JP6584170B2 - 検出装置、リソグラフィ装置、物品の製造方法、および検出方法 - Google Patents

検出装置、リソグラフィ装置、物品の製造方法、および検出方法 Download PDF

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JP6584170B2
JP6584170B2 JP2015133920A JP2015133920A JP6584170B2 JP 6584170 B2 JP6584170 B2 JP 6584170B2 JP 2015133920 A JP2015133920 A JP 2015133920A JP 2015133920 A JP2015133920 A JP 2015133920A JP 6584170 B2 JP6584170 B2 JP 6584170B2
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imaging
mark
substrate
processing unit
output value
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Japanese (ja)
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JP2017015994A5 (enExample
JP2017015994A (ja
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卓朗 辻川
卓朗 辻川
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Canon Inc
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Canon Inc
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Priority to JP2015133920A priority Critical patent/JP6584170B2/ja
Priority to US15/189,043 priority patent/US10095124B2/en
Priority to KR1020160083252A priority patent/KR102086409B1/ko
Publication of JP2017015994A publication Critical patent/JP2017015994A/ja
Publication of JP2017015994A5 publication Critical patent/JP2017015994A5/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • H10P74/203—
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/1717—Systems in which incident light is modified in accordance with the properties of the material investigated with a modulation of one or more physical properties of the sample during the optical investigation, e.g. electro-reflectance
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70681—Metrology strategies
    • G03F7/70683—Mark designs
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/0002—Inspection of images, e.g. flaw detection
    • G06T7/0004—Industrial image inspection
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/544—Marks applied to semiconductor devices or parts, e.g. registration marks, alignment structures, wafer maps
    • H10P72/0606—
    • H10P74/27—
    • H10P76/2041—
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N2021/1765—Method using an image detector and processing of image signal
    • G01N2021/177—Detector of the video camera type
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/30—Subject of image; Context of image processing
    • G06T2207/30108—Industrial image inspection
    • G06T2207/30148—Semiconductor; IC; Wafer
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/30—Subject of image; Context of image processing
    • G06T2207/30204—Marker

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Health & Medical Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Multimedia (AREA)
  • Chemical & Material Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Quality & Reliability (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Analytical Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • Theoretical Computer Science (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Length Measuring Devices By Optical Means (AREA)
JP2015133920A 2015-07-02 2015-07-02 検出装置、リソグラフィ装置、物品の製造方法、および検出方法 Active JP6584170B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2015133920A JP6584170B2 (ja) 2015-07-02 2015-07-02 検出装置、リソグラフィ装置、物品の製造方法、および検出方法
US15/189,043 US10095124B2 (en) 2015-07-02 2016-06-22 Detection apparatus, lithography apparatus, method of manufacturing article, and detection method
KR1020160083252A KR102086409B1 (ko) 2015-07-02 2016-07-01 검출 장치, 리소그래피 장치, 물품의 제조 방법, 및 검출 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2015133920A JP6584170B2 (ja) 2015-07-02 2015-07-02 検出装置、リソグラフィ装置、物品の製造方法、および検出方法

Publications (3)

Publication Number Publication Date
JP2017015994A JP2017015994A (ja) 2017-01-19
JP2017015994A5 JP2017015994A5 (enExample) 2018-08-09
JP6584170B2 true JP6584170B2 (ja) 2019-10-02

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US (1) US10095124B2 (enExample)
JP (1) JP6584170B2 (enExample)
KR (1) KR102086409B1 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6955344B2 (ja) * 2017-02-20 2021-10-27 キヤノン株式会社 インプリント装置、および物品製造方法
DE102018124015B4 (de) * 2018-09-28 2021-07-29 Basler Ag System und Verfahren zur Erfassung von Bildern
KR102863335B1 (ko) * 2019-11-05 2025-09-25 삼성디스플레이 주식회사 표시 장치의 검사 방법 및 검사 장치
JP2022117091A (ja) * 2021-01-29 2022-08-10 キヤノン株式会社 計測装置、リソグラフィ装置及び物品の製造方法

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2734004B2 (ja) * 1988-09-30 1998-03-30 キヤノン株式会社 位置合わせ装置
JPH11211415A (ja) * 1998-01-29 1999-08-06 Canon Inc 位置検出装置及びそれを用いたデバイスの製造方法
JP4366031B2 (ja) * 2001-09-17 2009-11-18 キヤノン株式会社 位置検出装置及び方法並びに露光装置、デバイスの製造方法
JP2003092246A (ja) * 2001-09-17 2003-03-28 Canon Inc アライメントマーク及びアライメント装置とその方法、及び露光装置、デバイスの製造方法
JP2003092248A (ja) * 2001-09-17 2003-03-28 Canon Inc 位置検出装置、位置決め装置及びそれらの方法並びに露光装置及びデバイスの製造方法
JP2003203839A (ja) * 2002-01-04 2003-07-18 Canon Inc 信号波形補正方法及び被観察面撮像方法並びにそれを用いる露光装置
JP2004006527A (ja) * 2002-05-31 2004-01-08 Canon Inc 位置検出装置及び位置検出方法、露光装置、デバイス製造方法並びに基板
JP4102201B2 (ja) 2003-01-09 2008-06-18 オリンパス株式会社 測光装置、電子カメラ
JP2004296921A (ja) * 2003-03-27 2004-10-21 Canon Inc 位置検出装置
US8477310B2 (en) * 2004-04-23 2013-07-02 Nikon Corporation Measurement method, measurement apparatus, exposure method, and exposure apparatus
JP4307482B2 (ja) * 2006-12-19 2009-08-05 キヤノン株式会社 位置計測装置、露光装置、およびデバイス製造方法
EP2131243B1 (en) * 2008-06-02 2015-07-01 ASML Netherlands B.V. Lithographic apparatus and method for calibrating a stage position
JP2009300798A (ja) * 2008-06-13 2009-12-24 Canon Inc 露光装置およびデバイス製造方法
JP5550253B2 (ja) * 2009-04-22 2014-07-16 キヤノン株式会社 マーク位置検出装置及びマーク位置検出方法、それを用いた露光装置及びデバイスの製造方法
JP2013145871A (ja) * 2011-12-13 2013-07-25 Canon Inc リソグラフィー装置および方法、ならびに物品製造方法
JP6213912B2 (ja) * 2013-05-02 2017-10-18 株式会社タムロン 小型高変倍ズームレンズ

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Publication number Publication date
KR102086409B1 (ko) 2020-03-09
US10095124B2 (en) 2018-10-09
JP2017015994A (ja) 2017-01-19
US20170005017A1 (en) 2017-01-05
KR20170004889A (ko) 2017-01-11

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