JP6663340B2 - 半導体装置 - Google Patents
半導体装置 Download PDFInfo
- Publication number
- JP6663340B2 JP6663340B2 JP2016211435A JP2016211435A JP6663340B2 JP 6663340 B2 JP6663340 B2 JP 6663340B2 JP 2016211435 A JP2016211435 A JP 2016211435A JP 2016211435 A JP2016211435 A JP 2016211435A JP 6663340 B2 JP6663340 B2 JP 6663340B2
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- Prior art keywords
- wire
- bonding
- width
- semiconductor chip
- set1
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- 239000004065 semiconductor Substances 0.000 title claims description 267
- 238000007789 sealing Methods 0.000 claims description 94
- 238000005304 joining Methods 0.000 claims description 89
- 239000000463 material Substances 0.000 claims description 48
- 229920005989 resin Polymers 0.000 claims description 37
- 239000011347 resin Substances 0.000 claims description 37
- 230000002093 peripheral effect Effects 0.000 claims description 12
- 239000007769 metal material Substances 0.000 claims description 10
- 101150055297 SET1 gene Proteins 0.000 description 131
- 101150117538 Set2 gene Proteins 0.000 description 104
- 238000000034 method Methods 0.000 description 42
- 229910052751 metal Inorganic materials 0.000 description 39
- 239000002184 metal Substances 0.000 description 39
- 230000004048 modification Effects 0.000 description 39
- 238000012986 modification Methods 0.000 description 39
- 238000007747 plating Methods 0.000 description 23
- 101001046426 Homo sapiens cGMP-dependent protein kinase 1 Proteins 0.000 description 20
- 102100022422 cGMP-dependent protein kinase 1 Human genes 0.000 description 20
- 239000010949 copper Substances 0.000 description 20
- 238000004519 manufacturing process Methods 0.000 description 20
- 229910000679 solder Inorganic materials 0.000 description 17
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 15
- 238000000926 separation method Methods 0.000 description 14
- 230000008569 process Effects 0.000 description 13
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 9
- 230000015572 biosynthetic process Effects 0.000 description 9
- 229910052802 copper Inorganic materials 0.000 description 9
- 230000005669 field effect Effects 0.000 description 9
- 239000002245 particle Substances 0.000 description 9
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 8
- 239000000853 adhesive Substances 0.000 description 8
- 230000001070 adhesive effect Effects 0.000 description 8
- 238000005520 cutting process Methods 0.000 description 8
- 229910052709 silver Inorganic materials 0.000 description 8
- 239000004332 silver Substances 0.000 description 8
- 238000000465 moulding Methods 0.000 description 7
