JP6484398B2 - 半導体装置 - Google Patents
半導体装置 Download PDFInfo
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- JP6484398B2 JP6484398B2 JP2015102078A JP2015102078A JP6484398B2 JP 6484398 B2 JP6484398 B2 JP 6484398B2 JP 2015102078 A JP2015102078 A JP 2015102078A JP 2015102078 A JP2015102078 A JP 2015102078A JP 6484398 B2 JP6484398 B2 JP 6484398B2
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- Prior art keywords
- light emitting
- emitting device
- semiconductor device
- external connection
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- 239000004065 semiconductor Substances 0.000 title claims description 41
- 230000000052 comparative effect Effects 0.000 description 7
- 239000000758 substrate Substances 0.000 description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 4
- 239000000956 alloy Substances 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 4
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 4
- 229910052737 gold Inorganic materials 0.000 description 4
- 239000010931 gold Substances 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 229910052709 silver Inorganic materials 0.000 description 4
- 239000004332 silver Substances 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 229910052763 palladium Inorganic materials 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
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Description
図1は実施形態1に係る半導体装置の模式的平面図であり、図2は図1中のA−A断面図であり、図3は図1中のB−B断面図である。また、図4は図3中の破線で囲んだ部分を拡大して示す図である。図1においては、理解を容易にするため、接合部材30の図示を省略している。図1から図4に示すように、実施形態1に係る半導体装置1は、第1面122と第1面122より高い第2面124とを有するランド部12を備える実装基板10と、第1面122上に配置される外部接続端子26を備える発光装置20と、少なくとも第2面124上に配置され、外部接続端子26とランド部12とを接合する接合部材30と、を備える半導体装置である。以下、順に説明する。なお、半導体装置1の平面視において、発光装置20の光軸に平行な方向の前方が正面側、その反対の後方が背面側であって、発光装置20の光軸に直交する方向が側方である。
実装基板10は、ガラスエポキシ樹脂、セラミック又はポリイミドなどからなる板状の母材を備えている。また、実装基板10は、母材上に、銅、金、銀、ニッケル、パラジウム、タングステン、クロム、チタン、又はこれらの合金などからなるランド部12や配線パターン11を備えている。ランド部12は、接合部材30の濡れ性の観点において、表面が金、銀、又はこれらの合金からなることが好ましい。ランド部12は配線パターン11に接続され、配線パターン11は外部電極などに接続される。ランド部12の数は特に限定されないが、外部接続端子26の数と同数であることが好ましい。本実施形態では外部接続端子26の数が2つであるため、ランド部12の数も2つとされている。ランド部12や配線パターン11は例えばメッキ、積層圧着、貼り付け、スパッタ、蒸着、エッチングなどの方法を用いて形成される。
発光装置20には側面発光型(「サイドビュー型」とも言う。)の発光装置などを用いることができる。具体的に説明すると、発光装置20は、半導体発光素子や封止部材(波長変換層、光反射層などを含む)などからなる発光部22と、パッケージ基材やリード電極などからなる配置部24と、外部接続端子26と、を備えている。発光部22は配置部24の正面に配置されている。なお、発光装置20には上面発光型(「トップビュー型」とも言う。)の発光装置を用いることもできる。上面発光型の発光装置の場合、発光部22は配置部24の上面に配置される。
