JP6633904B2 - プレス成形用ガラス素材、ガラス光学素子およびその製造方法 - Google Patents
プレス成形用ガラス素材、ガラス光学素子およびその製造方法 Download PDFInfo
- Publication number
- JP6633904B2 JP6633904B2 JP2015243700A JP2015243700A JP6633904B2 JP 6633904 B2 JP6633904 B2 JP 6633904B2 JP 2015243700 A JP2015243700 A JP 2015243700A JP 2015243700 A JP2015243700 A JP 2015243700A JP 6633904 B2 JP6633904 B2 JP 6633904B2
- Authority
- JP
- Japan
- Prior art keywords
- glass
- oxide
- press molding
- press
- coating layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000011521 glass Substances 0.000 title claims description 172
- 238000000465 moulding Methods 0.000 title claims description 152
- 239000000463 material Substances 0.000 title claims description 102
- 230000003287 optical effect Effects 0.000 title claims description 66
- 238000004519 manufacturing process Methods 0.000 title claims description 20
- 239000000075 oxide glass Substances 0.000 claims description 134
- 239000011247 coating layer Substances 0.000 claims description 101
- 239000010410 layer Substances 0.000 claims description 86
- 229910044991 metal oxide Inorganic materials 0.000 claims description 51
- 150000004706 metal oxides Chemical class 0.000 claims description 51
- 229910052760 oxygen Inorganic materials 0.000 claims description 48
- 239000000203 mixture Substances 0.000 claims description 47
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 46
- 239000001301 oxygen Substances 0.000 claims description 46
- 229910052751 metal Inorganic materials 0.000 claims description 44
- 239000002184 metal Substances 0.000 claims description 43
- 230000009477 glass transition Effects 0.000 claims description 42
- 230000002950 deficient Effects 0.000 claims description 25
- 238000009792 diffusion process Methods 0.000 claims description 23
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 23
- 125000004429 atom Chemical group 0.000 claims description 18
- 238000003825 pressing Methods 0.000 claims description 18
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical group [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims description 15
- 229910001928 zirconium oxide Inorganic materials 0.000 claims description 15
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 10
- 239000010955 niobium Substances 0.000 claims description 10
- 239000010936 titanium Substances 0.000 claims description 10
- 229910052726 zirconium Inorganic materials 0.000 claims description 9
- 229910052727 yttrium Inorganic materials 0.000 claims description 5
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 claims description 5
- 229910052758 niobium Inorganic materials 0.000 claims description 4
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 4
- 229910052715 tantalum Inorganic materials 0.000 claims description 4
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 4
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 4
- 229910052721 tungsten Inorganic materials 0.000 claims description 4
- 239000010937 tungsten Substances 0.000 claims description 4
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 3
- 229910052719 titanium Inorganic materials 0.000 claims description 3
- 238000000034 method Methods 0.000 description 30
- 150000002500 ions Chemical group 0.000 description 28
- 230000000052 comparative effect Effects 0.000 description 18
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 15
- 229910052799 carbon Inorganic materials 0.000 description 15
- 238000004458 analytical method Methods 0.000 description 14
- 230000007423 decrease Effects 0.000 description 12
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 description 12
- 239000005304 optical glass Substances 0.000 description 11
- 229910018068 Li 2 O Inorganic materials 0.000 description 10
- 229910010413 TiO 2 Inorganic materials 0.000 description 10
- 239000007789 gas Substances 0.000 description 10
- 238000010586 diagram Methods 0.000 description 9
- 238000004544 sputter deposition Methods 0.000 description 8
- 229910021193 La 2 O 3 Inorganic materials 0.000 description 7
- 229910004298 SiO 2 Inorganic materials 0.000 description 7
- 238000005187 foaming Methods 0.000 description 7
- 238000010438 heat treatment Methods 0.000 description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 6
- 150000001768 cations Chemical class 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- 230000001590 oxidative effect Effects 0.000 description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 5
