JP6503286B2 - 半導体装置の製造方法および半導体ウェハ - Google Patents
半導体装置の製造方法および半導体ウェハ Download PDFInfo
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- JP6503286B2 JP6503286B2 JP2015250866A JP2015250866A JP6503286B2 JP 6503286 B2 JP6503286 B2 JP 6503286B2 JP 2015250866 A JP2015250866 A JP 2015250866A JP 2015250866 A JP2015250866 A JP 2015250866A JP 6503286 B2 JP6503286 B2 JP 6503286B2
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Description
≪複数の半導体チップが形成された半導体ウェハ≫
本実施の形態による複数の半導体チップが形成された半導体ウェハについて、図1〜図4を用いて説明する。図1は、本実施の形態による複数の半導体チップが形成された半導体ウェハの主面上の状態を示す上面図である。図2は、図1のA領域を拡大して示す上面図である。図3は、図2のA−A´線に沿った断面図である。図4は、本発明者らが比較検討した複数の半導体チップが形成された半導体ウェハの一部の主面上の状態を拡大して示す上面図である。
本実施の形態による半導体装置の製造方法について、図5〜図12を用いて工程順に説明する。図5〜図12は、本実施の形態による半導体装置の製造工程を示す断面図である。
本実施の形態の変形例による複数の半導体チップが形成された半導体ウェハについて図13〜図16を用いて説明する。図13、図14、図15および図16はそれぞれ、本実施の形態の第1、第2、第3および第4変形例による複数の半導体チップが形成された半導体ウェハの一部の主面上の状態を拡大して示す上面図である。
AR2 擬似チップ領域
ARS スクライブ領域(スクライブライン、スペーシング)
BE バンプ電極
BL バリア層
BP ボンディングパッド
C1 第1開口部
C2 第2開口部
C3 第3開口部
C4 第4開口部
C5 第5開口部
CN 接続孔
CU 第1金属膜
GEn,GEp ゲート電極
GI ゲート絶縁膜
IL 絶縁膜
M1,M2,M3,M4,M5,M6 配線
ML 電極層
NI 第2金属膜
NW n型ウェル
PL プラグ
PN 窒化シリコン膜
PR 保護テープ
PR1 ベース層
PR2 中間層
PR3 糊層
PSN 絶縁膜
PT TEOS膜
PW p型ウェル
RF1 第1保護膜
RF2 第2保護膜
SC 半導体チップ
SC1 製品チップ
SC2 擬似チップ
SL1,SL2 シード層
SP 分離部
SRn n型半導体領域
SRp p型半導体領域
SW 半導体ウェハ
WA 壁
WS サイドウォール
Claims (20)
- 以下の工程を含む半導体装置の製造方法:
(a)主面と、前記主面を取り囲む周縁と、前記主面に形成された半導体素子を備える複数の第1チップと、複数の前記第1チップを取り囲み、前記周縁に接する複数の第2チップと、を有し、複数の前記第1チップのそれぞれに複数のボンディングパッドが形成された半導体ウェハを準備する工程;
(b)前記主面上に絶縁膜を形成する工程;
(c)前記第1チップの前記絶縁膜に、複数の第1開口部を形成して、前記第1開口部の底面に前記ボンディングパッドを露出させる工程;
(d)前記主面上に第1保護膜を形成する工程;
(e)前記第1チップおよび前記第2チップの前記第1保護膜に、複数の第2開口部をそれぞれ形成して、前記第1チップでは、平面視において前記第2開口部と重なる前記第1開口部の底面に前記ボンディングパッドを露出させ、前記第2チップでは、前記第2開口部の底面に前記絶縁膜を露出させる工程;
