JP6620088B2 - Ｅｕｖ投影リソグラフィのための照明系及び照明光学ユニット - Google Patents

Ｅｕｖ投影リソグラフィのための照明系及び照明光学ユニット Download PDF

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JP6620088B2
JP6620088B2 JP2016515545A JP2016515545A JP6620088B2 JP 6620088 B2 JP6620088 B2 JP 6620088B2 JP 2016515545 A JP2016515545 A JP 2016515545A JP 2016515545 A JP2016515545 A JP 2016515545A JP 6620088 B2 JP6620088 B2 JP 6620088B2
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individual
mirror
field
illumination
mirrors
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JP2016533513A (ja
JP2016533513A5 (enExample
Inventor
マルティン エンドレス
マルティン エンドレス
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カール・ツァイス・エスエムティー・ゲーエムベーハー
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70116—Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Lenses (AREA)
  • Microscoopes, Condenser (AREA)
JP2016515545A 2013-09-18 2014-08-25 Ｅｕｖ投影リソグラフィのための照明系及び照明光学ユニット Active JP6620088B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2019159617A JP6987817B2 (ja) 2013-09-18 2019-09-02 Ｅｕｖ投影リソグラフィのための照明系及び照明光学ユニット

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102013218749.1A DE102013218749A1 (de) 2013-09-18 2013-09-18 Beleuchtungssystem sowie Beleuchtungsoptik für die EUV-Projektionslithografie
DE102013218749.1 2013-09-18
PCT/EP2014/067958 WO2015039839A1 (de) 2013-09-18 2014-08-25 Beleuchtungssystem sowie beleuchtungsoptik für die euv-projektionslithografie

Related Child Applications (1)

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JP2019159617A Division JP6987817B2 (ja) 2013-09-18 2019-09-02 Ｅｕｖ投影リソグラフィのための照明系及び照明光学ユニット

Publications (3)

Publication Number Publication Date
JP2016533513A JP2016533513A (ja) 2016-10-27
JP2016533513A5 JP2016533513A5 (enExample) 2019-03-07
JP6620088B2 true JP6620088B2 (ja) 2019-12-11

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JP2016515545A Active JP6620088B2 (ja) 2013-09-18 2014-08-25 Ｅｕｖ投影リソグラフィのための照明系及び照明光学ユニット
JP2019159617A Active JP6987817B2 (ja) 2013-09-18 2019-09-02 Ｅｕｖ投影リソグラフィのための照明系及び照明光学ユニット

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JP2019159617A Active JP6987817B2 (ja) 2013-09-18 2019-09-02 Ｅｕｖ投影リソグラフィのための照明系及び照明光学ユニット

Country Status (4)

Country Link
US (1) US9921484B2 (enExample)
JP (2) JP6620088B2 (enExample)
DE (1) DE102013218749A1 (enExample)
WO (1) WO2015039839A1 (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102017200658A1 (de) 2017-01-17 2017-03-02 Carl Zeiss Smt Gmbh Beleuchtungsoptik für eine Projektionsbelichtungsanlage
KR102374206B1 (ko) 2017-12-05 2022-03-14 삼성전자주식회사 반도체 장치 제조 방법

