JP6587822B2 - 外観検査装置 - Google Patents

外観検査装置 Download PDF

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Publication number
JP6587822B2
JP6587822B2 JP2015087760A JP2015087760A JP6587822B2 JP 6587822 B2 JP6587822 B2 JP 6587822B2 JP 2015087760 A JP2015087760 A JP 2015087760A JP 2015087760 A JP2015087760 A JP 2015087760A JP 6587822 B2 JP6587822 B2 JP 6587822B2
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JP
Japan
Prior art keywords
light
reflected
transmitted
imaging lens
lens
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Active
Application number
JP2015087760A
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English (en)
Japanese (ja)
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JP2016206000A (ja
Inventor
敬行 佐藤
敬行 佐藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
V Technology Co Ltd
Original Assignee
V Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by V Technology Co Ltd filed Critical V Technology Co Ltd
Priority to JP2015087760A priority Critical patent/JP6587822B2/ja
Priority to PCT/JP2016/056920 priority patent/WO2016170860A1/ja
Priority to KR1020177026677A priority patent/KR102496099B1/ko
Priority to CN201680023617.2A priority patent/CN107533015B/zh
Priority to TW105112393A priority patent/TWI713518B/zh
Publication of JP2016206000A publication Critical patent/JP2016206000A/ja
Application granted granted Critical
Publication of JP6587822B2 publication Critical patent/JP6587822B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N2021/9513—Liquid crystal panels

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Signal Processing (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP2015087760A 2015-04-22 2015-04-22 外観検査装置 Active JP6587822B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2015087760A JP6587822B2 (ja) 2015-04-22 2015-04-22 外観検査装置
PCT/JP2016/056920 WO2016170860A1 (ja) 2015-04-22 2016-03-07 外観検査装置
KR1020177026677A KR102496099B1 (ko) 2015-04-22 2016-03-07 외관 검사 장치
CN201680023617.2A CN107533015B (zh) 2015-04-22 2016-03-07 外观检查装置
TW105112393A TWI713518B (zh) 2015-04-22 2016-04-20 外觀檢查裝置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2015087760A JP6587822B2 (ja) 2015-04-22 2015-04-22 外観検査装置

Publications (2)

Publication Number Publication Date
JP2016206000A JP2016206000A (ja) 2016-12-08
JP6587822B2 true JP6587822B2 (ja) 2019-10-09

Family

ID=57143914

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015087760A Active JP6587822B2 (ja) 2015-04-22 2015-04-22 外観検査装置

Country Status (5)

Country Link
JP (1) JP6587822B2 (ko)
KR (1) KR102496099B1 (ko)
CN (1) CN107533015B (ko)
TW (1) TWI713518B (ko)
WO (1) WO2016170860A1 (ko)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7290449B2 (ja) * 2019-04-03 2023-06-13 株式会社ディスコ 超高速度撮像装置
CN117894706B (zh) * 2024-03-15 2024-06-18 季华实验室 多模态晶圆检测系统及方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61122648A (ja) * 1984-11-20 1986-06-10 Nippon Kogaku Kk <Nikon> 欠陥検査装置
JPH04318550A (ja) * 1991-04-17 1992-11-10 Nikon Corp 欠陥検査装置
JP4097761B2 (ja) * 1998-03-02 2008-06-11 オリンパス株式会社 自動焦点顕微鏡及び自動合焦検出装置
US6646604B2 (en) 1999-01-08 2003-11-11 Trueposition, Inc. Automatic synchronous tuning of narrowband receivers of a wireless location system for voice/traffic channel tracking
JP2001021486A (ja) * 1999-07-08 2001-01-26 Shimadzu Corp 光画像計測装置
JP2003107670A (ja) * 2001-09-27 2003-04-09 Toshiba Corp 欠陥検査装置
JP4214363B2 (ja) * 2002-06-20 2009-01-28 株式会社ジェイエイアイコーポレーション 像倍率補正機能付き光学系を備えた撮像装置
JP4633499B2 (ja) * 2005-02-28 2011-02-16 オリンパス株式会社 外観検査装置及び外観検査方法
JP2007271529A (ja) * 2006-03-31 2007-10-18 Soma Kougaku:Kk 顕微蛍光観測装置
TWI428686B (zh) * 2006-12-05 2014-03-01 Hoya Corp 光罩之檢查裝置、光罩之檢查方法、液晶裝置製造用光罩之製造方法以及圖案轉印方法
JP5228878B2 (ja) * 2008-12-17 2013-07-03 株式会社リコー カップリングレンズ、照明装置、及び電子機器
JP2011017852A (ja) * 2009-07-08 2011-01-27 Olympus Corp 光学ユニット、顕微鏡光学系、及び顕微鏡
JP2014003433A (ja) * 2012-06-18 2014-01-09 Ricoh Co Ltd 撮像装置

Also Published As

Publication number Publication date
WO2016170860A1 (ja) 2016-10-27
CN107533015B (zh) 2020-10-30
TWI713518B (zh) 2020-12-21
KR20170137723A (ko) 2017-12-13
TW201638655A (zh) 2016-11-01
KR102496099B1 (ko) 2023-02-03
JP2016206000A (ja) 2016-12-08
CN107533015A (zh) 2018-01-02

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