する剛性マンドレルと、
発泡材料で形成されたブラシとを具備し、
前記ブラシは、前記溝内に配置されると共に前記マンドレルの外面から外方へ突出しており、該ブラシは複数巻回された連続ねじ形状を形成し、前記マンドレルの外面においてブラシの隣り合う一巻き一巻きの間の部分は、前記ブラシによって覆われておらず、
前記溝は、該溝の内部に配置されている前記ブラシよりも僅かに小さくなっている洗浄装置。 - 前記ブラシは、ポリ酢酸ビニル発泡材、ポリウレタン発泡材、及びポリマー発泡材のうちの1つから形成される請求項1に記載の洗浄装置。
- 前記溝は、前記マンドレルの第1の端部から前記マンドレルの反対側の第2の端部に延在する請求項1に記載の洗浄装置。
- 前記ブラシは円形断面を有する請求項1に記載の洗浄装置。
- 前記ブラシは非円形断面を有する請求項1に記載の洗浄装置。
- 前記マンドレルは、該マンドレルの一端部から貫通して延在する通路と、該通路から前記溝の前記壁に延在する複数の孔とを有する請求項1に記載の洗浄装置。
- 前記ブラシは、摩擦嵌合によって前記溝内に係合する請求項1に記載の洗浄装置。
- 前記ブラシは、接着剤によって前記溝内に係合する請求項1に記載の洗浄装置。
- 基板を洗浄するための洗浄装置において、
円筒状の外面と、該外面から内方へ延びる複数の壁であって、該複数の壁の各々が螺旋状の溝を形成するようにした複数の壁とを有した剛性マンドレルと、
吸収性材料で形成された複数のブラシとを具備し、
前記複数のブラシの各々は、前記複数の溝の各々内に少なくとも部分的に配置され、それによって複数の連続ねじ形状が形成され、前記マンドレルの外面において、前記複数のブラシの隣り合う一巻き一巻きの間の部分が、該複数のブラシによって覆われないようになっており、
前記複数の溝の各々は、該溝の内部に配置される前記ブラシよりも僅かに小さくなっている洗浄装置。 - 前記複数の溝は同じピッチを有する請求項9に記載の洗浄装置。
- 前記複数の溝は異なるピッチを有する請求項9に記載の洗浄装置。
- 前記ブラシは、ポリ酢酸ビニル発泡材、ポリウレタン発泡材、及びポリマー発泡材のうちの1つから形成される請求項9に記載の洗浄装置。
- 前記マンドレルは、該マンドレルの一端部から貫通して延在する通路と、該通路から前記溝の前記壁に延在する複数の孔とを有する請求項9に記載の洗浄装置。
- 前記ブラシは、摩擦嵌合によって前記溝内に係合する請求項9に記載の洗浄装置。
- 前記ブラシは、接着剤によって前記溝内に係合
する請求項9に記載の洗浄装置。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US14/537,707 US10271636B2 (en) | 2014-11-10 | 2014-11-10 | Archimedes brush for semiconductor cleaning |
US14/537,707 | 2014-11-10 | ||
PCT/US2015/055998 WO2016077030A1 (en) | 2014-11-10 | 2015-10-16 | Archimedes brush for semiconductor cleaning |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2020037766A Division JP7177110B2 (ja) | 2014-11-10 | 2020-03-05 | 半導体洗浄用のアルキメデスブラシ |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2017535081A JP2017535081A (ja) | 2017-11-24 |
JP6673916B2 true JP6673916B2 (ja) | 2020-03-25 |
Family
ID=54477247
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2017525089A Active JP6673916B2 (ja) | 2014-11-10 | 2015-10-16 | 半導体洗浄用のアルキメデスブラシ |
JP2020037766A Active JP7177110B2 (ja) | 2014-11-10 | 2020-03-05 | 半導体洗浄用のアルキメデスブラシ |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2020037766A Active JP7177110B2 (ja) | 2014-11-10 | 2020-03-05 | 半導体洗浄用のアルキメデスブラシ |
Country Status (8)
Country | Link |
---|---|
US (1) | US10271636B2 (ja) |
EP (2) | EP3217837B1 (ja) |
JP (2) | JP6673916B2 (ja) |
KR (2) | KR102544905B1 (ja) |
CN (2) | CN113100558B (ja) |
SG (3) | SG10201902983VA (ja) |
TW (1) | TWI666715B (ja) |
WO (1) | WO2016077030A1 (ja) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20190090624A1 (en) * | 2017-09-22 | 2019-03-28 | Illinois Tool Works Inc. | Hybrid material post-cmp brushes and methods for forming the same |
