JP6539657B2 - コートされた基材への入熱を減少させるための硬質材料層 - Google Patents
コートされた基材への入熱を減少させるための硬質材料層 Download PDFInfo
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- 239000000463 material Substances 0.000 title claims description 57
- 239000000758 substrate Substances 0.000 title claims description 26
- 238000000576 coating method Methods 0.000 claims description 58
- 239000011248 coating agent Substances 0.000 claims description 53
- 238000000034 method Methods 0.000 claims description 25
- 229910052751 metal Inorganic materials 0.000 claims description 9
- 239000002184 metal Substances 0.000 claims description 9
- -1 transition metal nitride Chemical class 0.000 claims description 7
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 6
- 238000000151 deposition Methods 0.000 claims description 6
- 229910052723 transition metal Inorganic materials 0.000 claims description 6
- 229910044991 metal oxide Inorganic materials 0.000 claims description 5
- 150000004706 metal oxides Chemical class 0.000 claims description 5
- 238000005240 physical vapour deposition Methods 0.000 claims description 5
- 150000002739 metals Chemical class 0.000 claims description 4
- 229910010037 TiAlN Inorganic materials 0.000 claims description 2
- 229910010282 TiON Inorganic materials 0.000 claims description 2
- 238000007733 ion plating Methods 0.000 claims description 2
- 238000001755 magnetron sputter deposition Methods 0.000 claims description 2
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 claims description 2
- 239000010410 layer Substances 0.000 description 91
- 238000003754 machining Methods 0.000 description 13
- 238000004519 manufacturing process Methods 0.000 description 8
- 230000000694 effects Effects 0.000 description 7
- 230000007547 defect Effects 0.000 description 4
- 238000009826 distribution Methods 0.000 description 4
- 230000000877 morphologic effect Effects 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 238000005328 electron beam physical vapour deposition Methods 0.000 description 2
- 239000002052 molecular layer Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 229910052582 BN Inorganic materials 0.000 description 1
- 208000012868 Overgrowth Diseases 0.000 description 1
- NPXOKRUENSOPAO-UHFFFAOYSA-N Raney nickel Chemical compound [Al].[Ni] NPXOKRUENSOPAO-UHFFFAOYSA-N 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
- QQHSIRTYSFLSRM-UHFFFAOYSA-N alumanylidynechromium Chemical compound [Al].[Cr] QQHSIRTYSFLSRM-UHFFFAOYSA-N 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 239000013590 bulk material Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 230000001050 lubricating effect Effects 0.000 description 1
