CN106465525B - 用于极紫外光源的自适应激光器系统 - Google Patents

用于极紫外光源的自适应激光器系统 Download PDF

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Publication number
CN106465525B
CN106465525B CN201580011220.7A CN201580011220A CN106465525B CN 106465525 B CN106465525 B CN 106465525B CN 201580011220 A CN201580011220 A CN 201580011220A CN 106465525 B CN106465525 B CN 106465525B
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China
Prior art keywords
optical
adaptive
amplified
light beam
adaptive optics
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CN201580011220.7A
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English (en)
Chinese (zh)
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CN106465525A (zh
Inventor
陶业争
D·J·W·布朗
A·A·沙夫甘斯
M·D·考迪尔
D·J·格里斯
R·L·桑德斯特罗姆
Y·亚马达
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ASML Holding NV
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ASML Holding NV
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Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/008—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation
    • H05G2/0082—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation the energy-carrying beam being a laser beam
    • H05G2/0084—Control of the laser beam
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
    • H01S3/0071—Beam steering, e.g. whereby a mirror outside the cavity is present to change the beam direction
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/10007—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating in optical amplifiers
    • H01S3/10023—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating in optical amplifiers by functional association of additional optical elements, e.g. filters, gratings, reflectors
    • H01S3/1003—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating in optical amplifiers by functional association of additional optical elements, e.g. filters, gratings, reflectors tunable optical elements, e.g. acousto-optic filters, tunable gratings
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
    • H01S3/1305—Feedback control systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/2232—Carbon dioxide (CO2) or monoxide [CO]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
    • H01S3/2308—Amplifier arrangements, e.g. MOPA
    • H01S3/2316—Cascaded amplifiers

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Automation & Control Theory (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • X-Ray Techniques (AREA)
  • Lasers (AREA)
CN201580011220.7A 2014-02-28 2015-02-24 用于极紫外光源的自适应激光器系统 Active CN106465525B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US14/194,027 2014-02-28
US14/194,027 US9380691B2 (en) 2014-02-28 2014-02-28 Adaptive laser system for an extreme ultraviolet light source
PCT/EP2015/053763 WO2015128297A1 (en) 2014-02-28 2015-02-24 Adaptive laser system for an extreme ultraviolet light source

Publications (2)

Publication Number Publication Date
CN106465525A CN106465525A (zh) 2017-02-22
CN106465525B true CN106465525B (zh) 2019-01-22

Family

ID=52577856

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201580011220.7A Active CN106465525B (zh) 2014-02-28 2015-02-24 用于极紫外光源的自适应激光器系统

Country Status (6)

Country Link
US (1) US9380691B2 (enExample)
JP (1) JP6663353B2 (enExample)
KR (1) KR102458094B1 (enExample)
CN (1) CN106465525B (enExample)
TW (1) TWI670996B (enExample)
WO (1) WO2015128297A1 (enExample)

Families Citing this family (13)

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Publication number Priority date Publication date Assignee Title
US20170311429A1 (en) * 2016-04-25 2017-10-26 Asml Netherlands B.V. Reducing the effect of plasma on an object in an extreme ultraviolet light source
US10411435B2 (en) * 2016-06-06 2019-09-10 Raytheon Company Dual-axis adaptive optic (AO) system for high-power lasers
US9778022B1 (en) * 2016-09-14 2017-10-03 Asml Netherlands B.V. Determining moving properties of a target in an extreme ultraviolet light source
US10524345B2 (en) * 2017-04-28 2019-12-31 Taiwan Semiconductor Manufacturing Co., Ltd. Residual gain monitoring and reduction for EUV drive laser
WO2019224601A2 (en) * 2018-05-24 2019-11-28 Panasonic intellectual property Management co., Ltd Exchangeable laser resonator modules with angular adjustment
CN108982399B (zh) * 2018-07-09 2021-04-06 安徽建筑大学 一种烟道氨浓度激光在线检测系统
CN108982411B (zh) * 2018-07-09 2021-04-06 安徽建筑大学 一种检测烟道中氨气浓度的激光原位检测系统
NL2023633A (en) * 2018-09-25 2020-04-30 Asml Netherlands Bv Laser system for target metrology and alteration in an euv light source
WO2020086901A1 (en) * 2018-10-26 2020-04-30 Asml Netherlands B.V. Monitoring light emissions
WO2020197719A1 (en) * 2019-03-27 2020-10-01 Cymer, Llc Pressure-controlled spectral feature adjuster
WO2020242540A1 (en) 2019-05-30 2020-12-03 University Of Virginia Patent Foundation Low power receiver and related circuits
JP7329422B2 (ja) 2019-11-18 2023-08-18 ギガフォトン株式会社 ビームデリバリシステム、焦点距離選定方法及び電子デバイスの製造方法
KR20220166280A (ko) 2020-04-09 2022-12-16 에이에스엠엘 네델란즈 비.브이. 방사선 소스용 시드 레이저 시스템

