JP6527524B2 - 静電チャックおよびその作製方法 - Google Patents

静電チャックおよびその作製方法 Download PDF

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Publication number
JP6527524B2
JP6527524B2 JP2016548231A JP2016548231A JP6527524B2 JP 6527524 B2 JP6527524 B2 JP 6527524B2 JP 2016548231 A JP2016548231 A JP 2016548231A JP 2016548231 A JP2016548231 A JP 2016548231A JP 6527524 B2 JP6527524 B2 JP 6527524B2
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dielectric layer
layer
electrostatic chuck
dielectric
deposited
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JP2017507484A (ja
JP2017507484A5 (enExample
Inventor
クック，リチャード・エイ
ネフ，ウルフラム
バルトフリート，カルロ
リプチンスキー，ヤクブ
ハナガン，マイケル
クラル，ウェイド
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Entegris Inc
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Entegris Inc
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    • H10P72/722—
    • H10P14/6326—
    • H10P72/0602—
    • H10P72/72—
    • H10W20/071—
    • H10W20/075—
    • H10W70/05—

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Ceramic Engineering (AREA)
JP2016548231A 2014-02-07 2015-02-06 静電チャックおよびその作製方法 Active JP6527524B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201461937135P 2014-02-07 2014-02-07
US61/937,135 2014-02-07
PCT/US2015/014810 WO2015120265A1 (en) 2014-02-07 2015-02-06 Electrostatic chuck and method of making same

Publications (3)

Publication Number Publication Date
JP2017507484A JP2017507484A (ja) 2017-03-16
JP2017507484A5 JP2017507484A5 (enExample) 2018-03-15
JP6527524B2 true JP6527524B2 (ja) 2019-06-05

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US (1) US10497598B2 (enExample)
EP (1) EP3103136B1 (enExample)
JP (1) JP6527524B2 (enExample)
KR (1) KR102369706B1 (enExample)
CN (1) CN107078086B (enExample)
SG (1) SG10201806706VA (enExample)
TW (1) TWI663681B (enExample)
WO (1) WO2015120265A1 (enExample)

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KR102655866B1 (ko) 2018-01-31 2024-04-05 램 리써치 코포레이션 정전 척 (electrostatic chuck, ESC) 페데스탈 전압 분리
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US11086233B2 (en) * 2018-03-20 2021-08-10 Lam Research Corporation Protective coating for electrostatic chucks
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US11183368B2 (en) 2018-08-02 2021-11-23 Lam Research Corporation RF tuning systems including tuning circuits having impedances for setting and adjusting parameters of electrodes in electrostatic chucks
US11031272B2 (en) * 2018-11-06 2021-06-08 Mikro Mesa Technology Co., Ltd. Micro device electrostatic chuck with diffusion blocking layer
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US11673161B2 (en) * 2019-03-11 2023-06-13 Technetics Group Llc Methods of manufacturing electrostatic chucks
US10858741B2 (en) 2019-03-11 2020-12-08 Applied Materials, Inc. Plasma resistant multi-layer architecture for high aspect ratio parts
US11335581B2 (en) * 2019-07-31 2022-05-17 Eryn Smith System and method for adhering a semiconductive wafer to an electrostatic carrier by adjusting relative permittivity
KR102790475B1 (ko) 2019-09-16 2025-04-08 삼성디스플레이 주식회사 금속 마스크, 이의 제조 방법, 및 표시 패널 제조 방법
CN112553592B (zh) * 2019-09-25 2023-03-31 中微半导体设备(上海)股份有限公司 一种利用ald工艺对静电吸盘进行处理的方法
CN113053774A (zh) * 2019-12-27 2021-06-29 迪科特测试科技(苏州)有限公司 探测装置
KR102701133B1 (ko) * 2020-03-06 2024-09-03 세메스 주식회사 지지 유닛 및 그를 포함하는 기판 처리 장치
EP4256100A1 (en) 2020-12-02 2023-10-11 Oerlikon Surface Solutions AG, Pfäffikon Improved plasma resistant coatings for electrostatic chucks
CN112652677B (zh) * 2020-12-09 2023-10-27 晋能光伏技术有限责任公司 一种perc电池背面钝化工艺
US11417557B2 (en) * 2020-12-15 2022-08-16 Entegris, Inc. Spiraling polyphase electrodes for electrostatic chuck
US11955361B2 (en) * 2021-04-15 2024-04-09 Applied Materials, Inc. Electrostatic chuck with mesas
KR102548445B1 (ko) * 2021-05-10 2023-06-28 부경대학교 산학협력단 클래드재 전극층을 포함하는 정전척의 제조방법 및 이에 의해 제조된 정전척
KR102520805B1 (ko) * 2021-05-10 2023-04-13 주식회사 템네스트 이종 복합재료로 이루어진 전극층을 포함하는 정전척의 제조방법 및 이에 의해 제조된 정전척
JP7572569B2 (ja) * 2021-08-31 2024-10-23 京セラ株式会社 耐プラズマ積層体、その製造方法、ならびにプラズマ処理装置
US12500109B2 (en) 2021-10-28 2025-12-16 Entegris, Inc. Electrostatic chuck that includes upper ceramic layer that includes a dielectric layer, and related methods and structures
KR102697860B1 (ko) * 2022-02-08 2024-08-22 (주)아이씨디 정전 장치 및 그 동작 방법
US20230294208A1 (en) * 2022-03-21 2023-09-21 Applied Materials, Inc. Electrostatic chuck with laser-machined mesas
US12512357B2 (en) * 2022-04-01 2025-12-30 Applied Materials, Inc. Ceramic engineering by grading materials
JP2023170413A (ja) * 2022-05-19 2023-12-01 新光電気工業株式会社 セラミックス基板及びその製造方法、静電チャック、基板固定装置、半導体装置用パッケージ
JP2024020855A (ja) * 2022-08-02 2024-02-15 新光電気工業株式会社 静電チャック、基板固定装置、ペースト
WO2025004883A1 (ja) * 2023-06-29 2025-01-02 東京エレクトロン株式会社 プラズマ処理装置
WO2026014263A1 (ja) * 2024-07-12 2026-01-15 東京エレクトロン株式会社 プラズマ処理装置、静電チャックの製造方法及び静電チャックの再生方法

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Also Published As

Publication number Publication date
JP2017507484A (ja) 2017-03-16
CN107078086A (zh) 2017-08-18
US20160336210A1 (en) 2016-11-17
EP3103136A1 (en) 2016-12-14
CN107078086B (zh) 2021-01-26
KR20160118259A (ko) 2016-10-11
EP3103136B1 (en) 2021-06-23
KR102369706B1 (ko) 2022-03-04
SG10201806706VA (en) 2018-09-27
TWI663681B (zh) 2019-06-21
TW201545268A (zh) 2015-12-01
WO2015120265A1 (en) 2015-08-13
US10497598B2 (en) 2019-12-03

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