- 238000001000 micrograph Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 229910000907 nickel aluminide Inorganic materials 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 229910001233 yttria-stabilized zirconia Inorganic materials 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
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- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
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- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
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- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
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- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
- C23C28/044—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material coatings specially adapted for cutting tools or wear applications
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- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/40—Coatings including alternating layers following a pattern, a periodic or defined repetition
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Description
摩擦学的なプロセス、例えば成形および機械加工プロセスの場合において、工具表面と製作品表面との間の界面で、機械的変形エネルギーによって摩擦熱が発生する。入熱の程度および持続時間が、コーティング内および基礎になっている基材内の温度分布を決定する。工具表面および製作品表面は、顕微鏡的なスケールで、形態学的不規則性(いわゆる形態学的ピーク)を示す。この「形態学的ピーク」は、機械加工プロセスにおいて、機械的変形によって摩擦熱が生じる実際の接触面を構成する。この機械加工プロセスは連続的に進行する、すなわち両表面の「ピーク」は、互いに、時間と空間のいずれに関しても不規則に接触するため、層表面における入熱を、形態学的ピークで局所的に隔離され、空間的に不規則に分布し、経時的に素早く変化するプロセスとして表すことが可能である。上記のことを考慮すると、各機械加工プロセスに適合させたコーティングにおける熱管理は、系全体の性能の大幅な向上に役立ち得る、特にステンレス鋼ならびにTiおよびNi系合金の機械加工の場合に役立ち得ることがわかる。
本発明の目的は、技術水準における現在の難点を克服し得るコーティング概念を提供することである。
本発明により、請求項1に記載の硬質材料コーティングが提供されるため、上記の目的が達成される。
κA<n・κB、
n≧1.5、
κA≦10、
200nm≧DA≧25nm、および100nm≧DB≧25nm、
|DA−DB|≦0.15・DA、または|DA−DB|≦0.15・DB、および
DM≧0.1μm
である。
好ましくは、(多重層構造Mの)総コーティング厚さDMは、10μmを超えず、0.5μm以上であり、さらに好ましくは、DMは、1μm〜5μmである。
個々の副層の熱伝導特性に関する正確な情報(すなわち、対応する実験方法/手法の使用)、
微細構造特性(化学的および構造的組成、粒径、欠陥密度、結晶学的組織)の制御による、個々の副層の熱伝導特性に関する目的に応じた制御、および
所望の特性(特に、多層コーティング系における個々の副層の界面の「純粋さ、および鋭さ」に関する特性)を有する硬質材料層の製造のための、適合化/最適化したPVDプロセスの目的に応じた使用。
以下に、双方の副層の体積比率が同じである限り、各副層の厚さは自由な可変パラメーターを意味するという条件で、異方性熱伝導性を有する硬質材料コーティングを生成させる場合に実施する方法に関して、一種の「処方」(方策)を説明する。
全層厚が5μmの硬質材料層を、アークPVD法によって生成させた。この層は、TiN(κ=30Wm−1K−1)とAlCrN(κ=3Wm−1K−1)が規則的に交替しており、理論異方性値は3である。この理論値を実験的に確認するために、特別な手順を開発し、全厚さが15〜20μmの非常に厚い層を生成させた(図4参照)。次いで、横断薄切片について、層に対して平行ならびに垂直の双方について、確立した方法「時間領域サーモリフレクタンス法」(D.G.Cahill,Rev.Sci.Inst.75(2004)5119〜5122)を使用して測定した。このようにして、薄い硬質材料層の熱伝導率における異方性を、初めて実験で直接決定することができた。
Claims (15)
- 基材1の表面の少なくとも一部に堆積した硬質材料層2であって、該硬質材料層2が、多層構造Mおよび膜厚DMを有する、交互に堆積したA層およびB層を含む多重層を含み、A層の熱伝導率はκA、個々の層厚はDAであり、B層の熱伝導率はκB、個々の層厚はDBであって、
κAとκBとは互いに異なり、
κA<n・κB、
n≧1.5、
κA≦10、
200nm≧DA≧25nm、および100nm≧DB≧25nm、
|DA−DB|≦0.15・DA、または|DA−DB|≦0.15・DB、および
DM≧0.1μm
であり、
