JP6470528B2 - 検出装置、計測装置、露光装置、物品の製造方法、および計測方法 - Google Patents

検出装置、計測装置、露光装置、物品の製造方法、および計測方法 Download PDF

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Publication number
JP6470528B2
JP6470528B2 JP2014181599A JP2014181599A JP6470528B2 JP 6470528 B2 JP6470528 B2 JP 6470528B2 JP 2014181599 A JP2014181599 A JP 2014181599A JP 2014181599 A JP2014181599 A JP 2014181599A JP 6470528 B2 JP6470528 B2 JP 6470528B2
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Japan
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JP2014181599A
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English (en)
Japanese (ja)
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JP2016058452A5 (enExample
JP2016058452A (ja
Inventor
昭郎 赤松
昭郎 赤松
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Canon Inc
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Canon Inc
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Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2014181599A priority Critical patent/JP6470528B2/ja
Priority to TW104128138A priority patent/TWI605314B/zh
Priority to US14/840,400 priority patent/US9534888B2/en
Priority to KR1020150123406A priority patent/KR101895834B1/ko
Priority to CN201510553038.6A priority patent/CN105467771B/zh
Publication of JP2016058452A publication Critical patent/JP2016058452A/ja
Publication of JP2016058452A5 publication Critical patent/JP2016058452A5/ja
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Publication of JP6470528B2 publication Critical patent/JP6470528B2/ja
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/26—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes
    • G01B11/27—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes for testing the alignment of axes
    • G01B11/272—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes for testing the alignment of axes using photoelectric detection means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2014181599A 2014-09-05 2014-09-05 検出装置、計測装置、露光装置、物品の製造方法、および計測方法 Expired - Fee Related JP6470528B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2014181599A JP6470528B2 (ja) 2014-09-05 2014-09-05 検出装置、計測装置、露光装置、物品の製造方法、および計測方法
TW104128138A TWI605314B (zh) 2014-09-05 2015-08-27 檢測裝置、測量裝置、曝光裝置、物品製造的方法、和測量方法
US14/840,400 US9534888B2 (en) 2014-09-05 2015-08-31 Detection apparatus, measurement apparatus, exposure apparatus, method of manufacturing article, and measurement method
KR1020150123406A KR101895834B1 (ko) 2014-09-05 2015-09-01 검출장치, 계측장치, 노광장치, 물품의 제조방법, 및 계측방법
CN201510553038.6A CN105467771B (zh) 2014-09-05 2015-09-01 检测装置、测量装置、曝光装置、物品制造方法和测量方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014181599A JP6470528B2 (ja) 2014-09-05 2014-09-05 検出装置、計測装置、露光装置、物品の製造方法、および計測方法

Publications (3)

Publication Number Publication Date
JP2016058452A JP2016058452A (ja) 2016-04-21
JP2016058452A5 JP2016058452A5 (enExample) 2017-10-12
JP6470528B2 true JP6470528B2 (ja) 2019-02-13

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JP2014181599A Expired - Fee Related JP6470528B2 (ja) 2014-09-05 2014-09-05 検出装置、計測装置、露光装置、物品の製造方法、および計測方法

Country Status (5)

Country Link
US (1) US9534888B2 (enExample)
JP (1) JP6470528B2 (enExample)
KR (1) KR101895834B1 (enExample)
CN (1) CN105467771B (enExample)
TW (1) TWI605314B (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6685821B2 (ja) * 2016-04-25 2020-04-22 キヤノン株式会社 計測装置、インプリント装置、物品の製造方法、光量決定方法、及び、光量調整方法
JP7186531B2 (ja) * 2018-07-13 2022-12-09 キヤノン株式会社 露光装置、および物品製造方法
EP3667423B1 (en) * 2018-11-30 2024-04-03 Canon Kabushiki Kaisha Lithography apparatus, determination method, and method of manufacturing an article
JP2022117091A (ja) 2021-01-29 2022-08-10 キヤノン株式会社 計測装置、リソグラフィ装置及び物品の製造方法
JP2022187831A (ja) * 2021-06-08 2022-12-20 キヤノン株式会社 計測装置、リソグラフィ装置及び物品の製造方法
KR102524462B1 (ko) * 2022-03-28 2023-04-21 (주)오로스 테크놀로지 오버레이 측정장치

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6332303A (ja) 1986-07-25 1988-02-12 Canon Inc アライメント装置
JPH07123103B2 (ja) * 1986-11-26 1995-12-25 株式会社ニコン 位置合わせ装置
US5734478A (en) * 1988-10-12 1998-03-31 Nikon Corporation Projection exposure apparatus
JP2819592B2 (ja) * 1989-03-03 1998-10-30 キヤノン株式会社 位置合わせ装置
JP3033135B2 (ja) * 1990-06-13 2000-04-17 株式会社ニコン 投影露光装置及び方法
JPH08264427A (ja) * 1995-03-23 1996-10-11 Nikon Corp アライメント方法及びその装置
JPH0954443A (ja) * 1995-08-18 1997-02-25 Nikon Corp 露光方法及び装置
JP3445100B2 (ja) * 1997-06-02 2003-09-08 キヤノン株式会社 位置検出方法及び位置検出装置
JP2002289495A (ja) * 2001-03-23 2002-10-04 Nikon Corp 露光装置、露光装置の製造方法及びマイクロデバイスの製造方法
US7626701B2 (en) 2004-12-27 2009-12-01 Asml Netherlands B.V. Lithographic apparatus with multiple alignment arrangements and alignment measuring method
JP2009192271A (ja) * 2008-02-12 2009-08-27 Canon Inc 位置検出方法、露光装置、及びデバイス製造方法
NL2008110A (en) * 2011-02-18 2012-08-21 Asml Netherlands Bv Measuring method, measuring apparatus, lithographic apparatus and device manufacturing method.
JP6066627B2 (ja) * 2012-08-23 2017-01-25 キヤノン株式会社 位置検出装置、およびそれを用いたリソグラフィー装置並びにデバイスの製造方法

Also Published As

Publication number Publication date
CN105467771B (zh) 2018-02-27
TW201617741A (zh) 2016-05-16
CN105467771A (zh) 2016-04-06
KR101895834B1 (ko) 2018-09-07
TWI605314B (zh) 2017-11-11
KR20160029673A (ko) 2016-03-15
JP2016058452A (ja) 2016-04-21
US9534888B2 (en) 2017-01-03
US20160070175A1 (en) 2016-03-10

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