- 239000000377 silicon dioxide Substances 0.000 description 7
- 239000000758 substrate Substances 0.000 description 7
- 238000010586 diagram Methods 0.000 description 6
- 238000009713 electroplating Methods 0.000 description 6
- 239000010931 gold Substances 0.000 description 6
- 230000001681 protective effect Effects 0.000 description 6
- 238000012360 testing method Methods 0.000 description 6
- 229920001187 thermosetting polymer Polymers 0.000 description 6
- 239000000945 filler Substances 0.000 description 5
- 235000012239 silicon dioxide Nutrition 0.000 description 5
- 101100042371 Caenorhabditis elegans set-3 gene Proteins 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- 101150104646 SET4 gene Proteins 0.000 description 4
- 229910052581 Si3N4 Inorganic materials 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 239000004020 conductor Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 4
- 229910052737 gold Inorganic materials 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 4
- 229910004298 SiO 2 Inorganic materials 0.000 description 3
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 3
- 239000011368 organic material Substances 0.000 description 3
- 229920001721 polyimide Polymers 0.000 description 3
- 238000003825 pressing Methods 0.000 description 3
- 229910017770 Cu—Ag Inorganic materials 0.000 description 2
- 229910000577 Silicon-germanium Inorganic materials 0.000 description 2
- PQIJHIWFHSVPMH-UHFFFAOYSA-N [Cu].[Ag].[Sn] Chemical compound [Cu].[Ag].[Sn] PQIJHIWFHSVPMH-UHFFFAOYSA-N 0.000 description 2
- JWVAUCBYEDDGAD-UHFFFAOYSA-N bismuth tin Chemical compound [Sn].[Bi] JWVAUCBYEDDGAD-UHFFFAOYSA-N 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 230000012447 hatching Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 230000001771 impaired effect Effects 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 238000007689 inspection Methods 0.000 description 2
- 230000007774 longterm Effects 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 229910000881 Cu alloy Inorganic materials 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 229910020816 Sn Pb Inorganic materials 0.000 description 1
- 229910020888 Sn-Cu Inorganic materials 0.000 description 1
- 229910020922 Sn-Pb Inorganic materials 0.000 description 1
- 229910019204 Sn—Cu Inorganic materials 0.000 description 1
- 229910008783 Sn—Pb Inorganic materials 0.000 description 1