USD955115S1 (en) * | 2018-08-10 | 2022-06-21 | Sharkninja Operating Llc | Brush roll |
US10758946B2 (en) * | 2019-01-23 | 2020-09-01 | Tung An Development Ltd. | Device of cleaning brush |
US11694910B2 (en) | 2019-09-10 | 2023-07-04 | Illinois Tool Works Inc. | Brush with non-constant nodule density |
KR20210035601A (ko) | 2019-09-24 | 2021-04-01 | (주)아모레퍼시픽 | 메틸자스모네이트 처리를 통한 쿠메스트롤 함량이 증가된 콩과 식물 배양근의 생산 방법 |
US20220039912A1 (en) * | 2020-08-10 | 2022-02-10 | Covidien Lp | Endoscope cleaning device |
Family Cites Families (26)
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US3139641A (en) | 1961-06-22 | 1964-07-07 | Power Brushes Inc | Cylindrical brush construction |
JPS60186085U (ja) | 1984-05-22 | 1985-12-10 | カネボウ株式会社 | 洗浄用ロ−ル |
KR100230694B1 (ko) | 1992-05-18 | 1999-11-15 | 다카시마 히로시 | 기판세정처리장치 |
JPH08150377A (ja) | 1994-11-29 | 1996-06-11 | M Setetsuku Kk | スクラビング用円筒ブラシ |
US5778481A (en) | 1996-02-15 | 1998-07-14 | International Business Machines Corporation | Silicon wafer cleaning and polishing pads |
IL123707A (en) | 1997-05-26 | 2001-01-28 | Heidelberger Druckmasch Ag | Method and device for eliminating peeled-off surface portions of an ink-repellent layer of an offset printing plate |
JP2000015190A (ja) * | 1998-07-03 | 2000-01-18 | Matsushita Electric Ind Co Ltd | 基板洗浄方法及び装置 |
US6464010B1 (en) * | 1998-08-13 | 2002-10-15 | Global Completion Services, Inc. | Apparatus and method for cleaning a tubular member with a brush |
US20050081316A1 (en) * | 2002-12-13 | 2005-04-21 | Andrea Dondi | Roller for rotating cylindrical brushes applicable in any industrial, road-related or other sector |
KR20040081973A (ko) * | 2003-03-17 | 2004-09-23 | 삼성전자주식회사 | 반도체 웨이퍼의 세정 브러쉬 |
JP2007007501A (ja) | 2005-06-28 | 2007-01-18 | Shimada Phys & Chem Ind Co Ltd | 基板洗浄ブラシ |
US8407846B2 (en) * | 2006-03-07 | 2013-04-02 | Applied Materials, Inc. | Scrubber brush with sleeve and brush mandrel for use with the scrubber brush |
JP2007330536A (ja) * | 2006-06-15 | 2007-12-27 | Kowa Co Ltd | ブラシ用毛材 |
US8234739B2 (en) | 2006-10-03 | 2012-08-07 | Xyratex Technology Limited | Spiral brush for cleaning and conveying a substrate |
KR100818559B1 (ko) | 2007-03-22 | 2008-04-02 | 엠.씨.케이 (주) | 유리기판용 세정롤러 |
US9232851B2 (en) * | 2008-05-20 | 2016-01-12 | Albea Services | Variable pitch mascara brush |
KR101119951B1 (ko) * | 2009-09-29 | 2012-03-16 | 방선정 | 반도체 웨이퍼용 브러쉬 롤 |
SG183419A1 (en) * | 2010-02-22 | 2012-09-27 | Entegris Inc | Post-cmp cleaning brush |
GB201005140D0 (en) * | 2010-03-26 | 2010-05-12 | Spaans Babcock Ltd | An archimedean screw apparatus |
TWD161994S (zh) * | 2011-06-08 | 2014-08-01 | 伊利諾工具工程公司 | 海綿刷的刷心之部分(一) |
US9202723B2 (en) * | 2011-11-29 | 2015-12-01 | Illinois Tool Works, Inc. | Brush with cantilevered nodules |
US20130255721A1 (en) * | 2012-04-03 | 2013-10-03 | Illinois Tool Works Inc. | Concave nodule sponge brush |
US8778087B2 (en) * | 2012-04-03 | 2014-07-15 | Illinois Tool Works Inc. | Conical sponge brush for cleaning semiconductor wafers |
CN202873538U (zh) | 2012-05-28 | 2013-04-17 | 谢丽方 | 一种蛋品清洗机用圆柱毛刷 |
JP6058383B2 (ja) * | 2012-12-25 | 2017-01-11 | 槌屋ティスコ株式会社 | ブラシ及び電気掃除機用の回転ブラシ |
CN203018351U (zh) | 2012-12-31 | 2013-06-26 | 中芯国际集成电路制造(北京)有限公司 | 晶圆清洗刷和晶圆清洗装置 |
-
2014
- 2014-11-10 US US14/537,707 patent/US10271636B2/en active Active
-
2015
- 2015-10-15 TW TW104133894A patent/TWI666715B/zh active
- 2015-10-16 CN CN202110216088.0A patent/CN113100558B/zh active Active
- 2015-10-16 CN CN201580066701.8A patent/CN107257639B/zh active Active
- 2015-10-16 JP JP2017525089A patent/JP6673916B2/ja active Active
- 2015-10-16 KR KR1020177015462A patent/KR102544905B1/ko active IP Right Grant
- 2015-10-16 EP EP15791084.5A patent/EP3217837B1/en active Active
- 2015-10-16 SG SG10201902983VA patent/SG10201902983VA/en unknown
- 2015-10-16 KR KR1020207015413A patent/KR102542156B1/ko active IP Right Grant
- 2015-10-16 EP EP20173816.8A patent/EP3714733B1/en active Active
- 2015-10-16 SG SG11201703696RA patent/SG11201703696RA/en unknown
- 2015-10-16 SG SG10202003948SA patent/SG10202003948SA/en unknown
- 2015-10-16 WO PCT/US2015/055998 patent/WO2016077030A1/en active Application Filing
-
2020
- 2020-03-05 JP JP2020037766A patent/JP7177110B2/ja active Active
Also Published As
Publication number | Publication date |
---|---|
KR102542156B1 (ko) | 2023-06-12 |
TWI666715B (zh) | 2019-07-21 |
CN113100558B (zh) | 2023-06-16 |
US20160128460A1 (en) | 2016-05-12 |
WO2016077030A1 (en) | 2016-05-19 |
KR102544905B1 (ko) | 2023-06-16 |
JP2020096196A (ja) | 2020-06-18 |
TW201618218A (zh) | 2016-05-16 |
EP3714733B1 (en) | 2023-05-31 |
KR20200064170A (ko) | 2020-06-05 |
SG10201902983VA (en) | 2019-05-30 |
EP3714733A1 (en) | 2020-09-30 |
EP3217837B1 (en) | 2020-09-23 |
CN107257639A (zh) | 2017-10-17 |
JP7177110B2 (ja) | 2022-11-22 |
US10271636B2 (en) | 2019-04-30 |
KR20170082586A (ko) | 2017-07-14 |
EP3217837A1 (en) | 2017-09-20 |
CN107257639B (zh) | 2021-04-09 |
SG11201703696RA (en) | 2017-06-29 |
CN113100558A (zh) | 2021-07-13 |
SG10202003948SA (en) | 2020-06-29 |
JP2017535081A (ja) | 2017-11-24 |
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