JP6663353B2 - 極端紫外光源のための適応レーザシステム - Google Patents
極端紫外光源のための適応レーザシステム Download PDFInfo
- Publication number
- JP6663353B2 JP6663353B2 JP2016547862A JP2016547862A JP6663353B2 JP 6663353 B2 JP6663353 B2 JP 6663353B2 JP 2016547862 A JP2016547862 A JP 2016547862A JP 2016547862 A JP2016547862 A JP 2016547862A JP 6663353 B2 JP6663353 B2 JP 6663353B2
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- light beam
- adaptive
- optical
- optical amplifier
- output
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—Production of X-ray radiation generated from plasma
- H05G2/008—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation
- H05G2/0082—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation the energy-carrying beam being a laser beam
- H05G2/0084—Control of the laser beam
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
- H01S3/0071—Beam steering, e.g. whereby a mirror outside the cavity is present to change the beam direction
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/10007—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating in optical amplifiers
- H01S3/10023—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating in optical amplifiers by functional association of additional optical elements, e.g. filters, gratings, reflectors
- H01S3/1003—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating in optical amplifiers by functional association of additional optical elements, e.g. filters, gratings, reflectors tunable optical elements, e.g. acousto-optic filters, tunable gratings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
- H01S3/1305—Feedback control systems
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
- H01S3/2232—Carbon dioxide (CO2) or monoxide [CO]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
- H01S3/2308—Amplifier arrangements, e.g. MOPA
- H01S3/2316—Cascaded amplifiers
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Automation & Control Theory (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- X-Ray Techniques (AREA)
- Lasers (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US14/194,027 | 2014-02-28 | ||
| US14/194,027 US9380691B2 (en) | 2014-02-28 | 2014-02-28 | Adaptive laser system for an extreme ultraviolet light source |
| PCT/EP2015/053763 WO2015128297A1 (en) | 2014-02-28 | 2015-02-24 | Adaptive laser system for an extreme ultraviolet light source |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2017516288A JP2017516288A (ja) | 2017-06-15 |
| JP2017516288A5 JP2017516288A5 (enExample) | 2018-04-05 |
| JP6663353B2 true JP6663353B2 (ja) | 2020-03-11 |
Family
ID=52577856
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016547862A Active JP6663353B2 (ja) | 2014-02-28 | 2015-02-24 | 極端紫外光源のための適応レーザシステム |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US9380691B2 (enExample) |
| JP (1) | JP6663353B2 (enExample) |
| KR (1) | KR102458094B1 (enExample) |
| CN (1) | CN106465525B (enExample) |
| TW (1) | TWI670996B (enExample) |
| WO (1) | WO2015128297A1 (enExample) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20170311429A1 (en) * | 2016-04-25 | 2017-10-26 | Asml Netherlands B.V. | Reducing the effect of plasma on an object in an extreme ultraviolet light source |
| US10411435B2 (en) * | 2016-06-06 | 2019-09-10 | Raytheon Company | Dual-axis adaptive optic (AO) system for high-power lasers |
| US9778022B1 (en) * | 2016-09-14 | 2017-10-03 | Asml Netherlands B.V. | Determining moving properties of a target in an extreme ultraviolet light source |