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 4
- 229910000272 alkali metal oxide Inorganic materials 0.000 description 4
- 229910052786 argon Inorganic materials 0.000 description 4
- 229910052744 lithium Inorganic materials 0.000 description 4
- 238000001228 spectrum Methods 0.000 description 4
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- 229910001873 dinitrogen Inorganic materials 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 238000001704 evaporation Methods 0.000 description 3
- 238000003384 imaging method Methods 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 230000005499 meniscus Effects 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 238000001771 vacuum deposition Methods 0.000 description 3
- 238000007740 vapor deposition Methods 0.000 description 3
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- 229910052769 Ytterbium Inorganic materials 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 239000012467 final product Substances 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 150000002430 hydrocarbons Chemical class 0.000 description 2
- 238000007733 ion plating Methods 0.000 description 2
- 229910052747 lanthanoid Inorganic materials 0.000 description 2
- 150000002602 lanthanoids Chemical class 0.000 description 2
- 238000004949 mass spectrometry Methods 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 229910010271 silicon carbide Inorganic materials 0.000 description 2
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 229910015902 Bi 2 O 3 Inorganic materials 0.000 description 1
- 229910052684 Cerium Inorganic materials 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- 229910005191 Ga 2 O 3 Inorganic materials 0.000 description 1
- 229910005793 GeO 2 Inorganic materials 0.000 description 1
- 229910052777 Praseodymium Inorganic materials 0.000 description 1
- 229910052772 Samarium Inorganic materials 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910003134 ZrOx Inorganic materials 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 239000005385 borate glass Substances 0.000 description 1
- 239000003575 carbonaceous material Substances 0.000 description 1
- ZMIGMASIKSOYAM-UHFFFAOYSA-N cerium Chemical compound [Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce] ZMIGMASIKSOYAM-UHFFFAOYSA-N 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000012790 confirmation Methods 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000008034 disappearance Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 239000006260 foam Substances 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 229910052746 lanthanum Inorganic materials 0.000 description 1
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 1
- GJJSDZSDOYNJSW-UHFFFAOYSA-N lanthanum(3+);borate Chemical compound [La+3].[O-]B([O-])[O-] GJJSDZSDOYNJSW-UHFFFAOYSA-N 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 239000005365 phosphate glass Substances 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- PUDIUYLPXJFUGB-UHFFFAOYSA-N praseodymium atom Chemical compound [Pr] PUDIUYLPXJFUGB-UHFFFAOYSA-N 0.000 description 1
- 229910000923 precious metal alloy Inorganic materials 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- KZUNJOHGWZRPMI-UHFFFAOYSA-N samarium atom Chemical compound [Sm] KZUNJOHGWZRPMI-UHFFFAOYSA-N 0.000 description 1
- 229910052706 scandium Inorganic materials 0.000 description 1
- SIXSYDAISGFNSX-UHFFFAOYSA-N scandium atom Chemical compound [Sc] SIXSYDAISGFNSX-UHFFFAOYSA-N 0.000 description 1
- VSZWPYCFIRKVQL-UHFFFAOYSA-N selanylidenegallium;selenium Chemical compound [Se].[Se]=[Ga].[Se]=[Ga] VSZWPYCFIRKVQL-UHFFFAOYSA-N 0.000 description 1
- 239000005368 silicate glass Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 238000010583 slow cooling Methods 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 230000007480 spreading Effects 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 238000000859 sublimation Methods 0.000 description 1
- 230000008022 sublimation Effects 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- 230000000930 thermomechanical effect Effects 0.000 description 1
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 description 1
- UONOETXJSWQNOL-UHFFFAOYSA-N tungsten carbide Chemical compound [W+]#[C-] UONOETXJSWQNOL-UHFFFAOYSA-N 0.000 description 1