(f)前記第1開口部および前記第2開口部を介して、複数の前記ボンディングパッドとそれぞれ電気的に接続する複数の電極層を形成する工程;
(g)前記主面上に第2保護膜を形成する工程;
(h)前記第1チップおよび前記第2チップの前記第2保護膜に、複数の第3開口部をそれぞれ形成して、前記第1チップでは、前記第3開口部の底面に前記電極層を露出させ、前記第2チップでは、平面視において前記第3開口部と重なる前記第2開口部の底面に前記絶縁膜を露出させる工程;
(i)複数の前記電極層とそれぞれ電気的に接続する複数の外部電極を形成する工程;
(j)前記主面上に、複数の前記外部電極を覆う保護テープを貼り付ける工程。 - 請求項1記載の半導体装置の製造方法において、
前記第2チップの前記周縁に最も近い位置にある前記第3開口部の開口面積は、前記第1チップの前記第3開口部の開口面積よりも小さい、半導体装置の製造方法。 - 請求項1記載の半導体装置の製造方法において、
前記第2チップの前記第3開口部のピッチは、前記第1チップの前記第3開口部のピッチと同じである、半導体装置の製造方法。 - 請求項1記載の半導体装置の製造方法において、
前記第2チップには、前記外部電極を形成しない、半導体装置の製造方法。 - 請求項1記載の半導体装置の製造方法において、
互いに隣り合う前記第1チップ間、互いに隣り合う前記第2チップ間および互いに隣り合う前記第1チップと前記第2チップとの間は、スクライブ領域により隔てられており、
前記スクライブ領域には、前記第1保護膜および前記第2保護膜は形成されていない、半導体装置の製造方法。 - 以下の工程を含む半導体装置の製造方法:
(a)主面と、前記主面を取り囲む周縁と、前記主面に形成された半導体素子を備える複数の第1チップと、複数の前記第1チップを取り囲み、前記周縁に接する複数の第2チップと、を有し、複数の前記第1チップのそれぞれに複数のボンディングパッドが形成された半導体ウェハを準備する工程;
(b)前記主面上に絶縁膜を形成する工程;
(c)前記第1チップの前記絶縁膜に、複数の第1開口部を形成して、前記第1開口部の底面に前記ボンディングパッドを露出させる工程;
(d)前記主面上に第1保護膜を形成する工程;
(e)前記第1チップの前記第1保護膜に、複数の第2開口部を形成して、平面視において前記第2開口部と重なる前記第1開口部の底面に前記ボンディングパッドを露出させる工程;
(f)前記第1開口部および前記第2開口部を介して、複数の前記ボンディングパッドとそれぞれ電気的に接続する複数の電極層を形成する工程;
(g)前記主面上に第2保護膜を形成する工程;
(h)前記第1チップの前記第2保護膜に、複数の第3開口部を形成して、前記第3開口部の底面に前記電極層を露出させ、前記第2チップの前記第1保護膜および前記第2保護膜に、複数の第4開口部を形成して、前記第4開口部の底面に前記絶縁膜を露出させる工程;
(i)複数の前記電極層とそれぞれ電気的に接続する複数の外部電極を形成する工程;
(j)前記主面上に、複数の前記外部電極を覆う保護テープを貼り付ける工程。 - 請求項6記載の半導体装置の製造方法において、
前記第4開口部の平面視における形状は、円形状、楕円形状、四角形状またはストライプ形状である、半導体装置の製造方法。 - 請求項6記載の半導体装置の製造方法において、
前記第2チップには、前記外部電極を形成しない、半導体装置の製造方法。 - 請求項6記載の半導体装置の製造方法において、
互いに隣り合う前記第1チップ間、互いに隣り合う前記第2チップ間および互いに隣り合う前記第1チップと前記第2チップとの間は、スクライブ領域により隔てられており、
前記スクライブ領域には、前記第1保護膜および前記第2保護膜は形成されていない、半導体装置の製造方法。 - 主面と、