Citations (7)

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Publication number Priority date Publication date Assignee Title
GB2232526A (en) * 1989-01-10 1990-12-12 Trumpf Lasertechnik Gmbh Laser mirror head
US20040036940A1 (en) * 2002-06-20 2004-02-26 Hazelton Andrew J. Adaptive optic with discrete actuators for continuous deformation of a deformable mirror system
TW200822813A (en) * 2006-10-13 2008-05-16 Cymer Inc Drive laser delivery systems for EUV light source
US20100078577A1 (en) * 2008-09-19 2010-04-01 Gigaphoton Inc. Extreme ultraviolet light source device, laser light source device for extreme ultraviolet light source device, and method of adjusting laser light source device for extreme ultraviolet light source device
US20100078580A1 (en) * 2008-09-26 2010-04-01 Gigaphoton Inc. Extreme ultraviolet light source device, laser light source device for extreme ultraviolet light source device and method for controlling saturable absorber used in extreme ultraviolet light source device
US20100117009A1 (en) * 2008-11-06 2010-05-13 Gigaphoton Inc. Extreme ultraviolet light source device and control method for extreme ultraviolet light source device
CN103560387A (zh) * 2013-11-14 2014-02-05 中国电子科技集团公司第十一研究所 一种双程吸收分光匹配激光放大器及其放大方法

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8283643B2 (en) 2008-11-24 2012-10-09 Cymer, Inc. Systems and methods for drive laser beam delivery in an EUV light source
JP5946612B2 (ja) 2010-10-08 2016-07-06 ギガフォトン株式会社 ミラー、ミラー装置、レーザ装置および極端紫外光生成装置
US8810902B2 (en) 2010-12-29 2014-08-19 Asml Netherlands B.V. Multi-pass optical apparatus
JP5816440B2 (ja) * 2011-02-23 2015-11-18 ギガフォトン株式会社 光学装置、レーザ装置および極端紫外光生成装置
JP2013201388A (ja) * 2012-03-26 2013-10-03 Gigaphoton Inc レーザシステム及び極端紫外光生成システム
US8811440B2 (en) * 2012-09-07 2014-08-19 Asml Netherlands B.V. System and method for seed laser mode stabilization

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2232526A (en) * 1989-01-10 1990-12-12 Trumpf Lasertechnik Gmbh Laser mirror head
US20040036940A1 (en) * 2002-06-20 2004-02-26 Hazelton Andrew J. Adaptive optic with discrete actuators for continuous deformation of a deformable mirror system
TW200822813A (en) * 2006-10-13 2008-05-16 Cymer Inc Drive laser delivery systems for EUV light source
US20100078577A1 (en) * 2008-09-19 2010-04-01 Gigaphoton Inc. Extreme ultraviolet light source device, laser light source device for extreme ultraviolet light source device, and method of adjusting laser light source device for extreme ultraviolet light source device
US20100078580A1 (en) * 2008-09-26 2010-04-01 Gigaphoton Inc. Extreme ultraviolet light source device, laser light source device for extreme ultraviolet light source device and method for controlling saturable absorber used in extreme ultraviolet light source device
US20100117009A1 (en) * 2008-11-06 2010-05-13 Gigaphoton Inc. Extreme ultraviolet light source device and control method for extreme ultraviolet light source device
CN103560387A (zh) * 2013-11-14 2014-02-05 中国电子科技集团公司第十一研究所 一种双程吸收分光匹配激光放大器及其放大方法

Also Published As

Publication number Publication date
JP2017516288A (ja) 2017-06-15
CN106465525A (zh) 2017-02-22
WO2015128297A1 (en) 2015-09-03
US9380691B2 (en) 2016-06-28
JP6663353B2 (ja) 2020-03-11
TW201536112A (zh) 2015-09-16
KR102458094B1 (ko) 2022-10-21
KR20160125962A (ko) 2016-11-01
TWI670996B (zh) 2019-09-01
US20150250045A1 (en) 2015-09-03

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