SG11201703696RA - Archimedes brush for semiconductor cleaning - Google Patents
Archimedes brush for semiconductor cleaningInfo
- Publication number
- SG11201703696RA SG11201703696RA SG11201703696RA SG11201703696RA SG11201703696RA SG 11201703696R A SG11201703696R A SG 11201703696RA SG 11201703696R A SG11201703696R A SG 11201703696RA SG 11201703696R A SG11201703696R A SG 11201703696RA SG 11201703696R A SG11201703696R A SG 11201703696RA
- Authority
- SG
- Singapore
- Prior art keywords
- archimedes
- brush
- semiconductor cleaning
- cleaning
- semiconductor
- Prior art date
Links
- 238000004140 cleaning Methods 0.000 title 1
- 239000004065 semiconductor Substances 0.000 title 1
Classifications
-
- A—HUMAN NECESSITIES
- A46—BRUSHWARE
- A46B—BRUSHES
- A46B13/00—Brushes with driven brush bodies or carriers
- A46B13/001—Cylindrical or annular brush bodies
-
- A—HUMAN NECESSITIES
- A46—BRUSHWARE
- A46B—BRUSHES
- A46B9/00—Arrangements of the bristles in the brush body
- A46B9/08—Supports or guides for bristles
-
- A—HUMAN NECESSITIES
- A46—BRUSHWARE
- A46B—BRUSHES
- A46B13/00—Brushes with driven brush bodies or carriers
- A46B13/001—Cylindrical or annular brush bodies
- A46B13/006—Cylindrical or annular brush bodies formed by winding a strip tuft in a helix about the body
-
- B08B1/12—
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67046—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly scrubbing means, e.g. brushes
-
- A—HUMAN NECESSITIES
- A46—BRUSHWARE
- A46D—MANUFACTURE OF BRUSHES
- A46D1/00—Bristles; Selection of materials for bristles
- A46D1/02—Bristles details
- A46D1/0207—Bristles characterised by the choice of material, e.g. metal
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US14/537,707 US10271636B2 (en) | 2014-11-10 | 2014-11-10 | Archimedes brush for semiconductor cleaning |
PCT/US2015/055998 WO2016077030A1 (en) | 2014-11-10 | 2015-10-16 | Archimedes brush for semiconductor cleaning |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11201703696RA true SG11201703696RA (en) | 2017-06-29 |
Family
ID=54477247
Family Applications (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG10201902983VA SG10201902983VA (en) | 2014-11-10 | 2015-10-16 | Archimedes brush for semiconductor cleaning |
SG11201703696RA SG11201703696RA (en) | 2014-11-10 | 2015-10-16 | Archimedes brush for semiconductor cleaning |
SG10202003948SA SG10202003948SA (en) | 2014-11-10 | 2015-10-16 | Archimedes brush for semiconductor cleaning |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG10201902983VA SG10201902983VA (en) | 2014-11-10 | 2015-10-16 | Archimedes brush for semiconductor cleaning |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG10202003948SA SG10202003948SA (en) | 2014-11-10 | 2015-10-16 | Archimedes brush for semiconductor cleaning |
Country Status (8)
Country | Link |
---|---|
US (1) | US10271636B2 (en) |
EP (2) | EP3217837B1 (en) |
JP (2) | JP6673916B2 (en) |
KR (2) | KR102542156B1 (en) |
CN (2) | CN113100558B (en) |
SG (3) | SG10201902983VA (en) |
TW (1) | TWI666715B (en) |
WO (1) | WO2016077030A1 (en) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20190090624A1 (en) * | 2017-09-22 | 2019-03-28 | Illinois Tool Works Inc. | Hybrid material post-cmp brushes and methods for forming the same |
USD955115S1 (en) * | 2018-08-10 | 2022-06-21 | Sharkninja Operating Llc | Brush roll |
US10758946B2 (en) * | 2019-01-23 | 2020-09-01 | Tung An Development Ltd. | Device of cleaning brush |
US11694910B2 (en) | 2019-09-10 | 2023-07-04 | Illinois Tool Works Inc. | Brush with non-constant nodule density |
KR20210035601A (en) | 2019-09-24 | 2021-04-01 | (주)아모레퍼시픽 | Production method for cultured root of leguminous plants comprising high-content of coumestrol using methyl jasmonate treatment |
US20220039912A1 (en) * | 2020-08-10 | 2022-02-10 | Covidien Lp | Endoscope cleaning device |
Family Cites Families (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3139641A (en) | 1961-06-22 | 1964-07-07 | Power Brushes Inc | Cylindrical brush construction |
JPS60186085U (en) | 1984-05-22 | 1985-12-10 | カネボウ株式会社 | Cleaning roll |
KR100230694B1 (en) | 1992-05-18 | 1999-11-15 | 다카시마 히로시 | Cleaning apparatus for semiconductor substrate |
JPH08150377A (en) | 1994-11-29 | 1996-06-11 | M Setetsuku Kk | Cylindrical brush for scrubbing |