- LEVVHYCKPQWKOP-UHFFFAOYSA-N [Si].[Ge] Chemical compound [Si].[Ge] LEVVHYCKPQWKOP-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 230000001174 ascending effect Effects 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical compound [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 229910001325 element alloy Inorganic materials 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 239000000383 hazardous chemical Substances 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 230000010399 physical interaction Effects 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000010008 shearing Methods 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 238000001721 transfer moulding Methods 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
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- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/495—Lead-frames or other flat leads
- H01L23/49517—Additional leads
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- H01L24/42—Wire connectors; Manufacturing methods related thereto
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- H01L24/46—Structure, shape, material or disposition of the wire connectors prior to the connecting process of a plurality of wire connectors
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- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
- H01L23/293—Organic, e.g. plastic
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- H01L23/3107—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
- H01L23/3114—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed the device being a chip scale package, e.g. CSP
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- H01L23/3107—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
- H01L23/3121—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed a substrate forming part of the encapsulation
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- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/495—Lead-frames or other flat leads
- H01L23/49503—Lead-frames or other flat leads characterised by the die pad
- H01L23/4951—Chip-on-leads or leads-on-chip techniques, i.e. inner lead fingers being used as die pad
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- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/495—Lead-frames or other flat leads
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- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/495—Lead-frames or other flat leads
- H01L23/49541—Geometry of the lead-frame
- H01L23/49562—Geometry of the lead-frame for devices being provided for in H01L29/00
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- H01L23/49575—Assemblies of semiconductor devices on lead frames
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- H01L24/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
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- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/56—Encapsulations, e.g. encapsulation layers, coatings
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- H01L2224/0554—External layer
- H01L2224/05599—Material
- H01L2224/056—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
- H01L2224/05617—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than or equal to 400°C and less than 950°C
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- H01L2224/0603—Bonding areas having different sizes, e.g. different heights or widths
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- H01L2224/291—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
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Description
本願において、実施の態様の記載は、必要に応じて、便宜上複数のセクション等に分けて記載するが、特にそうでない旨明示した場合を除き、これらは相互に独立別個のものではなく、記載の前後を問わず、単一の例の各部分、一方が他方の一部詳細または一部または全部の変形例等である。また、原則として、同様の部分は繰り返しの説明を省略する。また、実施の態様における各構成要素は、特にそうでない旨明示した場合、理論的にその数に限定される場合および文脈から明らかにそうでない場合を除き、必須のものではない。
図1は、本実施の形態の半導体装置が備える回路の一例を模式的に示す説明図である。また、図2は、図1に示す電界効果トランジスタの素子構造例を示す要部断面図である。
次に、図1に示す半導体装置PKG1のパッケージ構造について説明する。図3は、図1に示す半導体装置の上面図である。また、図4は、図3に示す半導体装置の下面図である。また、図5は、図3に示す封止体を取り除いた状態で、半導体装置の内部構造を示す透視平面図である。また、図6は、図5のA−A線に沿った断面図である。
は、ワイヤ12(詳しくはワイヤ12G)を介して電気的に接続されている。同様に、半導体チップ10のソース電極パッドSEとリード30Sは、ワイヤ(導電性部材、金属線)12(詳しくはワイヤ12S)を介して電気的に接続されている。ワイヤ12は、半導体チップ10の表面10t側の電極パッドとリード30とを接続する導電性部材であって、例えばアルミニウム(Al)を主成分としている。なお、ワイヤ12の構成材料には種々の変形例があり、例えば、銅(Cu)、銀(Ag)、あるいは金(Au)などの金属材料が主成分であっても良い。
ここで、半導体チップの電極パッドと、ワイヤとが接続される部分の詳細について説明する。図7は、図5に示す半導体チップの上面周辺を拡大して示す拡大平面図である。また、図8は、図7のA−A線に沿った拡大断面図である。図9は、図7のB−B線に沿った拡大断面図である。図8では、半導体チップ10が備える多数のトランジスタQ1のうち、二個のトランジスタQ1を代表的に示している。
次に、図1〜図10を用いて説明した半導体装置PKG1の製造工程について説明する。半導体装置PKG1は、図12に示すフローに沿って製造される。図12は、図1〜図10を用いて説明した半導体装置の製造工程の概要を示す説明図である。以下の説明では、半導体装置PKG1の構成部品の説明に際し、必要に応じて既に説明した図1〜図11を参照して説明する場合がある。
図12に示す半導体チップ準備工程では、図13に示す半導体チップ10を準備する。図13は、図12に示す半導体チップ準備工程で準備する半導体チップの表面(電極露出面)側の平面図である。
また、図12に示すリードフレーム準備工程では、図14に示すリードフレームLFを準備する。また、図14は、図12に示すリードフレーム準備工程で準備するリードフレームの一部を示す拡大平面図である。
次に、図12に示す半導体チップ搭載工程では、図15に示すように、リードフレームLFのダイパッド20に半導体チップ10を搭載する。図15は、図14に示すダイパッド上に半導体チップを搭載した状態を示す拡大平面図である。
次に、図12に示すワイヤボンド工程では、図16に示すように、半導体チップ10の複数の電極パッド(ゲート電極パッドGEおよびソース電極パッドSE)と複数のリード30のそれぞれをワイヤ(金属ワイヤ)12を介して電気的に接続する。図16は、図15に示す半導体チップと、リードとを、ワイヤを介して電気的に接続した状態を示す拡大平面図である。図17および図18は、ウェッジツールを用いたワイヤボンド工程の例を示す説明図である。図19および図20は、図17に示す第1ボンド工程または第2ボンド工程において、半導体チップの電極パッドにワイヤ12を圧着する状態を示す拡大断面図である。図17および図18に示す拡大断面は、図16のA−A線に沿った断面に対応している。また、図19および図20は、図16のX方向に沿った拡大断面に対応する。
次に、図12に示す封止工程では、図16に示す、半導体チップ10、ダイパッド20の一部、複数のリード30のそれぞれの一部分(図22に示すインナ部30M)、および複数のワイヤ12を絶縁樹脂で封止し、図21に示す封止体40を形成する。図21は、図16に示す半導体チップおよびワイヤを封止する封止体を形成した状態を示す拡大平面図である。また、図22は、図21のA−A線に沿った断面において、成形金型内にリードフレームが配置された状態を示す拡大断面図である。また、図23は、封止工程において、樹脂に封止されたワイヤの周辺を示す拡大断面図である。