- 238000004017 vitrification Methods 0.000 description 1
- NAWDYIZEMPQZHO-UHFFFAOYSA-N ytterbium Chemical compound [Yb] NAWDYIZEMPQZHO-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B11/00—Pressing molten glass or performed glass reheated to equivalent low viscosity without blowing
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Optics & Photonics (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Glass Compositions (AREA)
- Surface Treatment Of Glass (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020177031031A KR102503080B1 (ko) | 2015-03-31 | 2016-03-30 | 프레스 성형용 유리 소재, 유리 광학 소자 및 그 제조 방법 |
| PCT/JP2016/060346 WO2016159055A1 (ja) | 2015-03-31 | 2016-03-30 | プレス成形用ガラス素材、ガラス光学素子およびその製造方法 |
| CN201680013300.0A CN107406306B (zh) | 2015-03-31 | 2016-03-30 | 模压成型用玻璃坯料、玻璃光学元件及其制造方法 |
| TW105109988A TWI725020B (zh) | 2015-03-31 | 2016-03-30 | 壓製成型用玻璃素材、玻璃光學元件及其製造方法 |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2015073862 | 2015-03-31 | ||
| JP2015073862 | 2015-03-31 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2016193812A JP2016193812A (ja) | 2016-11-17 |
| JP6633904B2 true JP6633904B2 (ja) | 2020-01-22 |
Family
ID=57323385
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015243700A Active JP6633904B2 (ja) | 2015-03-31 | 2015-12-15 | プレス成形用ガラス素材、ガラス光学素子およびその製造方法 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP6633904B2 (ko) |
| KR (1) | KR102503080B1 (ko) |
| CN (1) | CN107406306B (ko) |
| TW (1) | TWI725020B (ko) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114379115A (zh) * | 2021-12-31 | 2022-04-22 | 浙江德鸿碳纤维复合材料有限公司 | 一种碳碳埚托及其制备方法 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10356357B4 (de) * | 2003-11-28 | 2010-05-06 | Von Ardenne Anlagentechnik Gmbh | Wärmebehandelbares Sonnen- und Wärmeschutzschichtsystem und Verfahren zu dessen Herstellung |
| JP5085049B2 (ja) * | 2006-03-31 | 2012-11-28 | Ｈｏｙａ株式会社 | モールドプレス用ガラス素材、該ガラス素材の製造方法、及びガラス光学素子の製造方法 |
| US8945713B2 (en) | 2009-05-20 | 2015-02-03 | Hoya Corporation | Glass material for press molding, method for manufacturing optical glass element employing same, and optical glass element |
| JP5509691B2 (ja) * | 2009-06-26 | 2014-06-04 | 旭硝子株式会社 | レンズ及びその製造方法 |
| JP5364568B2 (ja) * | 2009-12-28 | 2013-12-11 | Ｈｏｙａ株式会社 | プレス成形用ガラス素材、プレス成形用ガラス素材の製造方法、および光学素子の製造方法 |
| JP5555204B2 (ja) | 2011-06-27 | 2014-07-23 | Ｈｏｙａ株式会社 | プレス成形用ガラス素材およびその製造方法、ならびに光学素子の製造方法 |
| JP6086027B2 (ja) | 2013-05-20 | 2017-03-01 | 旭硝子株式会社 | カバーガラス及びカバーガラスの製造方法 |
-
2015
- 2015-12-15 JP JP2015243700A patent/JP6633904B2/ja active Active
-
2016
- 2016-03-30 TW TW105109988A patent/TWI725020B/zh active
- 2016-03-30 CN CN201680013300.0A patent/CN107406306B/zh active Active
- 2016-03-30 KR KR1020177031031A patent/KR102503080B1/ko active IP Right Grant
Also Published As
| Publication number | Publication date |
|---|---|
| CN107406306A (zh) | 2017-11-28 |
| KR102503080B1 (ko) | 2023-02-23 |
| TWI725020B (zh) | 2021-04-21 |
| CN107406306B (zh) | 2020-07-14 |
| KR20170132259A (ko) | 2017-12-01 |
| JP2016193812A (ja) | 2016-11-17 |
| TW201700423A (zh) | 2017-01-01 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP4958991B2 (ja) | プレス成形用ガラス素材、および該ガラス素材を用いたガラス光学素子の製造方法、並びにガラス光学素子 | |
| JP4897072B2 (ja) | プレス成形用ガラス素材、該ガラス素材を用いたガラス光学素子の製造方法、及びガラス光学素子 | |
| JP5085049B2 (ja) | モールドプレス用ガラス素材、該ガラス素材の製造方法、及びガラス光学素子の製造方法 | |
| JP5364568B2 (ja) | プレス成形用ガラス素材、プレス成形用ガラス素材の製造方法、および光学素子の製造方法 | |
| JP2007269613A (ja) | ガラス光学素子の製造方法 | |
| JP4255292B2 (ja) | 光学素子成形用ガラス素材および光学素子の製造方法 | |
| JP6633904B2 (ja) | プレス成形用ガラス素材、ガラス光学素子およびその製造方法 | |
| JP6218536B2 (ja) | 光学素子およびその製造方法 | |
| WO2016159055A1 (ja) | プレス成形用ガラス素材、ガラス光学素子およびその製造方法 | |
| JP5547777B2 (ja) | ガラス光学素子の製造方法 | |
| JP5442420B2 (ja) | 精密プレス成形用ガラス素材の肉厚決定方法および製造方法、ならびにガラス光学素子の製造方法 | |
| JP5756769B2 (ja) | プレス成形用ガラス素材の製造方法およびガラス光学素子の製造方法 | |
| US9302928B2 (en) | Amorphous alloy, molding die, and method for molding optical element |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20181120 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20190910 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20191028 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20191203 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20191213 |
|
| R150 | Certificate of patent or registration of utility model |
Ref document number: 6633904 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |