JP6570937B2 - 感光性樹脂組成物 - Google Patents

感光性樹脂組成物 Download PDF

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Publication number
JP6570937B2
JP6570937B2 JP2015183463A JP2015183463A JP6570937B2 JP 6570937 B2 JP6570937 B2 JP 6570937B2 JP 2015183463 A JP2015183463 A JP 2015183463A JP 2015183463 A JP2015183463 A JP 2015183463A JP 6570937 B2 JP6570937 B2 JP 6570937B2
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JP
Japan
Prior art keywords
quantum dot
photosensitive resin
resin composition
particles
dot particles
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JP2015183463A
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English (en)
Japanese (ja)
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JP2016071362A (ja
Inventor
冑皓 金
冑皓 金
頌基 朴
頌基 朴
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Dongwoo Fine Chem Co Ltd
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Dongwoo Fine Chem Co Ltd
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Publication of JP2016071362A publication Critical patent/JP2016071362A/ja
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
    • C09K11/08—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Materials Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Polymerisation Methods In General (AREA)
  • Optical Filters (AREA)
  • Luminescent Compositions (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP2015183463A 2014-09-23 2015-09-16 感光性樹脂組成物 Active JP6570937B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020140127223A KR102092165B1 (ko) 2014-09-23 2014-09-23 감광성 수지 조성물
KR10-2014-0127223 2014-09-23

Publications (2)

Publication Number Publication Date
JP2016071362A JP2016071362A (ja) 2016-05-09
JP6570937B2 true JP6570937B2 (ja) 2019-09-04

Family

ID=55556431

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015183463A Active JP6570937B2 (ja) 2014-09-23 2015-09-16 感光性樹脂組成物

Country Status (4)

Country Link
JP (1) JP6570937B2 (zh)
KR (1) KR102092165B1 (zh)
CN (1) CN105446077B (zh)
TW (1) TWI665516B (zh)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107004741A (zh) * 2014-09-30 2017-08-01 康宁股份有限公司 包含凸的色转换元件的装置
KR101970724B1 (ko) 2016-06-14 2019-04-22 삼성에스디아이 주식회사 감광성 수지 조성물, 감광성 수지막 및 이를 이용한 컬러필터
KR102520299B1 (ko) * 2016-08-01 2023-04-10 메르크 파텐트 게엠베하 감광성 조성물, 색 변환 매체, 광학 디바이스 및 그의 제조 방법
KR102028968B1 (ko) * 2016-10-20 2019-10-07 동우 화인켐 주식회사 양자점 분산체, 이를 포함하는 자발광 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상 표시 장치
KR102028969B1 (ko) * 2016-11-15 2019-10-07 동우 화인켐 주식회사 양자점 분산액, 자발광 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상표시장치
KR101976659B1 (ko) 2016-12-12 2019-05-09 삼성에스디아이 주식회사 감광성 수지 조성물, 이를 이용한 감광성 수지막 및 컬러필터
JP6630754B2 (ja) * 2017-02-16 2020-01-15 住友化学株式会社 硬化性樹脂組成物、硬化膜及び表示装置
TWI753119B (zh) * 2017-03-17 2022-01-21 南韓商東友精細化工有限公司 具有有機配位體之量子點及其用途
US10571332B2 (en) * 2017-08-08 2020-02-25 Samsung Electronics Co., Ltd. Light filter and spectrometer including the light filter
JP7024336B2 (ja) * 2017-11-10 2022-02-24 Dic株式会社 インク組成物、光変換層及びカラーフィルタ
KR102037357B1 (ko) * 2018-06-21 2019-11-26 (주)라이타이저 색변환 다이오드의 제조방법
JP7326839B2 (ja) * 2018-07-13 2023-08-16 Dic株式会社 インク組成物、光変換層及びカラーフィルタ
JP2020063409A (ja) * 2018-10-12 2020-04-23 東洋インキＳｃホールディングス株式会社 インク組成物及び波長変換層
KR102133941B1 (ko) * 2018-11-20 2020-07-14 한국기계연구원 냉난방 필름
JP7569213B2 (ja) * 2019-12-26 2024-10-17 住友化学株式会社 感光性組成物
EP4435023A1 (en) 2021-11-30 2024-09-25 Canon Kabushiki Kaisha Ink composition

Family Cites Families (14)

* Cited by examiner, † Cited by third party
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KR100697511B1 (ko) * 2003-10-21 2007-03-20 삼성전자주식회사 광경화성 반도체 나노결정, 반도체 나노결정 패턴형성용 조성물 및 이들을 이용한 반도체 나노결정의 패턴 형성 방법
JP2006040642A (ja) * 2004-07-23 2006-02-09 Matsushita Toshiba Picture Display Co Ltd 色変換膜及びこれを用いたエレクトロルミネッセンス素子
KR20070114779A (ko) * 2005-03-28 2007-12-04 이데미쓰 고산 가부시키가이샤 반도체 나노 결정용 유기 배위자
KR101437158B1 (ko) * 2007-02-20 2014-09-03 동우 화인켐 주식회사 컬러필터용 착색 감광성 수지 조성물, 컬러필터 및 이를 구비한 액정표시장치
KR20090045681A (ko) * 2007-11-02 2009-05-08 삼성전자주식회사 유기발광소자 및 그 동작방법
KR20090074968A (ko) * 2008-01-03 2009-07-08 삼성에스디아이 주식회사 형광체 페이스트 조성물, 이로부터 얻은 형광체층, 상기형광체층을 구비한 전자 방출 소자
JP5334624B2 (ja) * 2008-03-17 2013-11-06 富士フイルム株式会社 着色硬化性組成物、カラーフィルタ、及びカラーフィルタの製造方法
KR101588317B1 (ko) * 2008-11-11 2016-01-27 삼성전자주식회사 감광성 양자점, 이를 포함한 조성물 및 상기 조성물을 이용한 양자점-함유 패턴 형성 방법
CN102736413B (zh) 2011-03-29 2015-07-15 东洋油墨Sc控股株式会社 滤色器用红色着色组合物和滤色器
KR20130114790A (ko) * 2012-04-10 2013-10-21 롬엔드하스전자재료코리아유한회사 알칼리 가용성 수지를 함유하는 감광성 수지 조성물
TWI463257B (zh) * 2012-11-23 2014-12-01 Chi Mei Corp 彩色濾光片用之感光性樹脂組成物及其應用
CN103146262B (zh) * 2012-12-12 2016-08-03 京东方科技集团股份有限公司 量子点在颜料分散液中的用途以及一种颜料分散液和其制备方法
KR102342193B1 (ko) * 2014-09-05 2021-12-23 스미또모 가가꾸 가부시키가이샤 경화성 조성물
WO2016035602A1 (ja) * 2014-09-05 2016-03-10 住友化学株式会社 硬化性組成物

Also Published As

Publication number Publication date
CN105446077A (zh) 2016-03-30
JP2016071362A (ja) 2016-05-09
CN105446077B (zh) 2019-10-25
TWI665516B (zh) 2019-07-11
KR102092165B1 (ko) 2020-03-23
KR20160035515A (ko) 2016-03-31
TW201612627A (en) 2016-04-01

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