次に、図12に示すめっき工程では、リードフレームLFを図示しないめっき溶液に浸し、封止体40から露出した金属部分(アウタ部)の表面に金属膜(図6に示す金属膜22および金属膜32)を形成する。
次に、図12に示す個片化工程では、図24に示すように、半導体装置PKG1(図3参照)に相当する組立体PKG0をリードフレームLFの枠部LFfおよびタイバーLFtから分離して、個片化する。図24は、図12に示す個片化工程で、複数のデバイス形成部のそれぞれを分離した状態を示す拡大平面図である。
上記実施の形態では、図7に示すように、X方向において、領域13R1の幅P1が、ワイヤ12S1の接続部12B1の幅WW1より大きい実施態様について説明した。上記実施の形態で説明したように、ワイヤ12S1、12S2の線径(直径)に対して、開口部13H1の開口面積および開口部13H2の開口面積が小さい状態で、領域13R1の幅P1が小さくなると、隣り合うワイヤ12S1、12S2の離間距離が短くなる。この場合、ワイヤボンディングを行う際に、ボンディングツール(例えば図19に示すウェッジツールWT)が隣のワイヤに接触する可能性がある。
また、上記実施の形態では、例えば図8に示すように、一つのソース電極パッドSEの複数の部分が絶縁膜13に設けられた複数の開口部13H1において露出している実施態様について説明した。しかし、図27に示す変形例のように、接合面SEt1が、絶縁膜13に覆われたソース電極パッド(電極、ソース電極)SE1の一部であり、接合面SEt2が、絶縁膜13に覆われたソース電極パッド(電極、ソース電極)SE2の一部であっても良い。図27は、図8に対する変形例を示す拡大断面図である。
また、上記実施の形態では、例えば図7に示すように、接合面SEt1と接合面SEt2の構造、およびワイヤ12S1とワイヤ12S2の構造が同じ構造である実施態様について説明した。この場合、接合面SEt1とワイヤ12S1とが接続される部分を取り上げて説明した効果と同等の効果が、接合面SEt2とワイヤ12S2とが接続される部分でも得られる。しかし、例えば図28に示す変形例の半導体チップ10Dのように、接合面SEt1と接合面SEt2の構造、あるいはワイヤ12S1とワイヤ12S2の構造が互いに異なっていても良い。図28は、図7に対する他の変形例を示す拡大平面図である。
また、上記実施の形態では、例えば図7に示すように、接合面SEt1と接合面SEt2の形状が長方形である場合について説明した。しかし、接合面SEt1と接合面SEt2の形状は長方形には限定されず、例えば、多角形や円形(楕円形を含む)など種々の変形例がある。一例として、図29を用いて接合面SEt1と接合面SEt2の輪郭(周縁部)が湾曲した形状である場合の実施態様を取り上げて説明する。図29は、図7に対する他の変形例を示す拡大平面図である。
また、図示は省略するが、図7に対する他の変形例として、ワイヤ12S1が、三箇所以上で一つの接合面SEt1に接合されていても良い。この場合、ワイヤ12S1と接合面SEt1の接合面積が増えるので、ワイヤ12S1を介する導電経路のインピーダンスを低減できる。ワイヤ12S2についても同様である。
また、上記実施の形態では、パワー半導体装置が備えるパワートランジスタの例として、MOSFETを例示したが、種々の変形例を適用できる。例えば、MOSFETに代えて、IGBTを備えていても良い。この場合、上記実施の形態で説明したMOSFETのドレインをIGBTのコレクタと読み替え、MOSFETのソースをIGBTのエミッタと読み替えて適用できる。また、IGBTを利用する場合、負荷電流の流れ方向を制御するダイオード(FWD,Free Wheeling Diode)チップがIGBTチップとは別に搭載される場合が多い。このため、図5に示すダイパッド20上には、IGBTチップおよびFWDチップが搭載される。
また、上記実施の形態では、例えば図7に示す半導体チップ10のように、接合面SEt1および接合面SEt2の配列方向であるX方向と、接合面SEt1および接合面SEt2の延在方向であるY方向とが半導体チップ10の表面10tの外縁の各辺に沿って延びている実施態様について説明した。しかし、上記した各構成は、X方向およびY方向のそれぞれが半導体チップ10の表面10tの外縁の各辺に対して、直交以外の角度で交差している場合にも適用可能である。図30は、図7に対する他の変形例を示す拡大平面図である。
また、例えば、上記の通り種々の変形例について説明したが、上記で説明した各変形例同士を組み合わせて適用することができる。また、各変形例の一部分を抽出して組み合わせても良い。
第1主面に形成され、かつ、第1接合面を露出する第1開口部と、第2接合面を露出する第2開口部を備えた絶縁膜を有する半導体チップと、
前記半導体チップの前記第1接合面と接合する第1導電性部材と、
前記半導体チップの前記第2接合面と接合する第2導電性部材と、
前記半導体チップの前記第1接合面および前記第2接合面に接するように、前記半導体チップと、前記第1導電性部材と、前記第2導電性部材とを封止する封止体と、を有し、
前記第1導電性部材は、前記第1接合面に接合する第1接続部、前記第1接合面に接合する第2接続部、および平面視の第1方向において前記第1接続部と前記第2接続部との間に位置し、前記第1接合面と離間する第1ループ部を有し、
前記第2導電性部材は、前記第2接合面に接合する第3接続部、前記第2接合面に接合する第4接続部、および平面視において前記第3接続部と前記第4接続部との間に位置し、前記第2接合面と離間する第2ループ部を有し、
平面視において、前記第1接合面および前記第2接合面は、前記第1方向と交差する第2方向に沿って並ぶように配置され、
前記第1接合面および前記第2接合面のそれぞれの周縁部は、前記第2方向において、各接合面に接合されるワイヤの一方の側にある第1部分(第1辺)と、前記ワイヤの他方の側にある第2部分(第2辺)と、を有し、