US5778481A (en) | 1996-02-15 | 1998-07-14 | International Business Machines Corporation | Silicon wafer cleaning and polishing pads |
IL123707A (en) | 1997-05-26 | 2001-01-28 | Heidelberger Druckmasch Ag | Method and device for eliminating peeled-off surface portions of an ink-repellent layer of an offset printing plate |
JP2000015190A (en) * | 1998-07-03 | 2000-01-18 | Matsushita Electric Ind Co Ltd | Method and device for substrate washing |
US6464010B1 (en) * | 1998-08-13 | 2002-10-15 | Global Completion Services, Inc. | Apparatus and method for cleaning a tubular member with a brush |
US20050081316A1 (en) * | 2002-12-13 | 2005-04-21 | Andrea Dondi | Roller for rotating cylindrical brushes applicable in any industrial, road-related or other sector |
KR20040081973A (en) * | 2003-03-17 | 2004-09-23 | 삼성전자주식회사 | Cleaning brush of semiconductor wafer |
JP2007007501A (en) | 2005-06-28 | 2007-01-18 | Shimada Phys & Chem Ind Co Ltd | Substrate washing brush |
WO2007103399A2 (en) * | 2006-03-07 | 2007-09-13 | Applied Materials, Inc. | Scrubber brush with sleeve and brush mandrel |
JP2007330536A (en) * | 2006-06-15 | 2007-12-27 | Kowa Co Ltd | Bristle material for brush |
US8234739B2 (en) | 2006-10-03 | 2012-08-07 | Xyratex Technology Limited | Spiral brush for cleaning and conveying a substrate |
KR100818559B1 (en) | 2007-03-22 | 2008-04-02 | 엠.씨.케이 (주) | Cleaning roller for glass substrate |
CN102088888A (en) * | 2008-05-20 | 2011-06-08 | 阿尔康包装美饰服务公司 | Variable pitch mascara brush |
KR101119951B1 (en) * | 2009-09-29 | 2012-03-16 | 방선정 | brush roll |
CN102792424A (en) * | 2010-02-22 | 2012-11-21 | 恩特格里公司 | Post-CMP cleaning brush |
GB201005140D0 (en) * | 2010-03-26 | 2010-05-12 | Spaans Babcock Ltd | An archimedean screw apparatus |
TWD161994S (en) * | 2011-06-08 | 2014-08-01 | 伊利諾工具工程公司 | Portion of brush core for sponge brush (1) |
US9202723B2 (en) * | 2011-11-29 | 2015-12-01 | Illinois Tool Works, Inc. | Brush with cantilevered nodules |
US20130255721A1 (en) * | 2012-04-03 | 2013-10-03 | Illinois Tool Works Inc. | Concave nodule sponge brush |
US8778087B2 (en) * | 2012-04-03 | 2014-07-15 | Illinois Tool Works Inc. | Conical sponge brush for cleaning semiconductor wafers |
CN202873538U (en) | 2012-05-28 | 2013-04-17 | 谢丽方 | Cylindrical hairbrush for egg washing machine |
JP6058383B2 (en) * | 2012-12-25 | 2017-01-11 | 槌屋ティスコ株式会社 | Rotating brush for brush and vacuum cleaner |
CN203018351U (en) | 2012-12-31 | 2013-06-26 | 中芯国际集成电路制造(北京)有限公司 | Wafer cleaning brush and wafer cleaning device |
-
2014
- 2014-11-10 US US14/537,707 patent/US10271636B2/en active Active
-
2015
- 2015-10-15 TW TW104133894A patent/TWI666715B/en active
- 2015-10-16 KR KR1020207015413A patent/KR102542156B1/en active IP Right Grant
- 2015-10-16 CN CN202110216088.0A patent/CN113100558B/en active Active
- 2015-10-16 JP JP2017525089A patent/JP6673916B2/en active Active
- 2015-10-16 SG SG10201902983VA patent/SG10201902983VA/en unknown
- 2015-10-16 CN CN201580066701.8A patent/CN107257639B/en active Active
- 2015-10-16 SG SG11201703696RA patent/SG11201703696RA/en unknown
- 2015-10-16 EP EP15791084.5A patent/EP3217837B1/en active Active
- 2015-10-16 WO PCT/US2015/055998 patent/WO2016077030A1/en active Application Filing
- 2015-10-16 SG SG10202003948SA patent/SG10202003948SA/en unknown
- 2015-10-16 EP EP20173816.8A patent/EP3714733B1/en active Active
- 2015-10-16 KR KR1020177015462A patent/KR102544905B1/en active IP Right Grant
-
2020
- 2020-03-05 JP JP2020037766A patent/JP7177110B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
KR102544905B1 (en) | 2023-06-16 |
TW201618218A (en) | 2016-05-16 |
EP3714733A1 (en) | 2020-09-30 |
US20160128460A1 (en) | 2016-05-12 |
WO2016077030A1 (en) | 2016-05-19 |
CN107257639B (en) | 2021-04-09 |
JP6673916B2 (en) | 2020-03-25 |
KR20170082586A (en) | 2017-07-14 |
CN113100558B (en) | 2023-06-16 |
JP7177110B2 (en) | 2022-11-22 |
EP3714733B1 (en) | 2023-05-31 |
TWI666715B (en) | 2019-07-21 |
KR102542156B1 (en) | 2023-06-12 |
EP3217837B1 (en) | 2020-09-23 |
EP3217837A1 (en) | 2017-09-20 |
US10271636B2 (en) | 2019-04-30 |
KR20200064170A (en) | 2020-06-05 |
CN107257639A (en) | 2017-10-17 |
JP2017535081A (en) | 2017-11-24 |
SG10202003948SA (en) | 2020-06-29 |
JP2020096196A (en) | 2020-06-18 |
CN113100558A (en) | 2021-07-13 |
SG10201902983VA (en) | 2019-05-30 |
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