JP6658897B2 - セラミックス基複合材料及びその製造方法 - Google Patents
セラミックス基複合材料及びその製造方法 Download PDFInfo
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- JP6658897B2 JP6658897B2 JP2018536053A JP2018536053A JP6658897B2 JP 6658897 B2 JP6658897 B2 JP 6658897B2 JP 2018536053 A JP2018536053 A JP 2018536053A JP 2018536053 A JP2018536053 A JP 2018536053A JP 6658897 B2 JP6658897 B2 JP 6658897B2
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- 239000000919 ceramic Substances 0.000 title claims description 56
- 239000002131 composite material Substances 0.000 title claims description 55
- 238000004519 manufacturing process Methods 0.000 title claims description 24
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims description 128
- 239000000835 fiber Substances 0.000 claims description 69
- 229910010271 silicon carbide Inorganic materials 0.000 claims description 66
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 46
- 239000002210 silicon-based material Substances 0.000 claims description 44
- 229910052799 carbon Inorganic materials 0.000 claims description 40
- 239000011159 matrix material Substances 0.000 claims description 38
- 229910045601 alloy Inorganic materials 0.000 claims description 35
- 239000000956 alloy Substances 0.000 claims description 35
- 230000008018 melting Effects 0.000 claims description 34
- 238000002844 melting Methods 0.000 claims description 34
- 238000010438 heat treatment Methods 0.000 claims description 32
- 239000000463 material Substances 0.000 claims description 32
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 31
- 229910052710 silicon Inorganic materials 0.000 claims description 31
- 239000010703 silicon Substances 0.000 claims description 31
- 229910000676 Si alloy Inorganic materials 0.000 claims description 27
- 238000005470 impregnation Methods 0.000 claims description 25
- 239000000843 powder Substances 0.000 claims description 22
- 229910021417 amorphous silicon Inorganic materials 0.000 claims description 20
- 229910008326 Si-Y Inorganic materials 0.000 claims description 17
- 229910006773 Si—Y Inorganic materials 0.000 claims description 17
- 238000000034 method Methods 0.000 claims description 14
- 229910008332 Si-Ti Inorganic materials 0.000 claims description 12
- 229910006749 Si—Ti Inorganic materials 0.000 claims description 12
- 239000000758 substrate Substances 0.000 claims description 12
- 229910001029 Hf alloy Inorganic materials 0.000 claims description 11
- 239000000155 melt Substances 0.000 claims description 7
- 238000006243 chemical reaction Methods 0.000 claims description 6
- 239000011153 ceramic matrix composite Substances 0.000 claims description 5
- 230000015556 catabolic process Effects 0.000 claims description 3
- 238000006731 degradation reaction Methods 0.000 claims description 3
- 230000003647 oxidation Effects 0.000 description 47
- 238000007254 oxidation reaction Methods 0.000 description 47
- 239000002002 slurry Substances 0.000 description 16
- 239000012071 phase Substances 0.000 description 13
- 239000002245 particle Substances 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 7
- 229910021419 crystalline silicon Inorganic materials 0.000 description 7
- 239000012535 impurity Substances 0.000 description 7
- 239000010936 titanium Substances 0.000 description 7
- 230000005496 eutectics Effects 0.000 description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 230000006866 deterioration Effects 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 238000005979 thermal decomposition reaction Methods 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 239000002759 woven fabric Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- 229910000946 Y alloy Inorganic materials 0.000 description 2
- -1 and for example Chemical compound 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- 229910002092 carbon dioxide Inorganic materials 0.000 description 2
- 239000001569 carbon dioxide Substances 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000011049 filling Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 239000007769 metal material Substances 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 238000005245 sintering Methods 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910008484 TiSi Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 238000005054 agglomeration Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000008119 colloidal silica Substances 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000007561 laser diffraction method Methods 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 239000005055 methyl trichlorosilane Substances 0.000 description 1
- JLUFWMXJHAVVNN-UHFFFAOYSA-N methyltrichlorosilane Chemical compound C[Si](Cl)(Cl)Cl JLUFWMXJHAVVNN-UHFFFAOYSA-N 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- 230000003014 reinforcing effect Effects 0.000 description 1
- 238000009774 resonance method Methods 0.000 description 1
- 238000000790 scattering method Methods 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 238000009941 weaving Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
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Description
Claims (8)
- セラミックス基複合材料であって、
炭化珪素繊維で形成される繊維体を含む基材と、
前記基材に形成され、炭化珪素と、珪素または2元系珪素合金からなる珪素材と、を含むマトリックスと、
を備え、
前記マトリックスが、炭素単体を含まない、セラミックス基複合材料。 - 請求項1に記載のセラミックス基複合材料であって、
前記マトリックスの炭化珪素は、反応焼結炭化珪素を除く、セラミックス基複合材料。 - 請求項1または2に記載のセラミックス基複合材料であって、
前記炭化珪素繊維は、非結晶性炭化珪素繊維であり、
前記珪素材は、2元系珪素合金である、セラミックス基複合材料。 - 請求項1から3のいずれか1つに記載のセラミックス基複合材料であって、
前記2元系珪素合金は、Si−Y合金、Si−Ti合金またはSi−Hf合金である、セラミックス基複合材料。 - セラミックス基複合材料の製造方法であって、
炭化珪素繊維で形成される繊維体を含む基材に、炭素単体を含まない炭化珪素粉末を含浸する粉末含浸工程と、
前記炭化珪素粉末を含浸した炭素単体を含まない基材に、珪素または2元系珪素合金からなる珪素材を、前記珪素材の融点以上で熱処理することにより溶融させて含浸する溶融含浸工程と、
を備える、セラミックス基複合材料の製造方法。 - 請求項5に記載のセラミックス基複合材料の製造方法であって、
前記炭化珪素繊維は、非結晶性炭化珪素繊維であり、
前記溶融含浸工程は、前記珪素材が2元系珪素合金であり、前記珪素材の融点以上、且つ前記非結晶性炭化珪素繊維の熱劣化温度より低い温度で熱処理する、セラミックス基複合材料の製造方法。 - 請求項5または6に記載のセラミックス基複合材料の製造方法であって、
前記2元系珪素合金は、Si−Y合金、Si−Ti合金またはSi−Hf合金である、セラミックス基複合材料の製造方法。 - 請求項5から7のいずれか1つに記載のセラミックス基複合材料の製造方法であって、
前記溶融含浸工程は、前記基材の上に、前記珪素材で形成した鋳塊を配置して含浸する、セラミックス基複合材料の製造方法。
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