前記第2方向において、前記第1接合面の前記第2部分と、前記第2接合面の前記第1部分とは、前記絶縁膜の第1領域を介して互いに隣り合うように配置され、
前記第2方向において、前記第1接合面のうち、前記第1導電性部材と前記第1接合面の前記第2部分に挟まれた領域の最大幅は、前記絶縁膜の前記第1領域の幅より小さい、半導体装置。
第1主面に形成され、かつ、第1接合面を露出する第1開口部と、第2接合面を露出する第2開口部を備えた絶縁膜を有する半導体チップと、
前記半導体チップの前記第1接合面と接合する第1導電性部材と、
前記半導体チップの前記第2接合面と接合する第2導電性部材と、
前記半導体チップの前記第1接合面および前記第2接合面に接するように、前記半導体チップと、前記第1導電性部材と、前記第2導電性部材とを封止する封止体と、を有し、
前記第1導電性部材は、前記第1接合面に接合する第1接続部、前記第1接合面に接合する第2接続部、および平面視の第1方向において前記第1接続部と前記第2接続部との間に位置し、前記第1接合面と離間する第1ループ部を有し、
前記第2導電性部材は、前記第2接合面に接合する第3接続部、前記第2接合面に接合する第4接続部、および平面視において前記第3接続部と前記第4接続部との間に位置し、前記第2接合面と離間する第2ループ部を有し、
平面視において、前記第1接合面および前記第2接合面は、前記第1方向と交差する第2方向に沿って並ぶように配置され、
前記第1接合面および前記第2接合面のそれぞれの周縁部は、前記第2方向において、各接合面に接合されるワイヤの一方の側にある第1部分(第1辺)と、前記ワイヤの他方の側にある第2部分(第2辺)と、を有し、
前記第2方向において、前記第1接合面の前記第2部分と、前記第2接合面の前記第1部分とは、前記絶縁膜の第1領域を介して互いに隣り合うように配置され、
平面視において、前記第1接合面の前記第2部分と前記第2接合面の前記第1部分の間に挟まれた前記第1領域の面積は、前記第1接合面のうち、前記第1導電性部材と重なっていない部分の面積より大きい、半導体装置。
付記2において、
平面視において、前記絶縁膜の前記第1開口部および前記第2開口部のそれぞれは、前記第1方向に沿って延びる第1辺と、前記第1方向に沿って延び、かつ、前記第1辺の反対側にある第2辺と、前記第1方向に交差する前記第2方向に沿って延びる第3辺と、前記第2方向に沿って延び、かつ、前記第3辺の反対側にある第4辺と、を有し、
平面視において、前記第1領域の外周は、前記第1開口部の前記第2辺と、前記第2開口部の前記第1辺と、前記第1開口部の前記第3辺と前記第2辺の交点から前記第2開口部の前記第3辺と前記第1辺の交点まで延びる第5辺と、前記第1開口部の前記第4辺と前記第2辺の交点から前記第2開口部の前記第4辺と前記第1辺の交点まで延びる第6辺と、を有し、
前記第1領域の面積と、前記第1開口部の面積とは、互いに等しい、半導体装置。
付記2において、
平面視において、前記絶縁膜の前記第1開口部および前記第2開口部のそれぞれは、前記第1方向に沿って延びる第1辺と、前記第1方向に沿って延び、かつ、前記第1辺の反対側にある第2辺と、前記第1方向に交差する前記第2方向に沿って延びる第3辺と、前記第2方向に沿って延び、かつ、前記第3辺の反対側にある第4辺と、を有し、
平面視において、前記第1領域の外周は、前記第1開口部の前記第2辺と、前記第2開口部の前記第1辺と、前記第1開口部の前記第3辺と前記第2辺の交点から前記第2開口部の前記第3辺と前記第1辺の交点まで延びる第5辺と、前記第1開口部の前記第4辺と前記第2辺の交点から前記第2開口部の前記第4辺と前記第1辺の交点まで延びる第6辺と、を有し、
前記第1領域の面積と、前記第1開口部の面積とは、互いに異なる、半導体装置。
付記2において、
平面視において、前記第1開口部の面積と前記第2開口部の面積は互いに等しい、半導体装置。
以下の工程を有する半導体装置の製造方法。
(b)前記半導体チップが固定される第2主面を有するチップ搭載部と、前記チップ搭載部から延びる第1リードと、前記第1リードと並んで延びる第2リードを有するリードフレームを準備する工程と、
(c)前記(a)工程と、前記(b)工程の後、前記半導体チップの第1裏面と前記チップ搭載部の第2主面が向い合うように前記半導体チップを前記チップ搭載部に搭載する工程と、
(d)前記(c)工程の後、第1ボンディングツールによって、前記半導体チップの前記複数の開口部から露出する前記第1電極の前記接合面と前記第1リードとを、複数の導電性部材を介して、互いに電気的に接続する工程と、
(e)前記(d)工程の後、前記第1電極の前記接合面に接するように、前記半導体チップ、前記チップ搭載部の一部、前記複数の導電性部材、前記第1リードの一部、前記第2リードの一部を樹脂で封止する工程と、を有し、
前記(a)工程において、
平面視において、第1方向に沿って前記複数の開口部は配置されており、
平面視において、前記絶縁膜の前記複数の開口部のそれぞれは、前記第1方向に沿って延びる第1辺と、前記第1方向に沿って延び、かつ、前記第1辺の反対側にある第2辺と、前記第1方向に交差する第2方向に沿って延びる第3辺と、前記第2方向に沿って延び、かつ、前記第3辺の反対側にある第4辺を有し、
平面視において、前記複数の開口部のうちの第1開口部の前記第4辺と、前記複数の開口部のうちの第2開口部の前記第3辺とは、前記絶縁膜の第1領域を介して互いに隣り合うように位置しており、
前記(d)工程は、
(d−1)前記複数の開口部のうちの前記第1開口部において、前記複数の導電性部材のうちの第1導電性部材の第1接続部と前記接合面を接合する工程と、
(d−2)前記(d−1)工程の後、前記第1開口部において、前記第1導電性部材の第2接続部と前記接合面を接合する工程と、
(d−3)前記(d−2)工程の後、前記第1導電性部材の第3接続部と前記第1リードを接合する工程と、を有し、
前記第1方向において、前記第1開口部の幅は前記第1ボンディングツールの先端部の幅より小さく、