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10138313A1 (de) 2001-01-23 2002-07-25 Zeiss Carl Kollektor für Beleuchtugnssysteme mit einer Wellenlänge < 193 nm
US6438199B1 (en) 1998-05-05 2002-08-20 Carl-Zeiss-Stiftung Illumination system particularly for microlithography
US6859515B2 (en) 1998-05-05 2005-02-22 Carl-Zeiss-Stiftung Trading Illumination system, particularly for EUV lithography
DE10053587A1 (de) * 2000-10-27 2002-05-02 Zeiss Carl Beleuchtungssystem mit variabler Einstellung der Ausleuchtung
KR100576746B1 (ko) * 2001-06-01 2006-05-03 에이에스엠엘 네델란즈 비.브이. 리소그래피장치, 디바이스제조방법, 그 디바이스,제어시스템, 컴퓨터프로그램, 및 컴퓨터프로그램물
US7170587B2 (en) * 2002-03-18 2007-01-30 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2006128321A (ja) * 2004-10-27 2006-05-18 Nikon Corp 照明光学系、露光装置及びマイクロデバイスの製造方法
US7405809B2 (en) * 2005-03-21 2008-07-29 Carl Zeiss Smt Ag Illumination system particularly for microlithography
DE102006020734A1 (de) * 2006-05-04 2007-11-15 Carl Zeiss Smt Ag Beleuchtungssystem für die EUV-Lithographie sowie erstes und zweites optisches Element zum Einsatz in einem derartigen Beleuchtungssystem
DE102006036064A1 (de) 2006-08-02 2008-02-07 Carl Zeiss Smt Ag Beleuchtungssystem für eine Projektionsbelichtungsanlage mit Wellenlängen ≦ 193 nm
KR101422882B1 (ko) 2007-06-07 2014-07-23 칼 짜이스 에스엠티 게엠베하 마이크로리소그래피 도구를 위한 반사 일루미네이션 시스템
EP2243047B1 (en) 2008-02-15 2021-03-31 Carl Zeiss SMT GmbH Facet mirror for use in a projection exposure apparatus for microlithography
DE102008049586A1 (de) 2008-09-30 2010-04-08 Carl Zeiss Smt Ag Feldfacettenspiegel zum Einsatz in einer Beleuchtungsoptik einer Projektionsbelichtungsanlage für die EUV-Mikrolithographie
US8497977B2 (en) 2009-03-12 2013-07-30 Nikon Corporation Optical integrator, illumination optical system, exposure apparatus, and device manufacturing method
JP6041304B2 (ja) * 2009-03-27 2016-12-07 カール・ツァイス・エスエムティー・ゲーエムベーハー Ｅｕｖマイクロリソグラフィ用の照明光学系、この種の照明光学系用のｅｕｖ減衰器、及びこの種の照明光学系を有する照明系及び投影露光装置
WO2010145959A1 (en) * 2009-06-17 2010-12-23 Asml Netherlands B.V. Lithographic apparatus and method
DE102009030501A1 (de) * 2009-06-24 2011-01-05 Carl Zeiss Smt Ag Abbildende Optik zur Abbildung eines Objektfeldes in ein Bildfeld sowie Beleuchtungsoptik zur Ausleuchtung eines Objektfeldes
WO2011023419A1 (en) * 2009-08-25 2011-03-03 Asml Netherlands B.V. Illumination system, lithographic apparatus and method of adjusting an illumination mode
JP2011077142A (ja) * 2009-09-29 2011-04-14 Nikon Corp 照明光学装置、露光装置及びデバイス製造方法
DE102009045694B4 (de) * 2009-10-14 2012-03-29 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die Mikrolithographie sowie Beleuchtungssystem und Projektionsbelichtungsanlage mit einer derartigen Beleuchtungsoptik
US8958053B2 (en) * 2010-08-11 2015-02-17 Asml Netherlands B.V. Lithographic apparatus and alignment method
DE102011003928B4 (de) * 2011-02-10 2012-10-31 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die Projektionslithographie
DE102011076145B4 (de) * 2011-05-19 2013-04-11 Carl Zeiss Smt Gmbh Verfahren zum Zuordnen einer Pupillenfacette eines Pupillenfacettenspiegels einer Beleuchtungsoptik einer Projektionsbelichtungsanlage zu einer Feldfacette eines Feldfacettenspiegels der Beleuchtungsoptik
DE102012201235B4 (de) * 2012-01-30 2013-08-29 Carl Zeiss Smt Gmbh Verfahren zum Einstellen einer Beleuchtungsgeometrie für eine Be-leuchtungsoptik für die EUV-Projektionslithographie
DE102012210174A1 (de) * 2012-06-18 2013-06-06 Carl Zeiss Smt Gmbh Optisches Bauelement

Also Published As

Publication number Publication date
JP6987817B2 (ja) 2022-01-05
JP2020073949A (ja) 2020-05-14
WO2015039839A1 (de) 2015-03-26
US9921484B2 (en) 2018-03-20
US20160195816A1 (en) 2016-07-07
JP2016533513A (ja) 2016-10-27
DE102013218749A1 (de) 2015-03-19

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