接合部材30は例えば半田材料からなる。接合部材30は、外部接続端子26の一部領域を覆うよう外部接続端子26とランド部12とを接合する。接合部材30は、少なくとも第2面124上に配置されていればよいが、第1面122上と第2面124上とにわたり配置されていることが好ましい。このようにすれば、発光装置20(外部接続端子26)と接合部材30の接合面積が発光装置20(外部接続端子26)の下方側に向けて拡大するため、両者の接合強度をより高めることができる。なお、第2面124の第1面122側の端部E2を曲面状に形成すれば、溶融状態の接合部材30が段差を越えて第1面122上と第2面124上とに行きわたりやすくなるため、接合部材30を第1面122上と第2面124上とにわたり配置させやすくなる。
第1面122と発光装置20の上面との高低差L0は、特に限定されるものではないが、例えば、0.1mm以上0.8mm以下であることが好ましく、0.2mm以上0.4mm以下であることがより好ましい。また、第2面124と接合部材30の最上部との高低差L1は、特に限定されるものではないが、例えば、0.09mm以上0.5mm以下であることが好ましく、0.1mm以上0.3mm以下であることがより好ましい。また、第1面122と第2面124との高低差Tは、特に限定されるものではないが、例えば、0.01mm以上0.3mm以下であることが好ましく、0.015mm以上0.08mm以下であることがより好ましい。
図5は実施形態2に係る半導体装置の模式的平面図であり、図6は図5中のC−C断面を拡大して示す図であり、図7は図5中のD−D断面図である。図5においては、理解を容易にするため、接合部材30の図示を省略している。図5から図7に示すように、実施形態2に係る半導体装置2は、第2面124が、平面視において、発光装置20の正面側と、発光装置20の背面側と、に設けられている点で、実施形態1に係る半導体装置1と相違する。実施形態2に係る半導体装置1によれば、発光装置20が正面側と背面側に設けられた接合部材30により、発光装置20の正面側と背面側の両方から引っ張られるようになるため、より精度良く、発光装置20を所望の位置や向きで実装することが可能となる。
図8は実施形態3に係る半導体装置の模式的平面図であり、図9は図8中のE−E断面を拡大して示す図であり、図10は図8中のF−F断面図である。また、図11は図10中の破線で囲んだ部分を拡大して示す図である。図8においては、理解を容易にするため、接合部材30の図示を省略している。図9から図11に示すように、実施形態3に係る半導体装置3は、第2面124が平面視C字状に設けられる点で、実施形態1に係る半導体装置1と相違する。実施形態3に係る半導体装置3によれば、外部接続端子26を接合部材30でC字状に取り囲むことができるため、より精度良く、発光装置20を所望の位置や向きで実装することが可能となる。
以上、実施形態1から3について説明したが、第2面124の平面視における位置・形状は、これらの実施形態に限定されるものではない。第2面124は、平面視において様々な位置・形状に形成することができる。
比較例として、第2面124を備えていない点を除き実施形態2に係る半導体装置2と同じ構成を有する半導体装置において、第1面122と発光装置20の上面との高低差L0が0.3mmである場合について検討する。この場合、発光装置20の最上部に10Nの応力Pが生じたとすると、発光装置20の最下部を回転中心として発光装置20の最上部に加わるモーメントM0は次の値をとる。M0=P×(L0−L1)=2.00×10−3Nm。
10 実装基板
11 配線パターン
12 ランド部
122 第1面
124 第2面
20 発光装置
22 発光部
24 配置部
26 外部接続端子
30 接合部材
E1 第2面124の第1面122側とは反対側の端部
E2 第2面124の第1面122側の端部
L0 第1面122と発光装置20の上面との高低差
L1 第2面124と接合部材30の最上部との高低差
T 第1面122と第2面124との高低差
Claims (6)
- 第1面と前記第1面より高い第2面とを有するランド部を備える実装基板と、
前記第1面上に配置される配置部と、前記配置部に配置される発光部と、前記配置部の少なくとも一端に設けられ前記第1面上に配置される外部接続端子と、を備える発光装置と、
少なくとも前記第2面上に配置され、前記外部接続端子と前記ランド部とを接合する接合部材と、を備え、
前記第1面は、前記配置部の下面に接しており、
前記第2面は、前記外部接続端子から遠い側に断面視において角張った形状の第1端部を有するとともに、前記外部接続端子から近い側に断面視曲面状の第2端部を有する半導体装置。 - 前記第2面は、平面視において、前記発光装置の側方にある請求項1に記載の半導体装置。
- 前記発光装置は、前記発光部が前記配置部の正面に配置される側面発光型の発光装置であり、
前記第2面は、平面視において、前記発光装置の正面側と、前記発光装置の背面側と、にある請求項1又は2に記載の半導体装置。 - 前記発光装置の正面側における前記第2面の面積が、前記発光装置の背面側における前記第2面の面積より大きい請求項3に記載の半導体装置。
- 前記第2面は平面視C字状に設けられる請求項1から4のいずれか1項に記載の半導体装置。
- 前記接合部材は前記第1面上と前記第2面上とにわたり配置されている請求項1から5のいずれか1項に記載の半導体装置。
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JPH0521523A (ja) | 1991-07-17 | 1993-01-29 | Matsushita Electric Works Ltd | 半導体装置実装用基板 |
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