前記A層および前記B層はそれぞれ、CrN、TiN、TiAlN、AlCrN、CrCN、TiCN、TiAlCN、AlCrCN、CrON、TiON、TiAlON、およびAlCrONからなる群より選ばれる少なくとも1種を含むことを特徴とする、硬質材料層。 - 前記A層および/または前記B層が、少なくとも1種の立方晶遷移金属窒化物を含むことを特徴とする、請求項1に記載の硬質材料層。
- 基材1の表面の少なくとも一部に堆積した硬質材料層2であって、該硬質材料層2が、多層構造Mおよび膜厚D M を有する、交互に堆積したA層およびB層を含む多重層を含み、A層の熱伝導率はκ A 、個々の層厚はD A であり、B層の熱伝導率はκ B 、個々の層厚はD B であって、
κ A とκ B とは互いに異なり、
κ A <n・κ B 、
n≧1.5、
κ A ≦10、
200nm≧D A ≧25nm、および100nm≧D B ≧25nm、
|D A −D B |≦0.15・D A 、または|D A −D B |≦0.15・D B 、および
D M ≧0.1μm
であり、
前記A層および前記B層が、少なくとも1種の金属酸化物を含むことを特徴とする、硬質材料層。 - 前記A層および/または前記B層が、少なくとも1種の立方晶遷移金属窒化物および少なくとも1種の金属酸化物をいずれも含むことを特徴とする、請求項1〜3の少なくとも1項に記載の硬質材料層。
- 基材1の表面の少なくとも一部に堆積した硬質材料層2であって、該硬質材料層2が、多層構造Mおよび膜厚D M を有する、交互に堆積したA層およびB層を含む多重層を含み、A層の熱伝導率はκ A 、個々の層厚はD A であり、B層の熱伝導率はκ B 、個々の層厚はD B であって、
κ A とκ B とは互いに異なり、
κ A <n・κ B 、
n≧1.5、
κ A ≦10、
200nm≧D A ≧25nm、および100nm≧D B ≧25nm、
|D A −D B |≦0.15・D A 、または|D A −D B |≦0.15・D B 、および
D M ≧0.1μm
であり、
前記A層および/または前記B層が、1種の金属、または数種の金属からなる金属層であることを特徴とする、硬質材料層。 - n>2、およびκA≦6であることを特徴とする、請求項1〜5の少なくとも1項に記載の硬質材料層。
- 10μm≧DM≧0.5μmであることを特徴とする、請求項1〜6の少なくとも1項に記載の硬質材料層。
- 前記A層および前記B層の個々の層厚が、≦100nmであることを特徴とする、請求項1〜7のいずれか1項に記載の硬質材料層。
- 前記A層および前記B層の個々の層厚が、≧75nmであることを特徴とする、請求項1〜8の少なくとも1項に記載の硬質材料層。
- PVDコーティング法、および/またはCVDコーティング法、および/またはPECVDコーティング法を使用する、請求項1〜9の少なくとも1項に記載の硬質材料層を堆積させるための方法。
- 少なくとも前記A層および/または前記B層を、マグネトロンスパッタ法を使用して堆積させることを特徴とする、請求項8に記載の硬質材料層を堆積させるための方法。
- 少なくとも前記A層および/または前記B層を、アークイオンプレーティング法を使用して堆積させることを特徴とする、請求項9に記載の硬質材料層を堆積させるための方法。
- 請求項1〜9の少なくとも1項に記載の硬質材料層が付着した基材。
- 請求項11〜12の少なくとも1項に記載の方法を使用してコートされた基材の製造方法。
- 前記基材が、コートされた表面が摩擦応力にさらされる部品、または工具であることを特徴とする、請求項13に記載のコートされた基材。
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PCT/EP2014/003124 WO2015078570A1 (de) | 2013-11-26 | 2014-11-24 | Hartstoffschicht zur reduzierung eines wärmeeintrags in das beschichtete substrat |
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US11654635B2 (en) | 2019-04-18 | 2023-05-23 | The Research Foundation For Suny | Enhanced non-destructive testing in directed energy material processing |
CN112941463B (zh) * | 2020-12-31 | 2024-01-23 | 广东振华科技股份有限公司 | 一种纳米多层氧氮化物耐蚀防护涂层及其制备方法和应用 |
CN113005416B (zh) * | 2021-03-01 | 2021-11-30 | 森科五金(深圳)有限公司 | 一种酒红色薄膜层及其制备方法 |
JP7312382B2 (ja) * | 2021-03-18 | 2023-07-21 | 株式会社タンガロイ | 被覆切削工具 |
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-
2013
- 2013-11-26 DE DE102013019691.4A patent/DE102013019691A1/de not_active Withdrawn
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2014
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DE102013019691A1 (de) | 2015-05-28 |
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US9950406B2 (en) | 2018-04-24 |
JP2017505856A (ja) | 2017-02-23 |
KR20160089469A (ko) | 2016-07-27 |
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