JP6497839B2 - インプリント装置及び物品の製造方法 - Google Patents

インプリント装置及び物品の製造方法 Download PDF

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Publication number
JP6497839B2
JP6497839B2 JP2013231575A JP2013231575A JP6497839B2 JP 6497839 B2 JP6497839 B2 JP 6497839B2 JP 2013231575 A JP2013231575 A JP 2013231575A JP 2013231575 A JP2013231575 A JP 2013231575A JP 6497839 B2 JP6497839 B2 JP 6497839B2
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JP
Japan
Prior art keywords
mold
contact
pattern
contact portion
shape
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Active
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JP2013231575A
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English (en)
Japanese (ja)
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JP2015090974A5 (enExample
JP2015090974A (ja
Inventor
悠輔 田中
悠輔 田中
弘稔 鳥居
弘稔 鳥居
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
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Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2013231575A priority Critical patent/JP6497839B2/ja
Priority to US14/533,992 priority patent/US10042250B2/en
Publication of JP2015090974A publication Critical patent/JP2015090974A/ja
Publication of JP2015090974A5 publication Critical patent/JP2015090974A5/ja
Application granted granted Critical
Publication of JP6497839B2 publication Critical patent/JP6497839B2/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
JP2013231575A 2013-11-07 2013-11-07 インプリント装置及び物品の製造方法 Active JP6497839B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2013231575A JP6497839B2 (ja) 2013-11-07 2013-11-07 インプリント装置及び物品の製造方法
US14/533,992 US10042250B2 (en) 2013-11-07 2014-11-05 Imprint apparatus, imprinting mold, and method of manufacturing article

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013231575A JP6497839B2 (ja) 2013-11-07 2013-11-07 インプリント装置及び物品の製造方法

Publications (3)

Publication Number Publication Date
JP2015090974A JP2015090974A (ja) 2015-05-11
JP2015090974A5 JP2015090974A5 (enExample) 2016-12-15
JP6497839B2 true JP6497839B2 (ja) 2019-04-10

Family

ID=53006458

Family Applications (1)

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JP2013231575A Active JP6497839B2 (ja) 2013-11-07 2013-11-07 インプリント装置及び物品の製造方法

Country Status (2)

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US (1) US10042250B2 (enExample)
JP (1) JP6497839B2 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6643048B2 (ja) * 2015-11-09 2020-02-12 キヤノン株式会社 基板を処理する装置、物品の製造方法、および気体供給経路
JP6808386B2 (ja) * 2016-07-12 2021-01-06 キヤノン株式会社 インプリント装置および物品製造方法
JP6882027B2 (ja) * 2017-03-16 2021-06-02 キヤノン株式会社 インプリント装置、および物品製造方法
JP7089375B2 (ja) * 2018-02-19 2022-06-22 キヤノン株式会社 平坦化装置
US12228854B2 (en) * 2021-11-12 2025-02-18 Canon Kabushiki Kaisha Layer forming system including cover with support pads, a positioning system with the cover and support pads, and a method of loading a plate

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050270516A1 (en) 2004-06-03 2005-12-08 Molecular Imprints, Inc. System for magnification and distortion correction during nano-scale manufacturing
JP2006165371A (ja) * 2004-12-09 2006-06-22 Canon Inc 転写装置およびデバイス製造方法
US8215946B2 (en) * 2006-05-18 2012-07-10 Molecular Imprints, Inc. Imprint lithography system and method
NL1036034A1 (nl) 2007-10-11 2009-04-15 Asml Netherlands Bv Imprint lithography.
NL2004735A (en) * 2009-07-06 2011-01-10 Asml Netherlands Bv Imprint lithography apparatus and method.
JP5669466B2 (ja) * 2010-07-12 2015-02-12 キヤノン株式会社 保持装置、インプリント装置及び物品の製造方法
JP5247777B2 (ja) * 2010-08-30 2013-07-24 キヤノン株式会社 インプリント装置およびデバイス製造方法
JP5395769B2 (ja) * 2010-09-13 2014-01-22 株式会社東芝 テンプレートチャック、インプリント装置、及びパターン形成方法
JP5744548B2 (ja) 2011-02-02 2015-07-08 キヤノン株式会社 保持装置、それを用いたインプリント装置および物品の製造方法
JP6140966B2 (ja) * 2011-10-14 2017-06-07 キヤノン株式会社 インプリント装置、それを用いた物品の製造方法
JP2013110162A (ja) 2011-11-17 2013-06-06 Canon Inc インプリント装置及び物品の製造方法
JP5661666B2 (ja) * 2012-02-29 2015-01-28 株式会社東芝 パターン形成装置及び半導体装置の製造方法
JP6071221B2 (ja) * 2012-03-14 2017-02-01 キヤノン株式会社 インプリント装置、モールド、インプリント方法及び物品の製造方法
JP6304934B2 (ja) * 2012-05-08 2018-04-04 キヤノン株式会社 インプリント装置および物品の製造方法

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Publication number Publication date
US20150123313A1 (en) 2015-05-07
US10042250B2 (en) 2018-08-07
JP2015090974A (ja) 2015-05-11

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