CN105467771B - 检测装置、测量装置、曝光装置、物品制造方法和测量方法 - Google Patents

检测装置、测量装置、曝光装置、物品制造方法和测量方法 Download PDF

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Publication number
CN105467771B
CN105467771B CN201510553038.6A CN201510553038A CN105467771B CN 105467771 B CN105467771 B CN 105467771B CN 201510553038 A CN201510553038 A CN 201510553038A CN 105467771 B CN105467771 B CN 105467771B
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CN105467771A (zh
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赤松昭郎
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Canon Inc
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Canon Inc
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/26—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes
    • G01B11/27—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes for testing the alignment of axes
    • G01B11/272—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes for testing the alignment of axes using photoelectric detection means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
CN201510553038.6A 2014-09-05 2015-09-01 检测装置、测量装置、曝光装置、物品制造方法和测量方法 Active CN105467771B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2014-181599 2014-09-05
JP2014181599A JP6470528B2 (ja) 2014-09-05 2014-09-05 検出装置、計測装置、露光装置、物品の製造方法、および計測方法

Publications (2)

Publication Number Publication Date
CN105467771A CN105467771A (zh) 2016-04-06
CN105467771B true CN105467771B (zh) 2018-02-27

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CN201510553038.6A Active CN105467771B (zh) 2014-09-05 2015-09-01 检测装置、测量装置、曝光装置、物品制造方法和测量方法

Country Status (5)

Country Link
US (1) US9534888B2 (enExample)
JP (1) JP6470528B2 (enExample)
KR (1) KR101895834B1 (enExample)
CN (1) CN105467771B (enExample)
TW (1) TWI605314B (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6685821B2 (ja) * 2016-04-25 2020-04-22 キヤノン株式会社 計測装置、インプリント装置、物品の製造方法、光量決定方法、及び、光量調整方法
JP7186531B2 (ja) * 2018-07-13 2022-12-09 キヤノン株式会社 露光装置、および物品製造方法
EP3667423B1 (en) * 2018-11-30 2024-04-03 Canon Kabushiki Kaisha Lithography apparatus, determination method, and method of manufacturing an article
JP2022117091A (ja) * 2021-01-29 2022-08-10 キヤノン株式会社 計測装置、リソグラフィ装置及び物品の製造方法
JP2022187831A (ja) * 2021-06-08 2022-12-20 キヤノン株式会社 計測装置、リソグラフィ装置及び物品の製造方法
KR102524462B1 (ko) * 2022-03-28 2023-04-21 (주)오로스 테크놀로지 오버레이 측정장치

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4794426A (en) * 1986-11-26 1988-12-27 Nikon Corporation Alignment apparatus
US5138176A (en) * 1990-06-13 1992-08-11 Nikon Corporation Projection optical apparatus using plural wavelengths of light
US5734478A (en) * 1988-10-12 1998-03-31 Nikon Corporation Projection exposure apparatus
CN102645847A (zh) * 2011-02-18 2012-08-22 Asml荷兰有限公司 测量方法、测量设备、光刻设备及器件制造方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6332303A (ja) 1986-07-25 1988-02-12 Canon Inc アライメント装置
JP2819592B2 (ja) * 1989-03-03 1998-10-30 キヤノン株式会社 位置合わせ装置
JPH08264427A (ja) * 1995-03-23 1996-10-11 Nikon Corp アライメント方法及びその装置
JPH0954443A (ja) * 1995-08-18 1997-02-25 Nikon Corp 露光方法及び装置
JP3445100B2 (ja) * 1997-06-02 2003-09-08 キヤノン株式会社 位置検出方法及び位置検出装置
JP2002289495A (ja) * 2001-03-23 2002-10-04 Nikon Corp 露光装置、露光装置の製造方法及びマイクロデバイスの製造方法
US7626701B2 (en) * 2004-12-27 2009-12-01 Asml Netherlands B.V. Lithographic apparatus with multiple alignment arrangements and alignment measuring method
JP2009192271A (ja) * 2008-02-12 2009-08-27 Canon Inc 位置検出方法、露光装置、及びデバイス製造方法
JP6066627B2 (ja) * 2012-08-23 2017-01-25 キヤノン株式会社 位置検出装置、およびそれを用いたリソグラフィー装置並びにデバイスの製造方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4794426A (en) * 1986-11-26 1988-12-27 Nikon Corporation Alignment apparatus
US5734478A (en) * 1988-10-12 1998-03-31 Nikon Corporation Projection exposure apparatus
US5138176A (en) * 1990-06-13 1992-08-11 Nikon Corporation Projection optical apparatus using plural wavelengths of light
CN102645847A (zh) * 2011-02-18 2012-08-22 Asml荷兰有限公司 测量方法、测量设备、光刻设备及器件制造方法

Also Published As

Publication number Publication date
CN105467771A (zh) 2016-04-06
US9534888B2 (en) 2017-01-03
JP2016058452A (ja) 2016-04-21
JP6470528B2 (ja) 2019-02-13
TW201617741A (zh) 2016-05-16
KR101895834B1 (ko) 2018-09-07
KR20160029673A (ko) 2016-03-15
TWI605314B (zh) 2017-11-11
US20160070175A1 (en) 2016-03-10

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