| US10524345B2 (en) * | 2017-04-28 | 2019-12-31 | Taiwan Semiconductor Manufacturing Co., Ltd. | Residual gain monitoring and reduction for EUV drive laser |
| WO2019224601A2 (en) * | 2018-05-24 | 2019-11-28 | Panasonic intellectual property Management co., Ltd | Exchangeable laser resonator modules with angular adjustment |
| CN108982399B (zh) * | 2018-07-09 | 2021-04-06 | 安徽建筑大学 | 一种烟道氨浓度激光在线检测系统 |
| CN108982411B (zh) * | 2018-07-09 | 2021-04-06 | 安徽建筑大学 | 一种检测烟道中氨气浓度的激光原位检测系统 |
| NL2023633A (en) * | 2018-09-25 | 2020-04-30 | Asml Netherlands Bv | Laser system for target metrology and alteration in an euv light source |
| WO2020086901A1 (en) * | 2018-10-26 | 2020-04-30 | Asml Netherlands B.V. | Monitoring light emissions |
| WO2020197719A1 (en) * | 2019-03-27 | 2020-10-01 | Cymer, Llc | Pressure-controlled spectral feature adjuster |
| WO2020242540A1 (en) | 2019-05-30 | 2020-12-03 | University Of Virginia Patent Foundation | Low power receiver and related circuits |
| JP7329422B2 (ja) | 2019-11-18 | 2023-08-18 | ギガフォトン株式会社 | ビームデリバリシステム、焦点距離選定方法及び電子デバイスの製造方法 |
| KR20220166280A (ko) | 2020-04-09 | 2022-12-16 | 에이에스엠엘 네델란즈 비.브이. | 방사선 소스용 시드 레이저 시스템 |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3900467C2 (de) | 1989-01-10 | 1995-09-07 | Trumpf Lasertechnik Gmbh | Vorrichtung mit einem Spiegelkopf |
| US7491954B2 (en) * | 2006-10-13 | 2009-02-17 | Cymer, Inc. | Drive laser delivery systems for EUV light source |
| US6880942B2 (en) | 2002-06-20 | 2005-04-19 | Nikon Corporation | Adaptive optic with discrete actuators for continuous deformation of a deformable mirror system |
| JP5833806B2 (ja) | 2008-09-19 | 2015-12-16 | ギガフォトン株式会社 | 極端紫外光源装置、極端紫外光源装置用レーザ光源装置及び極端紫外光源装置用レーザ光源の調整方法 |
| JP5587578B2 (ja) | 2008-09-26 | 2014-09-10 | ギガフォトン株式会社 | 極端紫外光源装置およびパルスレーザ装置 |
| JP5368261B2 (ja) | 2008-11-06 | 2013-12-18 | ギガフォトン株式会社 | 極端紫外光源装置、極端紫外光源装置の制御方法 |
| US8283643B2 (en) | 2008-11-24 | 2012-10-09 | Cymer, Inc. | Systems and methods for drive laser beam delivery in an EUV light source |
| JP5946612B2 (ja) | 2010-10-08 | 2016-07-06 | ギガフォトン株式会社 | ミラー、ミラー装置、レーザ装置および極端紫外光生成装置 |
| US8810902B2 (en) | 2010-12-29 | 2014-08-19 | Asml Netherlands B.V. | Multi-pass optical apparatus |
| JP5816440B2 (ja) * | 2011-02-23 | 2015-11-18 | ギガフォトン株式会社 | 光学装置、レーザ装置および極端紫外光生成装置 |
| JP2013201388A (ja) * | 2012-03-26 | 2013-10-03 | Gigaphoton Inc | レーザシステム及び極端紫外光生成システム |
| US8811440B2 (en) * | 2012-09-07 | 2014-08-19 | Asml Netherlands B.V. | System and method for seed laser mode stabilization |
| CN103560387A (zh) * | 2013-11-14 | 2014-02-05 | 中国电子科技集团公司第十一研究所 | 一种双程吸收分光匹配激光放大器及其放大方法 |
-
2014
- 2014-02-28 US US14/194,027 patent/US9380691B2/en active Active
-
2015
- 2015-02-09 TW TW104104272A patent/TWI670996B/zh active
- 2015-02-24 JP JP2016547862A patent/JP6663353B2/ja active Active
- 2015-02-24 CN CN201580011220.7A patent/CN106465525B/zh active Active
- 2015-02-24 WO PCT/EP2015/053763 patent/WO2015128297A1/en not_active Ceased
- 2015-02-24 KR KR1020167022708A patent/KR102458094B1/ko active Active
Also Published As
| Publication number | Publication date |
|---|---|
| JP2017516288A (ja) | 2017-06-15 |
| CN106465525A (zh) | 2017-02-22 |
| WO2015128297A1 (en) | 2015-09-03 |
| US9380691B2 (en) | 2016-06-28 |
| TW201536112A (zh) | 2015-09-16 |
| KR102458094B1 (ko) | 2022-10-21 |
| KR20160125962A (ko) | 2016-11-01 |
| TWI670996B (zh) | 2019-09-01 |
| CN106465525B (zh) | 2019-01-22 |
| US20150250045A1 (en) | 2015-09-03 |
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