前記(d−1)工程と前記(d−2)において、
前記第1ボンディングツールの先端部の一部は、前記絶縁膜の一部を覆う位置に配置されている、半導体装置の製造方法。
〔付記7〕
付記6において、
前記(d)工程には、前記(d−1)工程の後、かつ、前記(d−2)工程の前に、前記第1ボンディングツールを前記接合面から遠ざけた後、前記第2方向に沿って移動させる工程が含まれる、半導体装置の製造方法。
〔付記8〕
付記6において、
前記(d)工程には、前記(d−2)工程の後、かつ、前記(d−3)工程の前に、前記第1ボンディングツールを前記接合面から遠ざけた後、前記第1リードに向かって移動させる工程が含まれる、半導体装置の製造方法。
〔付記9〕
付記6において、
前記(d)工程の後、平面視において、前記第1導電性部材は前記第1開口部の複数の辺のうちのいずれかと交差する、半導体装置の製造方法。
〔付記10〕
付記6において、
前記第1方向において、前記絶縁膜のうち、前記第1開口部が有する前記第4辺と、前記第2開口部が有する前記第3辺に挟まれる前記第1領域の幅は、前記第1ボンディングツールの先端部の幅より小さい、半導体装置の製造方法。
10b 裏面(面、主面、下面)
10s 側面(面)
10t 表面(面、主面、上面)
11 ダイボンド材(接着材)
12、12G、12S,12S1,12S2,12S3 ワイヤ(金属ワイヤ、導電性部材、金属線)
12B1,12B2,12B3 接続部(接合部、ステッチ部)
12L1,12L2 ループ部(延在部)
13 絶縁膜(保護膜)
13H1,13H2,13H3,13H4 開口部
13R1,13R2 領域
20 ダイパッド(金属板、チップ搭載部、放熱板)
20b 下面(面、主面、裏面、露出面、実装面)
20s,20s1,20s2 側面
20t 上面(面、主面、表面、チップ搭載面)
21 基材
22,32 金属膜(めっき膜)
30,30D,30G,30S リード(端子)
30b 下面(面)
30M インナ部(インナリード部、被封止部)
30s 側面
30t 上面(面、ワイヤボンディング面)
30W ワイヤ接合部((リードポスト、パッド、ボンディングパッド、ワイヤ接続部、接合部)
30X アウタ部(アウタリード部、露出部)
31 基材
40 封止体(樹脂封止体、樹脂体、モールド樹脂)
40b 下面(実装面)
40s 側面
40t 上面
62 成形金型
62B 下型(第2金型)
62C キャビティ
62T 上型(第1金型)
CH チャネル形成領域
D ドレイン
DE ドレイン電極(電極)
EP エピタキシャル層
G ゲート電極
GE ゲート電極パッド(電極、ゲート電極)
GEt,SEt1,SEt2,SEt3,SEt4,SEt5 接合面(露出面、接合部)
GI ゲート絶縁膜
GW 配線(ゲート配線)
HP1,HP2 部分
HS1,HS2,HS3,HS4 辺(部分)
HS5,HS6 辺
LF リードフレーム
LFd デバイス形成部
LFf 枠部(フレーム部)
LFt タイバー
LS1,LS2 辺
PKG0 組立体
PKG1 半導体装置
Q1 トランジスタ
S ソース
SE,SE1,SE2 ソース電極パッド(電極、ソース電極)
SR ソース領域
SW 配線(ソース配線)
TR1 トレンチ(開口部、溝)
WH 半導体基板
WH1,WH2,WR1,WR2,WR3,WR4,WR5,WR6,WW1,WW2,WW3,WW4,WWT 幅(太さ)
WHt 主面
WT ウェッジツール(ボンディングツール)
WTc ワイヤカッタ(カッタブレード)
WTg ワイヤガイド
WTh 本体部(ヘッダ)
WThb 先端面(先端部、ヒール部、押圧面)
WThs 側面
Claims (3)
- 第1主面に形成され、かつ、第1接合面を露出する第1開口部と、第2接合面を露出する第2開口部を備えた絶縁膜を有する半導体チップと、
前記半導体チップの前記第1接合面と接合する第1ワイヤと、
前記半導体チップの前記第2接合面と接合する第2ワイヤと、
前記半導体チップの前記第1接合面および前記第2接合面に接するように、前記半導体チップと、前記第1ワイヤと、前記第2ワイヤとを封止する封止体と、を有し、
前記第1接合面および前記第2接合面は、金属材料から成り、
前記封止体は、樹脂材料から成り、
前記第1ワイヤは、前記第1接合面に接合する第1接続部、前記第1接合面に接合する第2接続部、および平面視の第1方向において前記第1接続部と前記第2接続部との間に位置し、前記第1接合面と離間する第1ループ部を有し、
前記第2ワイヤは、前記第2接合面に接合する第3接続部、前記第2接合面に接合する第4接続部、および平面視において前記第3接続部と前記第4接続部との間に位置し、前記第2接合面と離間する第2ループ部を有し、
平面視において、前記第1接合面および前記第2接合面は、前記第1方向と交差する第2方向に沿って並ぶように配置され、
前記第1接合面および前記第2接合面のそれぞれの周縁部は、前記第2方向において、各接合面に接合されるワイヤの一方の側にある第1部分と、前記ワイヤの他方の側にある第2部分と、を有し、
前記第2方向において、前記第1接合面の前記第2部分と、前記第2接合面の前記第1部分とは、前記絶縁膜の第1領域を介して互いに隣り合うように配置され、
前記第2方向において、前記第1領域の幅は、複数の値を含み、
前記第1領域の幅が含んでいる複数の値のうちの、最小の値は、前記第1ワイヤの前記第1ループ部の幅より大きく、
前記第1領域の幅および前記第1ワイヤの前記第1ループ部の幅とは、前記第2方向における長さである、半導体装置。 - 請求項1において、
平面視において、前記第1ワイヤは、前記第1開口部が有する周縁部のうちの一部に交差し、前記第2ワイヤは、前記第2開口部が有する周縁部のうちの一部に交差する、半導体装置。 - 請求項1において、
前記第2方向において、前記第1接合面のうち、前記第1ワイヤと前記第1接合面の前記第2部分に挟まれた領域の最大幅は、前記絶縁膜の前記第1領域の幅より小さい、半導体装置。
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