前記主面を取り囲む周縁と、
前記主面に形成された半導体素子を備える複数の第1チップと、
複数の前記第1チップを取り囲み、前記周縁に接する複数の第2チップと、
複数の前記第1チップにそれぞれ形成された複数のボンディングパッドと、
前記複数のボンディングパッドを覆い、前記主面上に形成された絶縁膜と、
前記第1チップの前記絶縁膜に形成され、前記複数のボンディングパッドの上面の一部をそれぞれ露出する複数の第1開口部と、
前記絶縁膜上に形成された第1保護膜と、
前記第1チップの前記第1保護膜に形成され、平面視において複数の前記第1開口部とそれぞれ重なり、前記複数のボンディングパッドの上面の一部をそれぞれ露出する複数の第2開口部と、
前記第2チップの前記第1保護膜に形成され、前記絶縁膜を露出する複数の第3開口部と、
前記第1開口部および前記第2開口部を介して、前記複数のボンディングパッドとそれぞれ電気的に接続する複数の電極層と、
前記複数の電極層を覆い、前記主面上に形成された第2保護膜と、
前記第1チップの前記第2保護膜に形成され、前記複数の電極層の上面の一部をそれぞれ露出する複数の第4開口部と、
前記第2チップの前記第2保護膜に形成され、平面視において複数の前記第3開口部とそれぞれ重なり、前記絶縁膜を露出する複数の第5開口部と、
前記第4開口部を介して、前記複数の電極層とそれぞれ電気的に接続する複数の外部電極と、
複数の前記外部電極を覆い、前記主面上に貼り付けられた保護テープと、
を有する、半導体ウェハ。 - 請求項10記載の半導体ウェハにおいて、
前記第2チップの前記周縁に最も近い位置にある前記第5開口部の開口面積は、前記第1チップの前記第4開口部の開口面積よりも小さい、半導体ウェハ。 - 請求項10記載の半導体ウェハにおいて、
前記第2チップの前記第5開口部のピッチと、前記第1チップの前記第4開口部のピッチとは同じである、半導体ウェハ。 - 請求項10記載の半導体ウェハにおいて、
前記第5開口部の平面視における形状は、円形状、楕円形状、四角形状またはストライプ形状である、半導体ウェハ。 - 請求項10記載の半導体ウェハにおいて、
前記第2チップには、前記外部電極を有しない、半導体ウェハ。 - 請求項10記載の半導体ウェハにおいて、
前記第2チップでは、前記保護テープは、前記第1保護膜、前記第2保護膜および複数の前記第3開口部の底面にそれぞれ露出する前記絶縁膜と接する、半導体ウェハ。 - 請求項10記載の半導体ウェハにおいて、
互いに隣り合う前記第1チップ間、互いに隣り合う前記第2チップ間および互いに隣り合う前記第1チップと前記第2チップとの間は、スクライブ領域により隔てられており、
前記スクライブ領域では、前記第1保護膜および前記第2保護膜が形成されておらず、前記保護テープとは、前記絶縁膜と接する、半導体ウェハ。 - 請求項10記載の半導体ウェハにおいて、
前記保護テープと前記絶縁膜との接着力が、前記保護テープと前記第1保護膜および前記第2保護膜との接着力よりも弱い、半導ウェハ。 - 請求項10記載の半導体ウェハにおいて、
前記保護テープは、糊層と、ベース層と、前記糊層と前記ベース層との間に設けられた中間層とから構成され、
前記糊層および前記中間層は、前記ベース層よりも柔らかく、
前記糊層と前記中間層の合計の厚さが、前記外部電極の高さよりも厚い、半導体ウェハ。 - 請求項10記載の半導体ウェハにおいて、
前記絶縁膜は、窒化シリコン膜、酸化シリコン膜、または窒化シリコン膜と酸化シリコン膜との積層膜であり、前記第1保護膜および前記第2保護膜はポリイミド膜である、半導体ウェハ。 - 請求項10記載の半導体ウェハにおいて、
平面視における前記第3開口部の開口面積と、前記第5開口部の開口面積とが同じである、半導体ウェハ。
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